Patent Grant
7275879
1. Field of the Invention
The present invention relates to a processing device of a photo-sensitive material, more specifically to a processing device for applying a processing liquid using a slot die.
2. Description of the Related Art
A photo-sensitive material such as a film, a photographic paper, or a printing plate is processed with a processing liquid such as a developer, a fixer, a stabilizing liquid, or a washing water after an image is recorded. As a processing device of a photo-sensitive material for conducting such processing, there is known an immersion processing device which conducts the processing by conveying a photo-sensitive material into a processing vessel in which a processing liquid is pooled, using conveying means constituted from a plurality of conveying roller pairs or the like, and immersing the photo-sensitive material in the processing liquid.
In such immersion processing device, a processing liquid is deteriorated due to processing fatigue accompanying the processing of photo-sensitive materials, fatigue with age caused by carbon dioxide or oxygen in the air, or the like, and therefore the deterioration of the processing liquid is recuperated by replenishing a replenisher into the processing liquid. Accordingly, it means that the constituent of a processing liquid at the time of starting the processing differs from the constituent of a processing liquid in a case where the processing is continued afterwards, and therefore it is impossible to conduct a strictly uniform processing. Further, such immersion processing devices have such problems as high running cost due to large amount of the processing liquid consumed and wasted, and as bad maintenanceability of the device.
As a processing device of a photo-sensitive material for overcoming these problems, there is known an application processing device for applying to a sensitized surface of a photo-sensitive material a processing liquid in an amount necessary for the processing of the photo-sensitive material, instead of immersing a photo-sensitive material in a processing liquid, as set forth, for example, in Japanese Unexamined Patent Publication No. Sho 62-237455, Japanese Unexamined Utility Model Publication No. Hei 6-8956, Japanese Unexamined Patent Publication No. Hei 6-27677, Japanese Unexamined Patent Publication No. 2001-174970, and Japanese Unexamined Patent Publication No. 2001-312036.
In particular, a processing device using a slot die disclosed in the above Japanese Unexamined Patent Publication No. 2001-174970 has an advantage of applying stably and uniformly even in a less amount of the processing liquid, and of not substantially generating a waste liquid. However, some photo-sensitive materials require a uniform processing even at the end section, and unevenness in the processing, in particular, at the very tip (e.g. within 1 cm of the tip) sometimes became a problem. This phenomenon was prone to occur especially when the amount of application was set to less.
In order to improve this problem, Japanese Unexamined Patent Publication No. 2001-312036 discloses, in pages 1-3 and
However, some processing liquid which conducts a processing had a problem that the constituent of a processing liquid fixes and crystallizes between the tip of the slit and the photo-sensitive material support member facing thereto during a period of time when no processing is conducted. In particular, in a processing device using, for a section facing to the tip of the slit, the photo-sensitive material support plane member which has a flat surface, a processing liquid after the processing of a photo-sensitive material is prone to remain in a relatively large amount due to its flatness. The remaining processing liquid converts into a fixed crystalline material through drying. When the photo-sensitive material is processed under such state, the fixed crystalline material adheres to the surface of the photo-sensitive material between the tip of the slit and the photo-sensitive material support plane member, causing processing defect and flaws, which sometimes had a bad influence on 2nd version or 3rd version depending on a state of fixation. Accordingly, it was required to wipe the photo-sensitive material support plane member periodically or to pour into a large amount of rinsing liquid, resulting in occurring decreasing maintenanceability and increasing amount of waste liquid.
In this case, a great rinsing effect can be obtained by modifying the photo-sensitive material support plane member into a support roll, and, for example, by rinsing while rotating. However, in a case where a processing is conducted, there is a problem that only by modifying the photo-sensitive material support member into a support roll, a processing liquid is resistant to remaining between the tip of the slit and the support roll due to the unflatness of the surface facing to the tip of the slit, so that the application starting section of the very tip and both ends in the application width direction of the photo-sensitive material are applied nonuniformly, causing the occurrence of unevenness in the processing, as mentioned above.
