Ring for a plasma processing apparatus

Abstract

Description

FIG. 1 is a front, bottom and right side perspective view of a ring for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,

FIG. 9 is an enlarged view of the portion shown in BOX 9 in FIG. 8.

The box labelled as 9 in FIG. 8 is shown in broken lines and forms no part of the claimed design.

Claims

The ornamental design for a ring for a plasma processing apparatus, as shown and described.