1. Field of the Invention
The present invention relates to a radiation imaging apparatus, a radiation imaging system, and a radiation imaging apparatus manufacturing method.
2. Description of the Related Art
In recent years, radiation imaging apparatuses in which a scintillator (scintillator substrate) for converting radiation such as X-rays into light with a wavelength detectable by a photoelectric conversion element is stacked (arranged) on a sensor panel on which a plurality of photoelectric conversion elements are formed have been commercialized.
Japanese Patent Laid-Open No. 2004-061116 proposes a technique of using, when a scintillator substrate and a sensor panel are adhered, an acrylic resin as a resin (sealant) for sealing their periphery in such radiation imaging apparatus.
If cesium iodide (CsI) having strong hygroscopicity is used as a scintillator, however, the sealant used for the conventional radiation imaging apparatus is not sufficient in terms of the moisture resistance (humidity resistance) of the scintillator.
To solve this problem, high moisture resistance may be obtained by using a resin having a high elastic modulus as a sealant. However, if a resin having a high elastic modulus is used to seal a sensor panel and a substrate such as a scintillator substrate, which have different thermal expansion coefficients, a thermal shock may cause the failure of the sealant. This is because a stress acts on the sealant due to a difference in thermal expansion between the scintillator substrate and the sensor panel.
The present invention provides a radiation imaging apparatus which is advantageous in improving the moisture resistance of a scintillator layer and the strength of a sealing member.
According to one aspect of the present invention, there is provided a radiation imaging apparatus including a sensor substrate on which photoelectric conversion elements are arranged, a scintillator base on which a scintillator layer for converting radiation into light with a wavelength detectable by the photoelectric conversion elements is arranged, and which is adhered to the sensor substrate so that the scintillator layer is arranged between the sensor substrate and the scintillator base, and a sealing member configured to fix an edge portion of the scintillator base and the sensor substrate, and spaced apart from the scintillator layer, wherein the scintillator base includes a bent portion for reducing a stress that acts on the sealing member in a region between an outer edge of a region in which the scintillator layer is arranged and the edge portion fixed by the sealing member.
Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.
Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. Note that the same reference numerals denote the same members throughout the drawings, and a repetitive description thereof will not be given.
The sensor panel 110 will be explained first. The sensor panel 110 includes a sensor base 102, an adhesion layer 111, a sensor substrate 112, a photoelectric conversion portion 113, a sensor protection layer 114, and wiring leads 115.
The sensor substrate 112 is an insulating substrate which is adhered to the sensor base 102 by the adhesion layer 111 and is made of, for example, glass. The photoelectric conversion portion 113 in which photoelectric conversion elements and switching elements (not shown) such as TFTs are two-dimensionally arrayed is arranged in the sensor substrate 112. The wiring leads 115 serve as bonding pad portions used to electrically connect external wiring lines 103 of an external flexible substrate or the like to the sensor substrate 112. The sensor protection layer 114 is arranged to cover the photoelectric conversion portion 113, and has a function of protecting the photoelectric conversion portion 113. The adhesion layer 111 adheres the sensor substrate 112 to the sensor base 102.
The sensor panel 110 may be formed by tiling the sensor substrate 112 as shown in
The sensor protection layer 114 may be made of SiN, TiO2, LiF, Al2O3, MgO, or the like. The sensor protection layer 114 may be made of a polyphenylene sulfide resin, fluororesin, polyether ether ketone resin, liquid crystal polymer, polyether nitrile resin, polysulfone resin, polyether sulfone resin, polyarylate resin, or the like. Alternatively, the sensor protection layer 114 may be made of a polyamide-imide resin, polyether-imide resin, polyimide resin, epoxy resin, silicone resin, or the like. Note that if the radiation imaging apparatus 1 is irradiated with radiation, light converted by the scintillator layer 105 passes through the sensor protection layer 114. Therefore, the sensor protection layer 114 may be made of a material having high transmittance with respect to the wavelength of the light converted by the scintillator layer 105.