Yet another problem is that when a metal such as aluminum is used for the support member of a photo-sensitive material, the photo-sensitive material may be damaged due to the friction of the photo-sensitive material by the support roll of the photo-sensitive material opposed to the tip of the slit. Thus, a resin is preferably used for the support roll of the photo-sensitive material, but in order to process a large-sized photo-sensitive material, it was required to lengthen the length of the photo-sensitive material support member in the application width direction, causing problems of maintaining straightness and costs. It is required to keep the gap constant in the width direction between the tip of the slit and the photo-sensitive material support member opposed to the tip of the slit, and this is the most important factor in applying a processing liquid to a photo-sensitive material uniformly in the width direction.
The present invention further improves a processing device using a slot die, i.e., to completely prevent the fixation and crystallization of a processing liquid on a processing liquid applied section with less amount of rinsing liquid, and provides a processing device of a photo-sensitive material which conducts stable application of a processing liquid even at the tip section of the processing of the photo-sensitive material. Further, the present invention keeps the gap constant in the width direction between the tip of the slit and the support roll of the photo-sensitive material opposed to the tip of the slit, and provides a processing device of a photo-sensitive material which uses a low-cost support roll of the photo-sensitive material.
The advantages of the present invention have been achieved by the following inventions:
(condition)
Length of the flat surface of the tip at the upstream side (L1)>Length of the flat surface of the tip at the downstream side (L2).
The processing device of a photo-sensitive material according to the present invention allows to completely prevent the fixation and crystallization of a processing liquid on a processing liquid applied section with less amount of rinsing liquid, and to conduct stable application of a processing liquid even at the tip section of the processing of the photo-sensitive material.
a) is a plan view of the film F and
a) is a side view of the slot die showing one embodiment of the present invention and
Hereinafter, the processing device of a photo-sensitive material according to the present invention is described in detail using drawings.
While not shown in
The material of the slot die 2 is not particularly limited, but would be sufficient if corrosion resistance against the processing liquid and mechanical precision is satisfied, and for example stainless steel is preferable. Other than that, general structure steel with chrome plating, plastics, or the like can be used. Further, when producing it with a metal, annealing treatment may be conducted in advance, in order to exclude the distortion of the stress during machining.
Indicated by reference numeral 10 in the figure is a reservoir tank of the processing liquid for pooling a processing liquid 7. Processing liquid supply means for supplying the processing liquid 7 in the reservoir tank of the processing liquid 10 is constituted from a pump 8, a valve 9 and piping 11. The piping 11 couples the reservoir tank to the processing liquid supply port 6 of the slot die 2, and there are provided therebetween respectively the pump 8 for sending the processing liquid and the valve 9 for stopping sending the processing liquid 7.
Indicated by reference character P is a photo-sensitive material, and is conveyed in a direction (arrow PX) from left to right in the figure by photo-sensitive material conveying roll pairs 19, one of photo-sensitive material conveying means. Indicated by reference numeral 13 is detection means for detecting a position of a photo-sensitive material P being conveyed, i.e., for detecting a top and an end portions of the photo-sensitive material to be processed, and a contact or non-contact detector should be used.
Indicated by reference numeral 16 is a supply control means of the processing liquid for controlling the supply and stop of the processing liquid from the processing liquid supply means. The supply control means of the processing liquid 16 drives the pump 8 and opens the valve 9 by detecting a leading end of the photo-sensitive material P being conveyed with the detection means 13, so as to supply the processing liquid 7 to the slot die 2. Further, by detecting a terminating end of the photo-sensitive material P with the detection means 13 in the same maimer, the pump 8 is stopped and the valve 9 is closed after a preset time is elapsed. Controlling in such a maimer allows uniform application of a certain constant amount of processing liquid to the photo-sensitive material P being conveyed.
When the amount of application to the photo-sensitive material P is intended to be controlled with high precision, a flow meter (not shown) should be placed in the midstream of the piping for the processing liquid, so as to configure to control the pump 8 and the valve 9 by feedback with signals from the flow meter as reference.
The amount of the flux of the processing liquid supplied to the slot die 2 can be determined by multiplying a desired amount of wet application of the processing liquid, the application width of the photo-sensitive material and the conveying speed of the photo-sensitive material together.
