Claims
- 1. A radiation sensitive compound which comprises a polymer including a plurality of structural units represented by the formula:
- in which, R represents H or CH.sub.3 ; each R.sub.1, which may be the same or different represents H or alkyl; R.sub.2 represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.
- 2. A compound as claimed in claim 1 wherein the radical R.sub.2 has the structure defined by any one of the following formulae: ##STR8##
- 3. A compound as claimed in claim 1 wherein the radical R.sub.2 contains one or more diazo groups and has the structure
- --NR.sub.3 CH.sub.2 CH.sub.2 --
- wherein R.sub.3 provides a link with moieties containing said diazo group or groups and is an ethylene, phenylene, succinoyl bis oxy ethyl, methylidene amino or N,N-2,4-tolylene bis carbamoyloxyethyl group or is a single bond when the moiety is a diazodiphenyl group.
- 4. A compound as claimed in claim 1 wherein the anion A.sup.- is p-toluene sulphonate, naphthalene sulphonate, dodecyl benzene sodium sulphonate, dicyclohexylsulphosuccinate, di octyl sulphosuccinate, triisopropyl naphthalene sulphonate diisobutyl naphthalene sulphonate, 2-hydroxy 4 methoxy benzophenone-5-sulphonate, mesitylene sulphonate, octyl phenyl sulphonate, lauryl sulphate, naphthoate, cinnamate, tetrafluoroborate, hexafluorophosphate or reineckate.
- 5. A compound as claimed in claim 1 wherein the polymer includes units derived from one or more monomeric compounds containing an unsaturated group.
- 6. A compound as claimed in claim 5 wherein the monomeric compound is a mono (meth)acrylate, (meth)acrylamide, maleic anhydride, an allyl compound, a vinyl compound, a styrene compound., an acrylonitrile compound, an itaconate, or a crotonate.
- 7. A method of producing a radiation sensitive compound which comprises:
- (i) polymerising a compound of the formula ##STR9## (ii) reacting the isocyanate groups of the resulting polymer with a compound containing a diazo group or diazo group precursor and an --OH, --SH, or --NH.sub.2 group,
- (iii) converting the diazo group precursors as necessary into diazo groups, and
- (iv) reacting the diazo groups with an acid of the formula HA or with a salt of such acid.
- 8. A method of producing a radiation sensitive compound which comprises:
- (i) reacting a compound of the formula ##STR10## with a compound containing a diazo group or diazo group precursor and an --OH, --SH, or --NH.sub.2 group,
- (ii) polymerising the resulting compound,
- (iii) converting the diazo group precursors as necessary into diazo groups, and
- (iv) reacting the diazo groups with an acid of the formula HA or with a salt of such acid.
- 9. A method according to claim 7 wherein the compound of step (i) is co-polymerised with one or more monomer compounds.
- 10. A method according to claim 8 wherein the compound containing a diazo group precursor of step (i) is co-polymerised with one or more monomer compounds.
Priority Claims (1)
Number |
Date |
Country |
Kind |
8603405 |
Feb 1986 |
GBX |
|
Parent Case Info
This is a continuation of Ser. No. 013,497, filed 2/11/87, now abandoned.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
3174860 |
Sus et al. |
Mar 1965 |
|
4581313 |
Minamizoho et al. |
Apr 1986 |
|
4595648 |
Stanton et al. |
Jun 1986 |
|
4666993 |
Urano et al. |
May 1987 |
|
Foreign Referenced Citations (2)
Number |
Date |
Country |
58-127923 |
Jul 1983 |
JPX |
2018779 |
Oct 1979 |
GBX |
Continuations (1)
|
Number |
Date |
Country |
Parent |
13497 |
Feb 1987 |
|