Claims
- 1. A Ni-base alloy composition comprising:Zr; B; and and balance Ni, wherein Zr and B are coupled to each other to form ZrB2, and B and Zr suppress melting points of the Ni-base alloy composition.
- 2. A composition according to claim 1, further comprising at least one further melting point suppressant.
- 3. A composition according to claim 2, wherein the further melting point suppressant comprises of at least Si.
- 4. A composition according to claim 1, further comprising at least one strengthener.
- 5. A composition according to claim 4, the strengthener comprising at least one strengthener selected from the group consisting of:Al, W, Mo, Re, Ta, and Nb.
- 6. The composition of claim 5, herein the strengthener comprising at least one strengthener selected from the group consisting of:Al, W, Mo, Re, Ta, and Nb, where Al is in a range of about 4.0-15.0 atomic percent; W is in a range up to about 3.0 atomic percent, Mo is in a range up to about 3.0 atomic percent, Re is in a range of about 0.2 to about 1.5 atomic percent, Ta is in a range of up to about 3.0 atomic percents and Nb is in a range of about 0.2 to about 2.5 atomic percent.
- 7. A composition according to claim 1, wherein a ratio of B:Zr is in a range of about 2:1 to about 5:1.
- 8. A composition according to claim 7, wherein the ratio of B:Zr is about 2:1.
- 9. A composition according to claim 7, wherein Zr is in a range of about 1.0 to about 4.0 atomic percent and B is in a range of about 3.0 to about 8.0 atomic percent.
- 10. A composition according to claim 7, further comprising of at least one constituent selected from the group consisting of:Cr, Co, and Al.
- 11. A composition according to claim 1, further comprising:Cr, Co, and Al.
- 12. A composition according to claim 10, wherein Cr is in a range of about 4.0 to about 12.0 atomic percent; Co is in a range of about 4.0 to about 12.0 atomic percent; and Al is in a range of about 5.0 to about 15.0 atomic percent.
- 13. A composition according to claim 1, further comprising Hf.
- 14. A composition according to claim 1, further comprising Ti, wherein Ti is in a range up to about 3.0 atomic percent.
- 15. The composition according to claim 3, wherein Si is present in the range of about 0.5 atomic percent to about 3.0 atomic percent.
Parent Case Info
This application is a division of application Ser. No. 09/2927,138, filed Sep. 2, 1997, now U.S. Pat. No. 6,027,584 which is hereby incorporated by reference in its entirety.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
4900638 |
Emmerich |
Feb 1990 |
|
5759300 |
Hasegawa et al. |
Jun 1998 |
|