Photosensitive materials

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CPC
G03F7/004

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/004Photosensitive materials

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method and composition
- Patent number 12,332,563
- Issue date Jun 17, 2025
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films with narrow band emission phosphor materials
- Patent number 12,331,208
- Issue date Jun 17, 2025
- EDISON INNOVATIONS, LLC
- Mark D. Doherty
- G02 - OPTICS
Information Patent Grant
Curable resin composition, cured film formed therefrom, and electro...
- Patent number 12,321,096
- Issue date Jun 3, 2025
- Samsung SDI Co., Ltd.
- Seungeun Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of synthesizing a polynucleotide array using photoactivated...
- Patent number 12,319,712
- Issue date Jun 3, 2025
- Vibrant Holdings, LLC
- John J. Rajasekaran
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Lithographically patterned electrically conductive hydrogels, photo...
- Patent number 12,313,969
- Issue date May 27, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable relief precursor having adjustable surface prope...
- Patent number 12,313,970
- Issue date May 27, 2025
- XSYS Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,306,534
- Issue date May 20, 2025
- Samsung SDI Co., Ltd.
- Seung Han
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoacid generator for chemically amplified photoresists for deep...
- Patent number 12,306,535
- Issue date May 20, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,300,487
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin composition and flow cells incorporating the same
- Patent number 12,287,574
- Issue date Apr 29, 2025
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluoropolymer adhesives and methods thereof
- Patent number 12,275,820
- Issue date Apr 15, 2025
- The Boeing Company
- Ashley M. Dustin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition, cured film, inductor and antenna
- Patent number 12,278,032
- Issue date Apr 15, 2025
- FUJIFILM Corporation
- Tatsuo Ishikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilized matrix-filled liquid radiation curable resin composition...
- Patent number 12,269,933
- Issue date Apr 8, 2025
- Stratasys, Inc.
- Mingbo He
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoactive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,265,328
- Issue date Apr 1, 2025
- The University of Chicago
- Dmitri V. Talapin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,265,329
- Issue date Apr 1, 2025
- FUJIFILM Corporation
- Kotaro Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...
- Publication number 20250207247
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE CONDUCTIVE PASTE, METHOD FOR PRODUCING LAMINATED ELE...
- Publication number 20250208503
- Publication date Jun 26, 2025
- Murata Manufacturing Co., Ltd.
- Kenta KONDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, CAGE-TYP...
- Publication number 20250208507
- Publication date Jun 26, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, AND CAGE...
- Publication number 20250208508
- Publication date Jun 26, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Saburo KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING PATTERNS HAVING CURVED WALLS BY PHOTOLITHO...
- Publication number 20250208504
- Publication date Jun 26, 2025
- ALEDIA
- Elisabeth JACQUIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOCRYSTALLINE COMPLEX, PREPARATION METHOD THEREFOR, AND USE THEREOF
- Publication number 20250208505
- Publication date Jun 26, 2025
- Huawei Technologies Co., Ltd
- Zhe Li
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOACTIVE ORGANIC LIGANDS AND METHODS FOR RADIATION PATTERNING OF...
- Publication number 20250207017
- Publication date Jun 26, 2025
- NanoPattern Technologies, Inc.
- Forrest S. Etheridge
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...
- Publication number 20250199406
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MAKING EUV PATTERNABLE HARD MASKS
- Publication number 20250201553
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...
- Publication number 20250201577
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Jiyeon YI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF...
- Publication number 20250199400
- Publication date Jun 19, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo MOON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250199399
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Ji Young Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250201586
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...
- Publication number 20250199405
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION
- Publication number 20250201559
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Dario Goldfarb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION
- Publication number 20250204164
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Yugo TANIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...
- Publication number 20250199401
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Kenta AOSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST
- Publication number 20250199412
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN POLYMER PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATT...
- Publication number 20250189886
- Publication date Jun 12, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...
- Publication number 20250189892
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, METHOD FOR PRODUCING THE COMPOUND, LEVELING AGENT, COATIN...
- Publication number 20250188226
- Publication date Jun 12, 2025
- DIC CORPORATION
- Ryuta Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250189893
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20250180988
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...
- Publication number 20250179100
- Publication date Jun 5, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta HIOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY DEVELOPMENT FOR METAL-OXIDE PHOTO RESISTS
- Publication number 20250180987
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- NASRIN KAZEM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PRETREATMENT
- Publication number 20250180989
- Publication date Jun 5, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...
- Publication number 20250180991
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...
- Publication number 20250172869
- Publication date May 29, 2025
- NISSAN CHEMICAL CORPORATION
- Shunsuke MORIYA
- H01 - BASIC ELECTRIC ELEMENTS

Photosensitive materials

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern-forming method and composition

Metal oxide resists for EUV patterning and methods for developing t...

Films with narrow band emission phosphor materials

Curable resin composition, cured film formed therefrom, and electro...

Methods of synthesizing a polynucleotide array using photoactivated...

Lithographically patterned electrically conductive hydrogels, photo...

Photopolymerizable relief precursor having adjustable surface prope...

Resist underlayer composition, and method of forming patterns using...

Semiconductor photoresist composition and method of forming pattern...

Treatment liquid and pattern forming method

Photoacid generator for chemically amplified photoresists for deep...

Photoresist composition and method of forming photoresist pattern

Resin composition and flow cells incorporating the same

Selective deposition of carbon on photoresist layer for lithography...

Photosensitive resin composition

Photoresist compositions and pattern formation methods

Liquid chemical, method for producing liquid chemical, and method f...

Organotin oxide hydroxide patterning compositions, precursors, and...

Fluoropolymer adhesives and methods thereof

Photosensitive resin composition, cured film, inductor and antenna

Integrated dry processes for patterning radiation photoresist patte...

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Stabilized matrix-filled liquid radiation curable resin composition...

Radiation-sensitive resin composition and method for forming resist...

Photoactive, inorganic ligand-capped inorganic nanocrystals

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Radiation-sensitive resin composition, method of forming resist pat...

EUV metallic resist performance enhancement via additives

Patents Applicationslast 30 patents

METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...

PHOTOSENSITIVE CONDUCTIVE PASTE, METHOD FOR PRODUCING LAMINATED ELE...

FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, CAGE-TYP...

FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, AND CAGE...

METHOD FOR MANUFACTURING PATTERNS HAVING CURVED WALLS BY PHOTOLITHO...

NANOCRYSTALLINE COMPLEX, PREPARATION METHOD THEREFOR, AND USE THEREOF

Compound For Forming Metal-Containing Film, Composition For Forming...

PHOTOACTIVE ORGANIC LIGANDS AND METHODS FOR RADIATION PATTERNING OF...

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...

METHODS FOR MAKING EUV PATTERNABLE HARD MASKS

METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...

SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...

SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION

DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION

RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...

METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST

ORGANOTIN POLYMER PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATT...

POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

COMPOUND, METHOD FOR PRODUCING THE COMPOUND, LEVELING AGENT, COATIN...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...

DRY DEVELOPMENT FOR METAL-OXIDE PHOTO RESISTS

COMPOSITION FOR PRETREATMENT

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...

WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...