Claims
- 1. A polishing pad comprising a urethane made from both a polyether polyol and a polyester polyol, wherein said urethane has the following properties: a density of greater than 0.5 g/cm.sup.3 a critical surface tension greater than or equal to 34 milliNewtons per meter, a tensile modulus of 0.02 to 5 GigaPascals, a ratio of tensile modulus at 30.degree. C. to the modulus at 60.degree. C. in the range of 1.0 to 2.5, hardness of 25 to 80 Shore D, a yield stress of 300 to 6000 psi, a tensile strength of 500 to 15000 psi, and an elongation to break up to 500%.
- 2. A polishing pad according to claim 1 wherein said polyether polyol and said polyester polyol are co-reacted.
- 3. A polishing pad according to claim 2 wherein said polyether polyol and said polyester polyol are diols.
- 4. A polishing pad according to claim 1 wherein said polyether polyol and said polyester polyol are diols.
- 5. A method for manufacturing a polishing pad comprising:
- a) providing a substrate;
- b) coating said substrate with a urethane polymer solution comprised of both a polyether polyol and a polyester polyol;
- c) coagulating said urethane polymer;
- d) drying said urethane polymer.
- 6. A method for manufacturing a polishing pad according to claim 5 wherein the top skin of said dried urethane polymer is removed.
Parent Case Info
This application claims the benefit of U.S. Provisional Application Ser. No. 60/059,753 filed Sep. 23, 1997.
US Referenced Citations (6)