Claims
- 1. A projection optical system that projects an image of an object in an object surface onto an image surface with a reduction magnification comprising, in light path order from said object surface:
- a first group of lenses with positive refractive power;
- a second group of lenses forming an approximately afocal system; and
- a third group of lenses with positive refractive power;
- wherein:
- said projection optical system has a focal length F,
- said projection optical system has a projection magnification B,
- said object surface and said image surface are separated by a distance L,
- a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d.sub.0,
- a paraxial marginal ray from an axial object point on said object surface enters said second group of lenses at an entrance height h.sub.1 from an optical axis,
- the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an emergence height h.sub.2 from the optical axis,
- 1.8.ltoreq..vertline.F/(B.multidot.L).vertline..ltoreq.6,
- d.sub.0 /L.ltoreq.0.2, and
- 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.
- 2. The projection optical system of claim 1, wherein:
- said first group of lenses has a focal length f.sub.1 ; and
- 0.05.ltoreq.f.sub.1 /L.ltoreq.0.3.
- 3. The projection optical system of claim 2, wherein:
- a maximum height of the object from the optical axis of said projection optical system on said object surface is represented by H.sub.MAX ; and
- 0.04.ltoreq.H.sub.MAX /L.ltoreq.0.2.
- 4. The projection optical system of claim 3, wherein:
- said first group of lenses comprises at least two positive lenses;
- said second group of lenses comprises at least four negative lenses and at least four positive lenses; and
- said third group of lenses comprises at least two positive lenses.
- 5. The projection optical system of claim 4, wherein said second group of lenses comprises, in light path order from said object surface:
- a first subgroup of lenses with negative refractive power;
- a second subgroup of lenses with positive refractive power; and
- a third subgroup of lenses with negative refractive power.
- 6. The projection optical system of claim 5, wherein:
- said first subgroup of lenses has a focal length f.sub.21 ;
- said second subgroup of lenses has a focal length f.sub.22 ; and
- 1.5.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline..ltoreq.5.
- 7. The projection optical system of claim 6, wherein:
- said third subgroup of lenses has a focal length f.sub.23 ; and
- 0.02.ltoreq..vertline.f.sub.23 /L.vertline..ltoreq.0.10.
- 8. The projection optical system of claim 5, wherein:
- said first subgroup of lenses has a focal length f.sub.21 ;
- said second subgroup of lenses has a focal length f.sub.22 ; and
- 1.7.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline..ltoreq.5.
- 9. The projection optical system of claim 3, wherein:
- said first group of lenses comprises at least two positive lenses;
- said third group of lenses comprises at least two positive lenses;
- said second group of lenses comprises, in light path order from said object surface, a first subgroup of lenses with negative refractive power, a second subgroup of lenses with positive refractive power, and a third subgroup of lenses with negative refractive power;
- said first subgroup of lenses comprises at least two negative lenses;
- said second subgroup of lenses comprises at least four positive lenses; and
- said third subgroup of lenses comprises at least two negative lenses.
- 10. The projection optical system of claim 9, wherein:
- said second subgroup of lenses comprises two biconvex lenses.
- 11. The projection optical system of claim 8, wherein:
- the paraxial marginal ray from the axial object point on said object surface enters said first group of lenses at an angle of incidence u.sub.1 ;
- the paraxial marginal ray from the axial object point on said object surface enters said second group of lenses at an angle of incidence u.sub.2 ;
- the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an angle of emergence u.sub.2 ';
- the paraxial marginal ray from the axial object point on said object surface emerges from said third group of lenses at an angle of emergence u.sub.3 ';
- .vertline.u.sub.2 /u.sub.1 .vertline..ltoreq.0.5; and
- .vertline.u.sub.2 '/u.sub.3 '.vertline..ltoreq.0.5.
- 12. The projection optical system of claim 11, wherein:
- said second group of lenses has a focal length f.sub.2 ;
- said third group of lenses has a focal length f.sub.3 ;
- .vertline.f.sub.2 .vertline.>f.sub.1 ; and
- .vertline.f.sub.2 .vertline.>f.sub.3.
- 13. The projection optical system of claim 3, wherein said second group of lenses comprises, in light path order from said object surface:
- a first subgroup of lenses with negative refractive power;
- a second subgroup of lenses with positive refractive power;
- a third subgroup of lenses with negative refractive power; and
- a fourth subgroup of lenses with positive refractive power.
- 14. The projection optical system of claim 13, wherein:
- said first group of lenses comprises at least two positive lenses, and
- said third group of lenses comprises at least two positive lenses;
- said first subgroup of lenses comprises at least two negative lenses;
- said second subgroup of lenses comprises at least four positive lenses;
- said third subgroup of lenses comprises at least two negative lenses; and
- said fourth subgroup of lenses comprises at least two positive lenses.
