Claims
- 1. A carrier gear for use in combination with a polishing apparatus as a workpiece holder, said carrier gear comprising in combination:
- an extruded or rolled, or calendered, uniform thickness, single layer sheet of a thermoplastic polymer material selected from the group consisting of polyetheretherketone, polyaryletherketone, polyetherimide, polyimide, polyether sulfone, polyamide-imide, polyethylene terephthalate, polybutylene terephthalate, acetal homopolymer, acetal copolymer, and liquid crystal polymer, said sheet formed with means for coaction with a wafer polishing apparatus and further including at least one shaped passage in the sheet for a congruent workpiece said polymer material having a tensile strength at break of at least about 8,000 psi.
- 2. The carrier gear of claim 1 in combination with a wafer polishing apparatus.
- 3. The carrier gear of claim 1 wherein the sheet has a thickness greater than about 0.1 mm.
- 4. The carrier gear of claim 2 wherein the sheet is coated on both sides with a layer selected from the group consisting of cured thermosetting resin, organic coating and inorganic coating.
- 5. The carrier gear of claim 4 wherein the resin is a resin selected from the group consisting of epoxy, an epoxy/acrylate mixture, an urethane/acrylate mixture, and an epoxy/acrylate/urethane mixture.
- 6. The carrier gear of claim 1 wherein the carrier is fabricated from a sheet of polyetheretherketone.
- 7. The carrier gear of claim 1 wherein the means for coaction comprise peripheral sprocket teeth formed in the carrier gear.
- 8. The carrier gear of claim 1 in combination with a plastic film coating on at least one side of the carrier gear.
- 9. A method for polishing the opposite surfaces of a thin wafer of material comprising, in combination, the steps of:
- placing the wafer in a congruent shaped holding passage defined through a carrier gear of the type comprising a sheet of single layer, uniform thickness thermoplastic polymer with means for coaction with a wafer polishing apparatus said polymer having a tensile strength at break of at least about 8,000 psi;
- positioning the wafer and carrier gear in a polishing apparatus of the type having platens on opposite sides of the carrier gear in opposed relation to the wafer;
- injecting a polishing slurry to cover the wafer; and
- driving the carrier gear between the platens to polish the wafer.
- 10. The method of claim 9 wherein the carrier gear is an extruded or rolled or calendered sheet of thermoplastic polymer material selected from the group consisting of polyetheretherketone, polyaryletherketone, polyetherimide, polyimide, polyether sulfone, polyamideimide, polyethylene terephthalate, polybutylene terephthalate, acetal homopolymer, acetal copolymer, and liquid crystal polymer.
- 11. The method of claim 9 wherein the carrier gear is an extruded or rolled or calendered sheet of polyetheretherketone thermoplastic polymer.
- 12. The method of claim 10 wherein the carrier gear sheet is coated on both sides with a layer of cured thermosetting resin from the group consisting of epoxy, an epoxy/acrylate mixture, an urethane/acrylate mixture, an epoxy/acrylate/urethane mixture, a plastic film and combinations thereof.
CROSS REFERENCE TO A RELATED APPLICATION
This application is a continuation-in-part of application Ser. No. 08/810,301, filed Feb. 28, 1997, now abandoned.
US Referenced Citations (8)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
810301 |
Feb 1997 |
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