The scintillator panel 109 will be described next. The scintillator panel 109 includes a scintillator base 101, a base protection layer 104, a scintillator layer 105, and a scintillator protection layer 106.
The scintillator base 101 is made of a material which has high transmittance with respect to X-rays, readily, plastically deforms, and is easy to process. The scintillator base 101 is made of, for example, at least one of beryllium (Be), magnesium (Mg), aluminum (Al), a composite material such as a clad plate thereof, or an alloy containing aluminum or magnesium as a principal component. The scintillator layer 105 is arranged on the scintillator base 101 via the base protection layer 104. Furthermore, a reflection layer for effectively using the light converted by the scintillator layer 105 may be arranged on the scintillator base 101. Such reflection layer is made of a high reflectance material such as silver (Ag) or aluminum (Al). Note that if the scintillator base 101 is made of aluminum, the scintillator base 101 also functions as a reflection layer and thus no reflection layer needs to be arranged.
The scintillator layer 105 has an area smaller than that of the scintillator base 101. The scintillator layer 105 is made of a columnar crystal scintillator represented by cesium iodide doped with a trace amount of thallium (Tl) (CsI:Tl) or a particulate scintillator represented by gadolinium sulfate doped with a trace amount of terbium (Tb) (GOS:Tb). In this embodiment, the scintillator layer 105 is made of a columnar crystal scintillator containing cesium iodide as a principal component.
The scintillator protection layer 106 is arranged on the scintillator layer 105. The scintillator protection layer 106 has a function of protecting the scintillator layer 105 from moisture degradation (has moisture resistance or humidity resistance). Especially if the scintillator layer 105 is made of a columnar crystal scintillator such as CsI:Tl, the characteristics of the scintillator layer 105 suffers due to moisture degradation and thus the scintillator protection layer 106 is needed. As a material for the scintillator protection layer 106, for example, a general organic material such as a silicone resin, acrylic resin, or epoxy resin, or a hot-melt resin such as a polyester-based resin, polyolefin-based resin, or polyamide-based resin can be used. Note that it may be to use, as a material for the scintillator protection layer 106, a resin having low moisture permeability such as a poly-para-xylylene organic layer formed by CVD or a hot-melt resin represented by a polyolefin-based resin.
The scintillator panel 109 and sensor panel 110 are adhered by the adhesion layer 107 so that the scintillator protection layer 106 and sensor protection layer 114 oppose each other, and are sealed by a sealing member 108. The sealing member 108 is spaced apart from the scintillator layer 105, and fixes the edge portion of the scintillator base 101 and the sensor base 102 (see
The scintillator protection layer 106 provides a moisture-proof protection function of preventing moisture from externally entering the scintillator layer 105 and an impact protection function of preventing damage to the scintillator layer 105 by impact. If the scintillator layer 105 is made of a scintillator having a columnar crystal structure, the scintillator protection layer 106 has a thickness of 10 to 200 μm. If the thickness of the scintillator protection layer 106 is 10 μm or smaller, it may be impossible to completely cover the uneven surface of the scintillator layer 105 or a large convex portion generated by abnormal growth in deposition, thereby lowering the moisture-proof protection function. On the other hand, if the thickness of the scintillator protection layer 106 is larger than 200 μm, the scattering of light converted by the scintillator layer 105 or reflected by the reflection layer increases in the scintillator protection layer 106. Therefore, the MTF (Modulation Transfer Function) and resolution of an image obtained in the radiation imaging apparatus 1 may decrease.
