The invention relates to a power generating device and a power generating module using same.
It has been known a power generating device (piezoelectric-type vibration power generating device) that employs a piezoelectric body and is configured to convert a vibration energy into an electric energy. The devices have been interested, for example, in an Energy Harvesting field, and have been studied by various researchers (e.g. see R. van Schaijk, et al, “Piezoelectric AlN energy harvesters for wireless autonomous body solutions”, IEEE SENSORS 2008 Conference, 2008, p.45-48 (hereinafter referred to as “non-patent document 1”), S. Roundy and P. K. Wright, “A piezoelectric vibration based generator for wireless electronics”, Smart Materials and Structures 13, 2004, p.1131-1142 (hereinafter referred to as “non-patent document 2”) or the like). The non-patent document 1 describes to utilize PZT (Pb(Zr,Ti)O3) as a material of the piezoelectric body. The non-patent document 2 describes to utilize PZT and aluminum nitride (AlN) as a material of the piezoelectric body.
In general, the power generating devices can be classified by the morphology of the piezoelectric body (into thin film type or bulk type). The non-patent document 1 describes a thin film type power generating device produced by micromachining technology. The non-patent document 2 describes a bulk type power generating device.
The power generating device disclosed in the non-patent document 1 includes a device substrate 301 formed of a silicon substrate 300 (see
The power generating section 320 includes: a lower electrode 322; a piezoelectric film 321 formed on the opposite side of the cantilever section 312 from the lower electrode 322; and an upper electrode 323 formed on the opposite side of the lower electrode 322 through the piezoelectric film 321. In short, the lower electrode 322 is formed on the cantilever section 312, the piezoelectric film 321 is formed on the lower electrode 322, and the upper electrode 323 is formed on the piezoelectric film 321. In the power generating section 320, the lower electrode 322 is formed of a Pt film, the piezoelectric film 321 is formed of an AlN thin film or a PZT thin film, and the upper electrode 323 is formed of an Al film.
The power generating device further includes: a first cover substrate 401 that is formed of a first glass substrate 400 and is fixed to the supporting section 311 at a first surface side (upper side in
Note that, the cantilever section 312 and the weight section 313 define a moving section of the device substrate 301. In the power generating device, displacement spaces (426, 526) for the moving section are formed between the first cover substrate 401 and the moving portion and the second cover substrate 501 and the moving section, respectively.
The power generating device disclosed in the non-patent document 2 includes a supporting section, a cantilever section swingably supported to the supporting section, and a weight section provided at one end of the cantilever section away from the other end supported to the supporting section. The cantilever section is formed of a bimorph cell that is composed of two piezoelectric layers pasted each other.
The non-patent document 2 further discloses a diagram of
The equivalent circuit model expresses an equivalent circuit of the power generating device using: an equivalent inductance Lm that represents a mass or an inertia weight of the weight section; an equivalent resistor Rb that represents a mechanical dumping; an equivalent capacitor Ck that represents a mechanical stiffness; an equivalent stress σin generated depending on an application of an external vibration; an equivalent winding ratio n of a transformer; and a capacitor Cb composed of a power generating section. The equivalent circuit model includes: a full-wave rectifier that includes four diodes (D1, D2, D3, D4) connected to form a bridge circuit and is configured to full-wave rectify an output voltage v of the power generating device; and an electricity storage capacitor Cst that is connected between output terminals of the full-wave rectifier.
Compared with the bulk type power generating device exemplified in the non-patent document 2, the thin film type power generating device, such as the power generating device describe in the non-patent document 1, has an inferior output voltage although can be downsized. Therefore, the thin film type power generating device has been desired to increase the output voltage. In case of constructing a power generating module that can output DC voltage using the power generating device described in the non-patent document 1, it may be possible to adopt the configuration exemplified in the non-patent document 2 in which output terminals of the power generating device are connected by a full-wave rectifier. In this case also, it is demanded to increase the output voltage.
