Patent Application
20240027909
This non-provisional application claims priority under 35 U.S.C. § 119(a) on Patent Application No. 2022-111900 filed in Japan on Jul. 12, 2022, the entire contents of which are hereby incorporated by reference.
This invention relates to a positive resist composition and a patterning process.
To meet the demand for higher integration density and operating speed of LSIs, the effort to reduce the pattern rule is in rapid progress. As the use of 5G high-speed communications and artificial intelligence (AI) is widely spreading, high-performance devices are needed for their processing. As the advanced miniaturization technology, manufacturing of microelectronic devices at the 5-nm node by the lithography using EUV of wavelength 13.5 nm has been implemented in a mass scale. Studies are made on the application of EUV lithography to 3-nm node devices of the next generation and 2-nm node devices of the next-but-one generation.
Since the wavelength (13.5 nm) of extreme ultraviolet (EUV) is shorter than 1/10 of the wavelength 193 nm of ArF excimer laser, the EUV lithography achieves a high light contrast, from which a high resolution is expectable. Because of the short wavelength and high energy density of EUV, an acid generator is sensitive to a small dose of photons. It is believed that the number of photons available with EUV exposure is 1/14 of that of ArF exposure. In the EUV lithography, the phenomenon that the edge roughness (LER, LWR) of line patterns or the critical dimension uniformity (CDU) of hole patterns is degraded by a variation of photon number is considered a problem.
Aiming to reduce a photon number variation, an attempt was made to render the resist film more photo-absorptive so that the number of photons absorbed in the resist film is increased. For example, among halogens, iodine is highly absorptive to EUV of wavelength 13.5 nm. Patent Documents 1 and 2 disclose to use iodized resins as the EUV resist material. Since iodine atoms are highly absorptive, i.e., absorb more photons during EUV exposure, a reduction of edge roughness is expectable. Due to their low alkaline solubility, however, the dissolution contrast is reduced, giving rise to the drawback that edge roughness is rather increased.
The introduction of iodine atoms into EUV-reactive acid generators or photo-decomposable quenchers contributes to a higher sensitivity and a lower edge roughness because the increased number of photons absorbed enhances the decomposition efficiency of acid generators or quenchers. See Patent Documents 3 and 4. However, the influence of image blur due to acid diffusion inherent to chemically amplified resist materials is yet unavoidable.
With the aim to reduce edge roughness, molecular resist materials based on low-molecular-weight compounds have been investigated. This is based on the hypothesis that the lower the molecular weight is, the more the risk is mitigated that uneven dissolution of a resist film in developer increases edge roughness. The chemically amplified molecular resist materials, however, raise the problem that edge roughness is degraded because of insufficient control of acid diffusion. Conventional polymer-based resist materials rather achieve lower edge roughness. The state-of-the-art technology fails to take advantage of the lower molecular weight of molecular resist materials.
Patent Document 5 discloses a molecular resist material comprising a highly absorptive calixarene compound containing iodine atoms. The control of acid diffusion remains unsolved.
Non-Patent Document 1 describes a resist material based on o-nitrobenzyl ester of cholic acid. Upon exposure to UV of wavelength 300 to 350 nm, the nitrobenzyl group is decomposed to release chloric acid. This is of positive tone in that the resist film in the exposed region is dissolved in alkaline developer. Since the decomposition efficiency of the nitrobenzyl group upon exposure to high-energy radiation is low, this resist material has a low sensitivity.
An object of the present invention is to provide a positive resist composition which exhibits a higher sensitivity and resolution than conventional positive resist compositions, and forms a pattern of good profile with reduced edge roughness and improved CDU after exposure and development, and a patterning process using the resist composition.
Making extensive investigations in search for a positive resist material capable of meeting the current requirements including high resolution, reduced edge roughness and reduced dimensional variation, the inventor has found the following. To meet the requirements, the influence of diffusion including acid diffusion should be eliminated, the molecular size be minimized, and the photo-reactive compound be more absorptive. A compound having a carboxy group bonded to an iodized aromatic group, in which the carboxy group is substituted with a photo-reactive nitrobenzyl group, is devoid of acid diffusion, achieves improvements in sensitivity and dissolution contrast due to photo-absorption, and minimizes the influence of swell in alkaline developer by virtue of a low molecular weight. Then the compound is quite effective for use as the base in a non-chemically-amplified positive resist composition. When the compound is combined with a base polymer comprising repeat units having a carboxy or phenolic hydroxy group whose hydrogen is substituted by an acid labile group, there is obtained a chemically amplified positive resist composition. This positive resist composition exhibits a high sensitivity, a significantly increased contrast of alkaline dissolution rate before and after exposure, and a high resolution, and forms a pattern of good profile with reduced edge roughness and improved CDU after exposure and development. The positive resist composition is thus suitable as a fine pattern forming material for the manufacture of VLSIs and photomasks.
In one aspect, the invention provides a positive resist composition comprising a compound having a nitrobenzyl ester group bonded to an iodized aromatic ring.
Typically, the compound having a nitrobenzyl ester group bonded to an iodized aromatic ring has the formula (1).
Herein m is an integer of 1 to 3, n is an integer of 0 to 4, p is an integer of 0 to 4, or an integer of 1 to 4 when m is 2 or 3, q is 1 or 2, r is an integer of 0 to 3, meeting 1≤p+q+r≤5.
In case of m=1, R0 is hydrogen, iodine, or a C20-C40 hydrocarbyl group having a steroid skeleton and optionally containing a heteroatom, in case of m=2, R0 is an ether bond, thioether bond, ester bond, thioester bond, amide bond, urethane bond, urea bond, carbonate bond, or a C1-C40 hydrocarbylene group which may contain a heteroatom, and in case of m=3. R0 is a C1-C40 trivalent hydrocarbon group which may contain a heteroatom; the hydrocarbyl, hydrocarbylene or trivalent hydrocarbon group may bond to the benzene ring in the formula via an ether bond, thioether bond, ester bond, thioester bond, amide bond, urethane bond, urea bond or carbonate bond, with the proviso that R0 is iodine in case of m=1 and p=0.
R1 is each independently hydroxy, C1-C6 saturated hydrocarbyl group, C1-C6 saturated hydrocarbyloxy group, C2-C6 saturated hydrocarbylcarbonyloxy group, C1-C4 saturated hydrocarbylsulfonyloxy group, fluorine, chlorine, bromine, amino, nitro, cyano, —N(R1a)(R1B), —N(R1C)—C(═O)—R1D, —N(R1C)—C(═O)—O—R1D, or —N(R1C)—S(═O)2—R1D, wherein R1A is a C1-C6 saturated hydrocarbyl group, R1B is hydrogen or a C1-C6 saturated hydrocarbyl group, R1C is hydrogen or a C1-C6 saturated hydrocarbyl group, R1D is a C1-C8 aliphatic hydrocarbyl group or C6-C10 aryl group, the saturated hydrocarbyl group, saturated hydrocarbyloxy group, saturated hydrocarbylcarbonyloxy group, saturated hydrocarbylsulfonyloxy group, and aliphatic hydrocarbyl group may have some or all of the hydrogen atoms substituted by halogen and may have an ether bond or ester bond intervening in a carbon-carbon bond, and the aryl group may have some or all of the hydrogen atoms substituted by halogen or hydroxy.
R2 is a single bond or C1-C6 saturated hydrocarbylene group,
R3 is nitro, halogen, a C1-C10 aliphatic hydrocarbyl group, or C1-C10 aliphatic hydrocarbyloxy group, in case of n=2, 3 or 4, two R3 may bond together to form a ring with the carbon atoms to which they are attached, and
R4 is hydrogen or a C1-C4 alkyl group.
The positive resist composition may further comprise a base polymer.
In one preferred embodiment, the base polymer comprises repeat units having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group.
Preferably, the repeat units having a carboxy group whose hydrogen is substituted by an acid labile group have the formula (a1) and the repeat units having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group has the formula (a2).
Herein RA is each independently hydrogen or methyl, Y1 is a single bond, phenylene group, naphthylene group or a C1-C12 linking group containing at least one moiety selected from an ether bond, ester bond, and lactone ring. Y2 is a single bond, ester bond or amide bond, Y3 is a single bond, ether bond or ester bond, R11 and R12 are each independently an acid labile group, R3 is fluorine, trifluoromethyl, cyano or a C1-C6 saturated hydrocarbyl group, R14 is a single bond or a C1-C6 saturated hydrocarbylene group in which some —CH2— may be replaced by an ether bond or ester bond, a is 1 or 2, b is an integer of 0 to 4, and a+b is from 1 to 5.
In one preferred embodiment, the base polymer further comprises repeat units (b) containing an adhesive group selected from hydroxy, carboxy, lactone ring, carbonate bond, thiocarbonate bond, carbonyl, cyclic acetal, ether bond, ester bond, sulfonic ester bond, cyano, amide bond, —O—C(═O)—S—, and —O—C(═O)—N(H)—.
In one preferred embodiment, the base polymer further comprises repeat units having any one of the formulae (c1) to (c3).
Herein RA is each independently hydrogen or methyl,
The positive resist composition may further comprise an acid generator, organic solvent, quencher and/or surfactant.
In another aspect, the invention provides a pattern forming process comprising the steps of applying the positive resist composition defined herein onto a substrate to form a resist film thereon, exposing the resist film to high-energy radiation, and developing the exposed resist film in a developer.
Typically, the high-energy radiation is i-line, KrF excimer laser, ArF excimer laser, EB, or EUV of wavelength 3 to 15 nm.
The positive resist composition comprising a compound having a nitrobenzyl ester group bonded to an iodized aromatic ring is a non-chemically-amplified resist composition not relying on acid-catalyzed reaction. Since it is a low-molecular-weight compound based material rather than a polymer based material, the influence of agglomeration and swell in developer is small, and the high absorption ensures a high photo-reactivity, leading to a high sensitivity and contrast. As a result, the patter profile, edge roughness and CDU after exposure are satisfactory. By combining a compound having a nitrobenzyl ester group bonded to an iodized aromatic ring with a base polymer comprising repeat units having a carboxy or phenolic hydroxy group whose hydrogen is substituted by an acid labile group, a chemically amplified positive resist composition can be formulated. This is a resist material having a higher sensitivity. By virtue of these properties, the resist composition is fully useful in commercial application and best suited as a micropatterning material for photomasks by EB lithography or for VLSIs by EB or EUV lithography. The resist composition may be used not only in the lithography for forming semiconductor circuits, but also in the formation of mask circuit patterns, micromachines, and thin-film magnetic head circuits.
