Patent Application
20230331957
The present invention relates to a resin composition, a prepreg, a film with resin, a metal foil with resin, a metal-clad laminate, and a wiring board.
As the information processing quantity by various kinds of electronic equipment increases, mounting technologies such as high integration of semiconductor devices to be mounted, densification of wiring, and multilayering are progressing. In addition, wiring boards used in various kinds of electronic equipment are required to be, for example, high-frequency compatible wiring boards such as a millimeter-wave radar board for in-vehicle use. Substrate materials for forming insulating layers of wiring boards used in various kinds of electronic equipment are required to have a low relative dielectric constant and a low dielectric loss tangent in order to increase the signal transmission speed and to decrease the signal transmission loss. Examples of such substrate materials include resin compositions containing polyphenylene ether.
Examples of such resin compositions containing polyphenylene ether include the resin composition described in Patent Literature 1. Patent Literature 1 describes a resin composition containing a polyphenylene ether resin, an elastomer having an SP value of 9 (cal/cm3)½ or less and a weight average molecular weight of 80000 or more and being solid at 25° C., and an elastomer having an SP value of 9 (cal/cm3)½ or less and a weight average molecular weight of 40000 or less and being liquid at 25° C. According to Patent Literature 1, it is disclosed that it is possible to provide a resin composition, which is excellent in handleability in the process of forming a laminate by being laminated with other laminates, is unlikely to warp or crack, and further exhibits properties, such as heat resistance after moisture absorption, peel strength, electrical properties, dimensional stability, and moldability, suitable for printed wiring boards for high multilayering and high frequencies.
Metal-clad laminates and metal foils with resin used in the manufacture of wiring boards and the like include not only an insulating layer but also a metal foil on the insulating layer. Wiring boards also include not only an insulating layer but also wiring on the insulating layer. Examples of the wiring include wiring derived from a metal foil equipped in the metal-clad laminate or the like.
In recent years, particularly small portable devices such as mobile communication terminals and notebook PCs have been rapidly becoming multi-functional, high performance, slim and compact. Along with this, in wiring boards used in these products as well, there is a further demand for miniaturization of conductor wiring, multilayering of conductor wiring layers, thinning, and improvement in performance such as mechanical properties. For this reason, in the wiring boards, miniaturized wiring is also required not to peel off from the insulating layers and thus it is further required that adhesive properties between the wiring and the insulating layers are high. Hence, it is required that adhesive properties between the metal foils and the insulating layers are high in metal-clad laminates and metal foils with resin, and substrate materials for forming insulating layers of wiring boards are required to afford cured products exhibiting excellent adhesive properties to metal foils.
Wiring boards used in various kinds of electronic equipment are required to be hardly affected by changes in the external environment, and the like. For example, insulating layers of wiring boards are required to suitably maintain low dielectric properties even at a relatively high temperature so that the wiring board can also be used in a high temperature environment. Hence, substrate materials for forming insulating layers of wiring boards are required to afford cured products in which increases in relative dielectric constant and dielectric loss tangent due to temperature rise are sufficiently suppressed. It is also required that insulating layers of wiring boards do not deform even in a relatively high temperature environment. Since this deformation is suppressed when the glass transition temperature of insulating layers is high, the substrate materials for forming insulating layers of wiring boards are required to have a high glass transition temperature.
Patent Literature 1: JP 2018-131519 A
The present invention has been made in view of such circumstances, and an object thereof is to provide a resin composition that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. Another object of the present invention is to provide a prepreg, a film with resin, a metal foil with resin, a metal-clad laminate, and a wiring board, which are obtained using the resin composition.
An aspect of the present invention is a resin composition containing a maleimide compound (A) having an indane structure in the molecule, and a styrenic polymer being solid at 25° C.
The present inventors have found out that the objects are achieved by the present invention described below as a result of extensive studies.
Hereinafter, embodiments according to the present invention will be described, but the present invention is not limited thereto.
The resin composition according to the present embodiment is a resin composition containing a maleimide compound (A) having an indane structure in the molecule, and a styrenic polymer being solid at 25° C. By curing a resin composition having such a configuration, there is obtained a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
First, it is considered that the resin composition can be suitably cured by curing the styrenic polymer together with the maleimide compound (A), and a cured product is obtained which exhibits low dielectric properties, high adhesive properties to a metal foil, and a high glass transition temperature. It is considered that it is possible to sufficiently suppress increases in relative dielectric constant and dielectric loss tangent due to temperature rise of a cured product obtained by curing the resin composition as the maleimide compound (A) is used. From these facts, it is considered that the resin composition affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
The maleimide compound (A) is not particularly limited as long as it is a maleimide compound having an indane structure in the molecule. Examples of the indane structure include a divalent group obtained by eliminating two hydrogen atoms from indane or indane substituted with a substituent, and more specific examples thereof include a structure represented by the following Formula (1). The maleimide compound (A) also has a maleimide group in the molecule. Examples of the maleimide compound (A) include a maleimide compound having a structure represented by the following Formula (1) in the molecule, and more specific examples thereof include a maleimide compound (A1) having a structure represented by the following Formula (2) in the molecule.
In Formula (1), “Rb”s are independent of each other. In other words, “Rb”s may be the same group as or different groups from each other, and for example, when r is 2 or 3, two or three “Rb”s bonded to the same benzene ring may be the same group as or different groups from each other. “Rb” represents an alkyl group having 1 to 10 carbon atoms, an alkyloxy group (alkoxy group) having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a hydroxyl group, or a mercapto group (thiol group). r represents 0 to 3.
In Formula (2), “Ra”s are independent of each other. In other words, “Ra”s may be the same group as or different groups from each other, and for example, when q is 2 to 4, two to four “Ra”s bonded to the same benzene ring may be the same group as or different groups from each other. “Ra” represents an alkyl group having 1 to 10 carbon atoms, an alkyloxy group having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a nitro group, a hydroxyl group, or a mercapto group. “Rb” is the same as “Rb” in Formula (1), and “Rb”s each independently represent an alkyl group having 1 to 10 carbon atoms, an alkyloxy group having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a nitro group, a hydroxyl group, or a mercapto group. q represents 0 to 4. r represents 0 to 3. n represents 0.95 to 10.
r is the average value of the degree of substitution of “Rb”, it is more preferable as r is smaller, and specifically, r is preferably 0. In other words, in the benzene ring to which “Rb” may be bonded, it is preferable that a hydrogen atom is bonded to the position to which “Rb” may be bonded. It is easy to synthesize the maleimide compound (A) having such r. It is considered that this is because steric hindrance is diminished and the electron density in the aromatic ring increases. When r is 1 to 3, “Rb” is preferably at least one selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms among the above. “Ra” is preferably at least one selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms among the above. As “Ra” and “Rb” are an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, or an aryl group having 6 to 10 carbon atoms, it is easy to dissolve the maleimide compound (A) in a solvent as well as a decrease in reactivity of the maleimide group can be suppressed and a suitable cured product is obtained. It is considered that this is due to a decrease in planarity in the vicinity of the maleimide group, a decrease in crystallinity, and the like.
Specific examples of the groups represented by “Ra” and “Rb” include the following groups.
The alkyl group having 1 to 10 carbon atoms is not particularly limited, and examples thereof include a methyl group, an ethyl group, a propyl group, a hexyl group and a decyl group.