The present invention is developed in view of above reason, and the objective of the present invention is to provide a power generating device that can output higher power as well as downsize the device and to provide a power generating module using the power generating device.
The power generating device of the present invention comprises: a device substrate having a supporting section, a cantilever section swingably supported to said supporting section, and a weight section provided at one end of said cantilever section away from the other end supported to said supporting section; and a power generating section carried by said cantilever section and configured to generate an AC voltage in response to a swing movement of said cantilever section, wherein said power generating section comprises: a piezoelectric body; and a plurality of electrode pairs each constituted by a pair of electrodes that are placed on opposite sides of said piezoelectric body with regard to a thickness direction of said piezoelectric body to define a functional section therebetween, each of the functional sections being cooperated with the related electrode pair to define a power generating element; wherein a plurality of the power generating elements comprises a first power generating element and a second power generating element configured to give a polarization orientation opposite to each other in the thickness direction, and wherein said first and second power generating elements are configured to have the corresponding electrodes being connected to each other by means of a wiring member on the same surface of said piezoelectric body with regard to the thickness direction thereof, such that all of said plurality of the power generating elements are connected in series.
In this power generating device, it is preferred that wherein one electrode, which is formed on said piezoelectric body after forming said piezoelectric body, of the electrode pair is made of a sheet electrode.
In this power generating device, it is preferred that wherein said cantilever section has embedding holes that are buried to form a part of the respective functional sections of the power generating elements, and wherein the piezoelectric body is formed of a self planarization film.
In this power generating device, it is preferred that wherein all of said plurality of the power generating elements are connected in series such that said first and second power generating elements are connected alternately.
In this power generating device, it is preferred that wherein said corresponding electrodes of said first and second power generating elements connected to each other by means of said wiring member are formed on the same surface side in the thickness direction.
In this power generating device, it is preferred that wherein the functional sections of said plurality of the power generating elements are formed in a single piezoelectric body.
The power generating module of the present invention comprises: said power generating device as set forth in any one claims of 1 to 6; and a circuit board on which said power generating device is mounted, wherein said circuit board is provided with a full-wave voltage doubler for a voltage doubler rectification of the voltage output from said power generation device.
The power generating device of the present invention can output higher power as well as downsize the device
The power generating module of the present invention can output higher power as well as downsize the device
Preferred embodiments of the invention will now be described in further details. Other features and advantages of the present invention will become better understood with regard to the following detailed description and accompanying drawings where:
A power generating device according to the present embodiment is described below with reference to
The power generating device 1 includes: a device substrate 10 having a supporting section 11, a cantilever section 12 swingably supported to the supporting section 11, and a weight section 13 provided at one end of the cantilever section 12 away from the other end supported to the supporting section 11. The cantilever section 12 carries a power generating section 20 configured to generate an AC voltage in response to a swing movement of the cantilever section 12.
The device substrate 10 is formed of a substrate 10a. In the present embodiment, the substrate 10a is a single-crystalline silicon substrate having a (100) surface as a first surface. Note that, the substrate 10a is not limited thereto, and may be a polycrystalline silicon substrate. A first insulation film 10b is formed on the first surface of the substrate 10a. The first insulation film 10b is made of a silicon dioxide film. The power generating section 20 is formed on the first insulation film 10b. The substrate 10a and the power generating section 20 are therefore electrically insulated by the first insulation film 10b of the silicon dioxide film formed at a first surface side of the substrate 10a. A second insulation film 10c is formed on a second surface (a surface opposite to the first surface) of the substrate 10a. The second insulation film 10c is made of a silicon dioxide film. Note that, the second insulation film 10c can be omitted. The substrate 10a is not limited to a silicon substrate, and may be a SOI (Silicon on Insulator) substrate, an MgO (magnesium oxide) substrate, a metal substrate, a glass substrate, a polymer substrate or the like. In a case where the substrate 10a is an insulating substrate such as an MgO substrate, a glass substrate, or a polymer substrate, the first insulation film 10b can be omitted.
