Polishing pad

Information

  • Patent Grant
  • 6358130
  • Patent Number
    6,358,130
  • Date Filed
    Thursday, September 28, 2000
    24 years ago
  • Date Issued
    Tuesday, March 19, 2002
    22 years ago
Abstract
A polishing pad for use with a polishing fluid has, a polishing layer, a window in an opening through the polishing layer, and a fluid impermeable layer spanning across the polishing layer and the window and the opening to provide an uninterrupted continuous barrier to leakage of polishing fluid, the fluid impermeable layer having thereon an adhesive forming bond seals with the polishing layer and the window.
Description




FIELD OF THE INVENTION




The invention relates to a polishing pad having a transparent window through which an optical beam is transmitted for an optical apparatus to detect the status of a workpiece during a polishing operation.




SUMMARY OF THE INVENTION




The invention resides in a polishing pad for use with a polishing fluid, wherein the polishing pad has, a polishing layer, a window in an opening through the polishing layer, and a fluid impermeable layer spanning across the polishing layer and the window and the opening to provide an uninterrupted continuous barrier to leakage of polishing fluid, the fluid impermeable layer having thereon an adhesive that forms bond seals with the polishing layer and the window. An advantage is that the fluid impermeable layer, being uninterrupted, avoids a tendency to produce leakage paths due to bending during routine handling, or due to exertion of polishing pressure during use of the polishing pad, or due to small voids or gaps in the adhesive. A further advantage is that the bond seals minimize wetting by the polishing fluid of the interface between the adhesive and each of the polishing layer, the window and the fluid impermeable layer.











BRIEF DESCRIPTION OF THE DRAWINGS




The invention will now be described by way of example with reference to the accompanying drawings wherein:





FIG. 1

is a top plan view of a polishing pad having a transparent window;





FIG. 2

is an enlarged cross-sectional view through a portion of a polishing pad having a transparent window and an unsuccessful seal; and





FIG. 3

is an enlarged cross-sectional view of a portion of the polishing pad disclosed in

FIG. 1

, further disclosing a transparent window and an uninterrupted seal according to the invention.











DETAILED DESCRIPTION




As shown in

FIG. 2

, an unsuccessful, polishing pad is a two layer pad that includes an upper polishing layer


10


of IC1000 material and a lower backing layer


20


of Suba IV material, both of which materials are made by Rodel, Inc. The transparent window


30


is made from a piece of optical transmissive polymeric material which is installed in an opening


16


in the polishing layer


10


of the polishing pad. An opening


18


in the lower layer


20


is aligned with and is smaller than the opening


16


, thereby forming a ledge


26


that served as a seat for the window


30


. A seal was attempted between the window


30


and the ledge


26


, which would prevent polishing fluid, in the form of slurry and/or de-ionized water, from leaking past the window


30


and causing interference with an optical beam from optical equipment. Previously, a seal was attempted to be established between the window


30


and the ledge


26


by an adhesive film


32


configured with a cutout


34


which matched the opening


18


in the lower layer


20


, and the window piece was sealed by the adhesive seal overlying the ledge


26


on the lower layer


20


. However, leakage could still occur if the adhesive seal was defective or became damaged as could occur by bending the polishing pad.




The invention will be described with reference to FIG.


3


. According to an embodiment, the invention provides a polishing pad having a polishing layer


10


, and a window


30


in an opening


16


through the polishing layer


10


, which are covered by an underlying, continuous, optically transmissive, fluid impermeable layer


40


having adhesive


41


that forms bond seals with the polishing layer


10


and the window


30


. The bond seals resist wetting by the polishing fluid of an interface between the adhesive


41


and each of, the polishing layer


10


and the window


30


and the fluid impermeable layer


40


.




Another embodiment of the polishing pad


10


according to the invention comprises, a lower backing layer


20


, together with, a polishing layer


10


and a window


30


in an opening


16


through the polishing layer


10


, which are covered by, and bond sealed to adhesive


41


on both, opposite sides of an underlying, fluid impermeable layer


40


. The adhesive


41


on the both sides forms bond seals with the lower backing layer, the polishing layer and the window


30


. The backing layer


20


has a top face


22


and a bottom face


24


. The bond seals resist wetting by the polishing fluid of an interface between the adhesive


41


and each of, the polishing layer


10


, the window


30


, the fluid impermeable layer


40


and the backing layer


20


. The polishing layer


10


and the backing layer


20


are adhered together by the fluid impermeable layer


40


which includes adhesive


41


.