The alkyloxy group having 1 to 10 carbon atoms is not particularly limited, and examples thereof include a methyloxy group, an ethyloxy group, a propyloxy group, a hexyloxy group and a decyloxy group.
The alkylthio group having 1 to 10 carbon atoms is not particularly limited, and examples thereof include a methylthio group, an ethylthio group, a propylthio group, a hexylthio group and a decylthio group.
The aryl group having 6 to 10 carbon atoms is not particularly limited, and examples thereof include a phenyl group and a naphthyl group.
The aryloxy group having 6 to 10 carbon atoms is not particularly limited, and examples thereof include a phenyloxy group and a naphthyloxy group.
The arylthio group having 6 to 10 carbon atoms is not particularly limited, and examples thereof include a phenylthio group and a naphthylthio group.
The cycloalkyl group having 3 to 10 carbon atoms is not particularly limited, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclohexyl group, and a cyclooctyl group.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
q is the average value of the degree of substitution of “Ra”, and is preferably 2 to 3, more preferably 2. It is easy to synthesize the maleimide compound (A) having such q. It is considered that this is because steric hindrance is diminished and the electron density in the aromatic ring increases particularly when q is 2.
n is the average value of the number of repetitions, and is 0.95 to 10 as described above, preferably 0.98 to 8, more preferably 1 to 7, still more preferably 1.1 to 6. The content of the maleimide compound, which is a maleimide compound represented by Formula (1) and a maleimide compound (A1) represented by Formula (2) and in which n that is the average number of repetitions (degree of polymerization) is 0, is preferably 32% by mass or less with respect to the total amount of the maleimide compound (A).
The molecular weight distribution (Mw/Mn) of the maleimide compound (A) acquired by GPC measurement is preferably 1 to 4, more preferably 1.1 to 3.8, still more preferably 1.2 to 3.6, particularly preferably 1.3 to 3.4. The molecular weight distribution is acquired by gel permeation chromatography (GPC) measurement.
It is preferable that the maleimide compound (A) further has an arylene structure bonded in the meta-orientation in the molecule. Examples of the arylene structure bonded in the meta-orientation include an arylene structure (an arylene structure in which a structure containing a maleimide group is substituted at the meta position) in which a structure containing a maleimide group (that is, other than “Rb”) is bonded to the meta position. The arylene structure bonded in the meta-orientation is an arylene group bonded in the meta-orientation, such as a group represented by the following Formula (3). Examples of the arylene structure bonded in the meta-orientation include m-arylene groups such as a m-phenylene group and a m-naphthylene group, and more specific examples thereof include a group represented by the following Formula (3).
Specific examples of the maleimide compound (A) include maleimide compounds represented by Formulas (4) to (6). These maleimide compounds (A) further have an arylene group bonded in the meta-orientation, such as a group represented by the following Formula (3), in
In Formula (4), n represents 0.95 to 10.
In Formula (5), n represents 0.95 to 10.
In Formula (6), n represents 0.95 to 10.
The method for producing the maleimide compound (A) is not particularly limited as long as the maleimide compound (A) can be produced. Specifically, the maleimide compound (A) is obtained by a so-called maleimidation reaction in which an amine compound represented by the following Formula (7) is reacted with maleic anhydride in an organic solvent such as toluene in the presence of a catalyst such as toluenesulfonic acid. More specifically, after the maleimidation reaction, unreacted maleic anhydride and other impurities are removed by washing with water and the like, and the solvent is removed by reducing the pressure, whereby the maleimide compound (A) is obtained. A dehydrating agent may be used during this reaction. A commercially available product may be used as the maleimide compound (A).
In Formula (7), “Ra”s are independent of each other. In other words, “Ra”s may be the same group as or different groups from each other, and for example, when q is 2 to 4, two to four “Ra”s bonded to the same benzene ring may be the same group as or different groups from each other. “Ra” represents an alkyl group having 1 to 10 carbon atoms, an alkyloxy group having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a nitro group, a hydroxyl group, or a mercapto group. “Rb” is the same as “Rb” in Formula (1), and “Rb”s each independently represent an alkyl group having 1 to 10 carbon atoms, an alkyloxy group having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a nitro group, a hydroxyl group, or a mercapto group. q represents 0 to 4. r represents 0 to 3. n represents 0.95 to 10.
The amine compound represented by Formula (7) is obtained by, for example, reacting 2,6-dimethylaniline with α,α′-dihydroxy-1,3-diisopropylbenzene in an organic solvent such as xylene using activated clay as a catalyst.
The styrenic polymer is not particularly limited as long as it is a styrenic polymer being solid at 25° C. Examples of the styrenic polymer include styrenic polymers that are solid at 25° C. and can be used as resins contained in resin compositions used for forming insulating layers of metal-clad laminates, wiring boards and the like, and the like. The resin compositions used for forming insulating layers of metal-clad laminates, wiring boards and the like may be resin compositions used for forming resin layers of films with resin, metal foils with resin and the like, or may be a resin composition contained in prepregs. Since the styrenic polymer is solid at 25° C., it is possible to enhance the adhesive properties to a metal foil.
The styrenic polymer is, for example, a polymer obtained by polymerizing a monomer including a styrenic monomer, and may be a styrenic copolymer. Examples of the styrenic copolymer include a copolymer obtained by copolymerizing one or more styrenic monomers and one or more other monomers copolymerizable with the styrenic monomers. The styrenic copolymer may be a random copolymer or a block copolymer as long as it has a structure derived from the styrenic monomer in the molecule. Examples of the block copolymer include a bipolymer of the structure (repeating unit) derived from the styrenic monomer and the other copolymerizable monomer (repeating unit) and a terpolymer of the structure (repeating unit) derived from the styrenic monomer, the other copolymerizable monomer (repeating unit), and the structure (repeating unit) derived from the styrenic monomer. The styrenic polymer may be a hydrogenated styrenic copolymer obtained by hydrogenating the styrenic copolymer.
The styrenic monomer is not particularly limited, but examples thereof include styrene, a styrene derivative, one in which some hydrogen atoms of the benzene ring in styrene are substituted with an alkyl group, one in which some hydrogen atoms of the vinyl group in styrene are substituted with an alkyl group, vinyltoluene, α-methylstyrene, butylstyrene, dimethylstyrene, and isopropenyltoluene. As the styrenic monomer, these may be used singly or in combination of two or more kinds thereof. The other copolymerizable monomer is not particularly limited, but examples thereof include olefins such as α-pinene, β-pinene, and dipentene, unconjugated dienes such as 1,4-hexadiene and 3-methyl-1,4-hexadiene, and conjugated dienes such as 1,3-butadiene and 2-methyl-1,3-butadiene (isoprene). As the other copolymerizable monomer, these may be used singly or in combination of two or more kinds thereof.
As the styrenic polymer, conventionally known ones can be widely used, the styrenic polymer is not particularly limited, but examples thereof include a polymer having a structural unit represented by the following Formula (8) (a structure derived from the styrenic monomer) in the molecule.
In Formula (8), R1 to R3 each independently represent a hydrogen atom or an alkyl group, and R4 represents any group selected from the group consisting of a hydrogen atom, an alkyl group, an alkenyl group, and an isopropenyl group. The alkyl group is not particularly limited and is, for example, preferably an alkyl group having 1 to 18 carbon atoms and more preferably an alkyl group having 1 to 10 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group. The alkenyl group is preferably an alkenyl group having 1 to 10 carbon atoms.
