Claims
- 1. A radiation sensitive composition comprising
- (i) a quaternary ammonium salt of the type which will accept at least one electron on exposure to radiation to form a substance capable of causing metal to be deposited onto said substance from an electroless plating solution in contact with said substance and comprising a salt of said metal and a reducing agent, said quaternary ammonium salt having the general formula ##STR5## wherein R.sup.1 to R.sup.10 are hydrogen or halogen atoms or organic substituents; R.sup.11 and R.sup.12, if present, are each halogen atoms or organic substituents or together represent a divalent organic substituent; Z is zero or an integer; X.sup.- is an anion; m=1 or 2; and at least one of the nitrogen atoms is quaternary; provided that R.sup.11 and R.sup.12 are not each --CH.sub.3 groups or are not together a --CH.sub.2 CH.sub.2 -- group when each of R.sup.1 to R.sup.10 is a hydrogen atom and Z is zero, and
- (ii) a chemical sensitiser for improving the speed of photoreduction of the quaternary ammonium salt, said sensitiser having the general formula ##STR6## wherein R.sup.21 is substituted or unsubstituted aryl group, an arylalkenyl group, or an arylalkyl group; R.sup.22 is a substituted or unsubstituted aryl group, an alkyl group, an arylalkyl group, an arylalkenyl group, a carboxylic acid group, a carboxylic acid salt group, or a hydrogen atom; or R.sup.21 and R.sup.22 together represent a bivalent species; and X represents a carboxylic acid group or a carboxylic acid salt group.
- 2. A composition according to claim 1 wherein the quaternary ammonium salt is N,N'-bis-(paracyano phenyl)-,4,4'-bipyridylium salt.
- 3. A composition according to claim 1 in which the chemical sensitiser is mandelic acid.
- 4. A composition according to claim 1 in which the chemical sensitiser is a mandelic acid derivative.
- 5. A composition according to claim 4 in which the derivative is p-bromo mandelic acid or ammonium mandelate.
- 6. A composition according to claim 4 in which the derivative is p-chloro mandelic acid, p-fluoromandelic acid, m-methoxy mandelic acid, o-methoxy mandelic acid, p-methoxy mandelic acid, m-nitro mandelic acid, sodium mandelate, tetramethyl ammonium p-fluoro mandelate, or hexamethylene tetramine mandelate.
- 7. A composition according to claim 1 in which the chemical sensitiser is benzilic acid.
- 8. A composition according to claim 1 in which the chemical sensitiser is a derivative of benzilic acid.
- 9. A composition according to claim 8 wherein the derivative is 3,4-dimethoxy 2'-chloro benzilic acid or di-p-methoxy benzilic acid.
- 10. A composition according to claim 1 wherein the chemical sensitiser is 3-phenyl lactic acid, atrolactic acid, potassium atrolactate, 9-hydroxy fluorene -9-carboxylic acid, styryl glycollic acid, or 1-naphthyl glycollic acid
- 11. A radiation sensitive composition comprising
- (i) a quaternary ammonium salt of the type which will accept at least one electron on exposure to radiation to form a substance capable of causing metal to be deposited onto said substance from an electroless plating solution in contact with said substance and comprising a salt of said metal and reducing agent, said quaternary ammonium salt having the general formula: ##STR7## wherein R.sup.1 to R.sup.10 are hydrogen or halogen atoms or organic substitutents; R.sup.11 and R.sup.12, if present, are each halogen atoms or organic substituents or together represent a divalent organic substituent; Z is zero or an integer; X.sup.- is an anion; m=1 or 2; and at least one of the nitrogen atoms is quaternary, and
- (ii) a chemical sensitiser having the general formula ##STR8## wherein R.sup.21 is a substituted or unsubstituted aryl group, an arylalkenyl group or an aryl alkyl group; R.sup.22 is a substituted or unsubstituted aryl group, an alkyl group, an aryl alkyl group, an aryl alkenyl group, a carboxylic acid group, a carboxylic acid salt group, or a hydrogen atom provided that R.sup.21 is not a phenyl group when R.sup.22 is a phenyl group; or R.sup.21 and R.sup.22 together represent a bivalent species; and X represents a carboxylic acid group, or a carboxylic acid salt group.
- 12. A composition according to claim 11 in which the chemical sensitiser is mandelic acid.
- 13. A composition according to claim 11 in which the chemical sensitiser is a mandelic acid derivative.
- 14. A composition according to claim 13 in which the derivative is p-bromo mandelic acid or ammonium mandelate.
- 15. A composition according to claim 13 in which the derivative is p-chloro mandelic acid, p-fluoromandelic acid, m-methoxy mandelic acid, o-methoxy mandelic acid, p-methoxy mandelic acid, m-nitro, mandelic acid, sodium mandelate, tetramethyl ammonium p-fluoromandelate or hexamethylene tetramine mandelate.
- 16. A composition according to claim 11 in which the sensitiser is 3,4-dimethoxy 2'-chloro benzilic acid or di-p-methoxy benzilic acid.
- 17. A composition according to claim 11 in which the chemical sensitiser is 3-phenyl lactic acid, atrolactic acid, potassium atrolactate, 9-hydroxy fluorene-9-carboxylic acid, styryl glycollic acid, or 1-naphthyl glycollic acid.
- 18. A composition according to claim 11 in which the quaternary ammonium salt has the general formula: ##STR9## wherein R.sup.1 to R.sup.10 are hydrogen or halogen atoms or organic substituents; R.sup.11 and R.sup.12, if present, are each halogen atoms or organic substituents or together represent a divalent organic substituent; z is zero or an integer; X.sup.- is an anion; m=1 or 2; and at least one of the nitrogen atoms is quaternary.
- 19. A composition according to claim 18 wherein the quaternary ammonium salt is selected from the group consisting of paraquat, diquat, and an N,N'-bis-(paracyanophenyl)-4,4'-bipyridilium salt.
Priority Claims (2)
Number |
Date |
Country |
Kind |
15261/76 |
Jun 1976 |
AUX |
|
4709/76 |
Jun 1976 |
AUX |
|
Parent Case Info
This Application is a continuation-in-part application of our application No. 700,506 filed on the 28th June 1976 and now abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3316093 |
Cerwonka et al. |
Aug 1967 |
|
3671250 |
Andrews et al. |
Jun 1972 |
|
3954471 |
Andrews et al. |
May 1976 |
|
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
700506 |
Jun 1976 |
|