As used herein, the singular forms “a,” “an” and “the” include plural referents unless the context clearly dictates otherwise. “Optional” or “optionally” means that the subsequently described event or circumstances may or may not occur, and that description includes instances where the event or circumstance occurs and instances where it does not. The notation (Cn-Cm) means a group containing from n to m carbon atoms per group. As used herein, the term “iodized” compound indicates a compound containing iodine or a compound substituted with iodine. The terms “group” and “moiety” are interchangeable. In chemical formulae, the broken line denotes a valence bond, Me stands for methyl, and Ac for acetyl.
The abbreviations and acronyms have the following meaning.
Positive Resist Composition
One embodiment of the invention is a positive resist composition comprising a compound having a nitrobenzyl ester group bonded to an iodized aromatic ring.
Nitrobenzyl Ester Compound
The compound having a nitrobenzyl ester group bonded to an iodized aromatic ring, which is simply referred to as “nitrobenzyl ester compound,” hereinafter, is preferably represented by the formula (1).
In formula (1), m is an integer of 1 to 3, n is an integer of 0 to 4, p is an integer of 0 to 4, p is an integer of 1 to 4 when m is 2 or 3, q is 1 or 2, r is an integer of 0 to 3, meeting 1≤p+q+r≤5.
In formula (1), in case of m=1, R0 is hydrogen, iodine, or a C20-C40 hydrocarbyl group having a steroid skeleton and optionally containing a heteroatom; in case of m=2, R0 is an ether bond, thioether bond, ester bond, thioester bond, amide bond, urethane bond, urea bond, carbonate bond, or a C1-C40 hydrocarbylene group which may contain a heteroatom; and in case of m=3, R0 is a C1-C40 trivalent hydrocarbon group which may contain a heteroatom. The hydrocarbyl, hydrocarbylene or trivalent hydrocarbon group may bond to the benzene ring in the formula via an ether bond, thioether bond, ester bond, thioester bond, amide bond, urethane bond, urea bond or carbonate bond. It is provided that R0 is iodine in case of m=1 and p=0.
The C20-C40 hydrocarbyl group having a steroid skeleton and optionally containing a heteroatom, represented by R0, preferably has the formula (1-1).
In formula (1-1), R01 to R03 are each independently oxo, hydroxy or a C2-C6 saturated hydrocarbylcarbonyloxy group. X1 is a single bond, ether bond, thioether bond, ester bond, thioester bond, amide bond, urethane bond, urea bond or carbonate bond, and k is an integer of 0 to 2.
The C1-C40 hydrocarbylene group, represented by R0 in case of m=2, may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include C1-C30 alkanediyl groups such as methanediyl, ethane-1,1-diyl, ethane-1,2-diyl, propane-1,3-diyl, butane-1,4-diyl, pentane-1,5-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8-diyl, nonane-1,9-diyl, decane-1,10-diyl, undecane-1,11-diyl, dodecane-1,12-diyl, tridecane-1,13-diyl, tetradecane-1,14-diyl, pentadecane-1,15-diyl, hexadecane-1,16-diyl, heptadecane-1,17-diyl, octadecane-1,18-diyl, nonadecane-1,12-diyl, and eicosane-1,20-diyl; C3-C30 cyclic saturated hydrocarbylene groups such as cyclopentanediyl, methylcyclopentanediyl, dimethylcyclopentanediyl, trimethylcyclopentanediyl, tetramethylcyclopentanediyl, cyclohexanediyl, methylcyclohexanediyl, dimethylcyclohexanediyl, trimethylcyclohexanediyl, tetramethylcyclohexanediyl, norbornanediyl and adamantanediyl; C6-C30 arylene groups such as phenylene, methylphenylene, ethylphenylene, n-propylphenylene, isopropylphenylene, n-butylphenylene, isobutylphenylene, sec-butylphenylene, tert-butylphenylene, naphthylene, methylnaphthylene, ethylnaphthylene, n-propylnaphthylene, isopropylnaphthylene, n-butylnaphthylene, isobutylnaphthylene, sec-butylnaphthylene, tert-butylnaphthylene, biphenyldiyl, methylbiphenyldiyl, and dimethylbiphenyldiyl; and combinations thereof.
The C1-C40 trivalent hydrocarbon group, represented by R0 in case of m=3, may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include groups obtained by removing one hydrogen atom from the above-exemplified hydrocarbylene groups.
In the hydrocarbylene group or trivalent hydrocarbon group, some or all of the hydrogen atoms may be substituted by a moiety containing a heteroatom such as oxygen, sulfur, nitrogen or halogen, and some constituent —CH2— may be replaced by a moiety containing a heteroatom such as oxygen, sulfur or nitrogen, so that the group may contain hydroxy, cyano, fluorine, chlorine, bromine, iodine, carbonyl, ether bond, ester bond, sulfonic ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride (—C(═O)—O—C(═O)—) or haloalkyl moiety.
The hydrocarbylene group preferably has the formula (1-2).
—X2A—R04A—R04—R04B—X2B— (1-2)
In formula (1-2), R04 is a C1-C20 saturated hydrocarbylene group which may contain a heteroatom, a C6-C20 arylene group which may contain a heteroatom, or a combination thereof. R and R are each independently a single bond, a C1-C10 saturated hydrocarbylene group which may contain a heteroatom, a C6-C10 arylene group which may contain a heteroatom, or a combination thereof. X2A and X2B are each independently a single bond, ether bond, thioether bond, ester bond, thioester bond, amide bond, urethane bond, urea bond or carbonate bond. It is preferred from the aspect of preparation that X2A and X2B be identical.
Examples of R04 include those groups exemplified above for the alkanediyl group, cyclic saturated hydrocarbylene group, and arylene group included in the hydrocarbylene group represented by R0, but of 1 to 20 carbon atoms. Examples of the C1-C10 saturated hydrocarbylene group and C6-C10 arylene group, represented by R04A and R04B, include those groups exemplified above for the alkanediyl group, cyclic saturated hydrocarbylene group, and arylene group included in the hydrocarbylene group represented by R0, but of 1 to 10 carbon atoms.
The trivalent hydrocarbon group preferably has the formula (1-3).
In formula (1-3), R05 is a C1-C10 trivalent saturated hydrocarbon group which may contain a heteroatom, C6-C10 trivalent aromatic hydrocarbon group which may contain a heteroatom, or a combination thereof. R05A, R05B and R05C are each independently a single bond, C1-C10 saturated hydrocarbylene group which may contain a heteroatom. C6-C10 arylene group which may contain a heteroatom, or a combination thereof. X3A, X3B and X3C are each independently a single bond, ether bond, thioether bond, ester bond, thioester bond, amide bond, urethane bond, urea bond or carbonate bond. It is preferred from the aspect of preparation that X3A, X3B and X3C be identical.
Examples of R05 include groups obtained by removing one hydrogen atom from those groups exemplified above for the alkanediyl group, cyclic saturated hydrocarbylene group, and arylene group included in the hydrocarbylene group represented by R0, but of 1 to 10 carbon atoms. Also included is the group obtained by removing three hydrogen atoms from isocyanuric acid. Examples of the C1-C10 saturated hydrocarbylene group and C6-C10 arylene group, represented by R1A, R1B and R1C include those groups exemplified for the alkanediyl group, cyclic saturated hydrocarbylene group and arylene group included in the hydrocarbylene group represented by R0, but of 1 to 10 carbon atoms.
In formula (1), R1 is each independently hydroxy, C1-C6 saturated hydrocarbyl group, C1-C6 saturated hydrocarbyloxy group, C2-C6 saturated hydrocarbylcarbonyloxy group, C1-C4 saturated hydrocarbylsulfonyloxy group, fluorine, chlorine, bromine, amino, nitro, cyano, —N(R1A)(R1B), —N(R1C)—C(═O)—R1D, —N(R1C)—C(═O)—O—R1D, or —N(R1C)—S(═O)2—R1D. R1A is a C1-C6 saturated hydrocarbyl group, R1B is hydrogen or a C1-C6 saturated hydrocarbyl group, R1C is hydrogen or a C1-C6 saturated hydrocarbyl group, R1D is a C1-C8 aliphatic hydrocarbyl group or C6-C10 aryl group. In the saturated hydrocarbyl group, saturated hydrocarbyloxy group, saturated hydrocarbylcarbonyloxy group, saturated hydrocarbylsulfonyloxy group, and aliphatic hydrocarbyl group, some or all of the hydrogen atoms may be substituted by halogen, and an ether bond or ester bond may intervene in a carbon-carbon bond. In the aryl group, some or all of the hydrogen atoms may be substituted by halogen or hydroxy.
In formula (1), R2 is a single bond or C1-C6 saturated hydrocarbylene group. The saturated hydrocarbylene group may be straight, branched or cyclic. Examples thereof include C1-C6 alkanediyl groups such as methanediyl, ethane-1,1-diyl, ethane-1,2-diyl, propane-1,1-diyl, propane-1,2-diyl, propane-1,3-diyl, propane-2,2-diyl, butane-1,1-diyl, butane-1,2-diyl, butane-1,3-diyl, butane-2,3-diyl, butane-1,4-diyl, 1,1-dimethylethane-1,2-diyl, pentane-1,5-diyl, 2-methylbutane-1,2-diyl, and hexane-1,6-diyl; C3-C6 cyclic saturated hydrocarbylene groups such as cyclopropane-1,2-diyl, cyclobutane-1,2-diyl, cyclobutane-1,3-diyl, cyclopentane-1,1-diyl, cyclopentane-1,2-diyl, cyclopentane-1,3-diyl, cyclohexane-1,2-diyl, cyclohexane-1,3-diyl, and cyclohexane-1,4-diyl; and combinations thereof.