A support roll 1 of the photo-sensitive material which is one of the characteristic features of the present invention is arranged at a position facing and spaced from the tip of the slot die 2. Further, the support roll 1 of the photo-sensitive material is provided at least with driving means 18 such as a motor for rotating the support roll 1 in the direction opposite to the conveying direction of the photo-sensitive material P, and rotation control means 17 for controlling the rotation of the support roll 1 of the photo-sensitive material. Here, the terms “at least” in “the support roll 1 is provided at least with driving means 18” mean that the driving means may rotate the support roll 1 in the same direction as the conveying direction of the photo-sensitive material P and in the reverse direction to the same, but it is essential that the driving means has a means to rotate the support roll 1 in the direction opposite to the conveying direction, or in the reverse direction.
The support roll 1 of the photo-sensitive material is set to have a width more than the application width of the slot die 2 in the application width direction, and is arranged in such a manner that the central axis of the circle of the support roll 1 of the photo-sensitive material should be a downward vertical extension of the slit section 5. The diameter of the support roll 1 of the photo-sensitive material is preferably 20 mm or more, and more preferably 30 mm or more, with about 50 mm as the upper limit. The material of the surface of is not particularly limited if it has corrosion resistance against the processing liquid and high straightness, and for example stainless steel, plastics, fluorine resin or the like can be used.
However, as mentioned above, the processing liquid is resistant to pooling between the tip of the slot die 2 and the support roll 1 facing thereto since the support roll 1 of the photo-sensitive material is not flat at the surface opposed to the tip of the slot die 2. Yet another problem is that when a metal plate such as aluminum is used, in particular, for a support medium of a photo-sensitive material, the photo-sensitive material is damaged. In this case, a resin having the characteristic of high surface tension is preferably used for the surface material of the support roll 1 of the photo-sensitive material, and more preferably fluorine resin in particular is used. Thereby, the pooling of the liquid formed between the tip of the slot die 2 and the support roll 1 of the photo-sensitive material can be increased, a developer is prevented to run off immediately, and further a photo-sensitive material is prevented from being damaged.
Distance H between the support roll 1 of the photo-sensitive material and the tip (the tip of the slot die 2) of the slit section 5 is preferably within 3 mm, more preferably within 2 mm, further more preferably within 1.5 mm, and particularly preferably within 1.0 mm. The lower limit of the distance H is a distance by which a sensitized surface of the photo-sensitive material P is not brought into contact with the tip (the tip of the slot die 2) of the slit section 5.
In the processing device of the present invention, a support roll of the photo-sensitive material comprising a metal roll and a tubular fluorine resin wound around its surface is preferably used for the support roll 1 of the photo-sensitive material, since the distance H between the support roll 1 of the photo-sensitive material and the tip of the slit section 5 can be constantly stabilized and low-cost production can be achieved.
In the present invention, the amount of application of the processing liquid is preferably 100 ml or less per 1 square meter. If the amount of application is set to less in this maimer, uniform processing for the tip of the photo-sensitive material becomes difficult. In particular, by employing a roll member for the photo-sensitive material support member, a processing liquid becomes resistant to remaining between the tip of the slit and the support roll 1 of the photo-sensitive material facing thereto. In order to solve this problem, the present invention is controlled such that the support roll 1 of the photo-sensitive material should be rotated in the direction opposite to the conveying direction (arrow PX) of the photo-sensitive material P by the driving means 18 while outpouring the processing liquid 7 from the tip of the slot die 2 using the supply means of the processing liquid in advance, by transmitting the signals detected by the detection means 13 to the supply control means of the processing liquid 16 and the rotation control means 17, before the photo-sensitive material P reaches the tip of the slot die 2.
By controlling in the above manner, the processing liquid 7 outpouring uniformly in the application width direction from the tip of the slot die 2 forms a slight liquid film between the tip of the slot die 2 and the support roll 1 of the photo-sensitive material. Then, by rotating the support roll 1 of the photo-sensitive material in the direction opposite to the conveying direction of the photo-sensitive material, the processing liquid comes to flow in an active manner to the upstream side of the conveying direction of the support roll 1 of the photo-sensitive material. If the photo-sensitive material is processed under such condition, when the processed tip of the photo-sensitive material is brought into contact with the support roll 1 of the photo-sensitive material, more processing liquid can be supplied to the tip of the photo-sensitive material. Subsequently, when the tip of the photo-sensitive material reaches the tip of the slot die 2, continuous application of the processing liquid 7 is conducted. Further, before the photo-sensitive material reaches the tip of the slot die 2, the amount of the outflux of the processing liquid 7 flowed from the tip of the slot die 2 may be more than the amount of flux at the time when the processing liquid 7 is applied to the photo-sensitive material P.