In this embodiment, a bent portion 140 is formed in the scintillator base 101 to reduce a stress that acts on the sealing member 108 due to a difference in thermal expansion between the scintillator panel 109 and the sensor panel 110. More specifically, the scintillator base 101 includes the bent portion 140 in a region between an outer edge 101a of a region where the scintillator layer 105 is arranged and an edge portion 101b fixed by the sealing member 108, as shown in
A condition to be satisfied by the bent portion 140 will now be described. Let l1 be the distance, along the surface of the scintillator base 101, between the edge portion 101b and the outer edge 101a of the region of the scintillator base 101 where the scintillator layer 105 is arranged, and l2 be the linear distance between the edge portion 101b and the outer edge 101a of the region of the scintillator base 101 where the scintillator layer 105 is arranged. In order for the bent portion 140 to effectively reduce a stress that acts on the sealing member 108, l1 need only be larger than l2 as much as possible, and the length of the bent portion 140 need only be larger than a difference between a contraction amount due to the heat of the scintillator panel 109 and that due to the heat of the sensor panel 110. The bent portion 140, therefore, need only satisfy
l
1
−l
2≧(α−β)×L×(t1−t2) (1)
where L represents the longest distance from a center O of the scintillator base 101 to its edge portion, α represents the thermal expansion coefficient of the scintillator base 101, β represents the thermal expansion coefficient of the sensor substrate 112, t1 represents the curing temperature of the sealing member 108, and t2 represents the lowest temperature in an environment in which the radiation imaging apparatus 1 is used.
The bent portion 140 may have various shapes. For example, the bent portion 140 has a zigzag shape (bellows shape) in a cross section perpendicular to the surface of the scintillator base 101, as shown in
As a method of forming a zigzag shape as the bent portion 140 in the scintillator base 101, it is preferable to press the scintillator base 101 using a die on which an uneven surface corresponding to the zigzag shape of the bent portion 140 is formed. It is possible to perform a process of forming the bent portion 140 in the scintillator base 101 by a press using the die before or after forming the base protection layer 104, after forming the scintillator protection layer 106, or after forming the adhesion layer 107. Note that it is preferable to perform the process of forming the bent portion 140 in the scintillator base 101 after forming the base protection layer 104.
The bent portion 140 may include a concave portion 141 concave toward the sensor substrate in a cross section perpendicular to the surface of the scintillator base 101, as shown in
As a method of forming the concave portion 141 in the scintillator base 101, as described above, it is preferable to press the scintillator base 101 using a die on which an uneven surface corresponding to the concave portion 141 is formed. Alternatively, the concave portion 141 may be formed by laser processing or cutting. As described above, it is preferable to perform the process of forming the concave portion 141 in the scintillator base 101 after forming the base protection layer 104.
Furthermore, as shown in
As a method of forming a curved surface shape as the bent portion 140 in the scintillator base 101, as described above, it is preferable to press the scintillator base 101 using a die on which an uneven surface corresponding to the curved surface shape of the bent portion 140 is formed. As described above, it is preferable to perform the process of forming the bent portion 140 having a curved surface shape in the scintillator base 101 after forming the base protection layer 104.
If the bent portion 140 has a curved surface shape, it is possible to form, in the bent portion 140, a supporting portion 142 for supporting the external wiring line 103 of the flexible substrate, as shown in
Furthermore, as shown in
As a method of forming the convex portion 143 in the scintillator base 101, as described above, it is preferable to press the scintillator base 101 using a die on which an uneven surface corresponding to the convex portion 143 is formed. It is also possible to form the convex portion 143 by welding, to the scintillator base 101, a frame body made of the same material as that of the scintillator base 101.
The supporting portion 142 for supporting the external wiring line 103 of the flexible substrate can be formed in the convex portion 143 of the bent portion 140, as shown in
The practical characteristics of the radiation imaging apparatus 1 according to the present invention will be described below by comparing with radiation imaging apparatuses according to Comparative Examples 1 and 2.