The styrenic polymer preferably contains at least one structural unit represented by Formula (8), and may contain two or more different structural units in combination. The styrenic polymer may contain a structure in which the structural unit represented by Formula (8) is repeated.
In addition to the structural unit represented by Formula (8), the styrenic polymer may have at least one among structural units represented by the following Formula (9), the following Formula (10), and the following Formula (11) and structures in which structural units represented by the following Formula (9), the following Formula (10), and the following Formula (11) are each repeated as a structural unit derived from another monomer copolymerizable with the styrenic monomer.
In Formula (9), Formula (10), and Formula (11), R5 to R22 each independently represent any group selected from the group consisting of a hydrogen atom, an alkyl group, an alkenyl group, and an isopropenyl group. The alkyl group is not particularly limited and is, for example, preferably an alkyl group having 1 to 18 carbon atoms and more preferably an alkyl group having 1 to 10 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group. The alkenyl group is preferably an alkenyl group having 1 to 10 carbon atoms.
The styrenic polymer preferably contains at least one among the structural units represented by Formula (9), Formula (10), and Formula (11), and may contain two or more different structural units among these in combination. The styrenic polymer may have at least one among structures in which the structural units represented by Formula (9), Formula (10), and Formula (11) are each repeated.
More specific examples of the structural unit represented by Formula (8) include structural units represented by the following Formulas (12) to (14). The structural unit represented by Formula (8) may be structures in which structural units represented by the following Formulas (12) to (14) are each repeated, and the like. The structural unit represented by Formula (8) may be one structural unit among these or a combination of two or more different structural units.
More specific examples of the structural unit represented by Formula (9) include structural units represented by the following Formulas (15) to (21). The structural unit represented by Formula (9) may be structures in which structural units represented by the following Formulas (15) to (21) are each repeated, and the like. The structural unit represented by Formula (9) may be one structural unit among these or a combination of two or more different structural units.
More specific examples of the structural unit represented by Formula (10) include structural units represented by the following Formulas (22) and (23). The structural unit represented by Formula (10) may be structures in which structural units represented by the following Formulas (22) and (23) are each repeated, and the like. The structural unit represented by Formula (10) may be one structural unit among these or a combination of two or more different structural units.
More specific examples of the structural unit represented by Formula (11) include structural units represented by the following Formulas (24) and (25). The structural unit represented by Formula (11) may be structures in which structural units represented by the following Formulas (24) and (25) are each repeated, and the like. The structural unit represented by Formula (11) may be one structural unit among these or a combination of two or more different structural units.
Preferred examples of the styrenic copolymer include polymers or copolymers obtained by polymerizing or copolymerizing one or more styrenic monomers such as styrene, vinyltoluene, α-methylstyrene, isopropenyltoluene, divinylbenzene, or allylstyrene. Examples of the styrenic copolymer include a methylstyrene (ethylene/butylene) methylstyrene block copolymer, a methylstyrene (ethylene-ethylene/propylene) methylstyrene block copolymer, a styrene isoprene block copolymer, a styrene isoprene styrene block copolymer, a styrene (ethylene/butylene) styrene block copolymer, a styrene (ethylene-ethylene/propylene) styrene block copolymer, a styrene butadiene styrene block copolymer, a styrene (butadiene/butylene) styrene block copolymer, and a styrene isobutylene styrene block copolymer. Examples of the hydrogenated styrenic copolymer include hydrogenated products of the styrenic copolymers. More specific examples of the hydrogenated styrenic copolymer include a hydrogenated methylstyrene (ethylene/butylene) methylstyrene block copolymer, a hydrogenated methylstyrene (ethylene-ethylene/propylene) methylstyrene block copolymer, a hydrogenated styrene isoprene block copolymer, a hydrogenated styrene isoprene styrene block copolymer, a hydrogenated styrene (ethylene/butylene) styrene block copolymer, and a hydrogenated styrene (ethylene-ethylene/propylene) styrene block copolymer.
As the styrenic polymer, the styrenic polymers exemplified above may be used singly or in combination of two or more kinds thereof.
The weight average molecular weight of the styrenic polymer is preferably 1,000 to 300,000, more preferably 1,200 to 200,000. When the molecular weight is too low, the glass transition temperature or heat resistance of the cured product of the resin composition tends to decrease. When the molecular weight is too high, the viscosity of the resin composition when prepared in the form of a varnish and the viscosity of the resin composition during heat molding tend to be too high. The weight average molecular weight is only required to be one measured by a general molecular weight measurement method, and specific examples thereof include a value measured by gel permeation chromatography (GPC).
As the styrenic polymer, a commercially available product can be used, and for example, V9827, V9461, 2002, and 7125F manufactured by Kuraray Co., Ltd., FTR2140 and FTR6125 manufactured by Mitsui Chemicals, Inc., and H 1041 manufactured by Asahi Kasei Corporation may be used.
The resin composition according to the present embodiment may contain an organic component other than the maleimide compound (A) and the styrenic polymer, if necessary, as long as the effects of the present invention are not impaired. Here, the organic component may or may not react with at least one of the maleimide compound (A) and the styrenic polymer. Examples of the organic component include a maleimide compound (B) different from the maleimide compound (A), an epoxy compound, a methacrylate compound, an acrylate compound, a vinyl compound, a cyanate ester compound, an active ester compound, and an allyl compound.
The maleimide compound (B) is a maleimide compound that has a maleimide group in the molecule but does not have an indane structure in the molecule. Examples of the maleimide compound (B) include a maleimide compound having one or more maleimide groups in the molecule, and a modified maleimide compound. The maleimide compound (B) is not particularly limited as long as it has one or more maleimide groups in the molecule but does not have an indane structure in the molecule. Examples of the maleimide compound (B) include phenylmaleimide compounds such as 4,4′-diphenylmethanebismaleimide, polyphenylmethanemaleimide, m-phenylenebismaleimide, bisphenol A diphenyl ether bismaleimide, 3,3′-dimethyl-5,5′-diethyl-4,4′-diphenylmethanebismaleimide, 4-methyl-1,3-phenylenebismaleimide, and a biphenylaralkyl type polymaleimide compound, and an N-alkyl bismaleimide compound having an aliphatic skeleton. Examples of the modified maleimide compound include a modified maleimide compound in which a part of the molecule is modified with an amine compound and a modified maleimide compound in which a part of the molecule is modified with a silicone compound. As the maleimide compound (B), a commercially available product can also be used, and for example, the solid component in MIR-3000-70MT manufactured by Nippon Kayaku Co., Ltd., BMI-4000 and BMI-5100 manufactured by Daiwa Kasei Industry Co., Ltd., and BMI-689, BMI-1500, and BMI-3000J manufactured by Designer Molecules Inc. may be used.
The epoxy compound is a compound having an epoxy group in the molecule, and specific examples thereof include a bisphenol type epoxy compound such as a bisphenol A type epoxy compound, a phenol novolac type epoxy compound, a cresol novolac type epoxy compound, a dicyclopentadiene type epoxy compound, a bisphenol A novolac type epoxy compound, a biphenylaralkyl type epoxy compound, and a naphthalene ring-containing epoxy compound. The epoxy compound also includes an epoxy resin, which is a polymer of each of the epoxy compounds.