The timing at which the processing liquid 7 starts outpouring from the tip of the slot die 2 and the timing at which the support roll 1 of the photo-sensitive material start driving are not necessarily the same. Further, while it is required that the support roll 1 of the photo-sensitive material should be rotated in the direction opposite to the conveying direction of the photo-sensitive material P at least until the photo-sensitive material reaches the position of the slot die 2, the support roll 1 of the photo-sensitive material may be stopped at the time when the photo-sensitive material P reaches the slot die 2. Taking into consideration the occurrence of flaws or the like on the back of the photo-sensitive material, the driving means is preferably controlled such that the support roll 1 of the photo-sensitive material is rotated in the same direction and at the same speed as the conveying direction and speed of the photo-sensitive material P at the time when the photo-sensitive material P reaches the slot die 2.
Since the peripheral speed at the time when the support roll 1 of the photo-sensitive material is rotated in the direction opposite to the conveying direction is largely associated with the formation of a liquid film (amount of the pooling of the processing liquid) between the tip of the slot die 2 and the support roll 1 of the photo-sensitive material, the driving means 18 is set so that the peripheral speed is slower than at least the conveying speed of the photo-sensitive material. Generally speaking, when the conveying speed of the photo-sensitive material P is set to 10 to 40 mm/second, the peripheral speed of the support roll 1 of the photo-sensitive material is set to 5 to 30 mm/second, preferably 5 to 20 mm/second.
Further, as shown in
As a method for lengthening the length L1 of the flat surface at the upstream side more than the length L2 of the flat surface at the downstream side in the conveying direction of the photo-sensitive material in the flat surface at both sides across the slit 5 of the tip of the slot die 2, each of the flat surfaces of the tip of the slot die 2 is preferably worked so as to have different lengths (thicknesses) as shown in
Next, a description is given regarding a processing device of a photo-sensitive material comprising a supply means of a rinsing liquid for supplying a rinsing liquid to the support roll of the photo-sensitive material, and a diffusion means of a rinsing liquid for diffusing the rinsing liquid supplied to the support roll of the photo-sensitive material, the diffusion means being arranged in such a manner as to abut the support roll of the photo-sensitive material.
As shown in
The rinsing liquid diffusion member 3 is arranged so as to be positioned at the same height or slightly upward with respect to the central axis in the horizontal direction of the support roll 1 of the photo-sensitive material, and may be provided at either the upstream side or the downstream side in the conveying direction of the support roll 1 of the photo-sensitive material. Further, the diameter of the rinsing liquid diffusion member 3 formed from a roll is set to the ratio of 0.2 to 0.8 with respect to the support roll 1 of the photo-sensitive material, i.e., about 5 to 30 mm. The surface material formed from a roll is not particularly limited if it has corrosion resistance against the processing liquid and high roundness, and for example stainless steel, plastics, fluorine resin or the like can be used. The rinsing liquid diffusion member 3 formed from a roll is preferably brought into contact with the support roll 1 of the photo-sensitive material all over in the application width direction, and may be either rotated or fixed.
The rinsing liquid 12 is preferably applied to the upper part of the section where the support roll 1 of the photo-sensitive material abuts the rinsing liquid diffusion member 3. For example, as shown in
In the embodiment of the present invention, the rinsing liquid diffusion member 3 formed from a roll was used as rinsing liquid diffusion means. However, the rinsing liquid diffusion member 3 is not limited to a roll if it constitutes means for spreading the rinsing liquid all over in the application width direction as mentioned above. For example, a plate-like material having a length equivalent to the support roll 1 of the photo-sensitive material may be abutted to the support roll 1 of the photo-sensitive material all over in the application width direction.
