the macromolecular compound being present in a chemically amplified positive photoresist composition

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0392the macromolecular compound being present in a chemically amplified positive photoresist composition

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the macromolecular compound being present in a chemically amplified positive photoresist composition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Flow cells and methods for making the same

Onium salt, chemically amplified resist composition and patterning...

Radiation-sensitive resin composition and method for forming resist...

Radiation-sensitive resin composition, method of forming resist pat...

Transparent electrode, process for producing transparent electrode,...

Electronic system of specimen qualification

Solution, solution storage body, actinic ray-sensitive or radiation...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive composition

Positive photosensitive resin composition, positive photosensitive...

Photoresist composition and method of forming photoresist pattern

Resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Resist composition and patterning process

Resist composition and method for producing resist pattern

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Chemically amplified positive resist composition and resist pattern...

Resist composition and resist pattern forming method

Sulfonium salt, photoacid generator, curable composition and resist...

Resist composition and method of forming resist pattern

Radiation-sensitive resin composition, method for forming resist pa...

Resin, photoresist composition, and method of manufacturing semicon...

Resist composition and pattern forming process

Photoresist with polar-acid-labile-group

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Quantum dot film, quantum dot device, and display panel

Lithography techniques for reducing defects

Patents Applicationslast 30 patents

PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY

Radiation-Sensitive Composition and Method for Forming Resist Pattern

PHOTORESIST COMPOSITION

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Polymer, Positive And Negative Photosensitive Resin Compositions, P...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAK...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...

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ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

Resist Material, Resist Composition, And Patterning Process