1. Field of the Invention
The present invention relates to a method and a system for searching a desired report in a database, and a reviewing apparatus. Especially, the invention, like a reviewing apparatus for semiconductor defects, searches desired information for selection according to the circumstances among various kinds of information such as a defect distribution, images of various kinds of defects, results of X-ray spectrum analysis for defects, results of defect classification to display a report describing the searched information.
2. Description of the Related Art
In the manufacturing process of the semiconductor device, early detection of abnormality and defects, which are caused in each manufacturing processes, and measures against the abnormality and defects are important in order to increase the yield rate of a semiconductor device. Recently, defects influencing the yield rate have become diversified as semiconductor devices become finer. Accordingly, an amount of information required for consideration of the measures has been increased.
The reviewing apparatus observing defects of the semiconductor device is a device acquiring various kinds of information on defects, and a device applying a scanning electron microscope (hereinafter, sometimes called a SEM) has been put into practical use as a finer semiconductor device has been developed. The reviewing apparatus may output: a distribution map for defects on a semiconductor wafer, which is generally called a wafer map; an image (hereinafter, called a SEM image) of an scanning electron microscope; an image (hereinafter, called an OM image) of an optical microscope; an image (hereinafter, called an EDX result) of an X-ray spectrum; a result (hereinafter, called an ADC result) of automatic defect classification; a distribution (hereinafter, called a size distribution) of defect sizes; and the like. Moreover, a magnification of each image, optical conditions at acquisition of an image, a memo paper on which an operator describes comments, and the like are memorized in the reviewing apparatus or a memory device as information.
Here, the defect classification includes manual defect classification by visual observation by a worker, semiautomatic defect classification in which classification is performed automatically to some degree, and detailed classification is performed by a worker. Here, results of defect classification by all the methods including the automatic defect classification are called ADC results.
The defect image and the supplementary information on the analysis result of the defect and the coordinate of the defect are sorted by an operator, using the reviewing apparatus, and are summarized as a report. The above report is made into an electronic file in such a way that the report may be displayed on the display of the reviewing apparatus, or that of a report control server connected to the reviewing apparatus through a network.
There has been a technology by which a SEM image and the supplementary information are summarized as an electronic report file as described in, for example, Japanese Patent Application Laid-Open No. 11-096384. According to the above technology, a report may be simply made by applying a defect image and supplementary information made into texts onto a report with a standard-sized format.
The report not only functions as a statement made when a defect is caused, but preserving the report in a database is useful for cause investigation and measurement consideration when there is caused a defect at a later date.
An image of a defect caused at this time has been displayed on the display of the reviewing apparatus and that of the report control server, and an operator has found an image of a similar defect among past images memorized in the database by his or her own eyes. However, as time and accuracy have become a serious issue by an increase in the number of past images, an increase in defect kinds caused by the finer structure of a semiconductor device, differences in the technical level among operators, and the like, reduction in work loads of operators, shortening of time, and improvement in the search accuracy have been realized by use of the similar image search function in a computer.
As there are various kinds of defects, there is a possibility that there are various kinds of formats of reports, depending on ideas of operators making a report. As an operator is configured to specify supplementary information applied onto a report even in the above-described technology (Japanese Patent Application Laid-Open No. 11-096384), no one can deny a possibility that important data drops out from supplementary information described in a report, even if a past similar image may be searched.
At cause investigation and measurement consideration of a defect, useful information depends on the kind of a defect. For example, when there are a lot of similar defects, there is used a thumbnail image list function in which a lot of images are arranged for comparison, when the shape and the surface properties of a defect are important, an enlarged SEM image is utilized, and, when the material of a defect is important, an EDX result is used. However, for example, when the material of a defect is an important factor for the cause investigation of the defect at this time, the EDX result drops out from the reports preserved in the database to require much labor and time for consideration of measures against defects generated at this time because only supplementary information and images other than the EDX result are used for consideration by an operator. Though it is thought that all information associated with an image of a defect is described in a report, the amount of information is increased for an operator. Accordingly, a difficult-to-use report is obtained to require much more labor and time.
An object of the present invention is to provide a report search method, a report search system, and a reviewing apparatus by which a measure against abnormalities such as defects may be quickly obtained by searching desired information in a report recording past information.
