Photosensitive materials

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CPC
G03F7/004

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/004Photosensitive materials

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resin composition and flow cells incorporating the same
- Patent number 12,287,574
- Issue date Apr 29, 2025
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, cured film, inductor and antenna
- Patent number 12,278,032
- Issue date Apr 15, 2025
- FUJIFILM Corporation
- Tatsuo Ishikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluoropolymer adhesives and methods thereof
- Patent number 12,275,820
- Issue date Apr 15, 2025
- The Boeing Company
- Ashley M. Dustin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilized matrix-filled liquid radiation curable resin composition...
- Patent number 12,269,933
- Issue date Apr 8, 2025
- Stratasys, Inc.
- Mingbo He
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoactive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,265,328
- Issue date Apr 1, 2025
- The University of Chicago
- Dmitri V. Talapin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,265,329
- Issue date Apr 1, 2025
- FUJIFILM Corporation
- Kotaro Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography with a bilayer resist
- Patent number 12,248,248
- Issue date Mar 11, 2025
- The Boeing Company
- Antonio Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition including a reactive polymer
- Patent number 12,247,133
- Issue date Mar 11, 2025
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Larry Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator for chemically amplified photoresists
- Patent number 12,242,190
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, photosensitive fluorescent resin composition comprising s...
- Patent number 12,242,191
- Issue date Mar 4, 2025
- LG Chem, Ltd.
- Hanbit Jang
- G02 - OPTICS
Information Patent Grant
Photosensitive resin composition, method for producing the same, re...
- Patent number 12,242,192
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
- Publication number 20250147415
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Sunyoung LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250147416
- Publication date May 8, 2025
- POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
- Myung-Gil KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...
- Publication number 20250147417
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250149336
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20250147418
- Publication date May 8, 2025
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CROSS-LINKERS FOR METALLIC PHOTORESIST
- Publication number 20250147414
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Shi-Cheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT CONTROL MEMBER, DISPLAY DEVICE INCLUDING THE SAME, AND MANUFA...
- Publication number 20250151567
- Publication date May 8, 2025
- SAMSUNG DISPLAY CO., LTD.
- JUO NAM
- B82 - NANO-TECHNOLOGY
Information Patent Application
RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...
- Publication number 20250138416
- Publication date May 1, 2025
- Inha University Research and Business Foundation
- JIN-KYUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENDPOINT DETECTION IN DRY DEVELOPMENT OF PHOTORESIST
- Publication number 20250138429
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Qi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138418
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE
- Publication number 20250138420
- Publication date May 1, 2025
- Irresistible Materials LTD
- Alex Phillip Graham Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138425
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVES FOR METALLIC PHOTORESIST
- Publication number 20250138417
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Shi-Cheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING MATERIAL FOR PHOTOLITHOGRAPHY, RESIST COMPOSITION AND PATTE...
- Publication number 20250138419
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20250138421
- Publication date May 1, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuki URAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDE POLYMER AND COMPOSITION THEREFROM
- Publication number 20250129214
- Publication date Apr 24, 2025
- DUK SAN NEOLUX CO., LTD.
- Yeon Joon CHUNG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
GENERATION OF MULTILINE ETCH SUBSTRATES
- Publication number 20250132166
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHODS OF MAKIN...
- Publication number 20250130494
- Publication date Apr 24, 2025
- AKRON POLYMER SYSTEMS, INC.
- Yufeng Zhu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYBENZOXAZOL PRECURSOR OR POLYIMIDE PRECURSOR OR THE COPOLYMER TH...
- Publication number 20250130495
- Publication date Apr 24, 2025
- DUK SAN NEOLUX CO., LTD.
- Gwang Sik SONG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...
- Publication number 20250130496
- Publication date Apr 24, 2025
- Merck Patent GmbH
- YANO TOMOTSUGU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY
- Publication number 20250130501
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250130491
- Publication date Apr 24, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION COMPRISING THE SAME, R...
- Publication number 20250123557
- Publication date Apr 17, 2025
- University-Industry Cooperation Group of Kyung Hee University
- Jongwook PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYSILOXANE COMPOSITION
- Publication number 20250123567
- Publication date Apr 17, 2025
- Merck Patent GmbH
- Megumi Yano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE AND MANUFACTURI...
- Publication number 20250123558
- Publication date Apr 17, 2025
- FUJIFILM CORPORATION
- Masaya SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE
- Publication number 20250123560
- Publication date Apr 17, 2025
- Christopher D. Simpson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20250122165
- Publication date Apr 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist Material And Patterning Process
- Publication number 20250123559
- Publication date Apr 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Photosensitive materials

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resin composition and flow cells incorporating the same

Selective deposition of carbon on photoresist layer for lithography...

Photosensitive resin composition

Photoresist compositions and pattern formation methods

Liquid chemical, method for producing liquid chemical, and method f...

Photosensitive resin composition, cured film, inductor and antenna

Integrated dry processes for patterning radiation photoresist patte...

Fluoropolymer adhesives and methods thereof

Organotin oxide hydroxide patterning compositions, precursors, and...

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Stabilized matrix-filled liquid radiation curable resin composition...

Radiation-sensitive resin composition and method for forming resist...

Photoactive, inorganic ligand-capped inorganic nanocrystals

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Radiation-sensitive resin composition, method of forming resist pat...

EUV metallic resist performance enhancement via additives

Solution, solution storage body, actinic ray-sensitive or radiation...

Positive resist composition and pattern forming process

Electron beam lithography with a bilayer resist

Photocurable composition including a reactive polymer

Selective deposition of carbon on photoresist layer for lithography...

Silicon-containing resist underlayer film-forming composition inclu...

Photoacid generator for chemically amplified photoresists

Resist underlayer film-forming composition comprising epoxy adduct...

Semiconductor photoresist composition, method for preparing thereof...

Onium salt, chemically amplified resist composition and patterning...

Compound, photosensitive fluorescent resin composition comprising s...

Photosensitive resin composition, method for producing the same, re...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

PHOTORESIST COMPOSITION

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

CROSS-LINKERS FOR METALLIC PHOTORESIST

LIGHT CONTROL MEMBER, DISPLAY DEVICE INCLUDING THE SAME, AND MANUFA...

RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...

ENDPOINT DETECTION IN DRY DEVELOPMENT OF PHOTORESIST

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

ADDITIVES FOR METALLIC PHOTORESIST

COATING MATERIAL FOR PHOTOLITHOGRAPHY, RESIST COMPOSITION AND PATTE...

PHOTOSENSITIVE COMPOSITION

POLYIMIDE POLYMER AND COMPOSITION THEREFROM

GENERATION OF MULTILINE ETCH SUBSTRATES

POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHODS OF MAKIN...

POLYBENZOXAZOL PRECURSOR OR POLYIMIDE PRECURSOR OR THE COPOLYMER TH...

POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...

ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

PHOTOACID GENERATOR, PHOTORESIST COMPOSITION COMPRISING THE SAME, R...

POLYSILOXANE COMPOSITION

PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE AND MANUFACTURI...

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

Resist Material And Patterning Process