Patent Grant
12227833
This application is based upon and claims priority to Chinese Patent Application No. 202310488835.5, filed on Apr. 28, 2023, the entire contents of which are incorporated herein by reference.
The invention relates to the technical field of target material, in particular to a preparation device and a preparation method for alloy targets.
For vacuum coating processes such as magnetron sputtering and pulse laser deposition, the material of the film is migrated from the surface of the target, and the target is one of the core components. In recent years, the continuous development and iteration of vacuum coating technology has also greatly promoted the continuous progress of target preparation technology. According to the chemical composition and geometric shape of the target, the target has different classification methods. According to the chemical composition, the target can be divided into an oxide target, ceramic target, alloy target, elemental metal target, etc. According to the geometric shape, the target can be divided into plane target, anomalous target, and so on. Among all kinds of target materials, the preparation method of target materials with simple chemical composition and geometric shape is relatively simple, but the preparation of target materials with complex composition or geometric shape is still difficult.
Taking the alloy target with complex composition as an example, at present, the preparation methods for alloy targets with complex composition are mainly divided into two kinds: the casting method and the powder metallurgy method. When preparing the alloy target by the casting method, although the purity is high, the uniformity of the alloy is poor, especially when the melting point or density of the components are quite different, it is difficult to obtain the alloy target with uniform composition. When preparing the alloy target by the powder metallurgy method, a relatively uniform target material can be obtained, but its density is prone to uneven phenomenon, and it is difficult to prepare large-sized and anomalous targets.
On the other hand, some special coating scenes put forward new requirements for the targets. For example, in some applications, the composition of the film needs to change gradually and evenly or to be doped in some specific positions in the film, which requires the composition of the alloy target to change instead of being fixed. Traditional target preparation methods are powerless to meet this demand. Therefore, a method that can be used to produce large-size, anomalous, non-fixed alloy targets is an urgent problem to be solved in the existing technology.
The purpose of the invention is to provide a preparation device and a preparation method for alloy targets, the alloy target preparation device provided by the invention can be used to produce large-size, anomalous, and non-fixed alloy targets to meet the special requirements of different coating scenes for the target.
In order to achieve the above purposes, the invention provides the following technical solutions:
Preferably, the number of material nozzles is 3 to 5.
Preferably, the preparation device for alloy targets also comprises a controller; the controller is connected to the material nozzle, the high-energy laser, and the target support substrate.
The invention also provides a preparation method for an alloy target, comprising the following steps:
Preferably, the material powder in Step (1) is a simple substance or an alloy; the material powder is composed of micron-sized particles and/or nano-sized particles.
Preferably, an area of the focusing surface in Step (2) is 1-100 mm2; a coincidence rate between the material nozzle and the focusing surface is >95%.
Preferably, when the alloy target is a periodically doped alloy target, the material nozzle in Step (2) obtains different focusing surfaces on the target support substrate; setting an injection mode of material nozzles on different focusing surfaces, and adjusting a working time of different injection modes to achieve periodic doping.
Preferably, the injection efficiency of the material nozzle in Step (2) is 0-100 mm3/s independently.
Preferably, in Step (2), the target support substrate or the material nozzle moves with the high-energy laser in three-dimensional space; a relative velocity of the movement is 1-100 mm/s.
Preferably, after the cyclic layer-by-layer spraying in Step (2) is completed, it also comprises separating the alloy target coating obtained by the cyclic layer-by-layer spraying from the target support substrate to obtain the alloy target.