In formula (1), R3 is nitro, halogen, a C1-C10 aliphatic hydrocarbyl group, or C1-C10 aliphatic hydrocarbyloxy group. In case of n=2, 3 or 4, two R3 may bond together to form a ring with the carbon atoms to which they are attached. The aliphatic hydrocarbyl group and aliphatic hydrocarbyl moiety in the aliphatic hydrocarbyloxy group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include C1-C10 alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, sec-pentyl, 3-pentyl, tert-pentyl, neopentyl, and n-hexyl; C3-C10 cyclic saturated hydrocarbyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, adamantyl, norbornyl, cyclopropylmethyl, cyclopropylethyl, cyclobutylmethyl, cyclobutylethyl, cyclopentylmethyl, cyclopentylethyl, cyclohexylmethyl, cyclohexylethyl, methylcyclopropyl, methylcyclobutyl, methylcyclopentyl, methylcyclohexyl, ethylcyclopropyl, ethylcyclobutyl, ethylcyclopentyl, and ethylcyclohexyl; C2-C10 alkenyl groups such as vinyl, 1-propenyl, 2-propenyl, butenyl, pentenyl, hexenyl, heptenyl, nonenyl and decenyl; C2-C10 alkynyl groups such as ethynyl, propynyl, butynyl, pentynyl, hexynyl, heptynyl, octynyl, nonynyl and decynyl; C3-C10 cyclic unsaturated aliphatic hydrocarbyl groups such as cyclopentenyl, cyclohexenyl, methylcyclopentenyl, methylcyclohexenyl, ethylcyclopentenyl, ethylcyclohexenyl and norbornenyl; and combinations thereof.
In formula (1), R4 is hydrogen or a C1-C4 alkyl group.
Examples of the nitrobenzyl ester compound are shown below, but not limited thereto.
Base Polymer
The positive resist composition based on the nitrobenzyl ester compound may be either a molecular resist material not containing abase polymer or a resist material further comprising a base polymer.
The base polymer preferably comprises repeat units having a carboxy group whose hydrogen is substituted by an acid labile group, referred to as repeat units (a1), hereinafter and/or repeat units having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group, referred to as repeat units (a2), hereinafter, for the purpose of enhancing dissolution contrast.
Typically, the repeat units (a1) have the formula (a1) and the repeat units (a2) has the formula (a2).
In formulae (a1) and (a2), RA is each independently hydrogen or methyl. Y1 is a single bond, phenylene group, naphthylene group or a C1-C12 linking group containing at least one moiety selected from an ether bond, ester bond, and lactone ring. Y2 is a single bond, ester bond or amide bond. Y3 is a single bond, ether bond or ester bond. R11 and R12 are each independently an acid labile group. R13 is fluorine, trifluoromethyl, cyano or a C1-C6 saturated hydrocarbyl group. R14 is a single bond or a C1-C6 saturated hydrocarbylene group in which some —CH2— may be replaced by an ether bond or ester bond. The subscript “a” is 1 or 2, “b” is an integer of 0 to 4, and a+b is from 1 to 5.
Examples of the monomer from which repeat units (a1) are derived are shown below, but not limited thereto. RA and R11 are as defined above.
Examples of the monomer from which repeat units (a2) are derived are shown below, but not limited thereto. RA and R12 are as defined above.
In formulae (a1) and (a2), R11 and R12 are each independently an acid labile group. The acid labile group may be selected from a variety of such groups, for example, groups having the following formulae (AL-1) to (AL-3).
In formula (AL-1), “c” is an integer of 0 to 6. RL1 is a C4-C20, preferably C4-C15 tertiary hydrocarbyl group, a trihydrocarbylsilyl group in which each hydrocarbyl moiety is a C1-C4 saturated hydrocarbyl moiety, a C4-C20 saturated hydrocarbyl group containing a carbonyl moiety, ether bond or ester bond, or a group having formula (AL-3). As used herein, the tertiary hydrocarbyl group refers to a group obtained from a tertiary hydrocarbon by eliminating the hydrogen atom on the tertiary carbon atom.
Of the groups represented by RL1, the tertiary hydrocarbyl group may be saturated or unsaturated and branched or cyclic, and examples thereof include tert-butyl, tert-pentyl, 1,1-diethylpropyl, 1-ethylcyclopentyl, 1-butylcyclopentyl, 1-ethylcyclohexyl, 1-butylcyclohexyl, 1-ethyl-2-cyclopentenyl, 1-ethyl-2-cyclohexenyl, and 2-methyl-2-adamantyl. Examples of the trihydrocarbylsilyl group include trimethylsilyl, triethylsilyl and dimethyl-tert-butylsilyl. Examples of the saturated hydrocarbyl group containing a carbonyl moiety, ether bond or ester bond may be straight, branched or cyclic, preferably cyclic, and examples thereof include 3-oxocyclohexyl, 4-methyl-2-oxooxan-4-yl, 5-methyl-2-oxooxolan-5-yl, 2-tetrahydropyranyl and 2-tetrahydrofuranyl.
Examples of the acid labile group having formula (AL-1) include tert-butoxycarbonyl, tert-butoxycarbonylmethyl, tert-pentyloxycarbonyl, tert-pentyloxycarbonylmethyl, 1,1-diethylpropyloxycarbonyl, 1,1-diethylpropyloxycarbonylmethyl, 1-ethylcyclopentyloxycarbonyl, 1-ethylcyclopentyloxycarbonylmethyl, 1-ethyl-2-cyclopentenyloxycarbonyl, 1-ethyl-2-cyclopentenyloxycarbonylmethyl, 1-ethoxyethoxycarbonylmethyl, 2-tetrahydropyranyloxycarbonylmethyl, and 2-tetrahydrofuranyloxycarbonylmethyl.
Other examples of the acid labile group having formula (AL-1) include groups having the formulae (AL-1)-1 to (AL-1)-10.
In formulae (AL-1)-1 to (AL-1)-10, “c” is as defined above. RL8 is each independently a C1-C10 saturated hydrocarbyl group or C6-C20 aryl group. RL9 is hydrogen or a C1-C10 saturated hydrocarbyl group. RL10 is a C2-C10 saturated hydrocarbyl group or C6-C20 aryl group. The saturated hydrocarbyl group may be straight, branched or cyclic.
In formula (AL-2), RL2 and RL3 are each independently hydrogen or a C1-C18, preferably C1-C10 saturated hydrocarbyl group. The saturated hydrocarbyl group may be straight, branched or cyclic and examples thereof include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, cyclopentyl, cyclohexyl, 2-ethylhexyl and n-octyl.
In formula (AL-2), RL4 is a C1-C18, preferably C1-C10 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Inter alia, C1-C18 saturated hydrocarbyl groups are preferred, in which some hydrogen may be substituted by hydroxy, alkoxy, oxo, amino or alkylamino. Examples of the substituted saturated hydrocarbyl group are shown below.
A pair of RL2 and RL3, RL2 and RL4, or RL3 and RL4 may bond together to form a ring with the carbon atom or carbon and oxygen atoms to which they are attached. RL2 and RL3, RL2 and RL4, or RL3 and RL4 which form a ring are each independently a C1-C18, preferably C1-C10 alkanediyl group. The ring thus formed is preferably of 3 to 10, more preferably 4 to 10 carbon atoms.
Of the acid labile groups having formula (AL-2), suitable straight or branched groups include those having formulae (AL-2)-1 to (AL-2)-69, but are not limited thereto.
Of the acid labile groups having formula (AL-2), suitable cyclic groups include tetrahydrofuran-2-yl, 2-methyltetrahydrofuran-2-yl, tetrahydropyran-2-yl, and 2-methyltetrahydropyran-2-yl.
Also included are acid labile groups having the following formulae (AL-2a) and (AL-2b). With these acid labile groups, the base polymer may be crosslinked within the molecule or between molecules.
In formulae (AL-2a) and (AL-2b), RL11 and RL12 are each independently hydrogen or a C1-C8 saturated hydrocarbyl group which may be straight, branched or cyclic. Also, RL11 and RL12 may bond together to form a ring with the carbon atom to which they are attached, and in this case, RL11 and RL12 are each independently a C1-C8 alkanediyl group. RL13 is each independently a C1-C10 saturated hydrocarbylene group which may be straight, branched or cyclic. The subscripts d and e are each independently an integer of 0 to 10, preferably 0 to 5, and f is an integer of 1 to 7, preferably 1 to 3.
In formulae (AL-2a) and (AL-2b), LA is a C1-C50 (f+1)-valent aliphatic saturated hydrocarbon group, C3-C50 (f+1)-valent alicyclic saturated hydrocarbon group, C6-C50 (f+1)-valent aromatic hydrocarbon group or C3-C50 (f+1)-valent heterocyclic group. In these groups, some constituent —CH2— may be replaced by a heteroatom-containing moiety, or some carbon-bonded hydrogen may be substituted by a hydroxy, carboxy, acyl moiety or fluorine. LA is preferably a C1-C20 saturated hydrocarbon group (e.g., saturated hydrocarbylene group, trivalent saturated hydrocarbon group or tetravalent saturated hydrocarbon group), or C6-C30 arylene group. The saturated hydrocarbon group may be straight, branched or cyclic. LB is —C(═O)—O—, —N(H)—C(═O)—O— or —N(H)—C(═O)—N(H)—.
Examples of the crosslinking acetal groups having formulae (AL-2a) and (AL-2b) include groups having the formulae (AL-2)-70 to (AL-2)-77.
In formula (AL-3), RL5, RL6 and RL7 are each independently a C1-C20 hydrocarbyl group which may contain a heteroatom such as oxygen, sulfur, nitrogen or fluorine. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic and examples thereof include C1-C20 alkyl groups, C3-C20 cyclic saturated hydrocarbyl groups, C2-C20 alkenyl groups, C3-C20 cyclic unsaturated hydrocarbyl groups, and C6-C10 aryl groups. A pair of RL5 and RL6, RL5 and RL7, or RL6 and RL7 may bond together to form a C3-C20 aliphatic ring with the carbon atom to which they are attached.
Examples of the group having formula (AL-3) include tert-butyl, 1,1-diethylpropyl, 1-ethylnorbornyl, 1-methylcyclopentyl, 1-ethylcyclopentyl, 1-isopropylcyclopentyl, 1-methylcyclohexyl, 2-(2-methyl)adamantyl, 2-(2-ethyl)adamantyl, and tert-pentyl.
Examples of the group having formula (AL-3) also include groups having the formulae (AL-3)-1 to (AL-3)-19.
