Claims
- 1. In a radiation curable composition comprising a radiation curable resin liquid selected from the group consisting of unsaturated polyester resins, urethane acrylate resins, epoxy acrylate resins, polyester acrylate resins, spirane acrylate resins, and mixtures of an ethylenically unsaturated monomer with said resins, and 0.1 to 50% by weight of the total solids content of the composition of cross-linked polymer microparticles prepared by polymerizing (a) a mixture of ethylenically unsaturated monomers containing, as cross-linked agent, a monomer having at least two polymerizable sites per molecule or (b) a mixture of monomer having mutually reactive groups, in an aqueous emulsion containing in the aqueous phase an emulsifier, and then removing water from the resulting emulsion by filtration, spray drying, lyophilization or solvent substitution, the improvement wherein the microparticles have a particle size of from 0.1 to 0.6 microns and are produced by emulsion polymerization employing as emulsifier, a water soluble amphoionic group-containing acrylic, alkyd, or epoxy resin, which resin is retained on the surfaces of the microparticles.
- 2. The radiation curable liquid resin composition according to claim 1, containing a solvent for said matrix resin.
- 3. A radiation curable liquid resin composition according to claim 1, wherein the amount of said microparticles is from 0.2 to 30% by weight based on the total solids content of said composition.
- 4. The radiation curable liquid resin composition according to claim 1, which is curable by UV rays.
- 5. The radiation curable liquid resin composition according to claim 4, containing a photosensitizer.
- 6. The radiation curable liquid resin composition according to claim 1, which is curable by electron beam radiation, X-rays or other ionizing radiation.
- 7. The radiation curable liquid resin composition according to claim 1, further containing a heat-polymerization inhibitor.
- 8. The radiation curable liquid resin according to claim 7, containing a solvent for said matrix resin.
- 9. A resin composition according to claim 5, wherein the photosensitizer is benzoin, benzoin methyl ether, benzoin propyl ether, benzoin butyl ether, benzophenone, diacetyl, benzil, dibutyl disulfide or dibenzyl disulfide.
- 10. A resin composition according to claim 7, wherein the heat-polymerization inhibitor is hydroquinone, t-butylhydro-quinone, p-methoxyphenol, catechol or benzoquinone.
- 11. A resin composition according to claim 1, wherein said matrix resin therein comprises a monomer selected from the group consisting of styrene, vinyltoluene, divinylbenzene, vinyl acetate, (meth)acrylonitrile, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, glycidyl (meth)acrylate, ethyleneglycol di-(meth)acrylate, trimethylolpropane tri-(meth)acrylate, diethyl itaconate, dibutyl itaconate, diethyl fumarate and diethyl maleate.
Priority Claims (1)
Number |
Date |
Country |
Kind |
62-3070 |
Jan 1985 |
JPX |
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CROSS REFERENCE TO RELATED APPLICATION
This is a continuation-in-part of application Ser. No. 084,046, filed Aug. 11, 1987, now abandoned, which is, in turn, a continuation of application Ser. No. 817,654, filed, Jan. 10, 1986, now abandoned.
US Referenced Citations (9)
Non-Patent Literature Citations (1)
Entry |
Polymerization Mechanisms and Processes, pp. 742-744. |
Continuations (1)
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Number |
Date |
Country |
Parent |
817654 |
Jan 1986 |
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Continuation in Parts (1)
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Number |
Date |
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Parent |
84046 |
Aug 1987 |
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