characterised by the composition or properties of the pad materials

Industry

CPC
B24B37/24

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B24Grinding technology B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS B24B37/00Lapping machines or devices Accessories

Current Industry

B24B37/24characterised by the composition or properties of the pad materials

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Buffing spherocylinder made of compressed material
- Patent number 12,275,120
- Issue date Apr 15, 2025
- Lake Country Manufacturing, Inc.
- Scott S. McLain
- B24 - GRINDING POLISHING
Information Patent Grant
CMP polishing pad with window having transparency at low wavelength...
- Patent number 12,275,116
- Issue date Apr 15, 2025
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Fabrication of a polishing pad for chemical mechanical polishing
- Patent number 12,269,141
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Hsuan Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive composition and method of manufacturing same
- Patent number 12,263,556
- Issue date Apr 1, 2025
- MOLLECULAR BOND SUPERABRASIVES, LLC
- Samuel Lyman Munson
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and method of fabricating semiconductor device using...
- Patent number 12,258,460
- Issue date Mar 25, 2025
- SK ENPULSE CO., LTD.
- Eun Sun Joeng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polyurethane for polishing layers, polishing layer and polishing pad
- Patent number 12,252,634
- Issue date Mar 18, 2025
- Kuraray Co., Ltd.
- Mitsuru Kato
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and method of fabricating semiconductor device using...
- Patent number 12,246,408
- Issue date Mar 11, 2025
- SK ENPULSE CO., LTD.
- Eun Sun Joeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing pad and preparation thereof
- Patent number 12,220,784
- Issue date Feb 11, 2025
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Microreplicated polishing surface with enhanced co-planarity
- Patent number 12,208,483
- Issue date Jan 28, 2025
- 3M Innovative Properties Company
- Kenneth A. P. Meyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing pad, method for manufacturing polishing pad, and polishin...
- Patent number 12,186,855
- Issue date Jan 7, 2025
- Kuraray Co., Ltd.
- Mitsuru Kato
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization tool
- Patent number 12,172,263
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Michael Yen
- B24 - GRINDING POLISHING
Information Patent Grant
Containment and exhaust system for substrate polishing components
- Patent number 12,145,236
- Issue date Nov 19, 2024
- Axus Technology, LLC
- Daniel Ray Trojan
- B24 - GRINDING POLISHING
Information Patent Grant
CMP polishing pad with enhanced rate
- Patent number 12,138,737
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials Holdings, Inc.
- Mohammad T. Islam
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, preparation method thereof and method for preparing...
- Patent number 12,138,738
- Issue date Nov 12, 2024
- SK ENPULSE CO., LTD.
- Jae In Ahn
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad sheet, polishing pad, and method for manufacturing se...
- Patent number 12,138,736
- Issue date Nov 12, 2024
- SK ENPULSE CO., LTD.
- Sung Hoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Composition for polishing pad and polishing pad
- Patent number 12,122,013
- Issue date Oct 22, 2024
- SK ENPULSE CO., LTD.
- Jong Wook Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Compositions and foam compositions containing composite particles,...
- Patent number 12,110,375
- Issue date Oct 8, 2024
- 3M Innovative Properties Company
- Joshua M. Fishman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Modification method of polyurethane, polyurethane, polishing pad, a...
- Patent number 12,109,665
- Issue date Oct 8, 2024
- Kuraray Co., Ltd.
- Azusa Oshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Magnetorheological-elastomer polishing pad for chemical mechanical...
- Patent number 12,083,647
- Issue date Sep 10, 2024
- GUANGDONG UNIVERSITY OF TECHNOLOGY
- Jiabin Lu
- B24 - GRINDING POLISHING
Information Patent Grant
Self-healing polishing pad
- Patent number 12,087,590
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Hao Kung
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with improved crosslinking density and process for pr...
- Patent number 12,076,832
- Issue date Sep 3, 2024
- SK ENPULSE CO., LTD.
- Jong Wook Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Method of using polishing pad
- Patent number 12,070,833
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- ChunHung Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Formulations for high porosity chemical mechanical polishing pads w...
- Patent number 12,064,846
- Issue date Aug 20, 2024
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bryan E. Barton
- B24 - GRINDING POLISHING
Information Patent Grant
Formulations for chemical mechanical polishing pads with high plana...
- Patent number 12,064,845
- Issue date Aug 20, 2024
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bryan E. Barton
- B24 - GRINDING POLISHING
Information Patent Grant
Rigid backsize to prevent fiber disc curling
- Patent number 12,059,773
- Issue date Aug 13, 2024
- Saint-Gobain Abrasives, Inc.
- Timothy Jerome Coogan
- B24 - GRINDING POLISHING
Information Patent Grant
Synthetic grindstone, synthetic grindstone assembly, and method of...
- Patent number 12,053,854
- Issue date Aug 6, 2024
- Tokyo Diamond Tools Mfg. Co., Ltd.
- Kai Kyoshima
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing articles and integrated system and methods for manufactur...
- Patent number 12,023,853
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Kasiraman Krishnan
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method
- Patent number 12,017,322
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Chang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing apparatus
- Patent number 12,020,946
