The present application relates to a printing plate for reverse offset printing and a method for preparing the same, a method for forming a bezel pattern using the printing plate, a printed material prepared using the printing plate, a display substrate including the same, and an electronic device including the same. The present application claims priority to and the benefit of Korean Patent Application No. 10-2012-0075706 filed in the Korean Intellectual Property Office on Jul. 11, 2012, the entire contents of which are incorporated herein by reference.
In a display substrate, a photolithography method or a screen printing method has been used in order to form a bezel pattern in the related art, but in the case of the photolithography method, there is a problem in that a process for forming the pattern is complicated and the preparation costs thereof are expensive, and in the case of the screen printing method, there is a problem in performance due to the generation of cracks caused by high level differences.
Thus, there is a need for developing a method which is simpler than the method for forming a bezel pattern in the related art and may improve the performance thereof while reducing the costs thereof
The present application has been made in an effort to provide a printing plate for reverse offset printing which may form a bezel pattern of a display substrate such that the costs thereof may be reduced or the performance of the display substrate may be improved by improving the process efficiency or simplifying the processes thereof
An exemplary embodiment of the present application provides a printing plate for reverse offset printing including an intaglio portion corresponding to at least one bezel pattern, in which a depth (D) of the intaglio portion satisfies the following Equations 1 and 2 with respect to a blanket for reverse offset printing.
[Equation 1]
t<d<D
[Equation 2]
t=t
max
−t
min
In Equation 1, t means a thickness deviation of a blanket, d means a displacement value of a blanket thickness by blanket printing pressure, and D means an etching depth of an intaglio portion.
In Equation 2,tmax means the maximum thickness of a blanket and tmin means the minimum thickness of a blanket.
An exemplary embodiment of the present application provides a reverse offset printing device including the printing plate for reverse offset printing.
An exemplary embodiment of the present application provides a printed material which is prepared using the printing plate and includes a printing pattern corresponding to a bezel pattern of the printing plate.
An exemplary embodiment of the present application provides a display substrate including the printed material.
An exemplary embodiment of the present application provides an electronic device including the display substrate.
An exemplary embodiment of the present application provides a method for forming a bezel pattern using the printing plate for reverse offset printing.
An exemplary embodiment of the present application provides a method for preparing a printing plate for reverse offset printing, the method including: forming at least one mask pattern on a substrate; and etching the substrate using the mask pattern, in which the mask pattern is a reverse image pattern of a bezel pattern, and a depth (D) of the etched portion satisfies the following Equations 1 and 2 with respect to a blanket for reverse offset printing.
[Equation 1]
t<d<D
[Equation 2]
t=t
max
−t
min
In Equation 1, t means a thickness deviation of the blanket, d means a displacement value of a blanket thickness by blanket printing pressure, and D means an etching depth of an intaglio portion.
In Equation 2, tmax means the maximum thickness of a blanket and tmin means the minimum thickness of a blanket.
The printing plate for reverse offset printing according to an exemplary embodiment of the present application is effective for forming a bezel pattern of a display substrate.
The advantages and features of the present application, and methods of accomplishing the advantages and features will become obvious with reference to exemplary embodiments to be described below in detail along with the accompanying drawings. However, the present application is not limited to the exemplary embodiments to be disclosed below, but will be implemented in various forms different from each other. The exemplary embodiments are merely intended to make the disclosure of the present application complete and to completely notify the person with ordinary skill to which the present application pertains of the scope of the invention, and the present application is only defined by the scope of claims. The size and relative size of the constituent elements marked in the drawings may be exaggerated for clarity of description.
Unless otherwise defined, all terms including technical and scientific terms used in the present specification may be used as the meaning which may be commonly understood by the person with ordinary skill in the art to which the present application pertains. Terms defined in commonly used dictionaries should not be interpreted in an idealized or excessive sense unless clearly and particularly defined.
Hereinafter, the present application will be described in detail.
A “bezel” used in the present specification means at least one border portion included in a display substrate. The bezel may be included in a region other than an effective screen portion. Further, a sensor portion, a camera portion, a logo portion, a button portion, or an open portion may be included in the border portion region.
A “bezel pattern” used in the present specification means a pattern formed in the bezel portion. The bezel pattern may be included in other regions such as the sensor portion, the camera portion, the logo portion, the button portion, or the open portion. The bezel pattern may also be a design pattern or a black matrix pattern.
In an exemplary embodiment of the present application, a printing plate for reverse offset printing may include an intaglio portion corresponding to at least one bezel pattern. Specifically, a region of a portion corresponding to a bezel pattern may be formed as an engraving.
The printing plate may include an intaglio portion corresponding to at least one bezel pattern, and particularly, intaglio portions corresponding to a plurality of bezel patterns, and thus several patterns may be simultaneously formed, thereby improving process efficiency.