In order to realize the above-described object, a report search method according to an embodiment of the present invention has a feature that an image having a defective appearance and supplementary information on the image are memorized as a unit of a report file in a database for an observation result of a defective appearance at a manufacturing process, and, when a new defective appearance is generated, the above-described supplementary information is searched as a search target from among a plurality of report files memorized in the above-described database, using a search condition set from among the above-described supplementary information, and the above-described searched supplementary information and an image related with the above-described supplementary information are output.
According to the present invention, there may be obtained a report search method, a report search system, and a reviewing apparatus, by which a measure against abnormalities such as defects may be quickly obtained by searching desired information in a report recording past information.
One example according to the present invention will be explained referring to drawings.
The lens 102, the deflector 103, and the object lens 104 are controlled by a control portion 110 of an electron optical system. Secondary particles 108 such as secondary electrons, reflected electrons, X rays and the like are generated from the sample 105 irradiated by the electron beams 107 according to the shape and the material of a sample. The generated secondary particles 108 are detected by the secondary particle detector 109, are converted into digital signals in an A/D (analog to digital) conversion portion 111 by which an analog signal is converted into a digital signal to form a SEM image in an image processing portion 114. Moreover, image processing such as defect detection, contrast adjustment, and stereoscopic-image formation, is executed in the image processing portion 114, using the formed SEM image.
An overall control portion 113 interprets inputs from a keyboard 116, a mouse 118, and a memory device 117, which are connected to the portion 113, and controls the electronic and optics system control portion 110, the stage control portion 112, and an image processing portion 114. Moreover, various kinds of processes contents are output to a display 115 and the memory device 117, as required.
The defect reviewing apparatus receives the coordinate of a defect detected by the not-shown inspection device, and that of an alignment mark, detects the defect based on those coordinates, and preserves the coordinate and the classification result of the defect in the memory device 117, wherein the coordinate and the classification result are automatically or manually classified. Moreover, the defect reviewing apparatus also has a function by which a report is made from the classification result of the defect, and the data is memorized in the memory device 117. The contents of the report will be explained in detail when
Each of
The example shown in
When it is assumed that a lot of defect reviewing apparatuses are introduced, it is preferable to adopt a system in which functions to make, preserve, and search reports are centrally controlled for a lot of defect reviewing apparatuses, using the report control server 205 shown in
The data contents 302 described in the report are a wafer map, a SEM image, acquisition conditions, and ADC results. The data contents not described in the report are an OM image, an EDX result, size distributions, a memo, and the like, and include detailed data shown in a supplementary information file 304 shown in
The reports memorized in the memory device 117 of the defect reviewing apparatus, and the not-shown memory device of the report control server 205 are searched by the report search function of the defect reviewing apparatus, using the report control server 205, and the report viewers 206 and 207.
First, it is confirmed (step 401) by an instruction of an operator for start of report search whether supplementary information files have been made for all the reports memorized in the memory device 117 of defect reviewing apparatus and the not-shown memory device in the report control server 205. When not having been made, a supplementary information file is made (step 402). When an operator judges whether a supplementary information file has been made, the display 115 of the defect reviewing apparatus or the not shown display of the report control server 205, and the report viewers 206 and 207 are configured to display whether the supplementary information file has been made, and the processing goes to the next step based on judgement of the operator seeing the display.
Then, the operator sets search conditions for the report (step 403). The set contents of the search conditions will be explained in detail referring to
Though the search results displayed on the display have common search conditions, there are common terms other than the search conditions too. Accordingly, when there is a common term (step 406) which an operator instructs to display, a common term is extracted (step 407), and a result is displayed (step 408) as will be explained in detail referring to
An operator puts a check mark on one of data to be selected as a search keyword, and a search condition is selected from a pull down list 503. In the example shown in
A preserved search condition may be read (or called) for display. When a check mark is put only on to, for example, “date” in the acquisition condition list 502, and a reading button 505 is specified, data having a “date” in agreement with the specified one, among the data preserved before, is displayed in the acquisition condition list 502.
