Claims
- 1. A method of processing a radiation sensitive device which device comprises a substrate coated with a radiation sensitive composition which composition comprises a radiation sensitive material and a dye, which method comprises the steps of
- (i) image-wise exposing the said composition to radiation so that said composition comprises radiation-struck areas and non-radiation-struck areas which areas are of differing solubility,
- (ii) developing the image-wise exposed composition to selectively remove the more soluble areas and to reveal the substrate underlying the more soluble areas, and
- (iii) heating the less soluble areas remaining on the substrate after development to a temperature of at least 180.degree. C., wherein on exposure the dye undergoes a colour change in the radiation-struck areas and wherein the dye undergoes a colour change on heating, to a temperature of at least 180.degree. C., the less soluble areas remaining on the substrate.
- 2. A method according to claim 1 wherein prior to the heating, the developed device is coated with a processing liquid comprising a protective substance, to shield the revealed underlying substrate from contaminating residues formed when the developed device is heated and wherein, after the heating, the developed device is washed to remove the protective substance.
- 3. A method as claimed in claim 1 wherein said dye comprises the product of the condensation reaction of an aromatic dialkylamino substituted aldehyde and a methylene group attached to a nitrogen containing heterocycle and wherein the dye has a chromophoric resonance conjugation system and a positive charge distributed over the system.
- 4. A method as claimed in claim 3 wherein the methylene group is generated in situ from a quaternary ammonium salt of the nitrogen containing heterocycle.
- 5. A method as claimed in claim 1, wherein the dye has the general structure ##STR27## where PG,42 Z represents a divalent group which forms a heterocyclic ring structure with the nitrogen atom,
- R.sup.1 represents an optionally substituted alkyl or aralkyl group, and is not H,
- R.sup.2 represents H or methyl,
- R.sup.3, R.sup.4 represent optionally substituted alkyl, aralkyl, alkylene or aralkylene groups and may be the same or different,
- R.sup.5, R.sup.6 represent H or alkylene groups, and may be the same or different and A represents a monovalent anionic group.
- 6. A method as claimed in claim 5 wherein R.sup.3 and R.sup.5 are fused to form a heterocycle ring containing the nitrogen atom to which R.sup.3 is attached.
- 7. A method as claimed in claim 5 wherein R.sup.4 and R.sup.6 are fused to form a heterocycle ring containing the nitrogen atom to which R.sup.4 is attached.
- 8. A method as claimed in claim 5 wherein R.sup.3 and R.sup.5, and R.sup.4 and R.sup.6, respectively are fused to form a heterocycle ring containing the nitrogen atom to which R.sup.3 and R.sup.4 are attached.
- 9. A method as claimed in claim 1 wherein the composition comprises not more than 5% by weight of the dye.
- 10. A method as claimed in claim 1 wherein the dye is an acid sensitive dye and wherein the composition further comprises an acid release agent which produces acid in the radiation-struck areas on exposure of the composition.
- 11. A method of processing a radiation sensitive device comprising the steps of
- providing a substrate coated with a composition having a radiation sensitive material and a dye, said dye being capable of changing color on exposure of radiation and of changing color on heating in excess of 180.degree. C.;
- image-wise exposing said composition to radiation in selected areas to form radiation struck areas and non-radiation struck areas with said dye in said radiation struck areas changing color to provide color contrast between said radiation struck areas and said non-radiation struck areas;
- developing said exposed composition to selectively remove one of said radiation struck areas and said non-radiation struck areas to reveal said substrate thereat while retaining the other of said respective areas thereon; and
- thereafter baking said substrate to a temperature sufficient to effect a second color change in said other of said areas remaining thereon.
- 12. A method as set forth in claim 11 which further comprises the step of coating the exposed substrate with a processing liquid having a protective substance to shield the revealed substrate from contamination residues prior to said baking step.
- 13. A method as set forth in claim 11 wherein said dye comprises the product of the condensation reaction of an aromatic dialkylamino substituted aldehyde and a methylene group attached to a nitrogen containing heterocycle and wherein said dye has a chromophoric resonance conjugation system and a positive charge distributed over the system.
- 14. A method as set forth in claim 13 wherein the methylene group is generated in situ from a quaternary ammonium salt of the nitrogen containing heterocycle.
- 15. A method as set forth in claim 11 wherein the composition comprises not more than 5% by weight of the dye.
- 16. A method as set forth in claim 11 wherein the dye is an acid sensitive dye and wherein the composition further comprises an acid release agent which produces acid in the radiation-struck areas on exposure of the composition.
- 17. A method as set forth in claim 11 wherein said radiation struck areas are removed during said step of developing and said second color change is effected in said non-radiation struck areas.
- 18. A method as set forth in claim 11 wherein said non-radiation struck areas are removed during said step of developing and said second color change is effected in said radiation struck areas.
Priority Claims (1)
Number |
Date |
Country |
Kind |
8921116 |
Sep 1989 |
GBX |
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Parent Case Info
This is a division of application Ser. No. 07/581,543 filed Sep. 12, 1990, U.S. Pat. No. 5,130,228.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
4659649 |
Dickinson et al. |
Apr 1987 |
|
4687728 |
Folkard et al. |
Aug 1987 |
|
4743531 |
Farid et al. |
May 1988 |
|
Divisions (1)
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Number |
Date |
Country |
Parent |
581543 |
Sep 1990 |
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