Photosensitive materials

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CPC
G03F7/004

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/004Photosensitive materials

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,164,228
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Michihiro Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 12,164,229
- Issue date Dec 10, 2024
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,164,230
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Taro Miyoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,158,699
- Issue date Dec 3, 2024
- Samsung SDI Co., Ltd.
- Changsoo Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,153,345
- Issue date Nov 26, 2024
- Sumitomo Bakelite Co., Ltd.
- Makoto Horii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organically modified metal oxide nanoparticle, method for producing...
- Patent number 12,153,347
- Issue date Nov 26, 2024
- National Institute of Advanced Industrial Science and Technology
- Kiwamu Sue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inorganic-infiltrated polymer hybrid thin film resists for advanced...
- Patent number 12,140,865
- Issue date Nov 12, 2024
- Brookhaven Science Associates, LLC
- Chang-Yong Nam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,140,867
- Issue date Nov 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
- Patent number 12,140,866
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,135,501
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 12,134,690
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Hao Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organometallic photoresists for DUV or EUV lithography
- Patent number 12,135,503
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
High-performance metal grids for solar cells formed by cracked film...
- Patent number 12,132,129
- Issue date Oct 29, 2024
- Alliance for Sustainable Energy, LLC
- Christopher Paul Muzzillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 12,117,728
- Issue date Oct 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
On-press development type lithographic printing plate precursor, me...
- Patent number 12,117,729
- Issue date Oct 15, 2024
- FUJIFILM Corporation
- Keisuke Nogoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing integrated circuit device using a metal-con...
- Patent number 12,112,948
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
- Publication number 20240419081
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Lin ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20240417365
- Publication date Dec 19, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240419071
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...
- Publication number 20240419074
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Michael Murphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS
- Publication number 20240419068
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Daniele Piumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIODERIVED ORGANIC SOLVENTS
- Publication number 20240408590
- Publication date Dec 12, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Sanjay Malik
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240402599
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CURABLE COMPOSITION, CURED FILM MANUFACTURED USING COMPOSITION, COL...
- Publication number 20240400891
- Publication date Dec 5, 2024
- Samsung SDI Co., Ltd.
- Hyunsook JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240402601
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Minoru UEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE
- Publication number 20240402598
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20240402600
- Publication date Dec 5, 2024
- Sumitomo Chemical Company, Limited
- Saki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAMATERIAL AND LAMINATE
- Publication number 20240402597
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20240402604
- Publication date Dec 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...
- Publication number 20240393698
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Si-Kyun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393687
- Publication date Nov 28, 2024
- JSR Corporation
- Fuyuki EGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393688
- Publication date Nov 28, 2024
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE
- Publication number 20240393685
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsing-Chieh Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240393684
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Jongpil HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...
- Publication number 20240395551
- Publication date Nov 28, 2024
- FUJIFILM CORPORATION
- Keigo YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...
- Publication number 20240393686
- Publication date Nov 28, 2024
- Resonac Corporation
- Hideyuki KATAGI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...
- Publication number 20240393689
- Publication date Nov 28, 2024
- DuPont Electronic Materials International, LLC
- Li Cui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240385515
- Publication date Nov 21, 2024
- Samsung SDI Co., Ltd.
- Gyeonghun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240385520
- Publication date Nov 21, 2024
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240385514
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST FOR SEMICONDUCTOR FABRICATION
- Publication number 20240385516
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng Liu
- C07 - ORGANIC CHEMISTRY

Photosensitive materials

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Resist composition and method for producing resist pattern

Chemically amplified negative resist composition and resist pattern...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Chemically amplified positive resist composition and resist pattern...

Photosensitive resin composition, method for forming resist pattern...

Semiconductor photoresist composition and method of forming pattern...

Photosensitive resin composition

Photoresist for semiconductor fabrication

Organically modified metal oxide nanoparticle, method for producing...

Resist underlayer film material, patterning process, and method for...

Photocurable composition and method for producing semiconductor device

Inorganic-infiltrated polymer hybrid thin film resists for advanced...

Resist composition and resist pattern forming method

Photoacid generators, photoresist compositions, and pattern formati...

Method of manufacturing a semiconductor device

Photoresist composition and method of manufacturing a semiconductor...

Resin, photoresist composition, and method of manufacturing semicon...

Organometallic photoresists for DUV or EUV lithography

Organotin clusters, solutions of organotin clusters, and applicatio...

Composition for resist underlayer, and pattern forming method using...

Sulfonium salt, photoacid generator, curable composition and resist...

High-performance metal grids for solar cells formed by cracked film...

Negative resist formulation for producing undercut pattern profiles

Carboxylate, resist composition and method for producing resist pat...

Film processing method

Resist composition and patterning process

On-press development type lithographic printing plate precursor, me...

Method of manufacturing integrated circuit device using a metal-con...

Patents Applicationslast 30 patents

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...

STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

BIODERIVED ORGANIC SOLVENTS

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CURABLE COMPOSITION, CURED FILM MANUFACTURED USING COMPOSITION, COL...

Compound For Forming Metal-Containing Film, Composition For Forming...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

METAMATERIAL AND LAMINATE

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE

METHOD OF FORMING PATTERNS

PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...

COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

METHOD OF FORMING PATTERNS

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

PHOTORESIST FOR SEMICONDUCTOR FABRICATION