- 15. The projection optical system of claim 14, wherein:
- said first subgroup of lenses has a focal length f.sub.21 ;
- said second subgroup of lenses has a focal length f.sub.22 ; and
- 1. 5.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline.5.
- 16. The projection optical system of claim 15, wherein:
- said third subgroup of lenses has a focal length f.sub.23 ; and
- 0.02.ltoreq..vertline.f.sub.23 /L.vertline..ltoreq.0.10.
- 17. The projection optical system of claim 16, wherein:
- 1.7.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline..ltoreq.5.
- 18. The projection optical system of claim 1, wherein said second group of lenses comprises, in light path order from said object surface:
- a first subgroup of lenses with negative refractive power;
- a second subgroup of lenses with positive refractive power; and
- a third subgroup of lenses with negative refractive power.
- 19. The projection optical system of claim 18, wherein said first subgroup of lenses comprises:
- a negative lens with its stronger curvature facing the image surface side;
- a negative biconcave negative lens; and
- a negative lens with its stronger curvature facing the object surface side.
- 20. The projection optical system of claim 19, wherein said second subgroup of lenses comprises:
- a positive lens with its stronger curvature facing the object surface side;
- at least two positive biconvex lenses; and
- a positive lens with its stronger curvature facing the image surface side.
- 21. The projection optical system of claim 20, wherein said third subgroup of lenses comprises:
- a negative lens with its stronger curvature facing the image surface side;
- a biconcave lens; and
- a negative lens with its stronger curvature facing the object surface side.
- 22. The projection optical system of claim 21, wherein:
- said second group of lenses further comprises, on the image surface side of said third subgroup of lenses, a fourth subgroup of lenses with positive refractive power; and
- said fourth subgroup of lenses comprises at least two positive lenses with convex surfaces facing the image surface side.
- 23. The projection optical system of claim 22, wherein said first group of lenses comprises:
- a positive lens with its stronger curvature facing the image surface side; and
- a positive biconvex lens.
- 24. The projection optical system of claim 23, wherein:
- said third group of lenses comprises at least three positive lenses with convex surfaces facing the object surface side.
- 25. The projection optical system of claim 1, wherein said second group of lenses has weak positive refractive power.
- 26. A projection exposure apparatus comprising:
- an illumination system that illuminates a first object having an object surface on which a pattern is formed;
- a projection optical system which projects an image of said pattern onto an image surface on a second object;
- a first supporting unit that supports said first object;
- a second supporting unit that supports said second object; and
- said projection optical system comprising, in light path order from said object surface:
- a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses;
- a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface,
- a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses
- a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, and
- a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses; and
- a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses;
- wherein:
- said projection optical system has a focal length F,
- said projection optical system has a projection magnification B,
- said object surface and said image surface are separated by a distance L,
- a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d.sub.0,
- a paraxial marginal ray from an axial object point on said object surface enters said second group of lenses at an entrance height h.sub.1 from an optical axis,
- the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an emergence height h.sub.2 from the optical axis,
- 1.8.ltoreq..vertline.F/(B.multidot.L).vertline.,
- d.sub.0 /L.ltoreq.0.2, and
- 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.
- 27. The projection exposure apparatus of claim 26, wherein said second group of lenses comprises, in light path order from said object surface:
- a first subgroup of lenses with negative refractive power;
- a second subgroup of lenses with positive refractive power; and
- a third subgroup of lenses with negative refractive power.
- 28. The projection exposure apparatus of claim 27, wherein said first subgroup of lenses comprises:
- a negative lens with its stronger curvature facing the image surface side;
- a negative biconcave lens; and
- a negative lens with its stronger curvature facing the object surface side.
- 29. The projection exposure apparatus of claim 27, wherein the second subgroup of lenses comprises:
- a positive lens with its stronger curvature facing the object surface side;
- at least two positive biconvex lenses; and
- a positive lens with its stronger curvature facing the image surface side.
- 30. The projection exposure apparatus of claim 27, wherein said third subgroup of lenses comprises:
- a negative lens with its stronger curvature facing the image surface side;
- a negative biconcave lens; and
- a negative lens with its stronger curvature facing the object surface side.
- 31. The projection exposure apparatus of claim 27, wherein:
- said second group of lenses further comprises, on the image surface side of said third subgroup of lenses, a fourth subgroup of lenses with positive refractive power; and
- said fourth subgroup of lenses comprises at least two positive lenses with convex surfaces facing the image surface side.