The polishing layer


10


is preferably a layer of IC1000 material, and the backing layer


20


is preferably a layer of Suba IV material, both of which materials are made by Rodel, Inc., of Newark, Del. The polishing layer


10


has a top polishing face


12


and a bottom face


14


.




The polishing layer


10


and the backing layer


20


are substantially opaque. A transparent window


30


is disposed in an opening


16


in the polishing layer


10


. The transparent window


30


is made of an optically transmissive, or light-transmissive, material to permit an optical beam from a known optical equipment or apparatus to pass through the polishing pad while the polishing pad is being used for polishing a workpiece (not shown). An optically transmissive material is known from U.S. Pat. No. 5,893,796.




The opening


16


extends through the thickness of the polishing layer


10


from the polishing face


12


to the bottom face


14


, and the transparent window


30


lies in the opening


16


within this thickness. The opening


16


is axially aligned above an opening


18


extending through the thickness of the backing layer from the top face


22


to the bottom face


24


.




The opening


18


is smaller in circumference than the circumference of the opening


16


. The backing layer


20


around a periphery of the opening


18


forms a circumferential ledge


26


that serves as a seat for the transparent window


30


and the fluid impermeable layer


40


.




According to the invention, the fluid impermeable layer


40


is uninterrupted as it spans an area between the openings


16


and


18


beneath the transparent window


30


. By uninterrupted it is meant that the fluid impermeable layer


40


is continuous without an aperture or passageway through which polishing fluid could flow through the layer


40


from the opening


16


to the opening


18


.




For example, the fluid impermeable layer


40


comprises a flexible, thin film of optically transmissive hydrophobic polymeric material that is used in minimized thickness to maximize its optical transparency, such as, polyethyleneteraphthalate, which is coated with a thin layer of the adhesive


41


on its opposite major surfaces.




The adhesive


41


is a pressure sensitive adhesive that is hydrophobic, and that is used in minimized thickness to maximize its optical transparency, for example, a synthetic rubber based adhesive from Rodel, Inc., of Newark, Del., and known as 3M442 commercially available from 3M Company, Minneapolis, Minn., USA, and further, for example, an acrylic based adhesive known as Rodel PSA V, Adchem 2019, commercially available from Rodel, Inc. of Newark, Del., and further for example, a metal-free acrylic adhesive known as, Rodel PSA VII, Adhesive Research Development 8049-28, commercially available from Rodel, Inc. of Newark, Del., and further for example, a metal-free acrylic adhesive known as, Rodel PSA VII, Adhesive Research Development 8119-28, commercially available from Rodel, Inc. of Newark, Del. Further, for example, the fluid impermeable layer


40


is fabricated as a film with opposite sides having adhesive


41


permanently adhered to the film, and the adhesive


41


on each of the opposite sides being covered and protected by a peel away covering film, not shown.




The peel away covering film is removed to expose the adhesive


41


on the fluid impermeable layer


40


for application in contact with the bottom face


14


of the polishing layer


10


and the entire bottom surface of the transparent window


30


. Pressure is applied to thereby adhere the adhesive


41


to the polishing layer


10


and the window


30


with a water repellant, hydrophobic bond seal. In particular, the adhesive


41


adheres to the bottom face


14


, and circumscribes around a periphery of the cutout


16


, and also adheres to the entire bottom surface of the transparent window


30


. The adhesive


41


on the bottom of the fluid impermeable layer


40


is exposed by removal of the peel away covering film, to adhere the polishing pad to a platen of a known polishing machine, not shown, or to adhere the polishing pad to a backing layer


20


.




According to an embodiment, the invention provides a polishing pad having a polishing layer


10


, and a window


30


in an opening


16


through the polishing layer


10


, which are covered by, and bond sealed to, an underlying, fluid impermeable layer


40


having adhesive


41


on both sides. Polishing fluid, such as slurry or de-ionized water, is delivered to the polishing face


12


. The fluid impermeable layer


40


that is adhesively bond sealed to the undersurfaces of the polishing layer


10


and the transparent window


30


, serves as an uninterrupted continuous, fluid impermeable barrier to polishing fluid that leaks into the opening


16


around the transparent window


30


or that leaks beneath the polishing layer


10


.