A method of manufacturing the radiation imaging apparatus 1000 according to Comparative Example 1 or 2 will be described with reference to
Next, as shown in
As shown in
With the processes shown in
As shown in
Next, as shown in
A humidity tolerance test was performed for the thus manufactured radiation imaging apparatus 1000. More specifically, after the radiation imaging apparatus 1000 was left to stand for 240 hours in an environment of a temperature of 55° C. and a humidity of 95%, the MTF (Modulation Transfer Function) of the radiation imaging apparatus 1000 was measured, thereby evaluating the MTF before and after the humidity tolerance test.
An MTF evaluation method was as follows. First, the radiation imaging apparatus 1000 was set on an evaluation apparatus, and an Al filter having a thickness of 20 mm for soft X-ray removal was set between an X-ray source and the apparatus. The distance between the radiation imaging apparatus 1000 and the X-ray source was adjusted to 130 cm, and the radiation imaging apparatus 1000 was connected to an electric driving system. In this state, an MTF chart was mounted on the radiation imaging apparatus 1000 at a tilt angle of about 2° to 3°, and 50-ms X-ray pulses were applied to the apparatus six times under the condition of a tube voltage of 80 kV and a tube current of 250 mA. The MTF chart was then removed, and X-ray pulses were applied to the apparatus six times under the same condition.
In the radiation imaging apparatus 1000, the humidity tolerance test in the environment of a temperature of 55° C. and a humidity of 95% decreased the MTF of the edge portion of the scintillator layer 105 by 30% as compared with that before the humidity tolerance test.
A temperature cycle test was performed for the radiation imaging apparatus 1000. The temperature cycle test was as follows. The radiation imaging apparatus 1000 was set on the evaluation apparatus. Processing in which the radiation imaging apparatus 1000 was left to stand for four hours in an environment of a temperature of 50° C. and a humidity of 60%, and was then left to stand for four hours in an environment of a temperature of −30° C. and a humidity of 0% was repeated five times. The sealing member 108 was visually evaluated for damage (crack or flaking off) due to a difference in thermal expansion between the scintillator panel 109 and the sensor panel 110. In the radiation imaging apparatus 1000, the sealing member 108 had not been damaged.
Similarly to the radiation imaging apparatus 1000, the radiation imaging apparatus was manufactured by adhering a scintillator panel 109 and a sensor panel 110, and forming a sealing member 108 by an epoxy-based resin, and the above-described humidity tolerance test and temperature cycle test were performed. In the humidity tolerance test, for the radiation imaging apparatus, in an environment of a temperature of 55° C. and a humidity of 95%, a decrease in MTF of the edge portion of a scintillator layer 105 was 5% or lower but the sealing member 108 was damaged in the temperature cycle test.
A method of manufacturing a radiation imaging apparatus 1 according to this embodiment will be described with reference to
First, as shown in
Next, as shown in
With the processes shown in
As shown in
Furthermore, as shown in
Moreover, as shown in
The above-described humidity tolerance test was performed for the thus manufactured radiation imaging apparatus 1. In the humidity tolerance test, for the radiation imaging apparatus 1, in an environment of a temperature of 55° C. and a humidity of 95%, a decrease in MTF of the edge portion of the scintillator layer 105 was 5% or lower and the sealing member 108 was not damaged in the temperature cycle test.
A radiation imaging apparatus 1 (see
A radiation imaging apparatus 1 (see
A radiation imaging apparatus 1 (see
As described above, according to this embodiment, it is possible to realize the radiation imaging apparatus 1 in which the moisture resistance of the scintillator layer 105 and the strength of the sealing member 108 are high.
<Application>
The radiation imaging apparatus according to each of the above-described embodiments is applicable to a radiation imaging system. The radiation imaging system includes, for example, the radiation imaging apparatus (radiation detection apparatus), a signal processing unit including an image processor, a display unit including a display, and a radiation source for generating radiation. For example, as shown in
While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.
This application claims the benefit of Japanese Patent Application No. 2012-220716 filed on Oct. 2, 2012, which is hereby incorporated by reference herein in its entirety.
Number | Date | Country | Kind |
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2012-220716 | Oct 2012 | JP | national |