The invention provides a preparation device for an alloy target, comprising the material nozzle, the high-energy laser, and the target support substrate, the material nozzle and the high-energy laser are respectively arranged above the target support substrate. The invention uses the material nozzle to spray the material powder required for the alloy target to be prepared, and the number of the material nozzles varies according to the type of material powder required for the alloy target to be prepared. The injection efficiency of the material nozzle is independently adjusted and is set according to the stoichiometric ratio of each element at a specific position of the alloy target to be prepared, so as to meet the requirements of doping certain specific positions in the film layer in the coating scene and realize the purpose of non-fixed composition of the alloy target. The thickness of the single-layer target coating is controlled by adjusting the injection efficiency of the material nozzle, and the spatial position and angle of the material nozzle are independently adjusted. To ensure that the composition and density of the target are uniform; the high-energy laser beam generated by the high-energy laser is used to heat the target support substrate, the material powder sprayed on the surface of the target support substrate and/or the target coating formed by the fusion of the material powder, that is, to heat the spraying area, so that the material powder in the spraying area has sufficient ability to form and diffuse to achieve alloying and form the target coating of the required composition. The target support substrate is used to support the target coating formed by the material powder, and the size and shape of the target coating are controlled by moving the target support substrate, and the target coating is sprayed layer by layer, which is used for producing large-size, anomalous alloy target. The preparation device provided by the invention can obtain alloy targets with non-fixed, anomalous, and large-size, it overcomes the inhomogeneity of composition and density in the preparation process of traditional target materials and meets the special requirements of different coating scenes for target materials.
1, material nozzle; 2, high-energy laser; 3, target support substrate; 4, material powder; 5, target coating; 6, focusing surface; x, x-axis of three-dimensional space; y, y-axis of three-dimensional space; z, z-axis of three-dimensional space.
The invention provides a preparation device for an alloy target, comprising the material nozzle 1, the high-energy laser 2, and the target support substrate 3;
As shown in
The invention independently adjusts the spatial position and angle of the material nozzle 1, and sets the injection efficiency of different material nozzles 1 according to the stoichiometric ratio of each element at a specific position of the alloy target to be prepared, so as to meet the requirements of doping certain specific positions in the film layer in the coating scene and realize the purpose of non-fixed composition of the alloy target.
As shown in
As shown in
In the invention, the preparation device for alloy targets also comprises the controller; the controller is connected to the material nozzle 1, the high-energy laser 2, and the target support substrate 3.
In the invention, the material nozzle 1, the high-energy laser 2, and the target support substrate 3 are preferably independently placed in a vacuum chamber containing an inert gas.
The invention also provides the preparation method for alloy targets, comprising the following steps:
The invention prepares the required material powder according to the chemical element composition of the alloy target to be prepared.
In the invention, the material powder is preferably a simple substance or an alloy. In this invention, the material powder is preferably micron-sized particles and/or nano-sized particles. The invention uses micron-sized particles and/or nano-sized particles as material powders, which has the advantage of short distance of element diffusion. At the same time, sufficient energy diffusion is obtained under the action of the auxiliary high-energy laser beam, and finally, the uniformity of composition and density of target coating obtained by spraying is good.
After obtaining the material powder, the material powder is divided and put into the material nozzle 1 of the preparation device described in the above technical solution, and then the spatial position and angle of the material nozzle 1 are adjusted independently, so that the position and area of the material nozzle 1 sprayed on the target support substrate 3 are consistent, and the focusing surface of the same position and size is obtained.
In the invention, the area of the focusing surface is preferably 1-100 mm2. In the invention, the coincidence rate of the material nozzle 1 and the focusing surface is >95%. The invention controls the coincidence rate of the material nozzle 1 and the focusing surface in the above range to ensure that the material powders ejected from different material nozzles 1 are ejected at the same position on the focusing surface, which can diffuse to form an alloy with uniform composition, so as to avoid the decrease in the shape resolution and composition uniformity of the target caused by the oversized focusing surface, at the same time, the low efficiency of prepared target caused by undersized focusing surface is also avoided. By independently adjusting the spatial position and angle of the material nozzle 1, the position and area of the material nozzle 1 sprayed on the target support substrate 3 are consistent, and the focusing surface of the same position and size is obtained to ensure the uniformity of the composition and density of the target.
In the invention, when the alloy target is a periodically doped alloy target, the material nozzle is preferably provided with different focusing surfaces on the target support substrate; the injection mode of the material nozzle on different focusing surfaces is set, and the working time of different injection modes is adjusted to realize the preparation of the periodically doped alloy target.
In the invention, the working time of the different injection modes is preferably adjusted according to the superlattice structure of the target film prepared by the deposition of the periodically doped alloy target.