If there is any gap in the bond seal provided by the adhesive


41


with either the polishing layer


10


or the window


30


, any polishing fluid which leaks through such a gap will be contained against an uninterrupted continuous, fluid impermeable barrier provided by the fluid impermeable layer


40


that covers and spans across the opening


16


and the back face


14


of the polishing layer


10


and the back side of the window


30


.




The uninterrupted fluid impermeable layer


40


eliminates reliance upon a seal imbedded in the opening


16


between the window


30


and the polishing layer


10


.




Although an embodiment of the invention has been described, other embodiments and modifications are intended to be covered by the spirit and scope of the appended claims.



Claims
  • 1. A polishing pad for use with a polishing fluid comprising:a polishing layer and a window in an opening through the polishing layer, the undersurfaces of which are covered by an underlying fluid impermeable layer; an adhesive on the fluid impermeable layer forming respective bond seals with the polishing layer and the window to resist wetting of an interface between the adhesive and each of, the polishing layer and the window and the fluid impermeable layer; the fluid impermeable layer spanning the polishing layer; the fluid impermeable layer being optically transmissive and spanning across the window and the opening; and the fluid impermeable layer being a continuous barrier to leakage of polishing fluid.
  • 2. The polishing pad of claim 1 wherein, the fluid impermeable layer comprises, a flexible thin film of hydrophobic polymeric material.
  • 3. The polishing pad of claim 1 wherein, the adhesive is of minimized thickness to maximize its optical transparency.
  • 4. The polishing pad of claim 1 wherein, the adhesive is a pressure sensitive adhesive that is hydrophobic.
  • 5. The polishing pad of claim 1, and further comprising, a backing layer adhered to the fluid impermeable layer, with the fluid impermeable layer being between the backing layer and the polishing layer, and an opening through the backing layer, the opening through the backing layer being aligned with the window in the opening through the polishing layer.
  • 6. The polishing pad of claim 5 wherein, the backing layer around a periphery of the opening through the backing layer forms a circumferential ledge that serves as a seat for the window and the fluid impermeable layer.
  • 7. The polishing pad of claim 5 wherein, the opening through the backing layer is smaller in circumference than the opening through the polishing layer.
  • 8. The polishing pad of claim 5 wherein, additional adhesive adheres the backing layer to the fluid impermeable layer.
  • 9. The polishing pad of claim 8 wherein, the additional adhesive is of minimized thickness to maximize its optical transparency.
  • 10. The polishing pad of claim 8 wherein, the additional adhesive is a pressure sensitive adhesive that is hydrophobic.
CROSS REFERENCE TO RELATED APPLICATION

This application claims the benefit of U.S. Provisional Patent Application Serial No. 60/156,614 filed on Sep. 29, 1999. Semiconductor wafers having integrated circuits fabricated thereon must be polished to provide a very smooth and flat wafer surface which in some cases may vary from a given plane by as little as a fraction of a micron. Such polishing is usually accomplished in a chemical-mechanical polishing (CMP) operation which utilizes a chemically active slurry that is buffed against the wafer surface by a polishing pad. U.S. Pat. No. 5,893,796 discloses a polishing pad for use with a polishing fluid, the polishing pad having, a polishing layer and a window in an opening through the polishing layer. The window transmits an optical beam for detection of the presence or absence of a thickness of material being removed from a semiconductor wafer by a CMP polishing operation. One of the problems to be faced is to prevent polishing fluid from leaking beyond the polishing layer and, thereby, causing optical interference with the optical beam being transmitted by the window. To prevent leakage, an adhesive seal is imbedded in the opening between the window and the fluid impermeable layer. However, the seal can be defective by having a leakage path due to a gap in the adhesive seal. Further, the polishing pad is thin and, thereby, is easily bent, which tends to develop a crack or separation of the adhesive from the sides of the opening, due to bending during routine handling of the polishing pad, or due to exertion of polishing pressure during use of the polishing pad, or due to small voids or gaps in the adhesive.

US Referenced Citations (6)
Number Name Date Kind
5893796 Birang et al. Apr 1999 A
6077783 Allman et al. Jun 2000 A
6102775 Ushio et al. Aug 2000 A
6146248 Jairath et al. Nov 2000 A
6190234 Swedek et al. Feb 2001 B1
6213845 Elledge Apr 2001 B1
Foreign Referenced Citations (1)
Number Date Country
0 663 265 Jul 1995 EP
Provisional Applications (1)
Number Date Country
60/156614 Sep 1999 US