Claims
- 1. A process for photocatalytic oxidation of organic molecules comprising:
forming a gas phase mixture of organic molecules, oxygen, and humid air; heating the mixture; and flowing the mixture through a reactor over a UV-irradiated photocatalytic film, wherein the photocatlytic film comprises a semiconductor which is in the form of nanoparticles.
- 2. The process according to claim 1 wherein the semiconductor is titanium dioxide.
- 3. The process according to claim 1 wherein the titanium dioxide is in the anatase form, the rutile form, or a mixture of the anatase and the rutile form.
- 4. The method according to claim 1 wherein the semiconductor has been deposited by flame aerosol coating.
- 5. The process according to claim 1 wherein the temperature is about 100-150° C. and the oxygen-to-substrate mole ratio is about 13.
- 6. The process according to claim 1 wherein the organic molecules are selected from the group consisting of alkanes, alkenes, and aromatics.
- 7. The process according to claim 6 wherein the organic molecule is cyclohexane.
- 8. A photocatalyst for partial oxidation reactions comprising a semiconductor that has been deposited from a precursor onto a substrate by flame aerosol deposition.
- 9. The photocatalyst according to claim 8 wherein the semiconductor is titanium dioxide.
- 10. The photocatalyst according to claim 8 wherein the precursor is selected from the group consisting of isopropoxides, nitrates, carbonyls, and halides of the cation forming the photocatalyst.
- 11. The photocatalyst according to claim 10 wherein the precursor is selected from the group consisting of titanium isopropoxide, ferric nitrate, titanium tetrachloride, tin chloride, and silicon tetrachloride.
- 12. The photocatalyst according to claim 8 wherein the substrate is selected from the group consisting of silica fibers, silica, quartz, stainless steel, steel, and aluminum.
- 13. The photocatalyst according to claim 8 wherein the photocatalyst is in the form of a nanostructured film.
- 14. The photocatalyst according to claim 13 wherein the nanostructured film is from about 50 nm to about 1.5 micron in thickness.
- 15. The photocatalyst according to claim 14 wherein the nanostructured film is from about 50 nm to about 0.8 micron in thickness.
- 16. The photocatalyst according to claim 9 wherein the titanium dioxide is in a form selected from the group consisting of anatase, rutile, and mixtures thereof.
- 17. The photocatalyst according to claim 8 wherein semiconductor is in particles of average diameter of about nm to about 400 nm.
Parent Case Info
[0001] CROSS-REFERENCE TO RELATED APPLICATIONS
[0002] The present application claims priority from provisional application No. 60/218,828, filed Jul. 18, 2000, the entire contents of which are hereby incorporated by reference.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60218828 |
Jul 2000 |
US |