Claims
- 1. Cutting tool comprising a body of sintered cemented carbide or cermet, ceramic or high speed steel substrate and on which at least on the functioning parts of the surface of the body, a 0.5 to 20 μm, preferably 1 to 15 μm, thick, adherent, hard and wear resistant coating is applied, and said coating is characterized in comprising a structure of one or more refractory compounds layer, of which at least one layer with a thickness of 0.5 to 15 μm, preferably 1-10 μm, essentially consists of very fine-grained, crystalline γ-Al2O3 phase, said very fine-grained crystalline γ-Al2O3 layer exhibiting significant X-ray diffraction reflexes from at least one of the (440) and (400) crystal planes, having a hardness of at least 20 GPa, a compressive stress of at least 1 GPa and being free from any halogen impurities.
- 2. Cutting tool according to claim 1 characterized in that the Al2O3 layer has a preferred growth orientation in the [440]-direction with a texture coefficient ≧1.5 defined as below:
- 3. Cutting tool according to any of the previous claims characterized in that the fine-grained crystalline γ-Al2O3 layer contains portions (detectable by XRD technique) of additional alumina phases from the γ-series of the Al2O3 polymorphs.
- 4. Cutting tool according to claim 3 characterized in that the additional alumina phase is the θ-phase.
- 5. Cutting tool according to any of the previous claims characterized in having at least one layer of thickness 0.1-10 μm, preferably 0.5-5 μm, comprising of metal nitrides and/or carbides with the metal elements selected from Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al.
- 6. Cutting tool according to claim 5 characterized in that said layer consists of TiC, TiCN, TiN or TiAlN.
- 7. Cutting tool according to any of the previous claims characterized in that the outer layer is Al2O3.
- 8. Cutting tool according to any of the claims 1-6 characterized in that the outer layer is TiN.
- 9. A process for producing a coated cutting tool, wherein at least one refractory layer consisting of fine-grained, crystalline γ-Al2O3 as per claim 1, is deposited by magnetron sputtering onto the moving substrate in a vacuum, characterized in that the Al2O3 layer is deposited by pulsed magnetron sputtering in an argon-containing gas, that the pulse frequency is set for 10 to 100 kHz, preferably 50 kHz, that deposition occurs with a rate of at least 1 nm/s with reference to a stationarily arranged substrate, that the magnetron target power density in time average is set for at least 10 W/cm2 and that the substrate temperature is set in the range 450 to 700 C.°, preferably in the range 550 to 650 C.°, depending on the material of the tool body being coated.
- 10. A process according to claim 9, characterized in that the Al2O3 layer is deposited by the sputtering of two magnetrons with Al targets that are alternatively switched as a cathode and as a anode of a magnetron sputtering apparatus.
- 11. A process according to at least one of the claims 9 and 10 characterized in that additional, non-Al2O3 layers are also deposited by a PVD process (Physical Vapor Depostion), particularly by pulsed magnetron sputtering.
- 12. A process according to claim 11, characterized in that all layers, Al2O3 and non-Al2O3 layer(s), are deposited in the same coating apparatus without vacuum interuption.
- 13. A process of at least one of the claims 9 and 10, characterized in that additional, non-Al2O3 layers are applied by a CVD process (Chemical Vapor Deposition).
Priority Claims (1)
Number |
Date |
Country |
Kind |
9704066-1 |
Nov 1997 |
SE |
|
Parent Case Info
[0001] This application is a continuation of application Ser. No. 09/782,226, filed on Feb. 14, 2001, which is a continuation of application Ser. No. 09/187,006, filed on Nov. 6, 1998, now U.S. Pat. No. 6,210,726.
Continuations (2)
|
Number |
Date |
Country |
Parent |
09782226 |
Feb 2001 |
US |
Child |
10151821 |
May 2002 |
US |
Parent |
09187006 |
Nov 1998 |
US |
Child |
09782226 |
Feb 2001 |
US |