Plasma etching Reactive-ion etching

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CPC
H01L21/3065

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3065Plasma etching Reactive-ion etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Polycrystalline SiC compact and method for manufacturing the same
- Patent number 12,368,026
- Issue date Jul 22, 2025
- Tokai Carbon Co., Ltd.
- Yohei Harada
- B24 - GRINDING POLISHING
Information Patent Grant
Electrostatic discharge prevention in ion beam system
- Patent number 12,368,117
- Issue date Jul 22, 2025
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Protective film agent and processing method of workpiece
- Patent number 12,368,049
- Issue date Jul 22, 2025
- Disco Corporation
- Sho Osawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Increasing source/drain dopant concentration to reduced resistance
- Patent number 12,369,342
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Jing Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial layers in source/drain contacts and methods of forming th...
- Patent number 12,369,386
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ding-Kang Shih
- C30 - CRYSTAL GROWTH
Information Patent Grant
Plasma etching apparatus and method
- Patent number 12,362,152
- Issue date Jul 15, 2025
- SPTS Technologies Limited
- Maxime Varvara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron extraction type free-wheeling diode device and preparation...
- Patent number 12,363,930
- Issue date Jul 15, 2025
- JSAB TECHNOLOGIES (SHENZHEN) LTD.
- Hao Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices related to radio frequency devices
- Patent number 12,362,191
- Issue date Jul 15, 2025
- Infineon Technologies Dresden GmbH & Co. KG
- Hans Taddiken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of gate all around device
- Patent number 12,363,948
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Myungsun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,363,959
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chuan Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field effect transistor with negative capacitance dielectric struct...
- Patent number 12,363,978
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and etching system
- Patent number 12,362,208
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical image capturing system, image capturing device and electron...
- Patent number 12,352,932
- Issue date Jul 8, 2025
- LARGAN PRECISION CO., LTD
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical integrated circuit structure including edge coupling protec...
- Patent number 12,353,034
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Chen-Hao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin height and STI depth for performance improvement in semiconduct...
- Patent number 12,356,710
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kun-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor device structure including bevel...
- Patent number 12,353,129
- Issue date Jul 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Sheng-Hui Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,656
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional selective deposition
- Patent number 12,347,674
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and manufacturing method of semiconductor...
- Patent number 12,347,693
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yu Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical device having a protrusion source
- Patent number 12,349,435
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- De-Fang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,347,645
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,646
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Bongseong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End point detection method and apparatus for anisotropic etching us...
- Patent number 12,347,663
- Issue date Jul 1, 2025
- SanDisk Technologies, Inc.
- Shoichi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching methods with alternating non-plasma and plasma etching proc...
- Patent number 12,341,017
- Issue date Jun 24, 2025
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and plasma processing apparatus
- Patent number 12,334,331
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of optimizing film deposition process in semiconductor fabri...
- Patent number 12,334,335
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Rei-Lin Chu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for plasma etching
- Patent number 12,334,353
- Issue date Jun 17, 2025
- SPTS Technologies Limited
- Weikang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure control device
- Patent number 12,334,355
- Issue date Jun 17, 2025
- Fujikin Incorporated
- Kaoru Hirata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH ASPECT RATIO CARBON LAYER ETCH WITH IMPROVED THROUGHPUT AND PR...
- Publication number 20250232981
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250234581
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jiun-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING NANOSHEET TRANSISTOR AND METHODS OF FAB...
- Publication number 20250234592
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bo Wei LAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDATION BASED ATOMIC LAYER ETCHING
- Publication number 20250232982
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Kangyi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE PATTERNING TECHNIQUES FOR FORMING A DEEP TRENCH ISOLATION ST...
- Publication number 20250233013
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Chao CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROTECTING A PERIPHERAL EDGE AND BACKSIDE OF A SEMICOND...
- Publication number 20250226208
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE INCLUDING DISCHARGE STRUCTURES AND METHOD F...
- Publication number 20250226231
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YAO-JEN TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ETCHING METHOD
- Publication number 20250226183
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...
- Publication number 20250226188
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATIVE HEAT WINDOWS AND WAFER SUPPORT PADS IN VAPOR ETCH REACTORS
- Publication number 20250218819
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Ilia Kalinovski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, REC...
- Publication number 20250218786
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Masato KAWANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250215320
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250221027
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Pi TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250218785
- Publication date Jul 3, 2025
- TES CO., LTD.
- Bongsoo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250220941
- Publication date Jul 3, 2025
- ENKRIS SEMICONDUCTOR, INC.
- Kai CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAULT ISOLATION FOR SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20250208061
- Publication date Jun 26, 2025
- Intel Corporation
- Megan KNAPP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple State Pulsing for High Aspect Ratio Etch
- Publication number 20250210364
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PACKAGING SEMICONDUCTOR DIES
- Publication number 20250210376
- Publication date Jun 26, 2025
- SPTS TECHNOLOGIES LIMITED
- Liam Andrew John CHARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20250210416
- Publication date Jun 26, 2025
- Kabushiki Kaisha Toshiba
- Etsuo HAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS
- Publication number 20250210362
- Publication date Jun 26, 2025
- SPTS TECHNOLOGIES LIMITED
- Eloise BOND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST ATOMIC LAYER ETCH
- Publication number 20250210363
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
- Publication number 20250210415
- Publication date Jun 26, 2025
- WINBOND ELECTRONICS CORP.
- Shih-Han Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH REDUCED LOADING EFFECT
- Publication number 20250212497
- Publication date Jun 26, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Lun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-Stimulated Etching of Silicon
- Publication number 20250210361
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation Of Gate All Around Device
- Publication number 20250203942
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Myungsun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TANTALUM ELECTRODE WITH TANTALUM NITRIDE LINER AS RIE DIFFUSION BAR...
- Publication number 20250201716
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Luxherta Buzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A FINFET WITH MERGED EXPITAXIAL SOURCE/DRAI...
- Publication number 20250203917
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Min LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND CHEMICAL VAPOR DEPOSITION APPARATUS FOR MANUFACTURING SE...
- Publication number 20250201568
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsz-Mei KWOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS AND METHOD
- Publication number 20250201592
- Publication date Jun 19, 2025
- HUAYING RESEARCH CO., LTD
- Sophia Ziying WEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING SUBSTRATES USING VAPOR ADSORPTION
- Publication number 20250201569
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS

Plasma etching Reactive-ion etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polycrystalline SiC compact and method for manufacturing the same

Electrostatic discharge prevention in ion beam system

Plasma processing method

Protective film agent and processing method of workpiece

Increasing source/drain dopant concentration to reduced resistance

Epitaxial layers in source/drain contacts and methods of forming th...

Plasma etching apparatus and method

Ion beam etching chamber with etching by-product redistributor

Electron extraction type free-wheeling diode device and preparation...

Methods and devices related to radio frequency devices

Formation of gate all around device

Semiconductor device and method

Field effect transistor with negative capacitance dielectric struct...

Inspection method and etching system

Optical image capturing system, image capturing device and electron...

Optical integrated circuit structure including edge coupling protec...

Fin height and STI depth for performance improvement in semiconduct...

Method for preparing semiconductor device structure including bevel...

Plasma processing apparatus

Directional selective deposition

Plasma processing method and manufacturing method of semiconductor...

Vertical device having a protrusion source

Substrate processing method and substrate processing apparatus

Plasma processing apparatus

End point detection method and apparatus for anisotropic etching us...

Etching methods with alternating non-plasma and plasma etching proc...

Substrate processing method and plasma processing apparatus

Method of optimizing film deposition process in semiconductor fabri...

Method and apparatus for plasma etching

Pressure control device

Patents Applicationslast 30 patents

HIGH ASPECT RATIO CARBON LAYER ETCH WITH IMPROVED THROUGHPUT AND PR...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE HAVING NANOSHEET TRANSISTOR AND METHODS OF FAB...

OXIDATION BASED ATOMIC LAYER ETCHING

DOUBLE PATTERNING TECHNIQUES FOR FORMING A DEEP TRENCH ISOLATION ST...

METHODS FOR PROTECTING A PERIPHERAL EDGE AND BACKSIDE OF A SEMICOND...

SEMICONDUCTOR STRUCTURE INCLUDING DISCHARGE STRUCTURES AND METHOD F...

PLASMA TREATMENT DEVICE AND ETCHING METHOD

PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...

RADIATIVE HEAT WINDOWS AND WAFER SUPPORT PADS IN VAPOR ETCH REACTORS

METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, REC...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

FAULT ISOLATION FOR SEMICONDUCTOR DEVICE MANUFACTURING

Multiple State Pulsing for High Aspect Ratio Etch

METHOD OF PACKAGING SEMICONDUCTOR DIES

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS

FAST ATOMIC LAYER ETCH

MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE

SEMICONDUCTOR DEVICE WITH REDUCED LOADING EFFECT

Electron-Stimulated Etching of Silicon

Formation Of Gate All Around Device

TANTALUM ELECTRODE WITH TANTALUM NITRIDE LINER AS RIE DIFFUSION BAR...

METHOD OF MANUFACTURING A FINFET WITH MERGED EXPITAXIAL SOURCE/DRAI...

METHOD AND CHEMICAL VAPOR DEPOSITION APPARATUS FOR MANUFACTURING SE...

SEMICONDUCTOR PROCESSING APPARATUS AND METHOD

ETCHING SUBSTRATES USING VAPOR ADSORPTION