Claims
- 1. A resin composition comprising from 99.9 to 50% by weight of a polyimide having recurring units represented by the formula (I): ##STR41## wherein X is a direct bond, divalent hydrocarbon having from 1 to 10 carbon atoms, hexafluorinated isopropylidene, carbonyl, thio or sulfonyl; Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are individually hydrogen, lower alkyl, lower alkoxy, chlorine or bromine; R is a tetravalent radical selected from an aliphatic having 2 or more carbon atoms, alicyclic, monocyclic aromatic or fused polycyclic aromatic radical or a polycyclic aromatic radical connected to each other through a direct bond or a bridge member and from 0.1 to 50% weight of a polyether ketone resin and/or a polyester resin which forms an anisotropic molten phase.
- 2. The resin composition of claim 1 wherein the polyimide is represented by the formula (II): ##STR42## wherein X and R are the same as above.
- 3. The resin composition of claim 1 wherein R in the formula (I) is a polycyclic aromatic tetravalent radical connected to each other through a direct bond or a bridge member and represented by the formula (XI): ##STR43## wherein X.sub.2 is a direct bond, --O--, --S--, --SO.sub.2 --, --CH.sub.2 --, --CO--, --C(CH.sub.3).sub.2 --, --C(CF.sub.3).sub.2 --, ##STR44## wherein Y.sub.11 is a direct bond, --O--, --S--, --SO.sub.2 --, --CH.sub.2 --, --CO--, --C(CH.sub.3).sub.2 --, --C(CF.sub.3).sub.2 --.
- 4. The resin composition of claim 2 wherein R in the formula (I) is a polycyclic aromatic tetravalent radical connected to each other through a direct bond or a bridge member and represented by the formula (X): ##STR45## wherein X.sub.2 is a direct bond, --O--, --S--, --SO.sub.2 --, --CH.sub.2 --, --CO--, --C(CH.sub.3).sub.2 --, --C(CF.sub.3).sub.2 --, ##STR46## wherein Y.sub.11 is a direct bond, --O--, --S--, --SO.sub.2 --, --CH.sub.2 --, --CO--, --C(CH.sub.3).sub.2 --, --C(CF.sub.3).sub.2 --.
- 5. The resin composition of claims 1, 2, 3 or 4 wherein the polyether ketone resin has recurring structural units represented by the formula (III): ##STR47##
- 6. The resin composition of claims 1, 2, 3 or 4 wherein the polyester resin has recurring structural units represented by the formula (IV): ##STR48## wherein Y is an aliphatic radical having from 1 to 4 carbon atoms or a radical represented by ##STR49## wherein Z is a direct bond, --C(CH.sub.3).sub.2 --, --SO.sub.2 --, --CH.sub.2 --, --O--, --CO-- or ##STR50##
- 7. The resin composition of claims 1, 2, 3 or 4 wherein the polyester resin can form an anisotropic molten phase at temperature of 420.degree. C. or less.
- 8. The resin composition of claims 1, 2, 3 or 4 wherein the polyester resin is an aromatic polyester resin capable of forming an anisotropic molten phase at temperature of 420.degree. C. or less.
- 9. The resin composition of claims 1, 2, 3 or 4 wherein the aromatic polyester resin capable of forming the anisotropic molten phase at temperature of 420.degree. C. or less is a thermotropic liquid-crystal polymer obtained by polymerizing so that polyester bond is formed by basic structural units represented by the formulas (V), (VI), (VII) and (VIII): ##STR51##
- 10. A polyimide-based resin composition of claim 1 wherein the polyimide represented by the formula (I) has an inherent viscosity of from 0.3 to 0.7 dl/g at 35.degree. C. in a solution containing 0.5 g of the polyimide in 100 ml of a solvent mixture consisting of 90 parts by weight of p-chlorophenol and 10 parts by weight of phenol.
- 11. A carbon fiber reinforced polyimide-based resin composition comprising from 5 to 100 parts by weight of carbon fiber for 100 parts by weight of a resin composition comprising from 50 to 99 % by weight of a polyimide resin having recurring units represented by the formula (I): ##STR52## wherein X is a radical selected from the group consisting of a direct bond, sulfur, divalent hydrocarbon having from 1 to 10 carbon atoms, hexafluorinated isopropylidene, carbonyl, thio, sulfonyl and ether; Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 and are individually a radical selected from the group consisting of hydrogen, lower alkyl, lower alkoxy, chlorine and bromine; and R is a tetravalent radical selected from the group consisting of an aliphatic radical having from 4 to 9 carbon atoms, monocycloaliphatic radical having from 4 to 10 carbon atoms, monoaromatic radical, condensed polyaromatic radical and noncondensed aromatic radical connected each other with a direct bond or bridge member, and from 50 to 1% by weight of one or more thermotropic liquid crystal polymer.
