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T. Ohmi, Applied Physics Letters, "In situ-surface cleaning for very low . . . ", vol. 53 No. 1 Jul. 4, 1988, pp. 45-47. |
T. Ohmi, Applied Physics Letters, "Low temperature silicon epitaxy, . . . " vol. 53 No. 5, Aug. 1, 1988, pp. 364-366. |
T. Ohmi, Applied Physics Letters, "Electrical characterization of epitaxial silicon", vol. 54 No. 3 Jan. 16, 1989, pp. 253-255. |
T. Ohmi, Applied Physics Letters, "Crystal structure analysis of epitaxial silicon . . . " vol. 54 No. 6, Feb. 6, 1989, pp. 523-525. |
T. Saito, Extended Abstracts of the 21st Conference on Solid State Devices and materials. Aug. 28-30, 1989, pp. 25-28. |
H. Yamane, Applied Physics Letters, "Y-Ba-Cu-O superconducting films . . . ", vol. 53, No. 16, Oct. 17, 1988, pp. 1548-1550. |
Vossen et al., "Thin Film Processes" Academic Press (N.Y. 1978) pp. 141, 164-165. |
Shah et al., Am. Inst. Physics Conf. Proc., No. 165 (1987) pp. 50-57, "Growth of YBa.sub.2 Cu.sub.3 O.sub.7-x Thin Films by Sputtering". |
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Yokosyu (The sectional meeting of "the physical society of Japan") 3'd part, 3 to 6 Oct., 1989, Abstract 6a-ZB-1 p. 372. |
2nd International Symposium on Superconductivity, Japan, Delivered on Nov. 14, 1989, Abstract, p. 202. |