Number | Date | Country | Kind |
---|---|---|---|
3325022 | Jul 1983 | DEX |
Number | Name | Date | Kind |
---|---|---|---|
3264104 | Reichel | Aug 1966 | |
3402044 | Steinhoff et al. | Sep 1968 | |
3660097 | Mainthia | May 1972 | |
4104070 | Moritz et al. | Aug 1978 | |
4125650 | Chiu et al. | Nov 1978 | |
4196003 | Watanabe | Apr 1980 | |
4259430 | Kaplan et al. | Mar 1981 | |
4387152 | Stahlhofen | Jun 1983 |
Number | Date | Country |
---|---|---|
0024916 | Nov 1981 | EPX |
2082339 | Mar 1982 | GBX |
Entry |
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DeForest, W. S., "Photoresist Materials and Processes", McGraw-Hill Book Co., 1975, pp. 47-49 and 55-59. |
Pocansky, J., et al., IBM J. Res. Dev., vol. 23, No. 1, 1/1979, pp. 42-51. |
Hawley, G., The Condensed Chemical Dictionary, 10th ed., 1981, p. 649. |