It is preferable that the rinsing of the processing liquid applied section (the support roll 1 of the photo-sensitive material and the tip of the slot die 2) should be conducted when no normal processing is conducted or during the stoppage of the device. When no processing is conducted or during the stoppage of the device, the rinsing liquid remains at the applied section of the support roll 1 of the photo-sensitive material opposed to the tip of the slot die 2, arid is prone to be crystallized by being subjected to the air. Depending on the degree of the development of the crystal, it becomes difficult to rinse by the rinsing liquid alone supplied from the tip of the lot die 2. Thus, in the present invention, the rinsing liquid 12 is supplied periodically from the nozzles 21 and 22 using the pump 14 and the piping 15 which constitute the rinsing liquid supply means when no processing is conducted or during the stoppage of the device. Further, the support roll 1 of the photo-sensitive material is preferably rotated at the same timing as the supply of the rinsing liquid 12, and as a result the rinsing liquid 12 can be supplied to the tip of the slot die 2 and the overall surroundings of the support roll 1 of the photo-sensitive material, leading to a great effect in preventing the crystallization of the processing liquid.
The above-mentioned wording “when no processing is conducted or during the stoppage of the device” means a standby period from the last processing of the photo-sensitive material to the next processing of the photo-sensitive material. While the timing of outpouring the rinsing liquid 12 from the nozzles 21 and 22 is not particularly limited, the rinsing liquid 12 is preferably outpoured at the rate of once per 30 minutes to 3 hours in the period from the last processing of the photo-sensitive material to the next processing. For example, by letting memorize the time when the photo-sensitive material is processed last based on the signals from the detection means for detecting the photo-sensitive material, a period of time until the supply of the rinsing liquid 12 can be measured. Further, the amount of the outflux in one time is preferably 3 to 60 ml, and can be appropriately determined in accordance with the environmental condition and the application width.
The timing at which the support roll 1 of the photo-sensitive material is driven during rinsing is preferably simultaneous with the start of the supply of the rinsing liquid 12, and the peripheral speed of the support roll 1 of the photo-sensitive material during rinsing is set to about 10 to 40 mm/second. Further, the driving time from the start to the stop of the driving of the support roll 1 of the photo-sensitive material is set to about 30 seconds to 3 minutes.
While the rinsing liquid 12 for use in the present invention is not particularly limited, tap water with a small amount of surface active agent or organic solvent added, or a neutralizing liquid or a washing water which are used after a developer can be used. Further, the temperature of the rinsing liquid 12 may be controlled, in order to obtain a greater rinsing effect.
In the processing device of the present invention, it is preferable to use as the slot die 2 a slot die which is produced easily at low cost. Hereinafter, a description is given regarding the easily produced slot die.
As shown in
The film F to be inserted between the flat plates 41 and 43 serves to form between the flat plates 41 and 43 a slit which is continuous to the manifold, and a film having a thickness identical to the thickness of the predesigned slit is used therefor. For the material of a film, a plastic film such as polyethylene terephthalate or polyvinyl chloride is preferable, and the thickness thereof is generally about 50 to 300 μm The film F is not particularly limited if shaped in such a manner as to form a slit in the lower part of the slot die. For example, as shown in
Shown in
The simplified slot die for use in the present invention can be formed by a quite simple combination of interposing the film F between the flat plates 41 and 43. However, as the application width (the length of the width direction of the slot die) becomes longer, deflection in the thickness of the slit may occur in the application width direction. This deflection can be overcome by simple means of interposing (positioning) the flaps which is integrally provided with the film F in the slit with appropriate spaces. The shapes or the like of the flap for securing uniform flow within the slit are described below.
While the number of the above-mentioned flaps can be appropriately selected depending on the application width, even one flap can achieve the effect sufficiently. Preferably, the flaps should be spaced 3 to 20 cm apart. More preferably, the flaps should be spaced 3 to 10 cm apart. The width of a flap is preferably set to about 5 to 20 mm, the size by which a bolt or a screw for the fixation can be inserted, and should not be unnecessarily wider. The flap is preferably shaped such that the tip should be thinner. For example, a triangle shape, an angle shape, a semicircle shape, or the like is preferable. This flap once interrupts the flow of the liquid from the manifold to the slit partially, while at the tip of the slit (the section through which the liquid pours outside) it is required to produce a uniform flow in the width direction, and in this sense the shape and the number of the flap and the position of the tip should be selected. Above all, the shape of the flap and the position of the tip are important. The shape preferably tapers as mentioned above, and it is required that the position of the tip of the flap should be inner (upper) than the tip of the slit. While the distance between the tip of the flap and the tip of the slit varies depending on the shape of the tip of the flap, the distance is preferably 1 mm or more, and more preferably 2 mm or more.