The methacrylate compound is a compound having a methacryloyl group in the molecule, and examples thereof include a monofunctional methacrylate compound having one methacryloyl group in the molecule and a polyfunctional methacrylate compound having two or more methacryloyl groups in the molecule. Examples of the monofunctional methacrylate compound include methyl methacrylate, ethyl methacrylate, propyl methacrylate, and butyl methacrylate. Examples of the polyfunctional methacrylate compound include dimethacrylate compounds such as tricyclodecanedimethanol dimethacrylate (DCP).
The acrylate compound is a compound having an acryloyl group in the molecule, and examples thereof include a monofunctional acrylate compound having one acryloyl group in the molecule and a polyfunctional acrylate compound having two or more acryloyl groups in the molecule. Examples of the monofunctional acrylate compound include methyl acrylate, ethyl acrylate, propyl acrylate, and butyl acrylate. Examples of the polyfunctional acrylate compound include diacrylate compounds such as tricyclodecanedimethanol diacrylate.
The vinyl compound is a compound having a vinyl group in the molecule, and examples thereof include a monofunctional vinyl compound (monovinyl compound) having one vinyl group in the molecule and a polyfunctional vinyl compound having two or more vinyl groups in the molecule. Examples of the polyfunctional vinyl compound include divinylbenzene, a curable polybutadiene having a carbon-carbon unsaturated double bond in the molecule, a butadiene-styrene copolymer other than the styrenic polymer, a polyphenylene ether compound having a vinylbenzyl group (ethenylbenzyl group) at the terminal, and modified polyphenylene ether obtained by modifying the terminal hydroxyl group of polyphenylene ether with a methacryl group. Examples of the butadiene-styrene copolymer other than the styrenic polymer include a curable butadiene-styrene copolymer having a carbon-carbon unsaturated double bond in the molecule and being liquid at 25° C., a curable butadiene-styrene random copolymer having a carbon-carbon unsaturated double bond in the molecule, and a curable butadiene-styrene random copolymer having a carbon-carbon unsaturated double bond in the molecule and being liquid at 25° C.
The cyanate ester compound is a compound having a cyanato group in the molecule, and examples thereof include 2,2-bis(4-cyanatophenyl)propane, bis(3,5-dimethyl-4-cyanatophenyl)methane, and 2,2-bis(4-cyanatophenyl)ethane.
The active ester compound is a compound having an ester group exhibiting high reaction activity in the molecule, and examples thereof include a benzenecarboxylic acid active ester, a benzenedicarboxylic acid active ester, a benzenetricarboxylic acid active ester, a benzenetetracarboxylic acid active ester, a naphthalenecarboxylic acid active ester, a naphthalenedicarboxylic acid active ester, a naphthalenetricarboxylic acid active ester, a naphthalenetetracarboxylic acid active ester, a fluorenecarboxylic acid active ester, a fluorenedicarboxylic acid active ester, a fluorenetricarboxylic acid active ester, and a fluorenetetracarboxylic acid active ester.
The allyl compound is a compound having an allyl group in the molecule, and examples thereof include a triallyl isocyanurate compound such as triallyl isocyanurate (TAIC), a diallyl bisphenol compound, and diallyl phthalate (DAP).
As the organic component, the organic components described above may be used singly or in combination of two or more kinds thereof.
The weight average molecular weight of the organic component is not particularly limited, and is, for example, preferably 100 to 5000, more preferably 100 to 4000, still more preferably 100 to 3000. When the weight average molecular weight of the organic component is too low, there is a risk that the organic component easily volatilizes from the blended component system of the resin composition. When the weight average molecular weight of the organic component is too high, the viscosity of the varnish of the resin composition and the melt viscosity at the time of heat molding become too high, and there is a risk of deterioration in appearance and moldability when the resin composition is brought into B stage. Hence, a resin composition imparting superior heat resistance and moldability to its cured product is obtained when the weight average molecular weight of the organic component is in such a range. It is considered that this is because the resin composition can be suitably cured. Here, the weight average molecular weight may be measured by a general molecular weight measurement method, and specific examples thereof include a value measured by gel permeation chromatography (GPC).
In the organic component, the average number (number of functional groups) of the functional groups, which contribute to the reaction during curing of the resin composition, per one molecule of the organic component varies depending on the weight average molecular weight of the organic component but is, for example, preferably 1 to 20, more preferably 2 to 18. When this number of functional groups is too small, sufficient heat resistance of the cured product tends to be hardly attained. When the number of functional groups is too large, the reactivity is too high and, for example, troubles such as a decrease in the storage stability of the resin composition or a decrease in the fluidity of the resin composition may occur.
The inorganic filler is not particularly limited as long as it is an inorganic filler that can be used as an inorganic filler contained in a resin composition. Examples of the inorganic filler include metal oxides such as silica, alumina, titanium oxide, magnesium oxide and mica, metal hydroxides such as magnesium hydroxide and aluminum hydroxide, talc, aluminum borate, barium sulfate, aluminum nitride, boron nitride, barium titanate, magnesium carbonate such as anhydrous magnesium carbonate, and calcium carbonate. Among these, silica, metal hydroxides such as magnesium hydroxide and aluminum hydroxide, aluminum oxide, boron nitride, and barium titanate are preferable, and silica is more preferable. The silica is not particularly limited, and examples thereof include crushed silica, spherical silica, and silica particles.
The inorganic filler may be an inorganic filler subjected to a surface treatment or an inorganic filler not subjected to a surface treatment. Examples of the surface treatment include treatment with a silane coupling agent.
Examples of the silane coupling agent include a silane coupling agent having at least one functional group selected from the group consisting of a vinyl group, a styryl group, a methacryloyl group, an acryloyl group, a phenylamino group, an isocyanurate group, a ureido group, a mercapto group, an isocyanate group, an epoxy group, and an acid anhydride group. In other words, examples of this silane coupling agent include compounds having at least one of a vinyl group, a styryl group, a methacryloyl group, an acryloyl group, a phenylamino group, an isocyanurate group, a ureido group, a mercapto group, an isocyanate group, an epoxy group, and an acid anhydride group as a reactive functional group, and further a hydrolyzable group such as a methoxy group or an ethoxy group.
Examples of the silane coupling agent include vinyltriethoxysilane and vinyltrimethoxysilane as those having a vinyl group. Examples of the silane coupling agent include p-styryltrimethoxysilane and p-styryltriethoxysilane as those having a styryl group. Examples of the silane coupling agent include 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, and 3-methacryloxypropylethyldiethoxysilane as those having a methacryloyl group. Examples of the silane coupling agent include 3-acryloxypropyltrimethoxysilane and 3-acryloxypropyltriethoxysilane as those having an acryloyl group. Examples of the silane coupling agent include N-phenyl-3-aminopropyltrimethoxysilane and N-phenyl-3-aminopropyltriethoxysilane as those having a phenylamino group.
The average particle size of the inorganic filler is not particularly limited, and is preferably 0.01 to 50 µm, more preferably 0.05 to 20 Vtm, Here, the average particle size refers to the volume average particle size. The volume average particle size can be measured by, for example, a laser diffraction method and the like.