In formulae (AL-3)-1 to (AL-3)-19, RL14 is each independently a C1-C8 saturated hydrocarbyl group or C6-C20 aryl group. RL15 and RL17 are each independently hydrogen or a C1-C20 saturated hydrocarbyl group. RL16 is a C6-C20 aryl group. The saturated hydrocarbyl group may be straight, branched or cyclic. Typical of the aryl group is phenyl. RF is fluorine or trifluoromethyl, and g is an integer of 1 to 5.
Other examples of the group having formula (AL-3) include groups having the formulae (AL-3)-20 and (AL-3)-21. With these acid labile groups, the base polymer may be crosslinked within the molecule or between molecules.
In formulae (AL-3)-20 and (AL-3)-21, RL14 is as defined above. RL18 is a C1-C20 (h+1)-valent saturated hydrocarbylene group or C6-C20 (h+1)-valent arylene group, which may contain a heteroatom such as oxygen, sulfur or nitrogen. The saturated hydrocarbylene group may be straight, branched or cyclic, and h is an integer of 1 to 3.
Examples of the monomer from which repeat units containing an acid labile group of formula (AL-3) are derived include (meth)acrylates (inclusive of exo-form structure) having the formula (AL-3)-22.
In formula (AL-3)-22, RA is as defined above. RLc1 is a C1-C8 saturated hydrocarbyl group or an optionally substituted C6-C20 aryl group; the saturated hydrocarbyl group may be straight, branched or cyclic. RLc2 to RLc11 are each independently hydrogen or a C1-C18 hydrocarbyl group which may contain a heteroatom; oxygen is a typical heteroatom. Suitable hydrocarbyl groups include C1-C18 alkyl groups and C6-C8 aryl groups. Alternatively, a pair of RLc2 and RLc3, RLc4 and RLc6, RLc4 and RLc7, RLc5 and RLc7, RLc8 and RLc11, RLc6 and RLc10, RLc8 and RLc9, or RLc9 and RLc10, taken together, may form a ring with the carbon atom to which they are attached, and in this event, the ring-forming group is a C1-C15 hydrocarbylene group which may contain a heteroatom. Also, a pair of RLc2 and RLc11, RLc8 and RLc11, or RLc4 and RLc6 which are attached to vicinal carbon atoms may bond together directly to form a double bond. The formula also represents an enantiomer.
Examples of the monomer having formula (AL-3)-22 are described in U.S. Pat. No. 6,448,420 (JP-A 2000-327633). Illustrative non-limiting examples of suitable monomers are given below. RA is as defined above.
Also included in the repeat units having an acid labile group of formula (AL-3) are repeat units of (meth)acrylate having a furandiyl, tetrahydrofurandiol or oxanorbornanediyl group as represented by the following formula (AL-3)-23.
In formula (AL-3)-23, RA is as defined above. RLc11 and RLc13 are each independently a C1-C10 hydrocarbyl group, or RLc12 and RLc13, taken together, may form an aliphatic ring with the carbon atom to which they are attached. RLc14 is furandiyl, tetrahydrofurandiyl or oxanorbomanediyl. RLc15 is hydrogen or a C1-C10 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be straight, branched or cyclic, and examples thereof include C1-C10 saturated hydrocarbyl groups.
Examples of the monomer having formula (AL-3)-23 are shown below, but not limited thereto. Herein RA is as defined above.
The base polymer may further comprise repeat units (b) having an adhesive group. The adhesive group is selected from hydroxy, carboxy, lactone ring, carbonate bond, thiocarbonate bond, carbonyl, cyclic acetal, ether bond, ester bond, sulfonic ester bond, cyano, amide bond, —O—C(═O)—S— and —O—C(═O)—N(H)—.
Examples of the monomer from which repeat units (b) are derived are given below, but not limited thereto. Herein RA is as defined above.
In a further embodiment, the base polymer may comprise repeat units (c) of at least one type selected from repeat units having the following formulae (c1), (c2) and (c3). These units are also referred to as repeat units (c1), (c2) and (c3).
In formulae (c1) to (c3), RA is each independently hydrogen or methyl. Z1 is a single bond, phenylene, naphthylene, —O—Z11—, —C(═O)—O—Z11— or —C(═O)—N(H)—Z11—, wherein Z11 is a C1-C6 aliphatic hydrocarbylene group, phenylene, naphthylene, or a C7-C18 group obtained by combining the foregoing, which may contain a carbonyl moiety, ester bond, ether bond or hydroxy moiety. Z2 is a single bond or ester bond. Z3 is a single bond, —Z31—C(═O)—O—, —Z31—O—, or —Z31—O—C(═O)—, wherein Z31 is a C1-C12 aliphatic hydrocarbylene group, phenylene group, or a C7-C18 group obtained by combining the foregoing, which may contain a carbonyl moiety, ester bond, ether bond, iodine or bromine. Z4 is a single bond, methylene or 2,2,2-trifluoro-1,1-ethanediyl. Z5 is a single bond, methylene, ethylene, phenylene, fluorinated phenylene, trifluoromethyl-substituted phenylene, —O—Z51—, —C(═O)—O—Z51—, or —C(═O)—N(H)—Z51—, wherein Z51 is a C1-C6 aliphatic hydrocarbylene group, phenylene, fluorinated phenylene, trifluoromethyl-substituted phenylene group or a C7-C18 group obtained by combining the foregoing, which may contain a carbonyl moiety, ester bond, ether bond or hydroxy moiety.
In formula (c2), Rf1 and Rf2 are each independently hydrogen, fluorine or trifluoromethyl, at least one thereof being fluorine. Preferably, both Rf1 and Rf2 are fluorine.
In formulae (c1) to (c3), R21 to R28 are each independently fluorine, chlorine, bromine, iodine or a C1-C20 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as exemplified above for R101 to R105 in formulae (2-1) and (2-2).
A pair of R23 and R24, or R26 and R27 may bond together to form a ring with the sulfur atom to which they are attached. Examples of the ring are as will be exemplified later for the ring that R101 and R102 in formula (2-1), taken together, form with the sulfur atom to which they are attached.
In formula (c1), M− is a non-nucleophilic counter ion. Examples of the non-nucleophilic counter ion include halide ions such as chloride and bromide ions; fluoroalkylsulfonate ions such as triflate, 1,1,1-trifluoroethanesulfonate, and nonafluorobutanesulfonate; arylsulfonate ions such as tosylate, benzenesulfonate, 4-fluorobenzenesulfonate, and 1,2,3,4,5-pentafluorobenzenesulfonate; alkylsulfonate ions such as mesylate and butanesulfonate; imide ions such as bis(trifluoromethylsulfonyl)imide, bis(perfluoroethylsulfonyl)imide and bis(perfluorobutylsulfouyl)imide; and methide ions such as tris(trifluoromethylsulfonyl)methide and tris(perfluoroethylsulfonyl)methide.
Also included are sulfonate ions having fluorine substituted at α-position as represented by the formula (c1-1) and sulfonate ions having fluorine substituted at α-position and trifluoromethyl at β-position as represented by the formula (c1-2).
In formula (c1-1), R31 is hydrogen or a C1-C20 hydrocarbyl group which may contain an ether bond, ester bond, carbonyl moiety, lactone ring, or fluorine atom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as will be exemplified later for the hydrocarbyl group R111 in formula (2A′).
In formula (c1-2), R32 is hydrogen, or a C1-C30 hydrocarbyl group or C2-C30 hydrocarbylcarbonyl group, which may contain an ether bond, ester bond, carbonyl moiety or lactone ring. The hydrocarbyl group and the hydrocarbyl moiety in the hydrocarbylcarbonyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as will be exemplified later for the hydrocarbyl group R111 in formula (2A′).
Examples of the cation in the monomer from which repeat unit (c1) is derived are shown below, but not limited thereto. RA is as defined above.
Examples of the cation in the monomer from which repeat unit (c2) or (c3) is derived are as will be exemplified later for the cation in the sulfonium salt having formula (2-1).
Examples of the anion in the monomer from which repeat unit (c2) is derived are shown below, but not limited thereto. RA is as defined above.
Examples of the anion in the monomer from which repeat unit (c3) is derived are shown below, but not limited thereto. RA is as defined above.
Repeat units (c1) to (c3) have the function of acid generator. The attachment of an acid generator to the polymer main chain is effective in restraining acid diffusion, thereby preventing a reduction of resolution due to blur by acid diffusion. Also, LWR and CDU are improved since the acid generator is uniformly distributed. When a base polymer comprising repeat units (c) is used, that is, in case of polymer-bound acid generator, an acid generator of addition type (to be described later) may be omitted.
The base polymer may further comprise repeat units (d) which are free of an amino group and contain iodine. Examples of the monomer from which the iodized units are derived are shown below, but not limited thereto. Herein RA is as defined above.
Besides the repeat units described above, the base polymer may further comprise repeat units (e) which are derived from styrene, vinylnaphthalene, indene, acenaphthylene, coumarin, and coumarone.
In the base polymer comprising repeat units (a1), (a2), (b), (c1), (c2), (c3), (d) and (e), a fraction of these units is: preferably 0≤a1≤0.9, 0≤a2≤0.9, 0<a1+a2≤0.9, 0≤b≤0.9, 0≤c1≤0.5, 0≤c2≤0.5, 0≤c3≤0.5, 0≤c1+c2+c3≤0.5, 0≤d≤0.5, and 0≤e≤0.5; more preferably 0≤a1≤0.8, 0≤a2≤0.8, 0<a1+a2≤0.8, 0≤b≤0.8, 0≤c1≤0.4, 0≤c2≤0.4, 0≤c3≤0.4, 0≤c1+c2+c3≤0.4, 0≤d≤0.4, and 0≤e≤0.4; and even more preferably 0≤a1≤0.7, 0≤a2≤0.7, 0<a1+a2≤0.7, 0≤b≤0.7, 0≤c1≤0.3, 0≤c2≤0.3, 0≤c3≤0.3, 0≤c1+c2+c3≤0.3, 0≤d≤0.3, and 0≤e≤0.3. Notably, a1+a2+b+c1+c2+c3+d+e=1.0.
