Claims
- 1. A process for the preparation of a radiation-sensitive silver halide emulsion comprised of high chloride cubical silver halide grains containing from 0.05 to 3 mole percent iodide, based on total silver, where the iodide is incorporated in the grains in a controlled, non-uniform distribution forming a core containing at least 50 percent of total silver, an iodide free surface shell having a thickness of greater than 50 Å, and a sub-surface shell that contains a maximum iodide concentration, the process comprising:(a) providing in a stirred reaction vessel a dispersing medium and host high chloride silver halide cubical grains comprising a speed enhancing amount of iodide, and (b) precipitating silver halide onto the host grains by introducing at least a silver salt solution into the dispersing medium at a rate such that the normalized molar addition rate, Rn, is above 3.0×10−2 min−1, Rn satisfying the formula: Rn=[Qf×Cf]/M whereQf is the volumetric rate of addition, in L/min, of silver salt solution into the reaction vessel, Cf is the concentration, in moles/L, of the silver salt solution, and M is total moles of silver halide in the host grains in the reaction vessel at the precise moment of addition of the silver salt solution.
- 2. The process according to claim 1, wherein in step (b) a halide salt solution is simultaneously introducing into the dispersing medium with the silver salt solution.
- 3. The process according to claim 1, wherein only silver salt solution is added during step (b).
- 4. The process according to claim 1 wherein iodide is incorporated in the host grains by adding an alkali metal iodide salt solution during precipitation of host grains provided in step (a).
- 5. The process according to claim 1 wherein iodide is incorporated in the host grains by adding silver iodide seed grains during precipitation of host grains provided in step (a).
- 6. The process according to claim 1 wherein the host grains provided in step (a) are prepared by a precipitation process wherein a silver salt solution is introduced into a dispersing medium in a reaction vessel at a rate such that the normalized molar addition rate, Rn, is above 3.0×10−2 min−1.
- 7. The process according to claim 1 wherein the host grains provided in step (a) are prepared by a precipitation process wherein a silver salt solution is introduced into a dispersing medium in a reaction vessel at a rate such that the normalized molar addition rate, Rn, is below 3.0×10−2 min−1.
- 8. The process according to claim 1 wherein the high chloride cubical silver halide grains contain at least 70 mole percent chloride, based on silver.
- 9. The process according to claim 1 wherein the high chloride cubical silver halide grains contain at least 90 mole percent chloride, based on silver.
- 10. A photographic element comprising a support having coated thereon a radiation sensitive emulsion layer comprising a high chloride emulsion prepared according to claim 1.
- 11. A process for the preparation of a radiation-sensitive silver halide emulsion comprised of high chloride cubical silver halide grains containing from 0.05 to 3 mole percent iodide, based on total silver, where the iodide is incorporated in the grains in a controlled, non-uniform distribution forming a core containing at least 50 percent of total silver, an iodide free surface shell having a thickness of greater than 50 Å, and a sub-surface shell that contains a maximum iodide concentration, the process comprising:(a) providing in a stirred reaction vessel a dispersing medium and host high chloride silver halide cubical grains comprising a speed enhancing amount of iodide, and (b) precipitating silver halide onto the host grains by introducing only a silver salt solution into the dispersing medium at a rate such that the normalized molar addition rate, Rn, is above 3.0×10−2 min−1, Rn satisfying the formula: Rn=[Qf×Cf]/M whereQf is the volumetric rate of addition, in L/min, of silver salt solution into the reaction vessel, Cf is the concentration, in moles/L, of the silver salt solution, and M is total moles of silver halide in the host grains in the reaction vessel at the precise moment of addition of the silver salt solution.
- 12. The process according to claim 11 wherein iodide is incorporated in the host grains by adding an alkali metal iodide salt solution during precipitation of host grains provided in step (a).
- 13. The process according to claim 11 wherein iodide is incorporated in the host grains by adding silver iodide seed grains during precipitation of host grains provided in step (a).
- 14. The process according to claim 11 wherein the host grains provided in step (a) are prepared by a precipitation process wherein a silver salt solution is introduced into a dispersing medium in a reaction vessel at a rate such that the normalized molar addition rate, Rn, is above 3.0×10−2 min−1.
- 15. The process according to claim 11 wherein the host grains provided in step (a) are prepared by a precipitation process wherein a silver salt solution is introduced into a dispersing medium in a reaction vessel at a rate such that the normalized molar addition rate, Rn, is below 3.0×10−2 min−1.
- 16. The process according to claim 11 wherein the high chloride cubical silver halide grains contain at least 70 mole percent chloride, based on silver.
- 17. The process according to claim 11 wherein the high chloride cubical silver halide grains contain at least 90 mole percent chloride, based on silver.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of commonly assigned U.S. Ser. No. 09/218,683, filed Dec. 22, 1998, now U.S. Pat. No. 6,048,683, the disclosure of which is incorporated by reference herein.
US Referenced Citations (18)
Non-Patent Literature Citations (3)
Entry |
Research Disclosure, “Mixer for Improved Control Over Reaction Environment”, 38213, Feb. 1996, pp. 111-114. |
Research Disclosure, “Photographic Silver Halide Emulsions, Preparations, Addenda, Systems And Processing”, 38957 (I), Sep. 1996, pp. 591-598. |
Research Disclosure, “A Robust Method For The Preparation Of High Chloride Emulsions”, 41955, Mar. 1999, pp. 345-350. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09/218683 |
Dec 1998 |
US |
Child |
09/475405 |
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US |