When a search condition as an acquisition condition is decided, a confirmation screen of the search condition is displayed as shown in
Moreover, when a linear defect distribution on a wafer map is required to be specified in an area, “linear” is selected in a pull down list of items on distributed states, and “map specification” is selected in a pull down list of items on a distributed position for check marks. When “map specification” is selected, a place at which a defect is generated may be set, using a pointing device such as a mouse. For example, when an arbitrary position in a rectangle representing a die on the wafer map 602, the die is selected, and the selected die 604 is displayed based on the lightness or on the color, in order to distinguish the die from other dies.
The wafer map search condition is preserved by specification with the preservation button 504, and a plurality of preserved wafer map search conditions may be displayed in the preservation order by specification of a page up and down button 605.
Though an acquisition condition and a wafer map have been illustrated as data for setting a search condition, there are a SEM image, and an ADC result other than the above items as data described in a report, and there are an OM image, an EDX result, a size distribution, a memo and the like as data not described in a report as shown in
When a generation frequency of a specific category and the like, which have been obtained after ADC execution, are used as a search keyword for a search condition of the ADC result, it becomes possible to search a report on a case which it has conventionally been difficult to search. For example, under a state in which a report includes a ratio of foreign substances to all defects it is possible by specifying data including foreign substances with a content of 60% or more to search a report on a case in which foreign substances with a content of 60% or more are included. Moreover, under a state in which a number of scratches is included as data on scratches in a report, it is possible by specifying data in which a number of scratches is equal to, or more than 10 pieces to search a report on a case in which the number of scratches is ten or more.
Generation cases of a specific element are used as one of search keywords for a search condition of the EDX result. There becomes possible search of reports specifying a relation between a foreign substance and the material by combination of the ADC result and the EDX result. For example, when a foreign substance is selected on a screen of a search condition for the ADC result, and aluminum is selected on a screen of a search condition for the EDX result, a report on a past case in which a defect having aluminum as a foreign substance has been generated may be searched.
The size distribution of the defects becomes a search keyword for a search condition of the size distribution. For example, when a defect size is preserved as data in a report and 1 μm or more is selected or is specified on a screen of a search condition for a size distribution, a report on a case of a defect with 1 μm or more may be searched. Moreover, a report of a case in which, for example, defects with a size of 0.3 μm through 0.6 μm make up 30% or more in all defects may be searched by preserving a size range, and a ratio containing the defects in all defects as data in a report. Moreover, when, for example, a scratch is specified on a screen of search conditions for an ADC result, and 1 μm or more is specified on a screen of search conditions for the size distribution for searching, a report of a past case in which scratches with a size of 1 μm or more are generated may be searched by combining the ADC result with the search condition of the size distribution.
Words and phrases in a comment registered in a report by an operator become a search keyword as a search condition in the memo. A report on a past case may be searched using a keyword such as an estimated cause, contents of a measure against the estimated cause, and a result of the measure. Thereby, a measure against a currently noteworthy problem may be examined referring to the past measure cases.
The data shown as common data in the table 902 is data which has not been determined as common data when a search condition was set. According to a conventional technique, it is difficult to obtain information such as “cluster in the wafer outer portion”, and “ . . . device washing” in the table 902. But, the above information may be an effective one for examination of measures against a defective appearance.
Moreover, as the report viewers 206 and 207 may be provided at locations apart from a manufacturing process of a semiconductor device in the cases of systems shown in
As a report on a result summarizing points of data on past cases of a defective appearance is searched as a search target as described above according to the present invention, it is possible to efficiently search required information without losing the required information in various kinds of information. Therefore, there may be made prompt measure against a defective appearance. As a report as a search result is output as the report was made in the past, it is possible to eliminate time for making the report. Moreover, when a desired image is searched among images, similarity search for images has been conventionally performed in some cases. Though the number of images is, for example, several hundreds in those cases, the number of data corresponding to that of those images is from several to several tens of data. As a search target is not an image, but data in the present invention, search may be performed in short period of time and with a high accuracy. Therefore, a measure against a defective appearance may be quickly made. Moreover, points which have been overlooked at report making, and information which has not been considered before search may be executed by a configuration in which, when a supplementary information file for a report is made, information not included in a report is memorized in a text form, and the above information not included in the above report may be used as a search keyword at search. As these pieces of information may be information useful for defective appearance analysis, the present invention is a very useful search system in comparison with a conventional technique.
Number | Date | Country | Kind |
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2007-000020 | Jan 2007 | JP | national |