In the invention, the material nozzle 1 is preferably a Laval nozzle. The invention adjusts the injection efficiency of the material nozzle 1 by controlling the velocity of the working gas in the Laval nozzle. The invention independently adjusts the injection efficiency of the material nozzle 1 according to the stoichiometric ratio of each element at the specific position of the alloy target to be prepared, so that in the spraying area, the material powder ejected by different material nozzles 1 is consistent with the stoichiometric ratio of the chemical elements of the alloy target to be prepared, and finally the target target coating with non-fixed composition is obtained.
In the invention, the injection efficiency of the material nozzle 1 is independently preferably 0-100 mm3/s. The invention controls the injection efficiency in the above range to ensure the uniformity of the target composition based on ensuring the target preparation efficiency and avoids the excessive injection efficiency that will limit the kinetic process of the element diffusion process, which is not suitable for preparing a target with uniform composition. At the same time, by adjusting the change of the injection efficiency of different material nozzles 1, the target with uniform composition change or periodic doping can be prepared.
The invention uses the high-energy laser beam produced by the high-energy laser 2 to synchronously heat the material nozzle 1 to spray the material powder on the target support substrate 3, so that the material powder is fused to form the target coating;
In the invention, in the moving process, the focusing surface is preferably maintained on the plane of the target support substrate 3 to ensure the uniformity of the target coating composition.
After the cyclic layer-by-layer spraying is completed, the alloy target coating obtained by the cyclic layer-by-layer spraying is separated from the target support substrate 3 to obtain the alloy target.
The preparation method for alloy targets provided by the invention uses laser-assisted spraying and adopts an additive method to spray the target coating layer by layer, which can form the alloy target with a non-fixed composition, anomalous, and large size. At the same time, it overcomes the inhomogeneity of composition and density in the preparation process of traditional target materials and meets the special requirements of different coating scenes for target materials.
The technical solution in the invention will be clearly and completely described in the following combined with the embodiments. Obviously, the described embodiments are only parts of the embodiments of the invention, not all of the embodiments. Based on the embodiments in the invention, all other embodiments obtained by ordinary technicians in this field without making creative labor belong to the scope of protection of the invention.
The disk-shaped superconducting alloy target YBa2Cu3 with a diameter of 15 cm and a thickness of 1 cm is prepared by using the preparation device for alloy targets shown in
The relative velocity of the target support substrate 3 moving relative to the material nozzle 1 is 1 mm/s.
The disk-shaped BaHf-doped superconducting alloy target YBa2Cu3 with a diameter of 15 cm and a thickness of 1 cm is prepared by the preparation device for alloy targets shown in
The relative velocity of the target support substrate 3 moving relative to the material nozzle 1 is 1 mm/s.
The prepared target is applied to the pulse laser deposition process, the target is uniformly rotated during the deposition process, and the superlattice nanostructure of YBa2Cu3O7 doped with BaHfO3 is obtained, that is, the YBa2Cu3O7+BaHfO3 superlattice film.
A circular ring-shaped superconducting alloy target YBa2Cu3 with an outer diameter of 15 cm and an inner diameter of 13 cm is prepared by using the preparation device for alloy targets shown in
The relative velocity of the target support substrate 3 moving relative to the material nozzle 1 is 1 mm/s.
It can be seen from the above that the preparation method of the alloy target provided by the invention, using laser-assisted spraying, using an additive method, and spraying the target coating layer by layer, can form a non-fixed, shaped, and large-sized alloy target. At the same time, it overcomes the inhomogeneity of composition and density in the traditional target preparation process and meets the special requirements of different coating scenarios for the target.
The above is only the preferred implementation method of the invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and embellishments can be made without breaking away from the principle of the invention. These improvements and embellishments should also be regarded as the protection scope of the invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 202310488835.5 | Apr 2023 | CN | national |
| Number | Name | Date | Kind |
|---|---|---|---|
| 20170173611 | Tan | Jun 2017 | A1 |
| 20210187618 | Irissou | Jun 2021 | A1 |
| Number | Date | Country |
|---|---|---|
| 2017025385 | Feb 2017 | JP |
| 2019518865 | Jul 2019 | JP |
| 2021085041 | Jun 2021 | JP |
| 2016151781 | Sep 2016 | WO |
| Entry |
|---|
| JP-2017025385-A English translation (Year: 2017). |
| Number | Date | Country | |
|---|---|---|---|
| 20240360544 A1 | Oct 2024 | US |
