Claims
- 1. In a process for the production of a 3-vinyl-cephalosporin derivative of formula I ##STR10## wherein R.sub.1 and R.sub.2 are the same or different and denote hydrogen, or a 3-vinyl-cephalosporin substituent selected from an alkyl group, alkenyl group, lower alkynyl group, lower cycloalkyl radical, (lower cycloalkyl)-lower alkyl radical, aryl radical, aralkyl radical, heterocycle radical, and heterocyclic alkyl radical or R.sub.1 and R.sub.2 form part of a 3-vinyl-cephalosporin ring system, by means of a Wittig reaction comprising the steps of
- i) reacting a compound of formula II ##STR11## wherein R is a protecting group, with a compound of formula VII of VIII ##STR12## where R.sub.4 is a lower alkyl or an aryl group, to produce a compound of formula III ##STR13## where X is --P(R.sub.4).sub.3 I or --P(O)(OR.sub.4).sub.2 and R and R.sub.4 are as defined above;
- ii) reacting the compound of formula III with a base to produce a compound of formula IV ##STR14## where R is as defined above and is X.sup.+ --P(R.sub.4).sub.3 or --P(O)(OR.sub.4).sub.2 Y.sup.+, where R.sub.4 is as defined above and Y is an alkali metal cation or the protonated form of a strong organic base; and
- iii) reacting the compound of formula IV with a compound of formula V ##STR15## where R.sub.1 and R.sub.2 are as defined above, the improvement which comprises reacting a silyl protected compound of formula II' ##STR16## where R' is a silyl protecting group, with the compound of formula VII or VIII in step i) and following step iii) removing the protecting groups by hydrolysis or alcoholysis to produce the compound of formula I.
- 2. In a process for the production of a 3-vinyl- cephalosporin derivative of formula I ##STR17## wherein one of R.sub.1 and R.sub.2 is hydrogen and the other is i) lower alkyl, lower alkenyl, or lower alkynyl;
- ii) lower cycloalkyl, (lower cycloalkyl)-lower alkyl, aryl, (aryl)-lower alkyl, a heterocyclic group or (heterocyclyl)-lower alkyl, the ring of each of which is optionally substituted by 1 to 3 substituents selected from lower alkoxy, lower alkylthio, halogen, lower alkyl, nitro, hydroxy, acyloxy, carboxy, carbalkoxy, lower alkylcarbonyl, lower alkylsulfonyl, lower alkoxysulfonyl, amino-(lower)-alkyl amino, and acylamido; or
- iii) a group of formula --CH.sub.2 Z, wherein Z is:
- a) hydroxy, lower alkoxy, formyloxy, acetyloxy, lower alkylsulfonyloxy, halogen, N-mono(lower)alkylcarbamoyloxy, or N,N-di(lower)alkylcarbamoyloxy,
- b) group of formula --S(O).sub.m R.sub.9 wherein R.sub.9 is an aliphatic, araliphatic, alicyclic, aromatic or heterocyclic group, and m is 0, 1 or 2, or
- c) an acyclic or cyclic ammonium group, by means of a Wittig reaction comprising the steps of
- i) reacting a compound of formula II ##STR18## wherein R is a protecting group for a Wittig reaction, with a compound of formula VII of VIII ##STR19## where R.sub.4 is a lower alkyl or an aryl group, to produce a compound of formula III ##STR20## where X is --P(R.sub.4).sub.3 I or --P(O) (OR.sub.4).sub.2 and R and R.sub.4 are as defined above;
- ii) reacting the compound of formula III with a base to produce a compound of formula IV ##STR21## where R is as defined above and X.sup.+ is --P.sup.+ (R.sub.4).sub.3 or --P(O) (OR.sub.4).sub.2 Y.sup.+, where R.sub.4 is as defined above and Y is an alkali metal cation or the protonated form of a strong organic base; and
- iii) reacting the compound of formula IV with a compound of formula V ##STR22## where R.sub.1 and R.sub.2 are as defined above, the improvement which comprises reacting a silyl protected compound of formula II' ##STR23## where R' is a silyl protecting group, with the compound of formula VII or VIII in step i) and following step iii) removing the protecting groups by hydrolysis or alcoholysis to produce the compound of formula I.
- 3. A process according to claim 1 in which steps i), ii) and iii) are effected in the same reaction vessel.
- 4. A process according to claim 1 wherein one of R.sub.1 and R.sub.2 is hydrogen and the other of R.sub.1 and R.sub.2 is hydrogen, methyl, phenyl, 3-acetoxymethyl, 4-methyl-1,3-thiazol-5-yl, N-methyl-N-ethyl-N-(carbamoylmethyl)-ammonium-methyl- or 1,5-dihydroxy-4-pyridon-2-yl.
- 5. A process according to claim 1 wherein the silyl protecting groups are selected from trimethylsilyl, triethylsilyl, tri-n-propylsilyl, tri-n-butylsilyl, methyldiethylsilyl, dimethylethylsilyl, phenyldimethylsilyl, tert-butyldiphenylsilyl, tert-butyldimethylsilyl and triphenylsilyl.
- 6. A process according to claim 1 in which, in step ii) and iii), the protonated form of the strong organic base is derived from tetramethylguanidine, 1,8-diazabicyclo-[5.4.0]undec-7-ene, 1,5-diazabicyclo[4.3.0]non-5-ene, 2-tert-butylimino-2-diethylamino-1,3-dimethyl-1,3,2-diazaphosphinane or tris(dimethylamino)-(1,1,3,3-tetramethylbutyl)iminophosphorane.
- 7. A process according to claim 1 in which, in step ii), the base is selected from tetramethylguanidine, 1,8-diazabicyclo[5.4.0]undec-7-ene, 1,5-diazabicylo-[4.3.0]non-5-ene, Li and Na salts of 1,1,1,3,3,3-hexamethyldisilazane, or Li-diisopropylamide, butyllithium, hydrides of alkali metals and iminophosphoranes.
- 8. A process according to claim 1 in which R.sub.4 is (C.sub.1-4)alkyl, phenyl, or naphthyl, or phenyl or naphthyl mono-, di-, or tri-substituted by substituents to selected from halogen, (C.sub.1-4)alkyl, and (C.sub.1-4)alkoxy.
- 9. A process according to claim 1 in which step iii) is carried out under anhydrous conditions.
- 10. A process according to claim 9 in which step iii) is carried out in the presence of a water-binding silylation agent.
- 11. A process according to claim 10 in which the water-binding silylation agent is N,O-bis(trimethylsilyl) acetamide, bissilylurea or mono or bis (trimethylsilyl) trifluoroacetamide.
Priority Claims (2)
Number |
Date |
Country |
Kind |
A504/91 |
Mar 1991 |
ATX |
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A101/91 |
May 1991 |
ATX |
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Parent Case Info
This is a continuation of application Ser. No. 07/848,457, filed Mar. 9, 1992, now abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
4110534 |
Clark et al. |
Aug 1978 |
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4703118 |
Lord et al. |
Oct 1987 |
|
4705851 |
Takaga et al. |
Nov 1987 |
|
Non-Patent Literature Citations (1)
Entry |
Derwent No. 50795(s) Jul. 29, 1971 (abstracting Patent No. DT-2103014). |
Continuations (1)
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Number |
Date |
Country |
Parent |
848457 |
Mar 1992 |
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