Size or form of projection system aperture

Industry

CPC
G03F7/7025

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7025Size or form of projection system aperture

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatuses for aligning and diagnosing a laser beam
- Patent number 12,204,161
- Issue date Jan 21, 2025
- Cymer, LLC
- Donald Harrison Barnhart
- G01 - MEASURING TESTING
Information Patent Grant
Actuator device and method for aligning an optical element, optical...
- Patent number 12,164,234
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Boaz Pnini-Mittler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Drive device, optical system and lithography apparatus
- Patent number 12,153,353
- Issue date Nov 26, 2024
- Carl Zeiss SMT GmbH
- Oliver Herbst
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of tuning a model for a lithographic process and associated...
- Patent number 12,147,161
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Mhamed Akhssay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 12,105,428
- Issue date Oct 1, 2024
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuator unit for positioning an optical element
- Patent number 12,099,307
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Sjoerd Martijn Huiberts
- G02 - OPTICS
Information Patent Grant
Controlling light source wavelengths for selectable phase shifts be...
- Patent number 11,899,198
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G02 - OPTICS
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,886,123
- Issue date Jan 30, 2024
- Franklin Mark Schellenberg
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for measuring a substrate for semiconductor lithography
- Patent number 11,880,145
- Issue date Jan 23, 2024
- Carl Zeiss SMT GmbH
- Sven Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multifunctional lithography device
- Patent number 11,868,055
- Issue date Jan 9, 2024
- The Institute of Optics and Electronics, the Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography having...
- Patent number 11,754,934
- Issue date Sep 12, 2023
- Carl Zeiss SMT GmbH
- Peter Nieland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method for manufacturing s...
- Patent number 11,747,737
- Issue date Sep 5, 2023
- Canon Kabushiki Kaisha
- Kazuhiro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-field control of a lithographic process and associated apparatus
- Patent number 11,662,666
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Rowin Meijerink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure apparatus, article manufacturing method,...
- Patent number 11,640,119
- Issue date May 2, 2023
- Canon Kabushiki Kaisha
- Tetsuya Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 11,614,689
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing effects of lens heating and/or cooling in a lith...
- Patent number 11,573,496
- Issue date Feb 7, 2023
- ASML Netherlands B.V.
- Nick Kant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining subset of components of an optical characteristic of pa...
- Patent number 11,561,478
- Issue date Jan 24, 2023
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system and lithographic apparatus comprising said projec...
- Patent number 11,550,227
- Issue date Jan 10, 2023
- ASML Netherlands B.V.
- Marinus Engelbertus Cornelis Mutsaers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,543,755
- Issue date Jan 3, 2023
- Canon Kabushiki Kaisha
- Takehiro Toyoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element driving mechanism
- Patent number 11,520,244
- Issue date Dec 6, 2022
- TDK TAIWAN CORP.
- Fu-Yuan Wu
- G11 - INFORMATION STORAGE
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,493,851
- Issue date Nov 8, 2022
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 11,467,501
- Issue date Oct 11, 2022
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Method for adusting a first element of a lithography apparatus towa...
- Patent number 11,460,780
- Issue date Oct 4, 2022
- Carl Zeiss SMT GmbH
- Boaz Pnini
- G02 - OPTICS
Information Patent Grant
Dynamic illumination method based on scan exposure machine
- Patent number 11,422,474
- Issue date Aug 23, 2022
- Shanghai Huali Integrated Circuit Corporation
- Yuyang Bian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensation of creep effects in an imaging device
- Patent number 11,415,895
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Marwène Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support of an optical element
- Patent number 11,366,393
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Eugen Anselm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for configuring spatial dimensions of a beam d...
- Patent number 11,366,396
- Issue date Jun 21, 2022
- ASML Netherlands B.V.
- Daan Maurits Slotboom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment apparatus, alignment method, lithography apparatus, and m...
- Patent number 11,360,401
- Issue date Jun 14, 2022
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuator device for aligning an element, projection exposure appara...
- Patent number 11,320,749
- Issue date May 3, 2022
- Carl Zeiss SMT GmbH
- Boaz Pnini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS
- Publication number 20250021010
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Eduard Schweigert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20250013156
- Publication date Jan 9, 2025
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...
- Publication number 20240419085
- Publication date Dec 19, 2024
- KIOXIA Corporation
- Yoshio MIZUTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT
- Publication number 20240402611
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Sjoerd Martijn HUIBERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...
- Publication number 20240393700
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- JUN KITAGAWA
- G05 - CONTROLLING REGULATING
Information Patent Application
OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...
- Publication number 20240345488
- Publication date Oct 17, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329545
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE
- Publication number 20240319614
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...
- Publication number 20240288678
- Publication date Aug 29, 2024
- FUJIFILM CORPORATION
- Hirotoshi ANDO
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD
- Publication number 20240288784
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Martin Martin von Hodenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...
- Publication number 20240272058
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Michal Emanuel PAWLOWSKI
- G01 - MEASURING TESTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...
- Publication number 20240255855
- Publication date Aug 1, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20240248407
- Publication date Jul 25, 2024
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...
- Publication number 20240184220
- Publication date Jun 6, 2024
- Gigaphoton Inc.
- Yuichi NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...
- Publication number 20240184097
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUPPORT FOR AN OPTICAL ELEMENT
- Publication number 20240159988
- Publication date May 16, 2024
- Carl Zeiss SMT GMBH
- Rodolfo Guglielmi Rabe
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND MEASUREMENT SYSTEM
- Publication number 20240142877
- Publication date May 2, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND DEVICE MANUFACTURING METHOD
- Publication number 20240126178
- Publication date Apr 18, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240027920
- Publication date Jan 25, 2024
- Gigaphoton Inc.
- Yusuke HOSHINO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...
- Publication number 20230408807
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SWAPPING TOOL
- Publication number 20230400772
- Publication date Dec 14, 2023
- Carl Zeiss SMT GMBH
- Eugen Doetzel
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD
- Publication number 20230359126
- Publication date Nov 9, 2023
- V TECHNOLOGY CO., LTD.
- Yoshiyuki ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR POSITIONING AND HOLDING AT LEAST ONE OPTICAL ELEMENT, ME...
- Publication number 20230350311
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Thomas GROEZINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILTER ASSEMBLY, IN PARTICULAR FOR A CONTROL LOOP FOR CONTROLLING T...
- Publication number 20230324649
- Publication date Oct 12, 2023
- Carl Zeiss SMT GMBH
- Thomas Gorius
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS
- Publication number 20230288817
- Publication date Sep 14, 2023
- ASML NETHERLANDS B.V.
- Rowin MEIJERINK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SWITCHES AN...
- Publication number 20230213868
- Publication date Jul 6, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT
- Publication number 20230168587
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Sjoerd Martijn HUIBERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Size or form of projection system aperture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and apparatuses for aligning and diagnosing a laser beam