- 12. A carbon fiber reinforced polyimide-based resin composition of claim 11 wherein the thermotropic liquid crystal polymer is one or more polymer consisting of a fundamental structure having recurring units selected from the group consisting of the formulas (V), (VI), (VII) and/or (VIII) ##STR53##
- 13. A polyimide-based resin composition comprising from 5 to 200 parts by weight of potassium titanate fiber for 100 parts by weight of a resin composition comprising from 50 to 99 by weight of a polyimide resin having recurring units represented by the formula (I): ##STR54## wherein X is a radical selected from the group consisting of a direct hexafluorinated isopropylidene, carboxyl, thio, sulfonyl and ether; Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are individually a radical selected from the group consisting of hydrogen, lower alkyl, lower alkoxy, chlorine and bromine; and R is a tetravalent radical selected from the group consisting of an aliphatic radical having from 4 to 9 carbon atoms, monocycloaliphatic radical having from 4 to 10 carbon atoms, monoaromatic radical, condensed polyaromatic radical and noncondensed aromatic radical connected each other with a direct bond or bridge member, and from 50 to 1% by weight of one or more thermotropic liquid crystal polymer.
- 14. A polyimide-based resin composition of claim 13 wherein the thermotropic liquid crystal polymer is one or more polymer consisting of a fundamental structure having recurring units selected from the group consisting of the formulas (V), (VI), (VII) and/or (VIII) ##STR55##
- 15. A polyimide-based resin composition comprising from 0.01 to 25 parts by weight of a crystallization accelerator for 100 parts by weight of a resin composition comprising from 50 to 100 parts by weight of a polyimide resin having recurring units represented by the formula (I) ##STR56## wherein X is a direct bond, divalent hydrocarbon having from 1 to 10 carbon atoms, hexafluorinated isopropylidene, carbonyl, thio or sulfonyl; Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are individually hydrogen, lower alkyl, lower alkoxy, chlorine or bromine; R is a tetravalent radical selected from an aliphatic 2 or more carbon atoms, alicyclic, monocyclic aromatic or fused polycyclic aromatic radical or a polycyclic aromatic radical connected to each other through a direct bond or a bridge member, and from 0 to 50 parts by weight of a thermotropic liquid crystal polymer.
- 16. A polyimide-based resin composition of claim 15 wherein the thermotropic liquid crystal polymer is one or more polymer consisting of a fundamental structure having recurring units selected from the group consisting of the formulas (V), (VI), (VII) and/or (VIII) ##STR57##
- 17. A resin composition of claim 15 wherein the crystallization accelerator is one or more inorganic or organic compounds selected from the group consisting of calcium chloride, aluminum phosphate, hydrotalcite compounds, sodium chloride, graphite, a compound having the structure represented by the formula (XII): ##STR58## wherein R is a tetravalent radical selected from the group consisting of an aliphatic radical and alicyclic radical having from 2 to 10 carbon atoms, respectively, and phenyl radical, and may be the same as or different from R in the formula (I); and X.sub.1 and X.sub.2 are one or more radicals selected from the group consisting of hydrogen, chlorine, bromine, fluorine, lower alkyl and lower alkoxy radical having from 1 to 10 carbon atoms, respectively; and a compound having the structure represented by the formula (XIII): ##STR59## wherein K is an integer of from 1 to 10, X.sub.3 is one or more divalent radicals selected from the group consisting of a direct bond, hydrocarbon having from 1 to 10 carbon atoms, hexafluorinated isopropylidene, carbonyl, thio and sulfonyl; Y.sub.5, Y.sub.6, Y.sub.7 and Y.sub.8 are individually one or more divalent radicals selected from the group consisting of hydrogen, chlorine, bromine, lower alkyl and lower alkoxy radical having from 1 to 10 carbon atoms, respectively; R is a tetravalent radical selected from the group consisting of an aliphatic radical and alicyclic radical having from 2 to 10 carbon atoms, respectively, and phenyl; X.sub.3, Y.sub.5, Y.sub.6, Y.sub.7, Y.sub.8 and R may be individually the same as or different from the radicals having the same symbols in the formula (I); and Y.sub.9, and Y.sub.10 are --H, --NH, or ##STR60##
Priority Claims (8)
Number |
Date |
Country |
Kind |
1-309100 |
Nov 1989 |
JPX |
|
1-314394 |
Dec 1989 |
JPX |
|
2-199058 |
Jul 1990 |
JPX |
|
3-116153 |
May 1991 |
JPX |
|
3-123350 |
May 1991 |
JPX |
|
3-125726 |
May 1991 |
JPX |
|
3-125789 |
May 1991 |
JPX |
|
3-127081 |
May 1991 |
JPX |
|
CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of copending application Ser. No. 07/617,147 filed on Nov. 23, 1990, now abandoned which is incorporated herein by reference.
US Referenced Citations (11)
Foreign Referenced Citations (8)
Number |
Date |
Country |
163464 |
Dec 1985 |
EPX |
313407 |
Apr 1989 |
EPX |
2311815 |
Dec 1972 |
FRX |
61-143478 |
Jul 1986 |
JPX |
62-68817 |
Mar 1987 |
JPX |
62-86021 |
Apr 1987 |
JPX |
62-235381 |
Oct 1987 |
JPX |
63-128025 |
May 1988 |
JPX |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
617147 |
Nov 1990 |
|