Number | Date | Country | Kind |
---|---|---|---|
197 03 206 | Jan 1997 | DE |
This is a continuation of copending International Application PCT/DE98/00187, filed Jan. 21, 1998, which designated the United States.
Number | Name | Date | Kind |
---|---|---|---|
3662312 | Thorp et al. | May 1972 | A |
4838089 | Okada et al. | Jun 1989 | A |
5436491 | Hase et al. | Jul 1995 | A |
5711302 | Lampropoulos et al. | Jan 1998 | A |
6047604 | Auburger et al. | Apr 2000 | A |
Number | Date | Country |
---|---|---|
39 37 522 | May 1991 | DE |
4400439 | Jul 1994 | DE |
431312 | Dec 1994 | DE |
4203832 | Jun 1996 | DE |
0497534 | Aug 1992 | EP |
Entry |
---|
Japanese Patent Abstract No. 6-232423 (Ishihashi), dated Aug. 19, 1994. |
Japanese Patent Abstract No. 4-155970 (Tanaka), dated May 28, 1992. |
“Trends bei Silizium-Druck-Sensoren”, Fachbeilage Mikroperipherik, May 1987, pp. 3-7, pertains to trends in silicon pressure sensor |
Published International Application No. 96/24424 (Eimer et al.), dated Aug. 15, 1996. |
Japanese Patent Abstract No. 6-120527 (Kawahira), dated Apr. 28, 1994. |
Japanese Patent Abstract No. 56-148870 (Kimijima), dated Nov. 18, 1981. |
Number | Date | Country | |
---|---|---|---|
Parent | PCT/DE98/00187 | Jan 1998 | US |
Child | 09/363264 | US |