The base polymer may be synthesized by any desired methods, for example, by dissolving one or more monomers selected from the monomers corresponding to the foregoing repeat units in an organic solvent, adding a radical polymerization initiator thereto, and heating for polymerization. Examples of the organic solvent which can be used for polymerization include toluene, benzene, tetrahydrofuran (THF), diethyl ether, and dioxane. Examples of the polymerization initiator used herein include 2,2′-azobisisobutyronitrile (AIBN), 2,2′-azobis(2,4-dimethylvaleronitrile), dimethyl 2,2-azobis(2-methylpropionate), benzoyl peroxide, and lauroyl peroxide. Preferably the reaction temperature is 50 to 80° C., and the reaction time is 2 to 100 hours, more preferably 5 to 20 hours.
When a monomer having a hydroxy group is copolymerized, the hydroxy group may be replaced by an acetal group susceptible to deprotection with acid, typically ethoxyethoxy, prior to polymerization, and the polymerization be followed by deprotection with weak acid and water. Alternatively, the hydroxy group may be replaced by an acetyl, formyl, pivaloyl or similar group prior to polymerization, and the polymerization be followed by alkaline hydrolysis.
When hydroxystyrene or hydroxyvinylnaphthalene is copolymerized, an alternative method is possible. Specifically, acetoxystyrene or acetoxyvinylnaphthalene is used instead of hydroxystyrene or hydroxyvinylnaphthalene, and after polymerization, the acetoxy group is deprotected by alkaline hydrolysis, for thereby converting the polymer product to hydroxystyrene or hydroxyvinylnaphthalene. For alkaline hydrolysis, a base such as aqueous ammonia or triethylamine may be used. Preferably the reaction temperature is −20° C. to 100° C., more preferably 0° C. to 60° C., and the reaction time is 0.2 to 100 hours, more preferably 0.5 to 20 hours.
The base polymer should preferably have a weight average molecular weight (Mw) in the range of 1,000 to 500,000, and more preferably 2,000 to 30,000, as measured by GPC versus polystyrene standards using tetrahydrofuran (THF) solvent. With too low a Mw, the resist composition may become less heat resistant. A polymer with too high a Mw may lose alkaline solubility and give rise to a footing phenomenon after pattern formation.
If a base polymer has a wide molecular weight distribution or dispersity (Mw/Mn), which indicates the presence of lower and higher molecular weight polymer fractions, there is a possibility that foreign matter is left on the pattern or the pattern profile is degraded. The influences of Mw and Mw/Mn become stronger as the pattern rule becomes finer. Therefore, the base polymer should preferably have a narrow dispersity (Mw/Mn) of 1.0 to 2.0, especially 1.0 to 1.5, in order to provide a resist composition suitable for micropatterning to a small feature size.
In the embodiment wherein the positive resist composition contains a base polymer, the base polymer is preferably present in an amount of 10 to 1,000 parts by weight, more preferably 20 to 500 parts by weight, even more preferably 50 to 200 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. The base polymer may be a blend of two or more polymers which differ in compositional ratio, Mw or Mw/Mn.
Acid Generator
The positive resist composition may contain an acid generator capable of generating a strong acid, also referred to as acid generator of addition type. As used herein, the “strong acid” is a compound having a sufficient acidity to induce deprotection reaction of acid labile groups on the base polymer.
The acid generator is typically a compound (PAG) capable of generating an acid upon exposure to actinic ray or radiation. Although the PAG used herein may be any compound capable of generating an acid upon exposure to high-energy radiation, those compounds capable of generating sulfonic acid, imidic acid (imide acid) or methide acid are preferred. Suitable PAGs include sulfonium salts, iodonium salts, sulfonyldiazomethane, N-sulfonyloxyimide, and oxime-O-sulfonate acid generators. Suitable PAGs are as exemplified in U.S. Pat. No. 7,537,880 (JP-A 2008-111103, paragraphs [0122]-[0142]).
As the PAG used herein, sulfonium salts having the formula (2-1) and iodonium salts having the formula (2-2) are also preferred.
In formulae (2-1) and (2-2), R101 to R105 are each independently fluorine, chlorine, bromine, iodine or a C1-C20 hydrocarbyl group which may contain a heteroatom. The C1-C20 hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include C1-C20 alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, n-octyl, n-nonyl, n-decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, heptadecyl, octadecyl, nonadecyl and icosyl; C3-C20 cyclic saturated hydrocarbyl groups such as cyclopropyl, cyclopentyl, cyclohexyl, cyclopropylmethyl, 4-methylcyclohexyl, cyclohexylmethyl, norbornyl, and adamantyl; C2-C20 alkenyl groups such as vinyl, propenyl, butenyl and hexenyl; C2-C20 alkynyl groups such as ethynyl, propynyl, and butynyl; C3-C20 cyclic unsaturated aliphatic hydrocarbyl groups such as cyclohexenyl and norbornenyl; C6-C20 aryl groups such as phenyl, methylphenyl, ethylphenyl, n-propylphenyl, isopropylphenyl, n-butylphenyl, isobutylphenyl, sec-butylphenyl, tert-butylphenyl, naphthyl, methylnaphthyl, ethylnaphthyl, n-propylnaphthyl, isopropylnaphthyl, n-butylnaphthyl, isobutylnaphthyl, sec-butylnaphthyl, and tert-butylnaphthyl; C7-C20 aralkyl groups such as benzyl and phenethyl; and combinations thereof.
In the hydrocarbyl group, some or all of the hydrogen atoms may be substituted by a moiety containing a heteroatom such as oxygen, sulfur, nitrogen or halogen, and some constituent —CH2— may be replaced by a moiety containing a heteroatom such as oxygen, sulfur or nitrogen, so that the group may contain a hydroxy, fluorine, chlorine, bromine, iodine, cyano, carbonyl, ether bond, ester bond, sulfonic ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride (—C(═O)—O—C(═O)—), or haloalkyl moiety.
R101 and R102 may bond together to form a ring with the sulfur atom to which they are attached. Exemplary preferred rings are shown below.
Herein the broken line designates a point of attachment to R103.
Examples of the cation in the sulfonium salt having formula (2-1) are shown below, but not limited thereto.
Examples of the cation in the iodonium salt having formula (2-2) are shown below, but not limited thereto.
In formulae (2-1) and (2-2), Xa− is an anion of the following formula (2A), (2B), (2C) or (2D).
In formula (2A), Rfa is fluorine or a C1-C40 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as will be exemplified later for the hydrocarbyl group R111 in formula (2A′).
Of the anions having formula (2A), an anion having the formula (2A′) is preferred.
In formula (2A′), RHF is hydrogen or trifluoromethyl, preferably trifluoromethyl.
R111 is a C1-C38 hydrocarbyl group which may contain a heteroatom. As the heteroatom, oxygen, nitrogen, sulfur and halogen atoms are preferred, with oxygen being most preferred. Of the hydrocarbyl groups represented by R111, those groups of 6 to 30 carbon atoms are preferred from the aspect of achieving a high resolution in forming patterns of fine feature size. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include C1-C38 alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, neopentyl, hexyl, heptyl, 2-ethylhexyl, nonyl, undecyl, tridecyl, pentadecyl, heptadecyl, and icosyl; C3-C38 cyclic saturated hydrocarbyl groups such as cyclopentyl, cyclohexyl, 1-adamantyl, 2-adamantyl, 1-adamantylmethyl, norbornyl, norbornylmethyl, tricyclodecyl, tetracyclododecyl, tetracyclododecylmethyl, and dicyclohexylmethyl; C2-C38 unsaturated aliphatic hydrocarbyl groups such as allyl and 3-cyclohexenyl; C6-C38 aryl groups such as phenyl, 1-naphthyl and 2-naphthyl; C7-C38 aralkyl groups such as benzyl and diphenylmethyl; and combinations thereof.
In the foregoing hydrocarbyl groups, some or all hydrogen atoms may be substituted by a moiety containing a heteroatom such as oxygen, sulfur, nitrogen or halogen, and some constituent —CH2— may be replaced by a moiety containing a heteroatom such as oxygen, sulfur or nitrogen, so that the group may contain a hydroxy, fluorine, chlorine, bromine, iodine, cyano, nitro, carbonyl, ether bond, ester bond, sulfonic ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride (—C(═O)—O—C(═O)—), or haloalkyl moiety. Examples of the heteroatom-containing hydrocarbyl group include tetrahydrofuryl, methoxymethyl, ethoxymethyl, methylthiomethyl, acetamidemethyl, trifluoroethyl, (2-methoxyethoxy)methyl, acetoxymethyl, 2-carboxy-1-cyclohexyl, 2-oxopropyl, 4-oxo-1-adamantyl, and 3-oxocyclohexyl.
With respect to the synthesis of the sulfonium salt having an anion of formula (2A′), reference may be made to JP-A 2007-145797, JP-A 2008-106045, JP-A 2009-007327, and JP-A 2009-258695. Also useful are the sulfonium salts described in JP-A 2010-215608, JP-A 2012-041320, JP-A 2012-106986, and JP-A 2012-153644.
Examples of the anion having formula (2A) include those exemplified as the anion having formula (1A) in JP-A 2018-197853.
In formula (2B), Rfb1 and Rfb2 are each independently fluorine or a C1-C40 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic, and examples thereof are as exemplified above for R111 in formula (2A′). Preferably Rfb1 and Rfb2 are fluorine or C1-C4 straight fluorinated alkyl groups. Also, Rfb1 and Rfb2 may bond together to form a ring with the linkage: —CF2—SO2—N−—SO2—CF2— to which they are attached. It is preferred that a combination of Rfb1 and Rfb2 be a fluorinated ethylene or fluorinated propylene group.
In formula (2C), Rfc1, Rfc2 and Rfc3 are each independently fluorine or a C1-C40 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic, and examples thereof are as exemplified above for R111 in formula (2A′). Preferably Rfc1, Rfc2 and Rfc3 are fluorine or C1-C4 straight fluorinated alkyl groups. Also, Rfc1 and Rfc2 may bond together to form a ring with the linkage: —CF2—SO2—C−—SO2—CF2— to which they are attached. It is preferred that a combination of Rfc1 and Rfc2 be a fluorinated ethylene or fluorinated propylene group.
In formula (2D), Rfd is a C1-C40 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic, and examples thereof are as exemplified above for R111 in formula (2A′).
With respect to the synthesis of the sulfonium salt having an anion of formula (2D), reference may be made to JP-A 2010-215608 and JP-A 2014-133723.