The content of the maleimide compound (A) is preferably 10 to 80 parts by mass, more preferably 15 to 75 parts by mass with respect to 100 parts by mass of the total mass of the maleimide compound (A) and the styrenic polymer. In other words, the content of the styrenic polymer is preferably 20 to 90 parts by mass, more preferably 25 to 85 parts by mass with respect to 100 parts by mass of the total mass of the maleimide compound (A) and the styrenic polymer. In a case where the resin composition contains the organic component, the content of the styrenic polymer is preferably 20 to 90 parts by mass, more preferably 25 to 85 parts by mass with respect to 100 parts by mass of the total mass of the maleimide compound (A), the styrenic polymer and the organic component. When the content of the maleimide compound (A) is too low, there is a tendency that the effect attained by addition of the maleimide compound (A) is unlikely to be exerted, and for example, excellent heat resistance is unlikely to be maintained. When the content of the maleimide compound (A) is too high, the adhesive properties to a metal foil tend to decrease. From these facts, when the content of each of the maleimide compound (A) and the styrenic polymer is in the above range, a cured product is more suitably obtained which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
The resin composition may contain an inorganic filler as described above. In a case where the resin composition contains the inorganic filler, the content of the inorganic filler is preferably 1 to 250 parts by mass, more preferably 10 to 200 parts by mass with respect to 100 parts by mass of the total mass of the maleimide compound (A) and the styrenic polymer.
The resin composition may contain an organic component as described above. In a case where the resin composition contains the organic component, the content of the organic component is preferably 1 to 60 parts by mass, more preferably 1 to 55 parts by mass with respect to 100 parts by mass of the total mass of the maleimide compound (A), the styrenic polymer and the organic component.
The resin composition according to the present embodiment may contain components (other components) other than the maleimide compound (A) and the styrenic polymer, if necessary, as long as the effects of the present invention are not impaired. As the other components contained in the resin composition according to the present embodiment, for example, additives such as a reaction initiator, a reaction accelerator, a catalyst, a polymerization retarder, a polymerization inhibitor, a dispersant, a leveling agent, a silane coupling agent, an antifoaming agent, an antioxidant, a heat stabilizer, an antistatic agent, an ultraviolet absorber, a dye or pigment, and a lubricant may be further contained in addition to an organic component and an inorganic filler as described above.
As described above, the resin composition according to the present embodiment may contain a reaction initiator. The reaction initiator is not particularly limited as long as it can promote the curing reaction of the resin composition, and examples thereof include a peroxide and an organic azo compound. Examples of the peroxide include α,α′-bis(t-butylperoxy-m-isopropyl)benzene, 2,5-dimethyl-2,5-di(t-butylperoxy)-3-hexyne, and benzoyl peroxide. Examples of the organic azo compound include azobisisobutyronitrile. A metal carboxylate can be concurrently used if necessary. By doing so, the curing reaction can be further promoted. Among these, α,α′-bis(t-butylperoxy-m-isopropyl)benzene is preferably used. α,α′-Bis(t-butylperoxy-m-isopropyl)benzene has a relatively high reaction initiation temperature and thus can suppress the promotion of the curing reaction at the time point at which curing is not required, for example, at the time of prepreg drying, and can suppress a decrease in storage stability of the resin composition. α,α′-Bis(t-butylperoxy-m-isopropyl)benzene exhibits low volatility, thus does not volatilize at the time of prepreg drying and storage, and exhibits favorable stability. The reaction initiators may be used singly or in combination of two or more thereof.
As described above, the resin composition according to the present embodiment may contain a silane coupling agent. The silane coupling agent may be contained in the resin composition or may be contained as a silane coupling agent covered on the inorganic filler contained in the resin composition for surface treatment in advance. Among these, it is preferable that the silane coupling agent is contained as a silane coupling agent covered on the inorganic filler for surface treatment in advance, and it is more preferable that the silane coupling agent is contained as a silane coupling agent covered on the inorganic filler for surface treatment in advance and further is also contained in the resin composition. In the case of a prepreg, the silane coupling agent may be contained in the prepreg as a silane coupling agent covered on the fibrous base material for surface treatment in advance. Examples of the silane coupling agent include those similar to the silane coupling agents used in the surface treatment of the inorganic filler described above.
As described above, the resin composition according to the present embodiment may contain a flame retardant. The flame retardancy of a cured product of the resin composition can be enhanced by containing a flame retardant. The flame retardant is not particularly limited. Specifically, in the field in which halogen-based flame retardants such as bromine-based flame retardants are used, for example, ethylenedipentabromobenzene, ethylenebistetrabromoimide, decabromodiphenyloxide, and tetradecabromodiphenoxybenzene which have a melting point of 300° C. or more are preferable. It is considered that the elimination of halogen at a high temperature and the decrease in heat resistance can be suppressed by the use of a halogen-based flame retardant. There is a case where a flame retardant containing phosphorus (phosphorus-based flame retardant) is used in fields required to be halogen-free. The phosphorus-based flame retardant is not particularly limited, and examples thereof include a phosphate ester-based flame retardant, a phosphazene-based flame retardant, a bis(diphenylphosphine oxide)-based flame retardant, and a phosphinate-based flame retardant. Specific examples of the phosphate ester-based flame retardant include a condensed phosphate ester such as dixylenyl phosphate. Specific examples of the phosphazene-based flame retardant include phenoxyphosphazene. Specific examples of the bis(diphenylphosphine oxide)-based flame retardant include xylylenebis(diphenylphosphine oxide). Specific examples of the phosphinate-based flame retardant include metal phosphinates such as an aluminum dialkyl phosphinate. As the flame retardant, the respective flame retardants exemplified may be used singly or in combination of two or more kinds thereof.
The method for producing the resin composition is not particularly limited, and examples thereof include a method in which the maleimide compound (A) and the styrenic polymer are mixed together so as to have predetermined contents. Examples thereof include the method to be described later in the case of obtaining a varnish-like composition containing an organic solvent.
Moreover, by using the resin composition according to the present embodiment, a prepreg, a metal-clad laminate, a wiring board, a metal foil with resin, and a film with resin can be obtained as described below.
As illustrated in
In the present embodiment, the semi-cured product is in a state in which the resin composition has been cured to an extent that the resin composition can be further cured. In other words, the semi-cured product is the resin composition in a semi-cured state (B-staged). For example, when a resin composition is heated, the viscosity of the resin composition first gradually decreases, then curing starts, and the viscosity gradually increases. In such a case, the semi-cured state includes a state in which the viscosity has started to increase but curing is not completed, and the like.
The prepreg to be obtained using the resin composition according to the present embodiment may include a semi-cured product of the resin composition as described above or include the uncured resin composition itself. In other words, the prepreg may be a prepreg including a semi-cured product of the resin composition (the resin composition in B stage) and a fibrous base material or a prepreg including the resin composition before being cured (the resin composition in A stage) and a fibrous base material. The resin composition or a semi-cured product of the resin composition may be one obtained by drying or heating and drying the resin composition.
When a prepreg is manufactured, the resin composition 2 is often prepared in a varnish form and used in order to be impregnated into the fibrous base material 3 which is a base material for forming the prepreg. In other words, the resin composition 2 is usually a resin varnish prepared in a varnish form in many cases. Such a varnish-like resin composition (resin varnish) is prepared, for example, as follows.