In the device substrate 10a, the supporting section 11 is formed into a frame shape (rectangular frame shape in this embodiment). The cantilever section 12 and the weight section 13 are located on the inside of the supporting section 11. The cantilever section 12 has a smaller thickness (thickness in the top-bottom direction in
The power generating section 20 is formed at a first surface side (top side in
In the power generating section 20, the first and second power generating elements (201, 202) are configured to have the corresponding electrodes (22, 22) being connected to each other by means of a wiring member 24 on the same surface of the piezoelectric body 21 with regard to the thickness direction thereof, such that all of the plurality of power generating elements 200 are connected in series. That is, in the power generating section 20, the corresponding electrodes of the first and second power generating elements (201, 202) connected to each other by means of the wiring member are formed on the same surface in the thickness direction of the piezoelectric body 21. The corresponding electrodes are connected to each other on the surface of the piezoelectric body where these electrodes are formed. The plurality of the power generating elements 200 are connected in series such that the first power generating element 201 and the second power generating element 202 are connected alternately.
In the power generating section 20, each power generating element 200 is composed of a piezoelectric transducer having the electrode 22 (hereinafter, it may be referred to as lower electrode 22), the functional section 21a, and the electrode 23 (hereinafter, it may be referred to as upper electrode 23). When the cantilever section 12 swings, the piezoelectric body 21 (the functional section 21a) receives a stress in response to the swing movement to generate a charge bias in the upper electrode 23 and the lower electrode 22, and an AC voltage is generated at the power generating element 200. In short, the power generating device 1 of the present embodiment is a piezoelectric type vibration power generating device which is configured to generate an electric power by utilizing piezoelectric effect of a piezoelectric material. Each of the power generating elements 200 is connected to another power generating element 200 in a manner that the electrodes of opposite polarity are connected. As a result, the power generating section 20 generates an output voltage obtained by summing the AC voltages generated by the individual power generating elements 200.
The lower electrode 221 of the first power generating element 201, the wiring member 24 and the lower electrode 222 of the second power generating element 202 are continuously connected. A first metal layer 22a, which is constituted by the lower electrode 221 of the first power generating element 201, the wiring member 24, and the lower electrode 222 of the second power generating element 202, has a rectangular shape in planar view. Each of the upper electrode 231 of the first power generating element 201 and the upper electrode 232 of the second power generating element 202 has a rectangular planar shape the planar size of which is slightly smaller than that of an object defined by dividing equally the first metal layer 22a by a line extending along a longitudinal direction of the cantilever section 12. The upper electrode 231 of the first power generating element 201 and the upper electrode 232 of the second power generating element 202 are formed so as to be divided from each other in a width direction (right-left direction in
In the present embodiment, the piezoelectric body 21 is made of PZT (Pb(Zr,Ti)O3), but the piezoelectric material of the piezoelectric body 21 is not limited thereto. For example, PZT-PMN (Pb(Mn,Nb)O3) or PZT doped with another impurities can be used for the piezoelectric material. AlN, ZnO, KNN (K0.5Na0.5NbO3), KN (KNbO3), NN (NaNbO3), KNN doped with impurities (such as Li, Nb, Ta, Sb, Cu) also can be used for the piezoelectric material. In the present embodiment, all of the functional sections 21 a of the plurality of power generating elements 200 are formed in a single piezoelectric body 21. In other words, the single piezoelectric body 21 includes the functional sections 21a of the plurality of power generating elements 200. With this configuration, all the plurality of power generating elements 200 have a substantially identical characteristic. As a result, it can produce a homogeneous device.
The lower electrode 22 is made of PT, but the material of the lower electrode 22 is not limited thereto. For example, Au, Al, Ir, or the like can be used. The upper electrode 23 is made of Au, but the material of the upper electrode 23 is not limited thereto. For example, Mo, Al, Pt, Ir, or the like can be used.