As shown in
For the material of the flat plates 41, 42 and 43, a plastic resin such as acryl, polycarbonate or vinyl chloride, or stainless steel can be used, but stainless steel is preferably used. The thickness of the flat plate 41 affects the size of a manifold 44 depending on a groove which is cut out. In the present invention, the sectional area (cross section orthogonal to the width direction) of the manifold 44 is preferably within the range of 10 to 100 square millimeters, particularly preferably within the range of 10 to 80 square millimeters, and further preferably within the range of 10 to 50 square millimeters. Accordingly, it is appropriate that the thickness of the flat plate 41 is preferably about 1 to 8 mm. Further, while the flat plates 41 and 43 form a slit, it is required that a surface which forms a slit should be smoothly polished. For the flat plates 41 and 43, a cold-rolled stainless (2B) also in No. 4, the classification meaning going through mechanical polishing is preferably used. The thickness of the flat plate 43 is 1 to 8 mm. For the flat plate 42, relatively thick stainless is used in order to control flexure or the like which occurs when thinner stainless is used for the flat plates 41 and 43. It is appropriate that the thickness of the flat plate 42 should be about 5 to 15 mm.
The size of the groove 44 which is cut out of the flat plate 41 for forming a manifold is as mentioned above regarding the sectional area. Depending on the thickness of the flat plate 41, the length in the vertical direction (a direction in which the liquid falls) varies, but it is appropriate that the length in the vertical direction of the grove 44 should be about 5 to 20 mm. Further, the length in the width direction of the groove 44 can be appropriately set depending on the application width, but is preferably equivalent to or slightly longer than the application width. Usually, the application width and the length in the width direction of the slit 60 are designed to be equivalent, while the length in the width direction of the above-mentioned groove 44 may be shorter than the application width if it is a sufficient length for spreading the liquid which falls through the slit 60 uniformly in the width direction.
The sectional area of the manifold (groove 44) is not necessarily constant throughout the width direction of the slot die, and for example the sectional area may be tapered as reaching the end in order to further improve the uniformity of the flux of the outpouring processing liquid in the width direction.
When using the above-mentioned slot die 2 produced in a simplified manner in the processing device of the present invention, as a method for lengthening the length L1 of the flat surface at the upstream side more than the length L2 of the flat surface at the downstream side in the conveying direction of the photo-sensitive material in the flat surface at both sides across the slit film F of the tip of the slot die 2, for example as shown in
The present inventors have found that the conventional problems of nonuniformity of the application at the very tip of a photo-sensitive material and at both ends in the application width direction causing the unevenness in the process to be prone to occur can be overcome using a processing device of a photo-sensitive material comprising conveying means for conveying a photo-sensitive material, a slot die for applying a processing liquid to the photo-sensitive material conveyed by the conveying means, a reservoir tank of the processing liquid, processing liquid supply means for supplying a processing liquid in the reservoir tank of the processing liquid to the slot die, a support roll of the photo-sensitive material arranged at a position facing to and spaced from the tip of the slot die, means for detecting a photo-sensitive material, and driving means for rotating the support roll of the photo-sensitive material at least in the direction reverse to the conveying direction of the photo-sensitive material. Further, the present inventors have found that the conventional problems of a large amount of the remainder of the processing liquid on the support roll of the photo-sensitive material and at the tip of the slot die causing fixation and crystallization to be prone to occur can be overcome using a photo-sensitive material processing device, wherein rinsing liquid supply means for supplying rinsing liquid to the support roll of the photo-sensitive material and rinsing liquid diffusion means for diffusing a rinsing liquid to the support roll of the photo-sensitive material are arranged in such a manner as to abut to the support roll of the photo-sensitive material.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2004-046110 | Feb 2004 | JP | national |
| Number | Name | Date | Kind |
|---|---|---|---|
| 6478483 | Maruyama et al. | Nov 2002 | B2 |
| Number | Date | Country |
|---|---|---|
| 6-8956 | Feb 1994 | JP |
| 6-27677 | Feb 1994 | JP |
| 62-237455 | Aug 1994 | JP |
| 2001-174970 | Jun 2001 | JP |
| 2001-312036 | Nov 2001 | JP |
| Number | Date | Country | |
|---|---|---|---|
| 20050185953 A1 | Aug 2005 | US |
