Claims
- 1. A process for the preparation of a photographic element comprising providing a light-sensitive photographic element comprising a support and a light sensitive layer on said support, which layer comprises in admixture, a binding amount of a water-insoluble binder, which is soluble in aqueous-alkaline solutions; and a light sensitizing amount of a light-sensitive component selected from the group consisting of o- or p- quinone-diazides; diazonium salt polycondensation products or a mixture of
- a) a compound which eliminates an acid on exposure to light and
- b) a compound having at least one C--O--C group which can be split by acid;
- and a thermo-crosslinking compound, which thermo-crosslinking compound is a cyclical acid amide of the general formula: ##STR4## wherein R denotes a hydrogen atom or an alkyl group and said binding amount is that amount which produces a difference between the exposed and unexposed areas of said element upon development, and the amount of thermo-crosslinking compound present is an amount which does not substantially reduce the shelf life of said composition and which enables said composition to be baked at lower temperatures than a similar composition without the thermo-crosslinking compound and without substantially reducing the developer resistance of said composition; imagewise exposing said copying material to actinic light or electrons; removing the non-image area of the layer with an aqueous-alkaline developer solution; and heating the material to an elevated temperature sufficient to harden the image layer.
- 2. The process of claim 1 wherein said aqueous alkaline developer solution comprises one or more compounds selected from the group consisting of sodium silicate, sodium metasilicate, trisodium phosphate, monosodium phosphate and alkaline hydroxides.
- 3. The process of claim 1 wherein said heating step is conducted at a temperature of from about 150.degree. C. to about 240.degree. C. for a time period of from about 1 to about 20 minutes.
- 4. The process of claim 1 wherein said heating step is conducted at a temperature of from about 160.degree. C. to about 210.degree. C. for a time period of from about 5 to about 10 minutes.
- 5. The process of claim 1 wherein said support comprises aluminum, silicon or polyester.
- 6. The process of claim 1 wherein said support comprises aluminum and wherein the surface of said aluminum support bearing said light sensitive layer has been treated by one or more processes selected from the group consisting of bright rolling, mechanical roughening, electrochemical roughening, anodization and hydrophilization.
- 7. The process of claim 1, wherein the cyclical acid amide is present in the light sensitive layer in an amount of between 1 and 20 percent by weight.
- 8. The process of claim 1 wherein R has from 1 to about 10 carbon atoms.
- 9. The process of claim 1 wherein R has from 1 to 4 carbon atoms.
- 10. The process of claim 1 wherein the cross-linking agent is hexamethylol melamine hexamethyl ether.
- 11. The process of claim 1, wherein the binder which is soluble in aqueous-alkaline solutions is a novolak resin.
- 12. The process of claim 1, wherein the binder is present in the light sensitive layer in an amount of from about 50% to about 90 % by weight.
- 13. The process of claim 1 wherein the light sensitive component is an o-quinone diazide.
- 14. The process of claim 1 wherein the light sensitive component is selected from the group consisting of naphthoquinone-(1,2)-diazide-(2)-4 or 5-sulfonic acid esters or amides.
- 15. The process of claim 1 wherein the o-quinone diazide is present in the light sensitive layer in an amount of from about 3% to about 50% by weight.
- 16. The process of claim 1 wherein the light sensitive component is a mixture of compounds (a) and (b) wherein (a) is present in an amount of from about 8% to about 65% by weight of said light sensitive layer and (b) is present in an amount of from about 0.1% to about 10% by weight of said light sensitive layer.
- 17. The process of claim 1 wherein the exposure is conducted with ultraviolet light.
- 18. The process of claim 1 wherein the exposure is conducted with a laser.
- 19. The process of claim 1 wherein said support comprises silicon, R has from 1 to about 10 carbon atoms, the light sensitive component is an o-quinone diazide, and wherein the exposure is conducted with ultraviolet light.
- 20. The process of claim 19 wherein the cross-linking agent is hexamethylol melamine hexamethyl ether and wherein the light sensitive component is selected from the group consisting of naphthoquinone-(1,2)-diazide-(2)-4 or 5-sulfonic acid esters or amides.
Priority Claims (1)
Number |
Date |
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Kind |
3246037 |
Dec 1982 |
DEX |
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Parent Case Info
This is a division of co-pending application Ser. No. 07/480,775 filed on Feb. 16, 1990, now U.S. Pat. No. 4,008,175, which was a continuation of co-pending application Ser. No. 06/549,059 filed on Nov. 7, 1983, now abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (3)
Number |
Date |
Country |
1151199 |
Oct 1966 |
GBX |
1154749 |
Jun 1969 |
GBX |
1555233 |
Nov 1979 |
GBX |
Non-Patent Literature Citations (5)
Entry |
DeForest, W. S. "Photoresist Materials and Processes" McGraw-Hill Co., 1975, pp. 47-49 and 55-59. |
Hawley, G. "The Condensed Chemical Dictionary", 10th Ed. 1981, p. 649. |
Vogel, Arthur, I., Practical Organic Chemistry, 3rd Ed., 1956, pp. 1017-1018, John Wiley, and Sons. |
Schildknecht, Calvin E. "Polymer Processes", 1956, pp. 300-305, Interscience Publishers Inc. |
Resimene, product brochure from Monstanto, 1983. |
Divisions (1)
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Number |
Date |
Country |
Parent |
480775 |
Feb 1990 |
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Continuations (1)
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Number |
Date |
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Parent |
549059 |
Nov 1983 |
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