FIG. 1 is an isometric view of a process tube for semiconductor device manufacturing apparatus of the present invention;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a top view thereof;
FIG. 7 is a bottom view thereof;
FIG. 8 is a sectional view along line 8—8 shown in FIG. 6;
FIG. 9 is a sectional view along line 9—9 shown in FIG. 6;
FIG. 10 is a sectional view along line 10—10 shown in FIG. 6; and,
FIG. 11 is a sectional view along line 11—11 shown in FIG. 2.