In the power generating device 1 of the present embodiment, the lower electrode 22 has a thickness of 500 [nm], the piezoelectric body 21 has a thickness of 600 [nm], and the upper electrode 23 has a thickness of 100 [nm], but these thickness are not limited thereto. Note that, it is possible that the piezoelectric body 21 is formed with a pinhole during a producing process thereof. In order to overcome a disadvantage, it is preferred that the upper electrode 23 that is formed after forming the piezoelectric body 21 is set to have a smaller thickness than that of the piezoelectric body 21. That is, in a case where the piezoelectric body 21 has a pinhole, there is a concern that the electrode material of the upper electrode 23 may deposit in the inside of the pinhole during a forming process of the upper electrode 23 through sputtering method on the piezoelectric body 21. Even in such a case, this configuration enables to prevent a short between the upper electrode 23 formed on the piezoelectric body 21 and the lower electrode 22 formed under the piezoelectric body 21. As a result, this configuration can improve the production yield and therefore can save the cost, and can improve the reliability of the product.
The upper electrode 23 is not limited to those produced by patterning (by way of a photolithographic technique and an etching technique) a thin film that is formed through a thin-film formation technique (such as sputtering method, chemical vapor deposition (CVD) method or evaporation method). For example, the upper electrode 23, which is formed on the piezoelectric body 21, may be made of a sheet electrode (or an electrode sheet). This configuration can solve the problem that the electrode material is deposited in the pinhole when the upper electrode 23 is formed on the piezoelectric body 21. This configuration therefore is enabled to reliably prevent a short between the upper electrode 23 formed on the piezoelectric body 21 and the lower electrode formed under the piezoelectric body 21.
The upper electrode 23 of the sheet electrode is formed on the piezoelectric body 21 preferably through vacuum laminating method. The sheet electrode is preferably formed of a laminate sheet with coating the electrode material through sputtering method etc or a metal foil such as an aluminum foil.
The power generating device 1 is preferably provided with a buffer layer between the device substrate 10 and the lower electrode 22. The buffer layer is made of a proper material in consideration of the piezoelectric material of the piezoelectric body 21. For example, it is preferred to use SrRuO3, (Pb,La)TiO3, PbTiO3, MgO, LaNiO3 or the like for the material of the buffer layer in a case where PZT is used as the piezoelectric material of the piezoelectric body 21. The buffer layer may be formed of a laminate of a Pt film and a SrRuO3 film. Providing the buffer layer improves a crystallinity of the piezoelectric body 21.
A first pad 27a and a second pad 27b are formed at the first surface side of the device substrate 10. The first pad 27a is electrically connected through a first metal wiring 26a to an electrode 231 (shown at upper side in
Each of the metal wirings (26a, 26b) and the pads (27a, 27b) is made of Au, but the material thereof is not limited thereto. For example, Mo, Al, Pt, Ir or the like can be used. In the present embodiment, all of the metal wirings (26a, 26b), the pads (27a, 27b) and the upper electrodes 23 are made of an identical material. In addition, the metal wirings (26a, 26b), the pads (27a, 27b) and the upper electrodes 23 are all formed simultaneously. This configuration therefore can simplify the production process and can save the cost, compared with a case where one of the metal wirings (26a, 26b), the pads (27a, 27b) or the upper electrodes 23 is made of different material from other components.
The insulation layer 25 is formed at the first surface side of the device substrate 10. The insulation layer 25 has openings (25a, 25a) for determining contact areas between the respective upper electrodes (23, 23) and the piezoelectric body 21. The insulation layer 25 extends to reach the first surface of the device substrate 10 (reach the first insulation film lob). The insulation layer 25 is formed so as to cover over an entire lateral surface of the first metal layer 22a and an entire lateral surface of the piezoelectric body 21. This configuration enables to prevent a short between the first metal layer 22a and the first metal wiring 26a as well as prevent a short between the first metal layer 22a and the second metal wiring 26b. In the present embodiment, the insulation layer 25 is made of a silicon dioxide film, but is not limited to a silicon dioxide film. For example, the insulation layer 25 may be made of a silicon nitride film.
