Claims
- 1. A process for depositing electrically conducting films on surfaces of high-temperature polymers which comprise the steps of:
- preparing a film of the high-temperature polymer, which is selected from the group consisting of polyphenylquinoxaline, polytolylquinoxaline, polyquinoline, polythiazole, and pyrrone; and
- placing the polymeric film into a solution comprising AgNO.sub.3 and a reducing agent therefor, which is selected from the group consisting of formaldehyde, paraformaldehyde, terephthalaldehyde, and isoascorbic acid in dimethyl sulfoxide, for a time period sufficient to permit the silver atoms produced thereby to coat the surface of said high-temperature polymer.
- 2. The process as described in claim 1, further comprising the step of soaking said high-temperature polymeric film of interest in a bath organic solvent before said step of placing said film in the solution comprising AgNO.sub.3 and a reducing agent therefor in order to improve the penetration and adhesion of the silver atoms on the polymeric film.
- 3. The process as described in claim 2, further comprising the steps of etching said high-temperature polymeric film of interest in a hot bath comprising chemicals selected from the group consisting of KOH and chromic acid and rinsing said etched high-temperature polymeric film produced thereby after said step of placing said high-temperature polymeric film of interest in a hot organic solvent and before said step of placing said film in the solution comprising AgNO.sub.3 and a reducing agent therefor.
- 4. The process as described in claim 3, wherein said etched high-temperature polymeric film is first placed in a solution comprising said reducing agent for AgNO.sub.3 and then said AgNO.sub.3 is subsequently introduced.
- 5. The process as described in claim 1, further comprising the step of etching said high-temperature polymeric film of interest in a heated bath comprising chemicals selected from the group consisting of KOH and chromic acid and rinsing said etched high-temperature polymeric film produced thereby before said step of placing said film in the solution comprising AgNO.sub.3 and a reducing agent therefor.
- 6. The process as described in claim 5, wherein said etched high-temperature polymeric film is first placed in a solution comprising said reducing agent for AgNO.sub.3 and then said AgNO.sub.3 is subsequently introduced.
- 7. A process for depositing electrically conducting films on surfaces of high-temperature polymers which comprises the steps of:
- preparing a film of the high-temperature polymer, which is selected form the group consisting of polyphenylquinoxaline, polytolylquinoxaline, polyquinoline, polythiazole, and pyrrone, soaking the film in an organic solvent;
- dipping the swollen film produced thereby in a solution comprising metallic atoms in the form of an organometallic compound having the form R.sub.3 M, where R is an organic moiety and M is the metallic species to be coated, for a period of time sufficient to permit the organometallic compound to permeate said swollen polymeric film;
- drying the permeated film produced thereby; and
- heating the dried permeated polymeric film at sufficient temperature for sufficient time to permit the release of the metallic species from the organometallic compound as metal atoms.
- 8. The process as described in claim 7, wherein the metallic species is selected from the group consisting of gold and platinum.
- 9. The process as described in claim 7, wherein said step of heating the solid produced from said step of drying to release the metallic species as metal atoms is performed using a laser directed at chosen areas desired to have substantial conductance.
- 10. A process for introducing electrical conductivity into bulk samples of high temperature polymeric materials which comprises the steps of:
- preparing a solution of the polymer, which is selected form the group consisting of polyphenylquinoxaline, polytolylquinoxaline, polyquinoline, polythiazole, and pyrrone in a suitable solvent;
- adding a solution comprising metallic species in the form of an organometallic compound having the form R.sub.3 M, where R is an organic moiety and M is the metallic species to be coated,; and
- irradiating the resulting solution with electromagnetic radiation having an appropriate wavelength to photodissociate the organometallic compound in order to release the metallic species therefrom as metal atoms.
- 11. The process as described in claim 10, wherein said step of photodissociating the organometallic compound is performed using laser means.
Parent Case Info
This is a division of application Ser. No. 091,251, filed Aug. 27, 1987, now U.S. Pat. No. 4,876,032.
Government Interests
This invention is the result of a contract with the Department of Energy (Contract No. W-7405-ENG-36).
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Jan 1981 |
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4663199 |
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May 1987 |
|
4755326 |
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Non-Patent Literature Citations (4)
Entry |
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Divisions (1)
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Number |
Date |
Country |
Parent |
91251 |
Aug 1987 |
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