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ld.
- Yu-Ping Tseng
- B24 - GRINDING POLISHING
Information Patent Grant
Additive manufacturing of polishing pads
- Patent number 12,006,442
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Atul Bhaskar Chaudhari
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POLISHING LAYER, POLISHING PAD, METHOD FOR MANUFACTURING POLISHING...
- Publication number 20250153304
- Publication date May 15, 2025
- KURARAY CO., LTD.
- Azusa SUNAYAMA
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING...
- Publication number 20250153305
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Yehwan KIM
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAIN...
- Publication number 20250144767
- Publication date May 8, 2025
- SK enpulse Co., Ltd.
- Younghwan KIM
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND PROCESS FOR PREPARING THE SAME
- Publication number 20250144763
- Publication date May 8, 2025
- SK enpulse Co., Ltd.
- Younghwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD, METHOD FOR PRODUCING POLISHING PAD, AND METHOD FOR P...
- Publication number 20250144765
- Publication date May 8, 2025
- FUJIBO HOLDINGS, INC.
- Yoshihide KAWAMURA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE US...
- Publication number 20250144766
- Publication date May 8, 2025
- SK enpulse Co., Ltd.
- Yujin SHIN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
EDGE AND HOT SPOT COMPENSATION TECHNIQUES IN CHEMICAL MECHANICAL PO...
- Publication number 20250114897
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Zhize Zhu
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD WITH DECOUPLED MEMBRANE POSITION CONTROL
- Publication number 20250108473
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Andrew J. Nagengast
- B24 - GRINDING POLISHING
Information Patent Application
SPONGE-LIKE POROUS BODY, POLISHING PAD, LIQUID ABSORBING PAD, CLEAN...
- Publication number 20250108478
- Publication date Apr 3, 2025
- Canon Kabushiki Kaisha
- SHINJI FUKUI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20250100100
- Publication date Mar 27, 2025
- DuPont Electronic Materials Holding, Inc.
- Fengji YEH
- B24 - GRINDING POLISHING
Information Patent Application
WAFER DOUBLE-SIDE POLISHING APPARATUS AND METHOD OF EVALUATING THE...
- Publication number 20250100102
- Publication date Mar 27, 2025
- SK SILTRON CO., LTD.
- Hyung Rak LEE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20250100099
- Publication date Mar 27, 2025
- DuPont Electronic Materials Holding, Inc.
- Fengji YEH
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL PLANARIZATION OF NON-METALLIC MATERIALS
- Publication number 20250091176
- Publication date Mar 20, 2025
- CHEMPOWER CORPORATION
- Sudhanshu Misra
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD
- Publication number 20250083278
- Publication date Mar 13, 2025
- KURARAY CO., LTD.
- Azusa SUNAYAMA
- B24 - GRINDING POLISHING
Information Patent Application
MULTILAYER CMP PADS
- Publication number 20250073842
- Publication date Mar 6, 2025
- Rajeev BAJAJ
- B24 - GRINDING POLISHING
Information Patent Application
ECO-FRIENDLY POLISHING PAD AND MANUFACTURING METHOD THEREOF
- Publication number 20250065467
- Publication date Feb 27, 2025
- SK enpulse Co., Ltd.
- Mingyeong JI
- B24 - GRINDING POLISHING
Information Patent Application
CONTAINMENT AND EXHAUST SYSTEM FOR SUBSTRATE POLISHING COMPONENTS
- Publication number 20250065473
- Publication date Feb 27, 2025
- AXUS TECHNOLOGY, LLC
- Daniel Ray Trojan
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND POLISHING APPARATUS
- Publication number 20250065468
- Publication date Feb 27, 2025
- Canon Kabushiki Kaisha
- YOSHIKI KONUMA
- B24 - GRINDING POLISHING
Information Patent Application
LEVERAGED POROMERIC POLISHING PAD
- Publication number 20250058426
- Publication date Feb 20, 2025
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Wei-Wen TSAI
- B24 - GRINDING POLISHING
Information Patent Application
UV CURABLE PRINTABLE FORMULATIONS FOR POROSITY CONTROL IN HIGH PERF...
- Publication number 20250034296
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Xinyi LU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD FORMED FROM DUAL CURATIVE
- Publication number 20250033161
- Publication date Jan 30, 2025
- DuPont Electronic Materials Holding, Inc.
- Fengji Yeh
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING PAD
- Publication number 20250025983
- Publication date Jan 23, 2025
- DuPont Electronic Materials Holding, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS
- Publication number 20250018525
- Publication date Jan 16, 2025
- DAIKIN INDUSTRIES, LTD.
- Yoshiaki HONDA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, PREPARATION METHOD THEREOF AND METHOD FOR PREPARING...
- Publication number 20250018526
- Publication date Jan 16, 2025
- SK enpulse Co., Ltd.
- Jae In AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PAD-IN-A-BOTTLE AND SINGLE PLATEN CHEMICAL MECHANICAL-PLANARIZATION...
- Publication number 20250014911
- Publication date Jan 9, 2025
- VERSUM MATERIALS US, LLC
- XIAOBO SHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THERMOPLASTIC POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER, AN...
- Publication number 20240399530
- Publication date Dec 5, 2024
- KURARAY CO., LTD.
- Azusa SUNAYAMA
- B24 - GRINDING POLISHING
Information Patent Application
PADS FOR CHEMICAL PLANARIZATION
- Publication number 20240391050
- Publication date Nov 28, 2024
- CHEMPOWER CORPORATION
- Sudhanshu Misra
- B24 - GRINDING POLISHING
Information Patent Application
Polish Apparatus and Methods for Use
- Publication number 20240383096
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsiang Yen
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD
- Publication number 20240383097
- Publication date Nov 21, 2024
- KURARAY CO., LTD.
- Yuko GOSHI
- B24 - GRINDING POLISHING
Information Patent Application
DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20240376238
- Publication date Nov 14, 2024
- CMC Materials LLC
- Achla Khanna
- B24 - GRINDING POLISHING