A method of producing the power generating device 1 of the present embodiment is explained below with reference to
An insulation film forming process is first performed by forming insulation films (10b, 10c) of silicon films at first and second surface sides of the substrate 10a, respectively. As a result, structure shown in
A metal film forming process is then performed by forming a metal film 22b over an entire surface of the first surface side of the substrate 10a. Note that, the metal film 22b serves as a basis of a first metal layer 22a composed of a wiring member 24 and each lower electrode (22, 22). A piezoelectric film forming process is then performed by forming a piezoelectric film (such as a PZT thin film) 21b over an entire surface of the first surface side of the substrate 10a. Note that, the piezoelectric film 21b serves as a basis of a piezoelectric body 21. As a result, structure shown in
A piezoelectric film patterning process is then performed by patterning the piezoelectric film 21b to form the piezoelectric body 21 that is formed of a part of the piezoelectric film 21b. As a result, structure shown in
A metal film patterning process is then performed by patterning the metal film 22b to form the first metal layer 22a (the wiring member 24 and each of the lower electrodes 22) that is formed of a part of the metal film 22b. As a result, structure shown in
An insulation layer forming process is then performed by forming an insulation layer 25 at the first surface side of the substrate 10a. As a result, structure shown in
An upper electrode forming process for forming upper electrodes (23(231), 23(232)) and a wiring forming process for forming metal wirings (26a, 26b) and pads (27a, 27b) are then performed simultaneously. As a result, structure shown in
A polarization treatment process is then performed for polarizing (poling treatment) a part of the piezoelectric body 21 located between the electrodes (22, 23) by applying electricity between the pads (27a, 27b). Functional sections (21a(211a), 21a(212a)) of the respective first and second power generating elements (201, 202) are formed by performing the polarization treatment process.
A groove forming process for forming a groove 10e is then performed by etching the substrate 10a from the first surface side to remove a part of the substrate 10a other than the cantilever section 12, the weight section 13 and the supporting section 11 (i.e. remove a part of the substrate 10a that corresponds to above mentioned slit 10d) so that the etching depth reaches the thickness of the cantilever section 12. As a result, structure shown in
A cantilever section forming process is then performed for forming the cantilever section 12 as well as the weight section 13 and the supporting section 11 by etching the substrate 10a from a second surface side to remove a part of the substrate 10a other than the weight section 13 and the supporting section 11 (i.e. remove a part of the substrate 10a corresponding to the slit 10d and the cantilever section 12). As a result, a power generating device 1 having structure shown in
For producing the power generating device 1 having the device substrate 10 and the power generating section 20, processes until finishing the cantilever section forming process are performed in units of a wafer, and a dicing process is then performed to divide the wafer into individual power generating devices 1.
Incidentally, inventors of the present application have produced experimentally a power generating device 1′ of a first reference aspect (see
The power generating device 1′ of the first reference aspect has the substantially same basic configuration with that in the first embodiment, except that: a power generating section 20 includes only one power generating element 200; and a second pad 27b is connected to a lower electrode 22.
