This non-provisional application claims priority under 35 U.S.C. ยง 119(a) on Patent Application No(s). 108113242 filed in Taiwan, R.O.C. on Apr. 16, 2019, the entire contents of which are hereby incorporated by reference.
The present disclosure relates to reticle pods, and in particular to a reticle pod with a spoiler structure.
Advanced lithography, especially EUV (Extreme Ultraviolet) lithography, has strict requirement for cleanliness. Lithography defects result from contamination of a reticle by particles. To attain cleanliness and reticle protection, prior art entails using a reticle pod to shut out external particles. The key to micro-contamination control lies in airtightness between the upper and lower covers of a conventional reticle pod. In case of poor airtightness, particles can readily enter the reticle pod to contaminate the reticle therein.
Considering the aforesaid drawbacks of conventional reticle pod, an objective of the present disclosure is to provide a reticle pod with a spoiler structure.
To achieve at least the above objective, the present disclosure provides a reticle pod with a spoiler structure, comprising: a body which a reticle allocation area is centrally disposed at; and a cover for covering the body, wherein a peripheral area of the cover and a peripheral area of the body are fitted together by a protruding portion and a dented portion, and a spoiler structure surrounding the reticle allocation area is jointly formed by the dented portion and the protruding portion, wherein the spoiler structure comprises a spoiler passage disposed between the dented portion and the protruding portion, and the body has at least one retreated sidewall corresponding in position to the spoiler passage to form a particle-collecting space.
In an embodiment of the present disclosure, the dented portion is disposed at the body, the protruding portion is disposed at the cover, and the dented portion is flanked by a retreated sidewall from one side.
In an embodiment of the present disclosure, the dented portion is flanked by the retreated sidewall from two sides.
In an embodiment of the present disclosure, the dented portion is disposed at the cover, the protruding portion is disposed at the body, and the protruding portion is flanked by a retreated sidewall from one side.
In an embodiment of the present disclosure, the protruding portion is flanked by the retreated sidewall from two sides.
In an embodiment of the present disclosure, the protruding portion has a rectangular cross section.
In an embodiment of the present disclosure, the protruding portion has an arcuate cross section.
In an embodiment of the present disclosure, the retreated sidewall has an acute angle.
In an embodiment of the present disclosure, the retreated sidewall has a fillet.
Therefore, according to the present disclosure, the reticle pod with a spoiler structure has a spoiler passage and thus is effective in lengthening a gas flow path to thereby reduce the likelihood that particles carried by a gas will reach a reticle allocation area. Furthermore, the body has at least one retreated sidewall corresponding in position to the spoiler passage, and thus particles carried by an air current which enters the retreated sidewall is unlikely to climb across the retreated sidewall, thereby confining the particles to the spoiler passage; hence, the particles cannot enter the reticle allocation area.
To facilitate understanding of the object, characteristics and effects of this present disclosure, embodiments together with the attached drawings for the detailed description of the present disclosure are provided. Various modifications and changes can be made in accordance with different viewpoints and applications to details disclosed herein without departing from the spirit of the present disclosure. Furthermore, the accompanying drawings of the present disclosure are illustrative but are not drawn to scale. Technical features of the present disclosure are illustrated by embodiments and described below, but the embodiments are not restrictive of the claims of the present disclosure.
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A reticle allocation area 11 is centrally disposed at the body 1 and adapted to accommodate a reticle R. The reticle allocation area 11 is surrounded by a peripheral area 12.
The cover 2 covers the body 1. A peripheral area 22 (corresponding in position to the peripheral area 12 of the body 1) of the cover 2 and the peripheral area 12 of the body 1 are fitted together by a protruding portion 32 and a dented portion 31. The dented portion 31 and the protruding portion 32 jointly form a spoiler structure 3 which surrounds the reticle allocation area 11. According to the present disclosure, the dented portion 31 and the protruding portion 32 are disposed at the body 1 and the cover 2, respectively, and in a swappable manner. For example, the dented portion 31 is disposed at the body 1, whereas the protruding portion 32 is disposed at the cover 2, as shown in
The spoiler structure 3 comprises a spoiler passage 33 disposed between the dented portion 31 and the protruding portion 32. In a cross section taken along line A-A of
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While the present disclosure has been described by means of specific embodiments, numerous modifications and variations could be made thereto by those skilled in the art without departing from the scope and spirit of the present disclosure set forth in the claims.
Number | Date | Country | Kind |
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108113242 | Apr 2019 | TW | national |