characterised by the composition or properties of the pad materials

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Buffing spherocylinder made of compressed material

CMP polishing pad with window having transparency at low wavelength...

Fabrication of a polishing pad for chemical mechanical polishing

Abrasive composition and method of manufacturing same

Polishing pad and method of fabricating semiconductor device using...

Polyurethane for polishing layers, polishing layer and polishing pad

Polishing pad and method of fabricating semiconductor device using...

Chemical mechanical polishing pad and preparation thereof

Microreplicated polishing surface with enhanced co-planarity

Polishing pad, method for manufacturing polishing pad, and polishin...

Chemical mechanical planarization tool

Containment and exhaust system for substrate polishing components

CMP polishing pad with enhanced rate

Polishing pad, preparation method thereof and method for preparing...

Polishing pad sheet, polishing pad, and method for manufacturing se...

Composition for polishing pad and polishing pad

Compositions and foam compositions containing composite particles,...

Modification method of polyurethane, polyurethane, polishing pad, a...

Magnetorheological-elastomer polishing pad for chemical mechanical...

Self-healing polishing pad

Polishing pad with improved crosslinking density and process for pr...

Method of using polishing pad

Formulations for high porosity chemical mechanical polishing pads w...

Formulations for chemical mechanical polishing pads with high plana...

Rigid backsize to prevent fiber disc curling

Synthetic grindstone, synthetic grindstone assembly, and method of...

Polishing articles and integrated system and methods for manufactur...

Chemical mechanical polishing method

Chemical mechanical polishing apparatus

Additive manufacturing of polishing pads

Patents Applicationslast 30 patents

POLISHING LAYER, POLISHING PAD, METHOD FOR MANUFACTURING POLISHING...

CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING...

POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAIN...

POLISHING PAD AND PROCESS FOR PREPARING THE SAME

POLISHING PAD, METHOD FOR PRODUCING POLISHING PAD, AND METHOD FOR P...

POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE US...

EDGE AND HOT SPOT COMPENSATION TECHNIQUES IN CHEMICAL MECHANICAL PO...

POLISHING HEAD WITH DECOUPLED MEMBRANE POSITION CONTROL

SPONGE-LIKE POROUS BODY, POLISHING PAD, LIQUID ABSORBING PAD, CLEAN...

METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD

WAFER DOUBLE-SIDE POLISHING APPARATUS AND METHOD OF EVALUATING THE...

CHEMICAL MECHANICAL POLISHING PAD

CHEMICAL PLANARIZATION OF NON-METALLIC MATERIALS

POLISHING PAD

MULTILAYER CMP PADS

ECO-FRIENDLY POLISHING PAD AND MANUFACTURING METHOD THEREOF

CONTAINMENT AND EXHAUST SYSTEM FOR SUBSTRATE POLISHING COMPONENTS

POLISHING PAD AND POLISHING APPARATUS

LEVERAGED POROMERIC POLISHING PAD

UV CURABLE PRINTABLE FORMULATIONS FOR POROSITY CONTROL IN HIGH PERF...

POLISHING PAD FORMED FROM DUAL CURATIVE

CMP POLISHING PAD

CHEMICAL MECHANICAL POLISHING APPARATUS

POLISHING PAD, PREPARATION METHOD THEREOF AND METHOD FOR PREPARING...

PAD-IN-A-BOTTLE AND SINGLE PLATEN CHEMICAL MECHANICAL-PLANARIZATION...

THERMOPLASTIC POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER, AN...

PADS FOR CHEMICAL PLANARIZATION

Polish Apparatus and Methods for Use

POLISHING PAD

DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS