Claims
- 1. A covercoated base substrate, comprising:a base substrate having an opening formed therethrough, the opening defining an interior edge; and a photoimageable covercoat layer having a lead portion extending beyond the interior edge into the opening, the covercoat layer having a controlled offset distance.
- 2. The base substrate of claim 1 wherein said base substrate includes at least one conductor, said conductor including a trace portion and a lead portion, said lead also extending into said opening.
- 3. The base substrate of claim 2 wherein said covercoat covers at least one lead.
- 4. The base substrate of claim 1 wherein said lead portion has a controlled thickness.
- 5. The base substrate of claim 1 wherein said controlled thickness is substantially uniform.
- 6. The base substrate of claim 1 wherein the lead portion of the photoimageable covercoat layer includes a three-dimensional photoimaged feature formed therein.
- 7. The base substrate of claim 6 wherein the photoimaged feature includes a channel having a depth of less than the controlled thickness of the covercoat.
- 8. The base substrate of claim 6 wherein the photoimaged feature includes a passage completely through said covercoat.
Parent Case Info
This is a divisional of application Ser. No. 09/378,080 filed Aug. 20, 1999, now pending.
US Referenced Citations (15)
Foreign Referenced Citations (4)
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Date |
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| 09298219 |
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Non-Patent Literature Citations (1)
| Entry |
| “Protective Coating Process for Thin Film Processes”, IBM Technical Disclosure Bulletin, vol. 33, No. 6B (IBM, New York), Nov. 1990, pp. 266-267. |