In an exemplary embodiment of the present application, the printing plate may include a relief portion which is a region other than the intaglio portion.
In an exemplary embodiment of the present application, the blanket may be specifically a silicone-based blanket. The silicone-based blanket means that an outer circumference portion of the blanket is composed of a silicone-based material. The silicone-based material is not particularly limited as long as the material is a material including a curable group while including silicone, but the hardness thereof is preferably from 20 to 70 and more preferably from 30 to 60. The hardness means Shore A hardness. The deformation in the blanket may occur within a suitable range by using a silicone-based material within the hardness range. When the hardness of the blanket material is too low, a phenomenon occurs in which a part of the blanket touches the intaglio portion of the printing plate due to the deformation in the blanket during the off process in which a part of the coating film of the printing composition is removed by a printing plate from the blanket, and thus the pattern precision may deteriorate. In addition, a material having a hardness of 70 or less may be selected by considering the easiness in selection of the blanket material.
For example, a polydimethyl siloxane (PDMS)-based curable material may be used as the silicone-based blanket material. Additives known in the art may be further included to the blanket material within the range of not impairing the object of the present invention.
In an exemplary embodiment of the present application, a depth (D) of the intaglio portion may satisfy the following Equations 1 and 2 with respect to a blanket.
[Equation 1]
t<d<D
[Equation 2]
t=t
max
−t
min
In Equation 1, t means a thickness deviation of the blanket, d means a displacement value of a blanket thickness by blanket printing pressure, and D means an etching depth of an intaglio portion.
In Equation 2, tmax means the maximum thickness of the blanket itself and tmin means the minimum thickness of the blanket itself
The unit of t, d, and D is μm.
In the present specification, the displacement value of the blanket thickness by blanket printing pressure means a displacement value of the blanket thickness generated by additionally applied pressure at a position in which the thickest portion (tmax) of the blanket begins to touch a printing plate.
In
The thickness deviation of the blanket may be the maximum deformation value of the blanket thickness within an intaglio portion region as an example. The maximum deformation value of the blanket thickness within the intaglio portion region means the maximum deformation value among the deformation values of the blanket thickness within the intaglio portion region at the moment in which the blanket passes the intaglio portion when a printing roll passes a printing plate. The intaglio portion region may mean a region including a height from a point corresponding to the surface of a relief portion adjacent to any one intaglio portion to a point corresponding to the lowest point of the intaglio portion. Furthermore, the maximum deformation value of the blanket thickness within the intaglio portion region may mean a thickness from a point corresponding to the surface of a relief portion adjacent to any one intaglio portion to the lowest point of the blanket present within the intaglio portion region.
Thus, so long as the D value is larger than the displacement value of the blanket thickness by blanket printing pressure, the bottom touch phenomenon may not occur.
An exemplary embodiment of the present application provides a method for preparing a printing plate for reverse offset printing.
In the printing plate prepared by the prepararing method according to an exemplary embodiment of the present application, the depth (D) of the intaglio portion may satisfy Equations 1 and 2 with respect to a blanket for reverse offset printing.
The method for preparing a printing plate for reverse offset printing according to an exemplary embodiment of the present application may include forming at least one mask pattern on a substrate. The substrate may be a glass substrate.
The method for preparing a printing plate for reverse offset printing according to an exemplary embodiment of the present application may include etching the substrate using the mask pattern.
In an exemplary embodiment of the present application, the mask pattern may be formed of a material including one or two or more selected from the group consisting of chromium, nickel, molybdenum, an oxide thereof, and a nitride thereof.
In an exemplary embodiment of the present application, the mask pattern may be a reverse image pattern of a bezel pattern.
In an exemplary embodiment of the present application, as long as a line width (W) of the pattern or the intaglio portion satisfies Equations 1 and 2, the size of the line width may be diversely applied.
In an exemplary embodiment of the present application, the line width (W) of the pattern may satisfy the following Equation 3.
[Equation 3]
W=2D+W0+X
W: Line Width, D: Depth, X: Constant, W0: Line Width of opening of mask pattern In an exemplary embodiment of the present application, the line width (W) of the pattern may be 300 μm or more and more specifically, from 300 μm to 5 cm, due to characteristics of the bezel pattern.
In an exemplary embodiment of the present application, the depth (D) of the intaglio portion may be from 20 μm to 200 μm. The depth from 20 μm to 200 μm may be a depth satisfying Equations 1 and 2, or a depth satisfying Equations 1 to 3. More specifically, the depth (D) of the intaglio portion may be from 80 μm to 120 μm, and more specifically 100 μm. When the depth of the intaglio portion satisfies Equations 1 and 2 and is from 20 μm to 200 μm, or satisfies Equations 1 to 3 and is from 20 μm to 200 μm, there is an effect in that the bottom touch does not occur.
A line height (height) of the printed bezel pattern according to an exemplary embodiment of the present application may be from 0.3 μm to 5 μm, specifically, from 0.3 μm to 3 μm, and more specifically from 0.5 μm to 2 μm. When a bezel pattern is printed using a screen printing method in the related art, the line height of the bezel pattern is 20 μm or more, and therefore, the level difference is high. Therefore, a bezel pattern of a touch panel is disadvantageous in that due to generation of cracks in the vicinity of a level difference of an ITO layer or a metal layer caused by the high level difference, a defect occurs and the yield is reduced. However, when the method of the present application is used, it is possible to implement a line height from 0.3 μm to 5 μm, and therefore, there is an advantage in that cracks are scarcely generated and as a result, the performance of the display may be improved.
The printing plate for reverse offset printing according to an exemplary embodiment of the present application may additionally include an align key on a region in which the bezel pattern is not provided.
In the printing plate for reverse offset printing according to an exemplary embodiment of the present application, a bottom touch phenomenon may not occur on an intaglio portion corresponding to the bezel pattern when ink is transferred on the printing plate.
An exemplary embodiment of the present application provides a method for forming a bezel pattern using a printing plate for reverse offset printing.
An exemplary embodiment of the present application provides a printing device for reverse offset printing including a printing plate for reverse offset printing.
The printing device for reverse offset printing may further include a blanket and a printing roll support that supports the blanket. The printing device for reverse offset printing may further include a coater which coats ink on a blanket.
An exemplary embodiment of the present application provides a printed material which is prepared using the reverse offset printing device and includes a bezel pattern corresponding to an intaglio portion of the printing plate. The intaglio portion of the printing plate means an intaglio portion corresponding to the bezel pattern. The bezel pattern included in the printed material means a pattern printed on the printed material. An exemplary embodiment of the present application provides a printed material which is prepared using the reverse offset printing device and includes a printing pattern corresponding to a bezel pattern of the printing plate.
An exemplary embodiment of the present application provides a display substrate including the printed material. Examples of the display device include a plasma display panel (PDP), a liquid crystal display (LCD) panel, an electrophoretic display panel, a cathode-ray tube (CRT) panel, an OLED display panel, or various touch panels, and the like.
An exemplary embodiment of the present application provides an electronic device including the display substrate.
An exemplary embodiment of the present application provides a method for forming a bezel pattern using the cliche for reverse offset printing.
An exemplary embodiment of the present application provides a method for forming a bezel pattern using the reverse offset printing device.
Hereinafter, the present application will be described in more detail through Examples. However, the following Examples are provided for illustrative purposes only, and the scope of the present application is not limited thereby.
When a displacement value of a blanket thickness by blanket printing pressure was set to 25 μm, the maximum thickness value of a blanket within an intaglio portion region of a pattern was computer-simulated at an upper portion of the intaglio portion region of the pattern. As a line width of the pattern was increased, the maximum thickness value of the blanket within the intaglio portion region was increased, but it could be confirmed that the value was a value less than a displacement value of the blanket thickness by blanket printing pressure. Furthermore, in a line width of 300 μm or more, it could be confirmed that the maximum thickness value of the blanket within the intaglio portion region converged on the displacement value of the blanket thickness by blanket printing pressure.
Thus, it can be seen that a bottom touch effect does not occur as long as the etching depth of the intaglio portion is more than 25 μm when the printing pressure is set to 25 μm.
When a displacement value of a blanket thickness by blanket printing pressure was set to 50 μm, the maximum thickness value of a blanket within an intaglio portion region of a pattern was computer-simulated at an upper portion of the intaglio portion region of the pattern. As a line width of the pattern was increased, the maximum thickness value of the blanket within the intaglio portion region was increased, but it could be confirmed that the value was a value less than a displacement value of the blanket thickness by blanket printing pressure. Further, in a line width of 300 μm or more, it could be confirmed that the maximum thickness value of the blanket within the intaglio portion region converged on the displacement value of the blanket thickness by blanket printing pressure. Thus, it can be seen that a bottom touch effect does not occur as long as the etching depth of the intaglio portion is more than 50 μm when the printing pressure is set to 50 μm.
It is understood by a person with ordinary skill in the art to which the present application pertains that various applications and modifications may be made within the scope of the present application based on the contents.
Although the specific part of the present application has been described in detail, it is obvious to those skilled in the art that such a specific description is just a preferred embodiment and the scope of the present application is not limited thereto. Thus, the substantial scope of the present application will be defined by the appended claims and equivalents thereto.
Number | Date | Country | Kind |
---|---|---|---|
10-2012-0075706 | Jul 2012 | KR | national |
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/KR2013/006018 | 7/5/2013 | WO | 00 |