- 32. A projection exposure apparatus comprising:
- an illumination system that illuminates a first object having an object surface on which a pattern is formed;
- a projection optical system which projects an image of said pattern onto an image surface on a second object;
- a first supporting unit that supports said first object;
- a second supporting unit that supports said second object; and
- said projection optical system comprising, in light path order from said object surface:
- a first group with positive refractive power;
- a second group forming an approximately afocal system; and
- a third group with positive refractive power;
- wherein:
- said projection optical system has a focal length F,
- said projection optical system has a projection magnification B,
- said object surface and said image surface are separated by a distance L,
- a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d.sub.0,
- a paraxial marginal ray from an axial object point on said object surface enters said second group at an entrance height h.sub.1 from an optical axis,
- the paraxial marginal ray from the axial object point on said object surface emerges from said second group at an emergence height h.sub.2 from the optical axis,
- 1. 8.ltoreq..vertline.F/(B.multidot.L).vertline..ltoreq.6,
- d.sub.0 /L.ltoreq.0.2, and
- 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.
- 33. The projection exposure apparatus of claim 32, wherein said second group comprises, in light path order from said object surface:
- a first subgroup with negative refractive power;
- a second subgroup with positive refractive power; and
- a third subgroup with negative refractive power.
- 34. The projection exposure apparatus of claim 23, wherein:
- said first group comprises at least two positive lenses;
- said third group comprises at least two positive lenses;
- said second group comprises, in light path order from said object surface, a first subgroup with negative refractive power, a second subgroup with positive refractive power, and a third subgroup with negative refractive power;
- said first subgroup comprises at least two negative lenses;
- said second subgroup comprises at least four positive lenses; and
- said third subgroup comprises at least two negative lenses.
- 35. The projection exposure apparatus of claim 34, wherein said second group further comprises, on the image surface side of said third subgroup, a fourth subgroup having positive refractive power.
- 36. The projection exposure apparatus of claim 35, wherein said fourth subgroup further comprises at least two positive lenses.
- 37. A method for manufacturing integrated circuits, comprising the steps of:
- illuminating, with ultraviolet light, a mask having an object surface formed with a predetermined pattern:
- projecting a reduced image of the pattern on the mask onto an image surface on a substrate through a projection optical system, thereby performing an exposure process;
- wherein said projection optical system comprises, in light path order from said object surface:
- a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses;
- a second group of lenses forming an approximately afocal system; and
- a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses;
- wherein said second group of lenses comprises, in light path order from said object surface:
- a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses;
- a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses; and
- a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses;
- wherein:
- said projection optical system has a focal length F,
- said projection optical system has a projection magnification B,
- said object surface and said image surface are separated by a distance L,
- a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by distance d.sub.0,
- a paraxial marginal ray from an axial object point on said object surface enters said second group of lenses at an entrance height h.sub.1, from an optical axis,
- the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an emergence height h.sub.2 from the optical axis,
- 1.8.ltoreq..vertline.F/(B.multidot.L).vertline..ltoreq.6,
- d.sub.0 /L.ltoreq.0.2, and
- 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.
- 38. The method of claim 37, wherein said second subgroup of lenses further comprises, on the image surface side of said third subgroup of lenses, a fourth subgroup having positive refractive power.
- 39. The method of claim 38, wherein said fourth subgroup comprises at least two positive lenses.
- 40. The method of claim 39, wherein:
- said first group of lenses has a focal length f.sub.1 ; and
- 0.05.ltoreq.f.sub.1 /L.ltoreq.0.3.
- 41. The method of claim 40, wherein:
- a maximum height of an object from the optical axis of said projection optical system on said object surface is represented by H.sub.MAX ; and
- 0.04.ltoreq.H.sub.MAX /L..ltoreq.0.2.
- 42. The method of claim 41, wherein:
- said first subgroup of lenses has a focal length f.sub.21 ;
- said second subgroup of lenses has a focal length f.sub.22 ; and
- 1.5.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline..ltoreq.5.
- 43. The method of claim 42, wherein:
- said third subgroup of lenses has a focal length f.sub.23 ; and
- 0.02.ltoreq..vertline.f.sub.23 /L.vertline..ltoreq.0.10.
- 44. The method of, claim 41, wherein:
- said first subgroup of lenses has a focal length f.sub.21 ;
- said second subgroup of lenses has a focal length f.sub.22 ; and
- 1.7.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline..ltoreq.5.