Actuator device and method for aligning an optical element, optical...

Drive device, optical system and lithography apparatus

Methods of tuning a model for a lithographic process and associated...

Image-forming optical system, exposure apparatus, and device produc...

Optical system with an aperture stop

Actuator unit for positioning an optical element

Controlling light source wavelengths for selectable phase shifts be...

Method and system for nanoscale data recording

Method for measuring a substrate for semiconductor lithography

Multifunctional lithography device

Projection exposure apparatus for semiconductor lithography having...

Exposure apparatus, exposure method, and method for manufacturing s...

Sub-field control of a lithographic process and associated apparatus

Exposure method, exposure apparatus, article manufacturing method,...

Fluid handling structure and lithographic apparatus

Method of reducing effects of lens heating and/or cooling in a lith...

Determining subset of components of an optical characteristic of pa...

Projection system and lithographic apparatus comprising said projec...

Method of manufacturing semiconductor device

Optical element driving mechanism

Lithographic method and lithographic apparatus

Image-forming optical system, exposure apparatus, and device produc...

Method for adusting a first element of a lithography apparatus towa...

Dynamic illumination method based on scan exposure machine

Compensation of creep effects in an imaging device

Support of an optical element

Method and apparatus for configuring spatial dimensions of a beam d...

Alignment apparatus, alignment method, lithography apparatus, and m...

Actuator device for aligning an element, projection exposure appara...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...

HIGH RESOLUTION PHOTOLITHOGRAPHY

ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT

INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...

OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...

EXPOSURE APPARATUS

METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE

EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...

OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD

INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...

PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...

METHOD FOR DETERMINING A POSITION OF A MIRROR

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...

CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...

SUPPORT FOR AN OPTICAL ELEMENT

EXPOSURE APPARATUS AND MEASUREMENT SYSTEM

EXPOSURE APPARATUS, CONTROL METHOD, AND DEVICE MANUFACTURING METHOD

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...

METHOD AND SWAPPING TOOL

PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD

DEVICE FOR POSITIONING AND HOLDING AT LEAST ONE OPTICAL ELEMENT, ME...

FILTER ASSEMBLY, IN PARTICULAR FOR A CONTROL LOOP FOR CONTROLLING T...

SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SWITCHES AN...

ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT