Claims
- 1. An extruded film having a thickness of about 0.5 to about 10 mils comprising about 0.1 to about 50 percent by weight of an aromatic sulfone polymer, and about 99.9 to about 50 percent by weight of an amide-imide phthalamide copolymer comprising recurring amide-imide units A: ##STR10## and recurring amide units B: ##STR11## wherein the molar ratio of A to B units is about 80 to about 20 to about 20 to about 80, wherein R is a divalent aromatic hydrocarbon radical of from about 6 to about 20 carbon atoms or two divalent hydrocarbons joined directly or by stable linkages selected from the group consisting of --O--, methylene, --CO--, --SO.sub.2 -- and X is a divalent aromatic radical.
- 2. The extruded film of claim 1 wherein the aromatic sulfone polymer is of the following repeating structure: ##STR12##
- 3. The extruded film of claim 1 wherein the molar ratio of A units to B units is about 1 to about 1.
- 4. The extruded film of claim 3 wherein the aromatic sulfone polymer comprises the following repeating structure: ##STR13##
- 5. The extruded film of claim 4 wherein said amide-imide phthalamide copolymer comprises about 90 to about 70 percent by weight of said film, said aromatic sulfone polymer comprises about 10 to about 30 percent by weight of said film, and R and X are the same and have the following structure: ##STR14##
- 6. The extruded film of claim 4 wherein X and R are the same and have the following structure: ##STR15##
- 7. A process for forming an amide-imide phthalamide copolymer film with improved tensile properties which comprises forming a blend by combining (1) about 99.9 to about 50 percent by weight of an amide-imide phthalamide copolymer having recurring amide units A: ##STR16## which are capable of undergoing imidization and recurring amide units B: ##STR17## wherein the molar ratio of A units to B units is about 80 to about 20 to about 20 to about 80, wherein R is a divalent aromatic hydrocarbon radical of from about 6 to about 20 carbon atoms or two divalent hydrocarbons joined directly or by stable linkages selected from the group consisting --O--, methylene, --CO--, --SO.sub.2 --, and wherein X is a divalent aromatic radical and .fwdarw. denotes isomerization, and (2) about 0.1 to about 50 percent by weight of a polyethersulfone having the following repeating structure: ##STR18## and extruding said blend to form a film having a thickness of about 0.5 to about 10 mils.
- 8. The process of claim 7 wherein the molar ratio of A units to B units is about 1 to about 1.
- 9. The process of claim 8 wherein said amide-imide phthalamide copolymer comprises about 90 to about 70 percent by weight of said blend, said polyethersulfone comprises about 10 to about 30 percent by weight of said blend, and R and X are the same and have the following structure: ##STR19##
- 10. A process for forming an amide-imide phthalamide copolymer film with improved tensile properties which comprises forming a blend by combining (1) about 99.9 to about 50 percent by weight of an amide-imide phthalamide copolymer having recurring amide-imide units A: ##STR20## and recurring amide units B: ##STR21## wherein the molar ratio of A units to B units is about 80 to about 20 to about 20 to about 80 wherein R is a divalent aromatic hydrocarbon radical of from about 6 to about 20 carbon atoms or two divalent hydrocarbons joined directly or by stable linkages selected from the group consisting of --O--, methylene, --CO--, --SO.sub.2 --, and wherein X is a divalent aromatic radical, and (2) about 0.1 to about 50 percent by weight of a polyethersulfone having the following repeating structure: ##STR22## and extruding said blend to form a film having a thickness of about 0.5 to about 10 mils.
- 11. The process of claim 10 wherein the molar ratio of A units to B units is about 1 to about 1.
- 12. The process of claim 11 wherein said amide-imide phthalamide copolymer comprises about 90 to about 70 percent by weight of said blend, said polyethersulfone comprises about 10 to about 30 percent by weight of said blend, and R and X are the same and have the following structure: ##STR23##
Parent Case Info
This is a continuation of application Ser. No. 787,252, filed Oct. 15, 1985, which in turn is a continuation of Ser. No. 595,276 filed Mar. 30, 1984, both now abandoned.
US Referenced Citations (4)
Continuations (2)
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Number |
Date |
Country |
Parent |
787252 |
Oct 1985 |
|
Parent |
595276 |
Mar 1984 |
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