As shown in
The inventors of the present application have learned that the power generating device 1′ of the first reference aspect with disconnecting the pads (27a, 27b) can be expressed by an equivalent circuit model shown in
In the power generating device 1 of the present embodiment, the power generating section 20 includes: the piezoelectric body 21; and a plurality of electrode pairs each constituted by a pair of electrodes (22, 23) that are placed on opposite sides of the piezoelectric body 21 with regard to a thickness direction of the piezoelectric body 21 to define the functional section 21a therebetween, where each of the functional sections 21a is cooperated with the related electrode pair (22, 23) to define the power generating element 200. In the power generating device 1 of the present embodiment, the plurality of the power generating elements 200 include the first power generating element 201 and the second power generating element 202 that are configured to give a polarization orientation opposite to each other in the thickness direction of the piezoelectric body 21. The first and second power generating elements (201, 202) are configured to have the corresponding electrodes (22, 22) that are connected to each other by means of the wiring member 24 on the same surface of the piezoelectric body 21 with regard to the thickness direction thereof, such that all the plurality of the power generating elements 200 are connected in series. With this configuration, the power generating device 1 of the present embodiment is enabled to increase the open circuit voltage Voc of the power generating section 20 without changing the chip size, compared with the power generating device 1′ of the reference aspect or the conventional power generating device shown in
In the power generating device 1 of the present embodiment, the insulation layer 25, which determines the connection area between the upper electrode 23 and the piezoelectric body 21 as well as prevents a short between the upper electrode 23 and the lower electrode 22, is provided extendedly so as to reach the supporting section 11 at the first surface side of the device substrate 10. In the power generating device 1, the piezoelectric body 21 is located inside of the peripheral line of the first metal layer 22a in planar view and the upper electrodes (23, 23) are located inside of the peripheral line of the piezoelectric body 21 in planar view. This configuration enables to reduce a difference in height of a foundation on which the metal wirings (26a, 26b) are formed, compared with a case where the lower electrodes 22, the piezoelectric body 21 and the upper electrodes 23 have an identical size in planar view. The power generating device 1 of the present embodiment therefore can suppress a possibility of breaking the metal wiring (26a, 26b). As a result, this configuration can improve the production yield and can improve the reliability of the product. As described in the above production process, the piezoelectric body 21 of the power generating device 1 of the present embodiment can be produced by steps of: firstly forming the first metal layer 22a over the entire surface of the first surface side of the substrate 10a; then forming the first metal film 21b that serves as a basis of the piezoelectric body 21 over the entire surface of the first surface side of the substrate 10a; and then patterning the piezoelectric film 21b to form the piezoelectric body 21 formed of a part of the piezoelectric film 21b. The power generating device 1 of the present embodiment therefore can improve the crystallinity of the piezoelectric body 21 and improve the power generating efficiency, compared with a case where the piezoelectric body 21 is produced by steps of: forming the lower electrodes 22 having desired shapes and the wiring member 24 having a desired shape at the first surface side of the substrate 10a; then forming the piezoelectric film 21b; and then patterning the piezoelectric film 21b to form the piezoelectric body 21.
Instead of the configuration shown in
A power generating module 2 including the power generating device 1 is then described with reference to
The power generating module 2 includes the power generating device 1 and a circuit board 3 on which the power generating device 1 is mounted. The circuit board 3 is provided with a full-wave voltage doubler 4 (see
The full-wave voltage doubler 4 includes a parallel circuit in which a series circuit of two diodes (D1, D3) and a series circuit of two capacitors (C2, C4) are connected in parallel. That is, the full-wave rectifier includes the two diodes (D1, D3) and the two capacitors (C2, C4) that are connected to form a bridge circuit. In the power generating module 2, the first pad 27a of the power generating device 1 is connected to a connection point of the two diodes (D1, D3), and the second pad 27b of the power generating device 1 is connected to a connection point of the capacitors (C2, C4). Each of the diodes (D1, D3) is a surface mount type diode. Further, each of the capacitors (C2, C4) is a surface mount type capacitor. With this configuration, the power generating module 2 has smaller thickness compared with a case where the diodes (D1, D3) and the capacitor (C2, C4) are formed of leaded chips that are connected to the circuit board 3 with inserting the lead thereof into a through hole of the circuit board 3.
The power generating module 2 serves as a power source for a load (not shown in figures) when the load is connected between one of the output terminals T2 that is connected to a high voltage end of the series circuit of the capacitors (C2, C4) and the other of the output terminals T2 that is connected to a low voltage end of the series circuit (i.e. between both ends of the series circuit of the capacitors (C2, C4)). An LED (light emitting diode), a sensor or the like can be used as the load. Note that, operation voltage of LED is basically determined by a band-gap energy of crystalline material of a light emitting layer thereof. For example, an operation voltage of a red LED having a band-gap energy of 2 [eV] is about 2 [V].