- 45. A projection exposure method, comprising the step of:
- illuminating, with ultraviolet light, a mask having an object surface formed a predetermined pattern;
- projecting a reduced image of the pattern on the mask onto an image surface on a substrate through a projection optical system, thereby performing an exposure process:
- wherein said projection optical system comprises, in light path order from said object surface:
- a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses;
- a second group of lenses forming an approximately afocal system; and
- a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses;
- wherein said second group of lenses comprises, in light path order from said object surface:
- a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses;
- a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses; and
- a third subgroup of lenses with negative refractive power, said third subgroup of lenses at least two negative lenses;
- wherein:
- said projection optical system has a focal length F,
- said projection optical system has a projection magnification B,
- said object surface and said image surface are separated by a distance L,
- a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d.sub.0,
- a paraxial marginal ray from an axial object point on said object surface enters said second group of lenses at an entrance height h.sub.1 from an optical axis,
- the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an emergence height h.sub.2 from the optical axis,
- 1.8.ltoreq..vertline.F/(B.multidot.L).vertline.,
- d.sub.0 /L.ltoreq.0.2, and
- 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.
- 46. The projection exposure method of claim 45, wherein said second subgroup of lenses further comprises, on the image surface side of said third subgroup of lenses, a fourth subgroup having positive refractive power.
- 47. The projection exposure method of claim 46, wherein said fourth subgroup comprises at least two positive lenses.
- 48. The projection exposure method of claim 47, wherein:
- said first group of lenses has a focal length f.sub.1 ; and
- 0.05.ltoreq.f.sub.1 /L.ltoreq.0.3.
- 49. The projection exposure method of claim 48, wherein:
- a maximum height of an object from the optical axis of said projection optical system on said object surface is represented by H.sub.MAX ; and
- 0.04.ltoreq.H.sub.MAX /L.ltoreq.0.02.
- 50. The projection exposure method of claim 49, wherein:
- said first subgroup of lenses has a focal length f.sub.21 ;
- said second subgroup of lenses has a focal length f.sub.22 ; and
- 1.5.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline..ltoreq.5.
- 51. The projection exposure method of claim 50, wherein:
- said third subgroup of lenses has a focal length f.sub.23 ; and
- 0.02.ltoreq..vertline.f.sub.23 /L.vertline..ltoreq.0.10.
- 52. The projection exposure method of claim 49, wherein:
- said first subgroup of lenses has a focal length f.sub.21 ;
- said second subgroup of lenses has a focal length f.sub.22 ; and
- 1.7.ltoreq..vertline.f.sub.22 /f.sub.21 .vertline..ltoreq.5.
- 53. A projection optical system that projects an image of an object in an object surface onto an image surface with a reduction magnification comprising, in light path order from said object surface:
- a first group of lenses with positive refractive power;
- a second group of lenses forming an approximately afocal system; and
- a third group of lenses with positive refractive power;
- wherein:
- said projection optical system has a focal length F,
- said projection optical system has a projection magnification B,
- said object surface and said image surface are separated by a distance L,
- a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d.sub.0 ;
- a paraxial marginal ray from an axial object point on said object surface enters said second group of lenses at an entrance height h.sub.1, from an optical axis,
- the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an emergence height h.sub.2 from the optical axis,
- 1.8.ltoreq..vertline.F/(B.multidot.L).vertline.,
- d.sub.0 /L.ltoreq.0.2, and
- 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.
- 54. An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 53 the method comprising the steps of:
- illuminating the mask in said object surface with light of a predetermined exposure wavelength; and
- projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.
- 55. The exposure method of claim 54 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.
Parent Case Info
This is a continuation of Ser. No. 08/777,862, filed Dec. 31, 1996, which is a continuation of Ser. No. 08/642,221, filed Apr. 30, 1996, which is a continuation of Ser. No. 08/152,164, filed Nov. 15, 1993, all now abandoned.
US Referenced Citations (15)
Foreign Referenced Citations (9)
Number |
Date |
Country |
47-35017 |
Sep 1972 |
JPX |
55-12902 |
Jan 1980 |
JPX |
58-78115A |
May 1983 |
JPX |
63-118115 |
May 1988 |
JPX |
63-121810 |
May 1988 |
JPX |
1-19317A |
Jan 1989 |
JPX |
4-42208A |
Feb 1992 |
JPX |
4-157412 |
May 1992 |
JPX |
5-173065 |
Jul 1993 |
JPX |
Non-Patent Literature Citations (1)
Entry |
Braat, Joseph "Optical microlithographic technology for integrated circuit fabrication and inspection," SPIE, pp. 22-30 (SPIE, vol. 811, 2-3 Apr. 1987, The Hague, Netherlands). |
Continuations (3)
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Number |
Date |
Country |
Parent |
777862 |
Dec 1996 |
|
Parent |
642221 |
Apr 1996 |
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Parent |
152164 |
Nov 1993 |
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