First, the respective components which can be dissolved in an organic solvent are introduced into and dissolved in an organic solvent. At this time, heating may be performed if necessary. Thereafter, components which are used if necessary but are not dissolved in the organic solvent are added to and dispersed in the solution until a predetermined dispersion state is achieved using a ball mill, a bead mill, a planetary mixer, a roll mill or the like, whereby a varnish-like resin composition is prepared. The organic solvent used here is not particularly limited as long as it dissolves the polyphenylene ether compound, the organic component and the like and does not inhibit the curing reaction. Specific examples thereof include toluene and methyl ethyl ketone (MEK).
Specific examples of the fibrous base material include glass cloth, aramid cloth, polyester cloth, a glass nonwoven fabric, an aramid nonwoven fabric, a polyester nonwoven fabric, pulp paper, and linter paper. When glass cloth is used, a laminate exhibiting excellent mechanical strength is obtained, and glass cloth subjected to flattening is particularly preferable. Specific examples of the flattening include a method in which glass cloth is continuously pressed at an appropriate pressure using a press roll to flatly compress the yarn. The thickness of the generally used fibrous base material is, for example, 0.01 mm or more and 0.3 mm or less. The glass fiber constituting the glass cloth is not particularly limited, and examples thereof include Q glass, NE glass, E glass, S glass, T glass, L glass, and L2 glass. The surface of the fibrous base material may be subjected to a surface treatment with a silane coupling agent. The silane coupling agent is not particularly limited, but examples thereof include a silane coupling agent having at least one selected from the group consisting of a vinyl group, an acryloyl group, a methacryloyl group, a styryl group, an amino group, and an epoxy group in the molecule.
The method for manufacturing the prepreg is not particularly limited as long as the prepreg can be manufactured. Specifically, when the prepreg is manufactured, the resin composition according to the present embodiment described above is often prepared in a varnish form and used as a resin varnish as described above.
Specific examples of the method for manufacturing the prepreg 1 include a method in which the fibrous base material 3 is impregnated with the resin composition 2, for example, the resin composition 2 prepared in a varnish form, and then dried. The fibrous base material 3 is impregnated with the resin composition 2 by dipping, coating, and the like. If necessary, the impregnation can be repeated a plurality of times. Moreover, at this time, it is also possible to finally adjust the composition and impregnated amount to the desired composition and impregnated amount by repeating impregnation using a plurality of resin compositions having different compositions and concentrations.
The fibrous base material 3 impregnated with the resin composition (resin varnish) 2 is heated under desired heating conditions, for example, at 80° C. or more and 180° C. or less for 1 minute or more and 10 minutes or less. By heating, the prepreg 1 before being cured (A-stage) or in a semi-cured state (B-stage) is obtained. By the heating, the organic solvent can be decreased or removed by being volatilized from the resin varnish.
The resin composition according to the present embodiment is a resin composition that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. For this reason, a prepreg including this resin composition or a semi-cured product of this resin composition is a prepreg that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. By using this prepreg, it is possible to suitably manufacture a wiring board including an insulating layer containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
As illustrated in
The method for manufacturing the metal-clad laminate 11 is not particularly limited as long as the metal-clad laminate 11 can be manufactured. Specific examples thereof include a method in which the metal-clad laminate 11 is fabricated using the prepreg 1. Examples of this method include a method in which the double-sided metal foil-clad or single-sided metal foil-clad laminate 11 is fabricated by stacking one sheet or a plurality of sheets of prepreg 1, further stacking the metal foil 13 such as a copper foil on both or one of upper and lower surfaces of the prepregs 1, and laminating and integrating the metal foils 13 and prepregs 1 by heating and pressing. In other words, the metal-clad laminate 11 is obtained by laminating the metal foil 13 on the prepreg 1 and then performing heating and pressing. The heating and pressing conditions can be appropriately set depending on the thickness of the metal-clad laminate 11, the kind of the resin composition contained in the prepreg 1, and the like. For example, it is possible to set the temperature to 170° C. to 220° C., the pressure to 3 to 4 MPa, and the time to 60 to 200 minutes. Moreover, the metal-clad laminate may be manufactured without using a prepreg. Examples thereof include a method in which a varnish-like resin composition is applied on a metal foil to form a layer containing the resin composition on the metal foil and then heating and pressing is performed.
The resin composition according to the present embodiment is a resin composition that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. For this reason, a metal-clad laminate including an insulating layer containing a cured product of this resin composition is a metal-clad laminate including an insulating layer containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. By using this metal-clad laminate, it is possible to suitably manufacture a wiring board including an insulating layer containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
As illustrated in
The method for manufacturing the wiring board 21 is not particularly limited as long as the wiring board 21 can be manufactured. Specific examples thereof include a method in which the wiring board 21 is fabricated using the prepreg 1. Examples of this method include a method in which the wiring board 21, in which wiring is provided as a circuit on the surface of the insulating layer 12, is fabricated by forming wiring through etching and the like of the metal foil 13 on the surface of the metal-clad laminate 11 fabricated in the manner described above. In other words, the wiring board 21 is obtained by partially removing the metal foil 13 on the surface of the metal-clad laminate 11 and thus forming a circuit. Examples of the method for forming a circuit include circuit formation by a semi additive process (SAP) in addition to the method described above. The wiring board 21 is a wiring board including the insulating layer 12 containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
The metal foil with resin 31 according to the present embodiment includes a resin layer 32 containing the resin composition or a semi-cured product of the resin composition and a metal foil 13 as illustrated in
The resin layer 32 may contain a semi-cured product of the resin composition as described above or may contain the uncured resin composition. In other words, the metal foil with resin 31 may be a metal foil with resin including a resin layer containing a semi-cured product of the resin composition (the resin composition in B stage) and a metal foil or a metal foil with resin including a resin layer containing the resin composition before being cured (the resin composition in A stage) and a metal foil. The resin layer is only required to contain the resin composition or a semi-cured product of the resin composition and may or may not contain a fibrous base material. The resin composition or a semi-cured product of the resin composition may be one obtained by drying or heating and drying the resin composition. As the fibrous base material, those similar to the fibrous base materials of the prepreg can be used.
As the metal foil, metal foils used in metal-clad laminates or metal foils with resin can be used without limitation. Examples of the metal foil include a copper foil and an aluminum foil.
The metal foil with resin 31 may include a cover film and the like if necessary. By including a cover film, it is possible to prevent entry of foreign matter and the like. The cover film is not particularly limited, and examples thereof include a polyolefin film, a polyester film, a polymethylpentene film, and films formed by providing a release agent layer on these films.
The method for manufacturing the metal foil with resin 31 is not particularly limited as long as the metal foil with resin 31 can be manufactured. Examples of the method for manufacturing the metal foil with resin 31 include a method in which the varnish-like resin composition (resin varnish) is applied on the metal foil 13 and heated to manufacture the metal foil with resin 31. The varnish-like resin composition is applied on the metal foil 13 using, for example, a bar coater. The applied resin composition is heated under the conditions of, for example, 80° C. or more and 180° C. or less and 1 minute or more and 10 minutes or less. The heated resin composition is formed as the uncured resin layer 32 on the metal foil 13. By the heating, the organic solvent can be decreased or removed by being volatilized from the resin varnish.