The diode D1 and the diode D3 have a same specification with each other, and have same characteristics. Each of the diodes (D1, D3) is a silicon diode, and has a forward voltage of about 0.6 to 0.7 [V].
The capacitor C2 and the capacitor C4 have a same specification with each other, and have same characteristics. Each of the capacitors (C2, C4) has a capacity of 10 [μF],but the capacity thereof is merely an example and is not limited thereto.
Operation of the power generating module 2 is described below briefly.
In a positive-half cycle of an output voltage in which electric potential of the first pad 27a is higher than that of the second pad 27b, an electric current flows from the first pad 27a to the second pad 27b via the diode D1 and the capacitor C2, thereby charging up the capacitor C2. In a negative-half cycle of the output voltage in which electric potential of the first pad 27a is lower than that of the second pad 27b, an electric current flows from the second pad 27b to the first pad 27a via the capacitor C4 and the diode D3, thereby charging up the capacitor C4. In the full-wave voltage doubler 4 of the power generating module 2, the capacitors (C2, C4) are charged up alternately with each half cycle of the output voltage of the power generating device 1. Output voltage of the power generating module 2 is substantially a twice of the peak of the output voltage of the power generating device 1.
Incidentally, the inventors of the present application have produced experimentally a power generating module 2′ of a second reference aspect (see
The power generating module 2′ of the second reference aspect includes the power generating device 1′ of the first reference aspect, a full-wave rectifier circuit 5 connected between the first pad 27a and the second pad 27b, and an electric storage capacitor Cst connected between output terminals of the full-wave rectifier circuit 5.
In consideration of this problem, the inventors of the present application have produced experimentally a power generating module 2″ of a third reference aspect the equivalent circuit model of which is shown in
Unlike the second and third reference aspects, the power generating module 2 of the present embodiment is enabled to have larger charge voltage Vsto, as is seen from the charge characteristic shown in
A power generating device 1 according to the present embodiment is described below with reference to
The power generating device 1 of the present embodiment has a similar basic configuration with that of the first embodiment, and differs from the first embodiment in that the present embodiment further includes a first cover substrate 30 fixed to a supporting section 11 at a first surface side (upper side in
The power generating device 1 of the present embodiment includes: the first cover substrate 30 that is fixed to the supporting section 11 at the first surface side of the device substrate 10 and covers at least the power generating section 20; and the second cover substrate 40 that is fixed to the supporting section 11 at the second surface side of the device substrate 10.
The first cover substrate 30 is formed of a second substrate 30a. The second substrate 30a is a silicon substrate. The first cover substrate 30 is formed at one surface thereof (at side of the device substrate 10; lower side in
The first cover substrate 30 is formed with a pair of through holes (31, 31) so as to penetrate in a thickness direction of the first cover substrate 30. Each of the through holes 31 is provided with a through hole wiring 33. The first cover substrate 30 is provided with a pair of connection electrodes (34, 34) at the above mentioned one surface side (lower side in
The first cover substrate 30 is further provided with an insulation film 32 of silicon dioxide film that extends across the abovementioned one surface (lower surface in
The second cover substrate 40 is formed of a third substrate 40a. The third substrate 40a is a silicon substrate. The second cover substrate 40 is formed at one surface thereof (at side of the device substrate 10; upper side in
The device substrate 10 is provided at the first surface side (upper side in
Each cover substrate (30, 40) is bonded to the device substrate 10 through room temperature bonding method in this embodiment, but bonding method is not limited thereto. For example, it can adopt such as: direct bonding method that bonds them with applying a proper pressure under a higher temperature (such as 50° C. to 100° C.) than a room temperature; resin bonding method using such as epoxy resin; anodic bonding method; or the like. In the resin bonding method, it is more preferred to utilize a room temperature curing type resin adhesive (such as two-component room temperature curing type epoxy resin adhesive or one-component room temperature curing type epoxy resin adhesive) than a case where using a thermosetting type resin adhesive (such as thermosetting type epoxy resin adhesive), because the room temperature curing type resin adhesive can reduce a bonding temperature.
