International Preliminary Examination Report for PCT/SE98/02009, dated Feb. 7, 2000. |
John A. Thornton et al., “Structure and Heat Treatment Characteristics of Sputter-Deposited Alumina”, Ceramic Bulletin, vol. 56, No. 5, pp. 504-512, 1977 (No month). |
R.F. Bunshah et al., “Alumina Deposition By Activated Reactive Evaporation”, International Conference on Metallurgical Coatings, Apr. 8, 1976, pp. 211-216. |
O. Zywitzki et al., “Correlation between structure and properties of reactively deposited Al3O3 coatings by pulsed magnetron sputtering”, Surface & Coatings Technology, 94-95, 1997 pp. 303-308 (No month). |
F. Fietzke et al., “Pulsed Magnetron of Alumina Films: Crystalline Phases at Low Temperatures”, No. 279 Jan.-Feb.-Mar. 1996, pp. 218-220. |
O. Zywitzki et al., “Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputtering”, Surface & Coatings Technology, 86-87, pp. 640-647, 1996 (No month). |
O. Zywitzki et al., “Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering”, Surface and Coatings Technology 82 (1996) pp. 169-175 (No month). |
“Novel hybrid solar cells consisting of inorganic nanoparticles and an organic hole transport material,” Jürgen Hagen et al.; Elsevier; May 29,1997. |
“The deposition of hard crystalline Al2O3 layers by means of bipolar pulsed magnetron sputtering,” F. Fietzke et al.; Elsevier; 1996. (No month). |