Examples of the anion having formula (2D) include those exemplified as the anion having formula (1D) in U.S. Pat. No. 11,022,883 (JP-A 2018-197853).
Notably, the compound having the anion of formula (2D) does not have fluorine at the α-position relative to the sulfo group, but two trifluoromethyl groups at the β-position. For this reason, it has a sufficient acidity to sever the acid labile groups in the base polymer. Thus the compound is an effective PAG.
Another preferred PAG is a compound having the formula (3).
In formula (3), R201 and R202 are each independently fluorine, chlorine, bromine, iodine or a C1-C30 hydrocarbyl group which may contain a heteroatom. R203 is a C1-C30 hydrocarbylene group which may contain a heteroatom. R201 and R202, or R201 and R203 may bond together to form a ring with the sulfur atom to which they are attached. Examples of the ring are as exemplified above for the ring that R101 and R102 in formula (2-1), taken together, form with the sulfur atom to which they are attached.
The hydrocarbyl groups R201 and R202 may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include C1-C30 alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, tert-pentyl, n-hexyl, n-octyl, 2-ethylhexyl, n-nonyl, and n-decyl; C3-C30 cyclic saturated hydrocarbyl groups such as cyclopentyl, cyclohexyl, cyclopentylmethyl, cyclopentylethyl, cyclopentylbutyl, cyclohexylmethyl, cyclohexylethyl, cyclohexylbutyl, norbornyl, tricyclo[5.2.1.02,6]decyl, and adamantyl; C6-C30 aryl groups such as phenyl, methylphenyl, ethylphenyl, n-propylphenyl, isopropylphenyl, n-butylphenyl, isobutylphenyl, sec-butylphenyl, tert-butylphenyl, naphthyl, methylnaphthyl, ethylnaphthyl, n-propylnaphthyl, isopropylnaphthyl, n-butylnaphthyl, isobutylnaphthyl, sec-butylnaphthyl, tert-butylnaphthyl, and anthracenyl; and combinations thereof. In the foregoing hydrocarbyl groups, some or all of the hydrogen atoms may be substituted by a moiety containing a heteroatom such as oxygen, sulfur, nitrogen or halogen, and some constituent —CH2— may be replaced by a moiety containing a heteroatom such as oxygen, sulfur or nitrogen, so that the group may contain a hydroxy, fluorine, chlorine, bromine, iodine, cyano, nitro, carbonyl, ether bond, ester bond, sulfonic ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride (—C(═O)—O—C(═O)—) or haloalkyl moiety.
The hydrocarbylene group R203 may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include C1-C30 alkanediyl groups such as methanediyl, ethane-1,1-diyl, ethane-1,2-diyl, propane-1,3-diyl, butane-1,4-diyl, pentane-1,5-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8-diyl, nonane-1,9-diyl, decane-1,10-diyl, undecane-1,11-diyl, dodecane-1,12-diyl, tridecane-1,13-diyl, tetradecane-1,14-diyl, pentadecane-1,15-diyl, hexadecane-1,16-diyl, and heptadecane-1,17-diyl; C3-C30 cyclic saturated hydrocarbylene groups such as cyclopentanediyl, cyclohexanediyl, norbornanediyl and adamantanediyl; C6-C30 arylene groups such as phenylene, methylphenylene, ethylphenylene, n-propylphenylene, isopropylphenylene, n-butylphenylene, isobutylphenylene, sec-butylphenylene, tert-butylphenylene, naphthylene, methylnaphthylene, ethylnaphthylene, n-propylnaphthylene, isopropylnaphthylene, n-butylnaphthylene, isobutylnaphthylene, sec-butylnaphthylene, and tert-butylnaphthylene; and combinations thereof. In the hydrocarbylene groups, some or all of the hydrogen atoms may be substituted by a moiety containing a heteroatom such as oxygen, sulfur, nitrogen or halogen, or some constituent —CH2— may be replaced by a moiety containing a heteroatom such as oxygen, sulfur or nitrogen, so that the group may contain a hydroxy, fluorine, chlorine, bromine, iodine, cyano, nitro, carbonyl, ether bond, ester bond, sulfonic ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride (—C(═O)—O—C(═O)—) or haloalkyl moiety. Of the heteroatoms, oxygen is preferred.
In formula (3), LC is a single bond, ether bond or a C1-C20 hydrocarbylene group which may contain a heteroatom. The hydrocarbylene group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as exemplified above for R203.
In formula (3), XA, XB, XC and XD are each independently hydrogen, fluorine or trifluoromethyl, with the proviso that at least one of XA, XB, XC and XD is fluorine or trifluoromethyl, and w is an integer of 0 to 3.
Of the PAGs having formula (3), those having formula (3′) are preferred.
In formula (3′), LC is as defined above. RHF is hydrogen or trifluoromethyl, preferably trifluoromethyl. R301, R302 and R303 are each independently hydrogen or a C1-C20 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as exemplified above for R111 in formula (2A′). The subscripts x and y are each independently an integer of 0 to 5, and z is an integer of 0 to 4.
Examples of the PAG having formula (3) are as exemplified as the PAG having formula (2) in U.S. Pat. No. 9,720,324 (JP-A 2017-026980).
Of the foregoing PAGs, those having an anion of formula (2A′) or (2D) are especially preferred because of reduced acid diffusion and high solubility in the solvent. Also those having formula (3′) are especially preferred because of extremely reduced acid diffusion.
A sulfonium or iodonium salt having an iodized or brominated aromatic ring-containing anion may also be used as the PAG. Suitable are sulfonium and iodonium salts having the formulae (4-1) and (4-2).
In formulae (4-1) and (4-2), s is an integer of 1 to 3, t is an integer of 1 to 5, u is an integer of 0 to 3, and 1≤t+u≤5. Preferably, t is an integer of 1 to 3, more preferably 2 or 3, and u is an integer of 0 to 2.
XBI is iodine or bromine, and may be the same or different when s and/or t is 2 or more.
L1 is a single bond, ether bond, ester bond, or a C1-C6 saturated hydrocarbylene group which may contain an ether bond or ester bond. The saturated hydrocarbylene group may be straight, branched or cyclic.
In case of s=1, L2 is a single bond or a C1-C6 divalent linking group. In case of s=2 or 3, L2 is a C1-C20 (p+1)-valent linking group. The linking group may contain an oxygen, sulfur or nitrogen atom.
R401 is a hydroxy group, carboxy group, fluorine, chlorine, bromine, amino group, or a C1-C20 hydrocarbyl, C1-C20 hydrocarbyloxy, C2-C20 hydrocarbylcarbonyl. C2-C20 hydrocarbyloxycarbonyl, C2-C20 hydrocarbylcarbonyloxy or C1-C20 hydrocarbylsulfonyloxy group, which may contain fluorine, chlorine, bromine, hydroxy, amino or ether bond, or —N(R401A)(R401B), —N(R401C)—(═O)—R401D or —N(R401C)—C(═O)—O—R401D. R401A and R401B are each independently hydrogen or a C1-C6 saturated hydrocarbyl group. R401C is hydrogen or a C1-C6 saturated hydrocarbyl group which may contain halogen, hydroxy, C1-C6 saturated hydrocarbyloxy, C2-C6 saturated hydrocarbylcarbonyl or C2-C6 saturated hydrocarbylcarbonyloxy moiety. R401D is a C1-C16 aliphatic hydrocarbyl, C6-C12 aryl or C7-C18 aralkyl group, which may contain halogen, hydroxy, C1-C6 saturated hydrocarbyloxy, C2-C6 saturated hydrocarbylcarbonyl or C2-C6 saturated hydrocarbylcarbonyloxy moiety. The aliphatic hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. The hydrocarbyl, hydrocarbyloxy, hydrocarbylcarbonyl, hydrocarbyloxycarbonyl, hydrocarbylcarbonyloxy, and hydrocarbylsulfonyloxy groups may be straight, branched or cyclic. A plurality of R401 may be the same or different when s and/or u is 2 or more. Of these, R401 is preferably hydroxy, —N(R401C)—C(═O)—R401D, —N(R401C)—C(═O)—O—R401D, fluorine, chlorine, bromine, methyl or methoxy.
In formulae (4-1) and (4-2), Rf11 to Rf14 are each independently hydrogen, fluorine or trifluoromethyl, at least one of Rf11 to Rf14 is fluorine or trifluoromethyl, or Rf11 and Rf12 taken together, may form a carbonyl group. Preferably, both Rf11 and Rf14 are fluorine.
R402 to R406 are each independently fluorine, chlorine, bromine, iodine or a C1-C20 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as exemplified above for the hydrocarbyl groups R1011 to R105 in formulae (2-1) and (2-2). In these groups, some or all of the hydrogen atoms may be substituted by hydroxy, carboxy, halogen, cyano, nitro, mercapto, sultone ring, sulfo, or sulfonium salt-containing moiety, and some constituent —CH2— may be replaced by an ether bond, ester bond, carbonyl moiety, amide bond, carbonate bond or sulfonic ester bond. R402 and R403 may bond together to form a ring with the sulfur atom to which they are attached. Exemplary rings are the same as described above for the ring that R101 and R102 in formula (2-1), taken together, form with the sulfur atom to which they are attached.
Examples of the cation in the sulfonium salt having formula (4-1) include those exemplified above as the cation in the sulfonium salt having formula (2-1). Examples of the cation in the iodonium salt having formula (4-2) include those exemplified above as the cation in the iodonium salt having formula (2-2).
Examples of the anion in the onium salts having formulae (4-1) and (4-2) are shown below, but not limited thereto. Herein XBI is as defined above.
In the embodiment wherein the resist composition does not contain a base polymer, the acid generator of addition type is preferably added in an amount of 0.1 to 50 parts by weight, and more preferably 1 to 40 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. In the other embodiment wherein the resist composition contains a base polymer, the acid generator of addition type is preferably added in an amount of 0.1 to 50 parts by weight, and more preferably 1 to 40 parts by weight per 100 parts by weight of the nitrobenzyl ester compound and the base polymer combined. The resist composition functions as a chemically amplified positive resist composition when the base polymer includes repeat units (c) and/or the resist composition contains the acid generator of addition type.