The power generating device 1 of the present embodiment can output higher power as well as downsize the device, as similar with the first embodiment. In the power generating device 1 of the present embodiment, it is preferred to form the first bond metal layer 28 over an entire circumference of the frame-shaped supporting section 11 and form the second bond metal layer over an entire circumference of the periphery of the first cover substrate 30. By bonding the first bond metal layer 28 to the second bond metal layer at the entire circumference and bonding the device substrate 10 to the second cover substrate 40 at the entire circumference, an interior space surrounded by the device substrate 10 and the cover substrates (30, 40) is airtightly sealed. The airtight space may be maintained in an inert-gas atmosphere or a vacuum atmosphere.
The power generating device 1 of the present embodiment can be applied in the power generating module 2 of the first embodiment (see
A power generating device according to the present embodiment is described below with reference to
The power generating device 1 of the present embodiment has a similar basic configuration with that of the first embodiment, and differs from the first embodiment in that the present embodiment utilizes, as a substrate 10a, a SOI substrate that includes support substrate 101 of a single-crystalline silicon substrate, an insulation layer (buried oxide layer) 102 of a silicon dioxide film formed on the support substrate 101, and a single-crystalline silicon layer 103 formed on the insulation layer 102. Like kind elements are assigned with the same reference numerals as depicted in the power generating device 1.
The first embodiment exemplifies such the power generating section 20 including two power generating elements 200, as shown in
In the device substrate 10, a cantilever section 12 has a plurality (thirty-two in this embodiment) of embedding holes 104 that are buried to form a part of the respective functional sections 21a of the power generating elements 200, and the piezoelectric body 21 is formed of a self planarization film.
The self planarization film is defined as a film that is formed on an object having an irregularity under a condition where the outermost surface of the film becomes flat. In the present embodiment, the self planarization film of the piezoelectric body 21 is formed through CVD method. This configuration enables to omit a smoothing process through such as etchback method or CMP (Chemical mechanical polishing) method after forming the self planarization film.
The embedding hole 104 is formed to penetrate the cantilever section 12 in a thickness direction of the cantilever section 12. Each of the embedding holes 104 is provided at the inner surface thereof with an insulation film 105 of a silicon dioxide film. The insulation film 105 lies between the inner surface of the embedding holes 104 and the functional section 21a.
Producing process of the power generating section 20 of the power generating device 1 of the present embodiment is described below. Firstly, the substrate 10a of the SOI substrate is etched from the first surface side of the substrate 10a (from the upper side in
It takes a long time for forming the piezoelectric body 21 of the first embodiment having a substantially uniform film thickness or forming a thick piezoelectric body 321 of the conventional example having a substantially uniform film thickness, and it leads increasing cost.
Compared to this, the power generating device 1 of the present embodiment includes the piezoelectric body 21 of the self planarization film. This configuration enables to form the functional section 21a having a thicker thickness than that of other part of the piezoelectric body 21. This configuration enables to increase the thickness of the functional section 21a as well as to shorten the formation time. Therefore, this configuration enables to reduce the volume of the power generating element 200.
The power generating device 1 of the present embodiment can output higher power as well as downsize the device, as similar with the first embodiment. The power generating device 1 of the present embodiment may be further provided with the first cover substrate 30 and the second cover substrate 40 as similar with the second embodiment.
The power generating device 1 of the present embodiment can be applied in the power generating module 2 of the first embodiment (see
Although the present invention has been described with reference to certain preferred embodiments, numerous modifications and variations can be made by those skilled in the art without departing from the true spirit and scope of this invention, namely claims.
Number | Date | Country | Kind |
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2011-020168 | Feb 2011 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2012/052050 | 1/31/2012 | WO | 00 | 2/26/2013 |