Claims
- 1. A composition comprising:
- a fluorine-containing diamine having the formula:
- H.sub.2 N--Q--NH.sub.2
- wherein
- Q is ##STR37## and X is hydrogen or halogen;
- a tetracarboxylic acid, or derivative thereof, having the formula, ##STR38## wherein R is a tetravalent organic radical having at least 4 carbon atoms, and
- R.sub.1 is hydrogen or a monovalent organic radical; and
- a solvent.
- 2. The composition of claim 1, wherein R is selected from the group consisting of ##STR39## wherein R.sub.2 is a carbon-carbon bond, --O--, --S--, --SO.sub.2 --, --CO--, --(CH.sub.2).sub.r --, ##STR40## wherein R.sub.3 is carbon-carbon bond --S--, --SO.sub.2 --, --CO--, --CH.sub.2 --, --C.sub.2 H.sub.4 --, ##STR41## R.sub.4 is halogen, hydroxy, lower (C.sub.1 -C.sub.6) alkyl or lower (C.sub.1 -C.sub.6) alkoxy, m is 0 to 2, r is 1 to 4, and s is 1 to 5.
- 3. The composition of claim 1, wherein Q has the structure: ##STR42##
- 4. The composition of claim 2, wherein Q has the structure: ##STR43##
- 5. The composition of claim 1, wherein the solvent is propylene glycol methyl ether.
- 6. The composition of claim 2, wherein the solvent is propylene glycol methyl ether.
- 7. The composition of claim 3, wherein the solvent is propylene glycol methyl ether.
- 8. The composition of claim 4, wherein the solvent is propylene glycol methyl ether.
- 9. A polyamide polymer having groups of the structure: ##STR44## wherein n is the number of repeating groups,
- Q is ##STR45## X is hydrogen or halogen, and Y is a divalent organic radical.
- 10. The polyamide polymer of claim 9, wherein Y is selected from the group consisting of ##STR46## wherein R.sub.5 is a carbon-carbon bond, --O--, --S--, --SO.sub.2 --, --CO--, --(CH.sub.2).sub.r --, ##STR47## wherein R.sub.6 is a carbon-carbon bond, --S--, --SO.sub.2 --, --CO--, --CH.sub.2 --, --C.sub.2 H.sub.4 --, ##STR48## R.sub.4 is hydrogen, hydroxy, lower (C.sub.1 -C.sub.6) alkyl, or lower (C.sub.1 -C.sub.6) alkoxy, m is 0 to 4, r is 1 to 4, m is 1 to 5, and u is 0 to 6.
- 11. The polyamide polymer of claim 9, wherein Q has the structure: ##STR49##
- 12. The polyamide polymer of claim 10, wherein Q has the structure: ##STR50##
- 13. Polyamide polymeric material prepared by reacting:
- a fluorine-containing diamine having the formula:
- H.sub.2 N--Q--NH.sub.2
- wherein
- Q is ##STR51## and X is hydrogen or halogen; and
- at least one dicarboxylic acid having the formula:
- XOOC--Y--COOX
- wherein
- X is hydrogen or halogen and
- Y is a divalent organic radical.
- 14. The polyamide polymeric material of claim 13, wherein the dicarboxylic acid is selected from the group consisting of:
- phthalic acid;
- isophthalic acid;
- terephthalic acid;
- biphenyl-3,3'-dicarboxylic acid;
- biphenyl-4,4'-dicarboxylic acid;
- bis(3-carboxyphenyl)methane;
- bis(4-carboxyphenyl)methane;
- 2,2-bis-(3-carboxyphenyl)propane;
- 2,2-bis-(4-carboxyphenyl)propane;
- naphthalene-2,6-dicarboxylic acid;
- bis(3-carboxyphenyl)ether;
- bis(4-carboxyphenyl)ether;
- bis(3-carboxyphenyl)sulfide;
- bis(4-carboxyphenyl)sulfide;
- bis(3-carboxyphenyl)sulfone;
- bis(4-carboxyphenyl)sulfone;
- 1. 4-cyclohexane dicarboxylic acid;
- pentanedioic acid;
- hexanedioic acid;
- 1,4-phenylene diethanoic acid;
- 2,4-furandicarboxylic acid;
- 1,4-bis(4-carboxyphenoxy)phenylene;
- 1,1-bis(4-carboxyphenyl)-1-phenyl-2,2,2-trifluoroethane;
- bis (4-carboxyphenyl).methyl phosphane oxide;
- 4,4'-dicarboxyltetraphenyl silane;
- 5-tertiary butyl isophthalic acid;
- 5-bromoisophthalic acid;
- 5-chloroisophthalic acid;
- 5-fluoroisophthalic acid;
- 2,2-bis(4-carboxyphenyl)hexafluoropropane;
- 2,2-bis[4-(4-carboxyphenoxy)phenyl]hexafluoropropane; and
- 1,1-bis[4-(4-carboxyphenoxy)phenyl]-1-phenyl-2,2,2-trifluoroethane.
- 15. The polyamide polymeric material of claim 13, wherein Q has the structure: ##STR52##
- 16. The polyamide polymeric material of claim 14, wherein Q has the structure: ##STR53##
- 17. Copolyamide polymeric material prepared by reacting:
- a fluorine-containing diamine having the formula:
- H.sub.2 N--Q--NH.sub.2
- wherein
- Q is ##STR54## and X is hydrogen or halogen;
- at least one diamine having the formula
- H.sub.2 N--A--NH.sub.2
- wherein A is a divalent organic radical; and
- at least one dicarboxylic acid having the formula:
- XOOC--Y--COOX
- wherein
- X is hydrogen or halogen and
- Y is a divalent organic radical.
- 18. The copolyamide polymeric material of claim 17, wherein Q has the structure: ##STR55##
- 19. An aricle fabricated from a polyamide polymer of claim 9.
- 20. An article fabricated from a polyamide polymeric material of claim 13.
- 21. An article fabricated from a copolyamide polymeric material of claim 17.
Parent Case Info
This is a divisional of application Ser. No. 124,704, filed Nov. 24, 1987, now U.S. Pat. No. 4,925,915.
US Referenced Citations (8)
Divisions (1)
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Number |
Date |
Country |
Parent |
124704 |
Nov 1987 |
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