Claims
- 1. A process for producing a multilayer ceramic capacitor which comprises the steps of:
- forming, by a thin-film forming method, a nickel or nickel alloy layer on ceramic green sheets comprising barium titanate, a bismuth compound, and an anti-reducing agent;
- superposing said ceramic green sheets on one another to form an assemblage; and
- subjecting said assemblage to high-speed firing,
- wherein the high-speed firing comprises heating the assemblage at an oxygen partial pressure of 10.sup.-6 to 10.sup.-10 MPa to a temperature in the range of 1000.degree. to 1180.degree. C. at a heating and cooling rate of 10.degree. C. per minute or greater.
- 2. A process for producing a multilayer ceramic capacitor as claimed in claim 1, wherein said anti-reducing agent is represented by general formula:
- .alpha.MOx+.beta.RO+.gamma.B.sub.2 O.sub.3 +(100-.alpha.-.beta.-.gamma.)SiO.sub.2
- wherein MOx represents one member selected from the group consisting of MnO.sub.2, Li.sub.2 O, and ZnO; R represents at least one member selected from the group consisting of Mg, Sr, Ca, and Ba; and .alpha., .beta., and .gamma., each indicating percentage by mole, represent numbers of 5.ltoreq..alpha..ltoreq.20, 10.ltoreq..beta..ltoreq.60, and 20.ltoreq..gamma..ltoreq.35, respectively.
- 3. A process for producing a multilayer ceramic capacitor as claimed in claim 1, wherein said thin-film forming method for forming a nickel or nickel alloy layer on ceramic green sheets comprises the steps of:
- forming a metal layer consisting of nickel or a nickel alloy on a resin film by a thin-film forming method;
- patterning said metal layer into a form of an internal electrode by photoetching;
- superposing said resin film carrying said patterned metal layer on said ceramic green sheet with said metal layer being sandwiched therebetween; and
- pressing said resin film and said ceramic green sheet with heating to thereby transfer said metal layer to said ceramic green sheet.
- 4. A process for producing a multilayer ceramic capacitor as claimed in claim 1, wherein said thin-film forming method is at least one selected from the group consisting of a vapor deposition method, a sputtering method, and a plating method.
- 5. A process for producing a multilayer ceramic as claimed in claim 1 in which the amount of anti-reducing agent is 30 wt % or less based on the total amount of the dielectric material and the anti-reducing agent.
- 6. A process for producing a multilayer ceramic as claimed in claim 5 in which the amount of anti-reducing agent is from 1-20 wt % based on the total amount of the dielectric material and the anti-reducing agent.
Priority Claims (1)
Number |
Date |
Country |
Kind |
6-141799 |
Jun 1994 |
JPX |
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Parent Case Info
This is a division of application Ser. No. 08/478,026, filed Jun. 7, 1995 and now U.S. Pat. No. 5,600,533.
US Referenced Citations (13)
Divisions (1)
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Number |
Date |
Country |
Parent |
478026 |
Jun 1995 |
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