The resin composition according to the present embodiment is a resin composition that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. For this reason, a metal foil with resin including a resin layer containing this resin composition or a semi-cured product of this resin composition is a metal foil with resin including a resin layer that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. This metal foil with resin can be used in the manufacture of a wiring board including an insulating layer containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. For example, by laminating the metal foil with resin on a wiring board, a multilayer wiring board can be manufactured. As a wiring board obtained using such a metal foil with resin, there is obtained a wiring board including an insulating layer containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
The film with resin 41 according to the present embodiment includes a resin layer 42 containing the resin composition or a semi-cured product of the resin composition and a support film 43 as illustrated in
The resin layer 42 may contain a semi-cured product of the resin composition as described above or may contain the uncured resin composition. In other words, the film with resin 41 may be a film with resin including a resin layer containing a semi-cured product of the resin composition (the resin composition in B stage) and a support film or a film with resin including a resin layer containing the resin composition before being cured (the resin composition in A stage) and a support film. The resin layer is only required to contain the resin composition or a semi-cured product of the resin composition and may or may not contain a fibrous base material. The resin composition or a semi-cured product of the resin composition may be one obtained by drying or heating and drying the resin composition. As the fibrous base material, those similar to the fibrous base materials of the prepreg can be used.
As the support film 43, support films used in films with resin can be used without limitation. Examples of the support film include electrically insulating films such as a polyester film, a polyethylene terephthalate (PET) film, a polyimide film, a polyparabanic acid film, a polyether ether ketone film, a polyphenylene sulfide film, a polyamide film, a polycarbonate film, and a polyarylate film.
The film with resin 41 may include a cover film and the like if necessary. By including a cover film, it is possible to prevent entry of foreign matter and the like. The cover film is not particularly limited, and examples thereof include a polyolefin film, a polyester film, and a polymethylpentene film.
The support film and the cover film may be those subjected to surface treatments such as a matt treatment, a corona treatment, a release treatment, and a roughening treatment if necessary.
The method for manufacturing the film with resin 41 is not particularly limited as long as the film with resin 41 can be manufactured. Examples of the method for manufacturing the film with resin 41 include a method in which the varnish-like resin composition (resin varnish) is applied on the support film 43 and heated to manufacture the film with resin 41. The varnish-like resin composition is applied on the support film 43 using, for example, a bar coater. The applied resin composition is heated under the conditions of, for example, 80° C. or more and 180° C. or less and 1 minute or more and 10 minutes or less. The heated resin composition is formed as the uncured resin layer 42 on the support film 43. By the heating, the organic solvent can be decreased or removed by being volatilized from the resin varnish.
The resin composition according to the present embodiment is a resin composition that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. For this reason, a film with resin including a resin layer containing this resin composition or a semi-cured product of this resin composition is a film with resin including a resin layer that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. This film with resin can be used in suitable manufacture of a wiring board including an insulating layer containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. A multilayer wiring board can be manufactured, for example, by laminating the film with resin on a wiring board and then peeling off the support film from the film with resin or by peeling off the support film from the film with resin and then laminating the film with resin on a wiring board. As a wiring board obtained using such a film with resin, there is obtained a wiring board including an insulating layer containing a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise.
According to the present invention, it is possible to provide a resin composition that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. In addition, according to the present invention, a prepreg, a film with resin, a metal foil with resin, a metal-clad laminate, and a wiring board which are obtained using the resin composition are provided.
Hereinafter, the present invention will be described more specifically with reference to examples, but the scope of the present invention is not limited thereto.
The respective components to be used when preparing a resin composition in the present examples will be described.
Maleimide compound (A): Maleimide compound (A1) represented by Formula (2) (a maleimide compound having an indane structure in the molecule).
Specifically, this is a maleimide compound synthesized as follows.
First, into a 1-L flask equipped with a thermometer, a condenser, a Dean-Stark tube, and a stirrer, 48.5 g (0.4 mol) of 2,6-dimethylaniline, 272.0 g (1.4 mol) of α,α′-dihydroxy-1,3-diisopropylbenzene, 280 g of xylene, and 70 g of activated clay were introduced and heated to 120° C. while being stirred. Further, the temperature was raised to 210° C. while removing the distilled water through the Dean-Stark tube. By doing so, the reaction was conducted for 3 hours. After that, the reaction mixture was cooled to 140° C., 145.4 g (1.2 mol) of 2,6-dimethylaniline was introduced, and then the temperature was raised to 220° C. By doing so, the reaction was conducted for 3 hours. After the reaction, the reaction mixture was air-cooled to 100° C., and diluted with 300 g of toluene, and activated clay was removed by filtration, and low molecular weight substances such as the solvent and unreacted substances were distilled off under reduced pressure, thereby obtaining 364.1 g of a solid. The obtained solid was an amine compound (amine equivalent: 298, softening point: 70° C.) represented by the following Formula (26).
Next, 131.8 g (1.3 mol) of maleic anhydride and 700 g of toluene were introduced into a 2-L flask equipped with a thermometer, a condenser, a Dean-Stark tube, and a stirrer, and stirred at room temperature. After that, a mixed solution of 364.1 g of the amine compound represented by Formula (26) and 175 g of DMF was added dropwise over 1 hour. After completion of the dropwise addition, the mixture was further stirred at room temperature for 2 hours to conduct the reaction. After that, 37.1 g of p-toluenesulfonic acid monohydrate was added, the reaction solution was heated, and the azeotropic water and toluene were cooled and separated under reflux, and then only toluene was returned to the system, thereby conducting the dehydration reaction for 8 hours. After air-cooling to room temperature, concentration under reduced pressure was performed, the brown solution was dissolved in 600 g of ethyl acetate and washed with 150 g of deionized water three times and 150 g of 2% aqueous sodium bicarbonate solution three times, sodium sulfate was added for drying, then concentration was performed under reduced pressure, and the obtained reaction product was vacuum-dried at 80° C. for 4 hours, thereby obtaining 413.0 g of a solid. The obtained solid was analyzed by FD-MS spectrum, GPC and the like, and was found to be a maleimide compound (A1) represented by Formula (2) (n = 1.47, molecular weight distribution (Mw/Mn) = 1.81).
PBP: α,α′-Di(t-butylperoxy)diisopropylbenzene (Perbutyl P (PBP) manufactured by NOF CORPORATION)
2E4MZ: 2-Ethyl-4-methylimidazole (2E4MZ manufactured by SHIKOKU CHEMICALS CORPORATION)
Silica: Silica particles subjected to surface treatment with silane coupling agent having phenylamino group in molecule (SC2050-MTX manufactured by Admatechs Company Limited)
First, the respective components other than the inorganic filler were added to and mixed in toluene at the compositions (parts by mass) presented in Tables 1 and 2 so that the solid concentration was 30% by mass. The mixture was stirred for 60 minutes. Thereafter, the filler was added to the obtained liquid, and the inorganic filler was dispersed in the liquid using a bead mill. By doing so, a varnish-like resin composition (varnish) was obtained.
Next, a metal foil with resin and an evaluation substrate (cured product of metal foil with resin) were obtained as follows.
The obtained varnish was applied to a copper foil (3EC-VLP manufactured by Mitsui Mining & Smelting Co., Ltd., thickness: 12 µm) to have a thickness of 50 µm, and dried by heating at 130° C. for 3 minutes, thereby fabricating a metal foil with resin (copper foil with resin). Thereafter, two sheets of each obtained metal foil with resin were stacked and heated to a temperature of 220° C. at a rate of temperature rise of 3° C./min and heated and pressed under the conditions of 220° C., 120 minutes, and a pressure of 3 MPa, thereby obtaining an evaluation substrate (cured product of metal foil with resin).