Organic Solvent
The positive resist composition may contain an organic solvent. The organic solvent used herein is not particularly limited as long as the foregoing and other components are soluble therein. Examples of the organic solvent are described in JP-A 2008-111103, paragraphs [0144]-[0145] (U.S. Pat. No. 7,537,880). Exemplary solvents include ketones such as cyclohexanone, cyclopentanone, methyl-2-n-pentyl ketone and 2-heptanone; alcohols such as 3-methoxybutanol, 3-methyl-3-methoxybutanol, 1-methoxy-2-propanol, I-ethoxy-2-propanol and diacetone alcohol (DAA); ethers such as propylene glycol monomethyl ether (PGME), ethylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol monoethyl ether, propylene glycol dimethyl ether, and diethylene glycol dimethyl ether; esters such as propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, ethyl lactate, ethyl pyruvate, butyl acetate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, tert-butyl acetate, tert-butyl propionate, and propylene glycol mono-tert-butyl ether acetate; and lactones such as γ-butyrolactone, which may be used alone or in admixture.
In the embodiment wherein the resist composition does not contain a base polymer, the organic solvent is preferably used in an amount of 100 to 10,000 parts by weight, and more preferably 200 to 8,000 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. In the other embodiment wherein the resist composition contains a base polymer, the organic solvent is preferably used in an amount of 100 to 10,000 parts by weight, and more preferably 200 to 8,000 parts by weight per 100 parts by weight of the nitrobenzyl ester compound and the base polymer combined.
Quencher
The positive resist composition may further comprise a quencher. As used herein, the quencher refers to a compound capable of trapping the acid generated by the PAG to prevent the acid from diffusing into the unexposed region of the resist film.
The quencher is typically selected from conventional basic compounds. Conventional basic compounds include primary, secondary, and tertiary aliphatic amines, mixed amines, aromatic amines, heterocyclic amines, nitrogen-containing compounds with carboxy group, nitrogen-containing compounds with sulfonyl group, nitrogen-containing compounds with hydroxy group, nitrogen-containing compounds with hydroxyphenyl group, alcoholic nitrogen-containing compounds, amide derivatives, imide derivatives, and carbamate derivatives. Also included are primary, secondary, and tertiary amine compounds, specifically amine compounds having a hydroxy group, ether bond, ester bond, lactone ring, cyano group, or sulfonic ester bond as described in JP-A 2008-111103, paragraphs [0146]-[0164], and compounds having a carbamate group as described in JP 3790649. Addition of a basic compound may be effective for further suppressing the diffusion rate of acid in the resist film or correcting the pattern profile.
Suitable other quenchers also include onium salts such as sulfonium salts, iodonium salts and ammonium salts of sulfonic acids which are not fluorinated at α-position and similar onium salts of carboxylic acid, as described in U.S. Pat. No. 8,795,942 (JP-A 2008-158339). While an α-fluorinated sulfonic acid, imide acid, and methide acid are necessary to deprotect the acid labile group of carboxylic acid ester, an α-non-fluorinated sulfonic acid or a carboxylic acid is released by salt exchange with an α-non-fluorinated onium salt. An α-non-fluorinated sulfonic acid and a carboxylic acid function as a quencher because they do not induce deprotection reaction.
Examples of the quencher include a compound having the formula (5), i.e., onium salt of α-non-fluorinated sulfonic acid and a compound having the formula (6), i.e., onium salt of carboxylic acid.
R501—SO3−Mq+ (5)
R502—CO2−Mq+ (6)
In formula (5), R501 is hydrogen or a C1-C40 hydrocarbyl group which may contain a heteroatom, exclusive of the hydrocarbyl group in which the hydrogen bonded to the carbon atom at α-position of the sulfo group is substituted by fluorine or fluoroalkyl moiety.
The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof include C1-C40 alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, tert-pentyl, n-pentyl, n-hexyl, n-octyl, 2-ethylhexyl, n-nonyl, n-decyl; C3-C40 cyclic saturated hydrocarbyl groups such as cyclopentyl, cyclohexyl, cyclopentylmethyl, cyclopentylethyl, cyclopentylbutyl, cyclohexylmethyl, cyclohexylethyl, cyclohexylbutyl, norbornyl, tricyclo[5.2.1.02,6]decyl, adamantyl, and adamantylmethyl; C2-C40 alkenyl groups such as vinyl, allyl, propenyl, butenyl and hexenyl; C3-C40 cyclic unsaturated aliphatic hydrocarbyl groups such as cyclohexenyl; C6-C40 aryl groups such as phenyl, naphthyl, alkylphenyl groups (e.g., 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-ethylphenyl, 4-tert-butylphenyl, 4-n-butylphenyl), dialkylphenyl groups (e.g., 2,4-dimethylphenyl and 2,4,6-triisopropylphenyl), alkylnaphthyl groups (e.g., methylnaphthyl and ethylnaphthyl), dialkylnaphthyl groups (e.g., dimethylnaphthyl and diethylnaphthyl); C7-C40 aralkyl groups such as benzyl, 1-phenylethyl and 2-phenylethyl; and combinations thereof.
In these hydrocarbyl groups, some or all hydrogen may be substituted by a moiety containing a heteroatom such as oxygen, sulfur, nitrogen or halogen, and some constituent —CH2— may be replaced by a moiety containing a heteroatom such as oxygen, sulfur or nitrogen, so that the group may contain a hydroxy moiety, fluorine, chlorine, bromine, iodine, cyano moiety, carbonyl moiety, ether bond, ester bond, sulfonic ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride (—C(═O)—O—C(═O)—), or haloalkyl moiety. Suitable heteroatom-containing hydrocarbyl groups include heteroaryl groups such as thienyl and indolyl; alkoxyphenyl groups such as 4-hydroxyphenyl, 4-methoxyphenyl, 3-methoxyphenyl, 2-methoxyphenyl, 4-ethoxyphenyl, 4-tert-butoxyphenyl, 3-tert-butoxyphenyl; alkoxynaphthyl groups such as methoxynaphthyl, ethoxynaphthyl, n-propoxynaphthyl and n-butoxynaphthyl; dialkoxynaphthyl groups such as dimethoxynaphthyl and diethoxynaphthyl; and aryloxoalkyl groups, typically 2-aryl-2-oxoethyl groups such as 2-phenyl-2-oxoethyl, 2-(1-naphthyl)-2-oxoethyl and 2-(2-naphthyl)-2-oxoethyl.
In formula (6), R502 is a C1-C40 hydrocarbyl group which may contain a heteroatom. Examples of the hydrocarbyl group R2 are as exemplified above for the hydrocarbyl group R501. Also included are fluorinated alkyl groups such as trifluoromethyl, trifluoroethyl, 2,2,2-trifluoro-1-methyl-1-hydroxyethyl, 2,2,2-trifluoro-1-(trifluoromethyl)-1-hydroxyethyl, and fluorinated aryl groups such as pentafluorophenyl and 4-trifluoromethylphenyl.
In formulae (5) and (6), Mq+ is an onium cation. The onium cation is preferably selected from sulfonium, iodonium and ammonium cations, more preferably sulfonium and iodonium cations. Exemplary sulfonium cations are as exemplified above for the cation in the sulfonium salt having formula (2-1). Exemplary iodonium cations are as exemplified above for the cation in the iodonium salt having formula (2-2).
A sulfonium salt of iodized benzene ring-containing carboxylic acid having the formula (7) is also useful as the quencher.
In formula (7), R601 is hydroxy, fluorine, chlorine, bromine, amino, nitro, cyano, or a C1-C6 saturated hydrocarbyl, C1-C6 saturated hydrocarbyloxy, C2-C6 saturated hydrocarbylcarbonyloxy or C1-C4 saturated hydrocarbylsulfonyloxy group, in which some or all hydrogen may be substituted by halogen, or —N(R601A)—C(═O)—R601B, or —N(R601A)—C(═O)—O—R601B. R601A is hydrogen or a C1-C6 saturated hydrocarbyl group. R601B is a C1-C6 saturated hydrocarbyl or C2-C8 unsaturated aliphatic hydrocarbyl group.
In formula (7), x′ is an integer of 1 to 5, y′ is an integer of 0 to 3, and z′ is an integer of 1 to 3. LII is a single bond, or a C1-C20 (z′+1)-valent linking group which may contain at least one moiety selected from ether bond, carbonyl moiety, ester bond, amide bond, sultone ring, lactam ring, carbonate bond, halogen, hydroxy moiety, and carboxy moiety. The saturated hydrocarbyl, saturated hydrocarbyloxy, saturated hydrocarbylcarbonyloxy, and saturated hydrocarbylsulfonyloxy groups may be straight, branched or cyclic. A plurality of R601 may be the same or different when y′ and/or z′ is 2 or 3.
In formula (7), R602, R603 and R604 are each independently fluorine, chlorine, bromine, iodine, or a C1-C20 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples thereof are as exemplified above for the hydrocarbyl groups R101 to R105 in formulae (2-1) and (2-2). In the hydrocarbyl groups, some or all hydrogen may be substituted by hydroxy, carboxy, halogen, oxo, cyano, nitro, sultone ring, sulfo, or sulfonium salt-containing moiety, or some —CH2— may be replaced by an ether bond, ester bond, carbonyl moiety, amide bond, carbonate bond or sulfonic ester bond. R602 and R603 may bond together to form a ring with the sulfur atom to which they are attached.
Examples of the compound having formula (7) include those described in U.S. Pat. No. 10,295,904 (JP-A 2017-219836). Since iodine atoms are fully absorptive to EUV of wavelength 13.5 nm, they generate secondary electrons upon exposure. The energy of secondary electrons is transferred to the PAG to promote decomposition of the quencher for thereby enhancing sensitivity.
In the embodiment wherein the resist composition does not contain a base polymer, the quencher is preferably used in an amount of 0 to 20 parts by weight, and more preferably 0.1 to 10 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. In the other embodiment wherein the resist composition contains a base polymer, the quencher is preferably used in an amount of 0 to 20 parts by weight, and more preferably 0.1 to 10 parts by weight per 100 parts by weight of the nitrobenzyl ester compound and the base polymer combined. The quencher may be used alone or in admixture.
Other Components
In addition to the foregoing components, the positive resist composition may contain other components such as a surfactant, dissolution inhibitor, water repellency improver, and acetylene alcohol.
