Claims
- 1. A process for preparing tris-pyrrolidonyl triazine from N,N',N"-tris(4-halobutyryl)melamine comprising: contacting said N,N',N"-tris(4-halobutyryl)melamine with a base at a temperature and length of time sufficient to produce tris-pyrrolidonyl triazine.
- 2. The process of claim 1, wherein the halogen in the N,N', N"-tris(4-halobutyryl) melamine is selected from the group consisting of chloro, bromo, iodo and mixtures thereof.
- 3. The process of claim 2, wherein the halogen in the N,N', N"-tris(4-halobutyryl) melamine is chloro.
- 4. The process of claim 1, wherein the N,N', N"-tris(4-halobutyryl)melamine is prepared by contacting N,N',N"-trishalomelamine with a 4-halobutyryl halide.
- 5. The process of claim 4, wherein the N,N', N"-tris(4-halobutyryl)melamine is prepared by contacting N,N',N"-trishalomelamine with a 4-halobutyryl halide.
- 6. The process of claim 5, wherein the N,N', N"-tris(4-halobutyryl melamine is prepared by contacting N,N', N"-trichoromelamine with a 4-chlorobutyryl chloride.
- 7. The process of claim 1, wherein the base is an organic base selected from the group consisting of trialkylamines, aralkylamines, quaternary ammonium hydroxides and alkoxides, hindered tertiary amines, pyridine derivatives, and bicyclic amines.
- 8. The process of claim 1, wherein the base is an inorganic base selected from the group consisting of sodium and potassium hydride, sodium and potassium amide, sodium and potassium hydroxide, sodium and potassium carbonate, and sodium and potassium carbonate.
- 9. The process of claim 1, wherein the base is an organometallic base selected from organosodium, organopotassium and organolithium reagents.
- 10. The process of claim 1, wherein the base is selected from the group consisting of sodium and potassium hydride, alkoxide, carbonate and a mixture thereof.
- 11. The process of claim 1, wherein the contacting takes place in a non-protic solvent.
- 12. The process of claim 1, wherein the contacting takes place at a temperature in the range of from about -20.degree. C. to about 120.degree. C.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a divisional of U.S. application Ser. No. 08/001,697, filed Jan. 7, 1993, pending, which is a continuation of U.S. application Ser. No. 07/973,676, filed Nov. 9, 1992, now abandoned, which is a continuation-in-part of U.S. application Ser. No. 07/793,077, filed Nov. 15, 1991, now abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (1)
Number |
Date |
Country |
58-146582 |
Sep 1983 |
JPX |
Non-Patent Literature Citations (4)
Entry |
Chemical abstracts 102:46792n for Japanese Patent No. 59-113019, Toshiba Corp., Jun., 1984. |
Chemical abstracts 79:6660t for Japanese Patent No. 73/00993, Teijin Ltd., Jan. 1973. |
Akkapeddi et al., "Some Mechanistic Aspects of the Anionic Block Copolymerization of Caprolactam and Polyether Diols", Proceedings of International Symposium of 1986, 1987, pp. 313-328. |
Lipp et al., Chemische Berichte, vol. 58, No. 6, 1925, pp. 1011-1014. |
Divisions (1)
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1697 |
Jan 1993 |
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Continuations (1)
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973676 |
Nov 1992 |
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Continuation in Parts (1)
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793077 |
Nov 1991 |
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