The metal foil with resin and evaluation substrates (cured product of metal foil with resin) fabricated as described above were evaluated by the following methods.
Using an unclad substrate obtained by removing the copper foil from the evaluation substrate (cured product of metal foil with resin) by etching as a test piece, the Tg of the cured product of the resin composition was measured by a viscoelastic spectrometer “DMS61 00” manufactured by Seiko Instruments Inc. At this time, dynamic viscoelasticity measurement (DMA) was performed with a tensile module at a frequency of 10 Hz, and the temperature at which tan δ was maximized when the temperature was raised from room temperature to 320° C. at a rate of temperature rise of 5° C./min was taken as Tg (°C).
When the measured Tg is more than 300° C., it is denoted as “> 300” in Table 1. When the measured Tg is less than 20° C., it is denoted as “< 20” in Table 1.
An unclad substrate obtained by removing the copper foil from the evaluation substrate (cured product of metal foil with resin) by etching was cut to have a length of 25 mm and a width of 5 mm. The cut unclad substrate was used as a test piece, and the dimensional change of the test piece was measured in a range of -70° C. to 320° C. at a probe distance of 15 mm and a tensile load of 50 mV using a TMA instrument (TMA6000 manufactured by SII NanoTechnology Inc.). From this dimensional change, the average coefficient of thermal expansion in the range of 30° C. to 260° C. was calculated, and this average coefficient of thermal expansion was taken as the coefficient of thermal expansion (CTE: ppm/°C).
The copper foil was peeled off from the evaluation substrate (cured product of metal foil with resin), and the peel strength at that time was measured in conformity with JIS C 6481 (1996). Specifically, a pattern having a width of 10 mm and a length of 100 mm was formed on the evaluation substrate, the copper foil was peeled off at a speed of 50 mm/min using a tensile tester, and the peel strength (N/mm) at that time was measured.
The evaluation substrates (cured products of metal foils with resin) were left in dryers at 280° C. and 290° C. for 1 hour, respectively. Thereafter, the presence or absence of blistering in the laminate after being left was visually observed. This observation was performed on two laminates. It was evaluated as “Very Good” when blistering was not confirmed (the number of blisters was 0) after being left in a dryer at 290° C. It was evaluated as “Good” when blistering was confirmed after being left in a dryer at 290° C. but blistering was not confirmed (the number of blisters was 0) after being left in a dryer at 280° C. It was evaluated as “Poor” when blistering was confirmed after being left in a dryer at 280° C.
The copper foil was removed from the evaluation substrate (cured product of metal foil with resin) by etching. The substrate thus obtained was used as a test piece, and the test piece was placed in a drier at 120° C. for 2 hours and dried to remove moisture in the test piece. The test piece taken out from the dryer was placed in a desiccator and returned to 25° C., and the relative dielectric constant (Dk) and dielectric loss tangent (Df) of the test piece were measured by the cavity perturbation method. Specifically, the relative dielectric constant (Dk) and dielectric loss tangent (Df) of the test piece before heat treatment at 10 GHz were measured using a network analyzer (N5230A manufactured by Agilent Technologies, Inc.).
The test piece used in the measurement of relative dielectric constant and dielectric loss tangent before heat treatment was left in a drier at 130° C. for 168 hours (one week) for heat treatment. The relative dielectric constant (Dk) and dielectric loss tangent (Df) of this test piece subjected to heat treatment were measured in the same manner as the measurement of relative dielectric constant and dielectric loss tangent before heat treatment.
The difference between the relative dielectric constant before heat treatment and the relative dielectric constant after heat treatment (relative dielectric constant after heat treatment -relative dielectric constant before heat treatment) was calculated.
The difference between the dielectric loss tangent before heat treatment and the dielectric loss tangent after heat treatment (dielectric loss tangent after heat treatment - dielectric loss tangent before heat treatment) was calculated.
The results of each of the evaluations are presented in Tables 1 and 2. In a case where the varnish cannot be prepared, it is denoted as “-” in the evaluation.
As can be seen from Tables 1 and 2, in resin compositions containing a styrenic polymer being solid at 25° C., in the case of using resin compositions (Examples 1 to 17) containing a maleimide compound having an indane structure in the molecule (maleimide compound (A)), cured products were obtained which had a higher glass transition temperature and a higher peel strength and had not only a lower relative dielectric constant and a lower dielectric loss tangent but also smaller amounts of change in the relative dielectric constant and dielectric loss tangent after heat treatment as compared to the case of not using these resin compositions. Specifically, it was not possible to suitably produce varnishes of the resin compositions according to Comparative Examples 1 and 2, which were the same as the resin composition according to Example 2 except that the resin compositions contained the maleimide compound (B) [(B)-1 or (B)-2] not having an indane structure in the molecule instead of the maleimide compound (A) as a maleimide compound. In the case (Comparative Example 6) of using the maleimide compound (B)-3 that did not have an indane structure in the molecule as well, it was possible to produce a varnish depending on the maleimide compound. The cured product obtained using the resin composition according to Example 2 had not only a higher glass transition temperature but also a lower coefficient of thermal expansion as compared to the cured product obtained using such a resin composition according to Comparative Example 6. The cured product obtained using the resin composition according to Example 2 had a higher peel strength, a lower relative dielectric constant and a lower dielectric loss tangent as compared to the cured product obtained using the resin composition according to Comparative Example 4, which was the same as the resin composition according to Example 2 except that the resin composition did not contain the styrenic polymer. The cured product obtained using the resin composition according to Example 2 had a lower relative dielectric constant and a lower dielectric loss tangent or smaller amounts of change in the relative dielectric constant and dielectric loss tangent after heat treatment as compared to the case of not containing the styrenic polymer but containing an organic component instead (Comparative Example 3 and Comparative Examples 7 to 9). The cured product obtained using the resin composition according to Example 2 had not only lower heat resistance such as a lower glass transition temperature but also a lower coefficient of thermal expansion as compared to the cured product obtained using the resin composition not containing a maleimide compound according to Comparative Example 5. From these facts, it has been found that the resin compositions according to Examples 1 to 17 afford cured products, which exhibit excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. From Tables 1 and 2, it has been found that a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise, is obtained when the kind of styrenic polymer is changed, the content of the maleimide compound is changed, or an organic component is further contained as well.
This application is based on Japanese Patent Application No. 2020-153180 filed on Sep. 11, 2020, the contents of which are included in the present application.
In order to express the present invention, the present invention has been described above appropriately and sufficiently through the embodiments. However, it should be recognized by those skilled in the art that changes and/or improvements of the above-described embodiments can be readily made. Accordingly, changes or improvements made by those skilled in the art shall be construed as being included in the scope of the claims unless otherwise the changes or improvements are at the level which departs from the scope of the appended claims.
According to the present invention, there is provided a resin composition that affords a cured product, which exhibits excellent low dielectric properties and adhesive properties to a metal foil, has a high glass transition temperature, and sufficiently suppressed increases in relative dielectric constant and dielectric loss tangent due to temperature rise. In addition, according to the present invention, a prepreg, a film with resin, a metal foil with resin, a metal-clad laminate, and a wiring board which are obtained using the resin composition are provided.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2020-153180 | Sep 2020 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2021/033125 | 9/9/2021 | WO |