Exemplary surfactants are described in JP-A 2008-111103, paragraphs [0165]-[0166]. Inclusion of a surfactant may improve or control the coating characteristics of the resist composition. In the embodiment wherein the resist composition does not contain a base polymer, the surfactant is preferably used in an amount of 0.0001 to 10 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. In the other embodiment wherein the resist composition contains a base polymer, the surfactant is preferably used in an amount of 0.0001 to 10 parts by weight per 100 parts by weight of the nitrobenzyl ester compound and the base polymer combined. The surfactant may be used alone or in admixture.
In the positive resist composition, inclusion of a dissolution inhibitor may lead to an increased difference in dissolution rate between exposed and unexposed areas and a further improvement in resolution. The dissolution inhibitor which can be used herein is a compound having at least two phenolic hydroxy groups on the molecule, in which an average of from 0 to 100 mol % of all the hydrogen atoms on the phenolic hydroxy groups are replaced by acid labile groups or a compound having at least one carboxy group on the molecule, in which an average of 50 to 100 mol % of all the hydrogen atoms on the carboxy groups are replaced by acid labile groups, both the compounds having a molecular weight of 100 to 1,000, and preferably 150 to 800. Typical are bisphenol A, trisphenol, phenolphthalein, cresol novolac, naphthalenecarboxylic acid, adamantanecarboxylic acid, and cholic acid derivatives in which the hydrogen atom on the hydroxy or carboxy group is replaced by an acid labile group, as described in U.S. Pat. No. 7,771,914 (JP-A 2008-122932, paragraphs [0155]-[0178]).
In the embodiment wherein the resist composition does not contain a base polymer, the dissolution inhibitor is preferably used in an amount of 0 to 50 parts by weight, and more preferably 5 to 40 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. In the other embodiment wherein the resist composition contains a base polymer, the dissolution inhibitor is preferably used in an amount of 0 to 50 parts by weight, and more preferably 5 to 40 parts by weight per 100 parts by weight of the nitrobenzyl ester compound and the base polymer combined. The dissolution inhibitor may be used alone or in admixture.
To the resist composition, a water repellency improver may also be added for improving the water repellency on surface of a resist film. The water repellency improver may be used in the topcoatless immersion lithography. Suitable water repellency improvers include polymers having a fluoroalkyl group and polymers having a specific structure with a 1,1,1,3,3,3-hexafluoro-2-propanol residue and are described in JP-A 2007-297590 and JP-A 2008-111103, for example. The water repellency improver to be added to the resist composition should be soluble in the alkaline developer and organic solvent developer. The water repellency improver of specific structure with a 1,1,1,3,3,3-hexafluoro-2-propanol residue is well soluble in the developer. A polymer having an amino group or amine salt copolymerized as repeat units may serve as the water repellency improver and is effective for preventing evaporation of acid during PEB, thus preventing any hole pattern opening failure after development.
In the embodiment wherein the resist composition does not contain a base polymer, the water repellency improver is preferably used in an amount of 0 to 20 parts by weight, and more preferably 0.5 to 10 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. In the other embodiment wherein the resist composition contains a base polymer, the water repellency improver is preferably used in an amount of 0 to 20 parts by weight, and more preferably 0.5 to 10 parts by weight per 100 parts by weight of the nitrobenzyl ester compound and the base polymer combined. The water repellency improver may be used alone or in admixture.
Also, an acetylene alcohol may be blended in the resist composition. Suitable acetylene alcohols are described in JP-A 2008-122932, paragraphs [0179]-[0182]. In the embodiment wherein the resist composition does not contain a base polymer, the acetylene alcohol is preferably used in an amount of 0 to 5 parts by weight per 100 parts by weight of the nitrobenzyl ester compound. In the other embodiment wherein the resist composition contains a base polymer, the acetylene alcohol is preferably used in an amount of 0 to 5 parts by weight per 100 parts by weight of the nitrobenzyl ester compound and the base polymer combined. The acetylene alcohol may be used alone or in admixture.
Pattern Forming Process
The positive resist composition is used in the fabrication of various integrated circuits. Pattern formation using the resist composition may be performed by well-known lithography processes. The process generally involves the steps of applying the resist composition onto a substrate to form a resist film thereon, exposing the resist film to high-energy radiation, and developing the exposed resist film in a developer. If necessary, any additional steps may be added.
Specifically, the resist composition is first applied onto a substrate on which an integrated circuit is to be formed (e.g., Si, SiO2, SiN, SiON, TiN, WSi, BPSG, SOG, or organic antireflective coating) or a substrate on which a mask circuit is to be formed (e.g., Cr, CrO, CrON, MoSi2, or SiO2) by a suitable coating technique such as spin coating, roll coating, flow coating, dipping, spraying or doctor coating. The coating is prebaked on a hot plate at a temperature of 60 to 150° C. for 10 seconds to 30 minutes, preferably at 80 to 120° C. for 30 seconds to 20 minutes. The resulting resist film is generally 0.01 to 2 μm thick.
The resist film is then exposed to a desired pattern of high-energy radiation such as UV, deep-UV. EB, EUV of wavelength 3 to 15 nm, x-ray, soft x-ray, excimer laser light, γ-ray or synchrotron radiation. When UV, deep-UV, EUV, x-ray, soft x-ray, excimer laser light, 7-ray or synchrotron radiation is used as the high-energy radiation, the resist film is exposed thereto directly or through a mask having a desired pattern in a dose of preferably about 1 to 200 mJ/cm2, more preferably about 10 to 100 mJ/cm2. When EB is used as the high-energy radiation, the resist film is exposed thereto directly or through a mask having a desired pattern in a dose of preferably about 0.1 to 100 μC/cm2, more preferably about 0.5 to 50 μC/cm2. It is appreciated that the inventive resist composition is suited in micropatterning using i-line of wavelength 365 nm, KrF excimer laser, ArF excimer laser, EB, EUV, x-ray, soft x-ray, γ-ray or synchrotron radiation, especially EB or EUV.
After the exposure, the resist film may be baked (PEB) on a hot plate or in an oven at 50 to 150° C. for 10 seconds to 30 minutes, preferably at 60 to 120° C. for 30 seconds to 20 minutes.
After the exposure or PEB, the resist film is developed in a developer in the form of an aqueous base solution for 3 seconds to 3 minutes, preferably 5 seconds to 2 minutes by conventional techniques such as dip, puddle and spray techniques. A typical developer is a 0.1 to 10 wt %, preferably 2 to 5 wt % aqueous solution of tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide (TEAH), tetrapropylammonium hydroxide (TPAH), or tetrabutylammonium hydroxide (TBAH). The resist film in the exposed area is dissolved in the developer whereas the resist film in the unexposed area is not dissolved. In this way, the desired positive pattern is formed on the substrate.
A hole or trench pattern after development may be shrunk by the thermal flow, RELACS® or DSA process. A hole pattern is shrunk by coating a shrink agent thereto, and baking such that the shrink agent may undergo crosslinking at the resist surface as a result of the acid catalyst diffusing from the resist layer during bake, and the shrink agent may attach to the sidewall of the hole pattern. The bake is preferably at a temperature of 70 to 180° C., more preferably 80 to 170° C., for a time of 10 to 300 seconds. The extra shrink agent is stripped and the hole pattern is shrunk.
Examples of the invention are given below by way of illustration and not by way of limitation. The abbreviation “pbw” is parts by weight.
Nitrobenzyl ester compound N-1 was synthesized by esterification reaction of 3,5,6-triiodobenzoic acid with 2-nitrobenzyl alcohol. By similar reaction, nitrobenzyl ester compounds N-2 to N-6, N-14 and comparative nitrobenzyl ester compound CN-1 were synthesized.
Nitrobenzyl ester compounds N-7 to N-13, N-15 to N-20 were synthesized by reaction of the nitrobenzyl ester compound with a carboxy-bearing compound and an acid anhydride or isocyanate compound.
Each of base polymers P-1 to P-3 was prepared by combining suitable monomers, effecting copolymerization reaction thereof in tetrahydrofuran (THE) solvent, pouring the reaction solution into methanol for precipitation, washing the precipitate with hexane, isolation, and drying. The resulting polymer was analyzed for composition by 1H-NMR spectroscopy and for Mw and Mw/Mn by GPC versus polystyrene standards using THF solvent.
(1) Preparation of Positive Resist Compositions
Positive resist compositions were prepared by dissolving various components in a solvent containing 100 ppm of surfactant PolyFox PF-636 (Omnova Solutions, Inc.) in accordance with the recipe shown in Table 1, and filtering through a filter having a pore size of 0.2 μm.
The components in Table 1 are identified below.
Organic Solvent:
(2) EUV Lithography Test
Each of the resist compositions in Table 1 was spin coated on a silicon substrate having a 20-nm coating of silicon-containing spin-on hard mask SHB-A940 (Shin-Etsu Chemical Co., Ltd., Si content 43 wt %) and prebaked on a hotplate at 100° C. for 60 seconds to form a resist film of 50 nm thick. Using an EUV scanner NXE3400 (ASML, NA 0.33, a 0.9/0.6, quadrupole illumination), the resist film was exposed to EUV through a mask bearing a hole pattern at a pitch 46 nm (on-wafer size) and +20% bias. In Examples 1 to 4 and 12 and Comparative Example 1, the resist film was baked (PEB) on a hotplate at the temperature shown in Table 1 for 60 seconds. After exposure or PEB, the resist film was developed in a 2.38 wt % TMAH aqueous solution for 30 seconds to form a hole pattern having a size of 23 nm.
The resist pattern was observed under CD-SEM (CG6300, Hitachi High-Technologies Corp.). The exposure dose that provides a hole pattern having a size of 23 nm is reported as sensitivity. The size of 50 holes printed at that dose was measured, from which a 3-fold value (3σ) of the standard deviation (σ) was computed and reported as dimensional variation or CDU.
The resist compositions are shown in Table 1 together with the sensitivity and CDU of EUV lithography.
It is demonstrated in Table 1 that positive resist compositions comprising the nitrobenzyl ester compound offer a high sensitivity and excellent CDU.
Japanese Patent Application No. 2022-111900 is incorporated herein by reference. Although some preferred embodiments have been described, many modifications and variations may be made thereto in light of the above teachings. It is therefore to be understood that the invention may be practiced otherwise than as specifically described without departing from the scope of the appended claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2022-111900 | Jul 2022 | JP | national |
