The present application claims priority from Japanese application JP 2006-343877 filed on Dec. 21, 2006, the content of which is hereby incorporated by reference into this application.
1. Field of the Invention
The present invention relates to an inspection apparatus and an inspection method for measuring electrical characteristics of a minute region of an electronic device.
2. Description of the Related Art
Inspection apparatuses such as an electron beam inspection apparatus (hereinafter simply referred to as an “EB inspection apparatus”) and a probe inspection apparatus have heretofore been known as inspection apparatuses for detecting an electrical defect in a microelectronic circuit formed on a semiconductor chip. The EB inspection apparatus is an inspection apparatus that locates an electrical failure in a large-scale integrated circuit (hereinafter simply referred to as an “LSI”) by irradiating a spot to be measured with an electron beam, utilizing a phenomenon in which the amount of secondary electron emissions arising from the spot to be measured varies depending on the voltage value of the spot to be measured. The probe inspection apparatus is an inspection apparatus that measures electrical characteristics of the LSI by bringing plural probes or mechanical probes arranged in accordance with the positions of characteristic measuring pads of the LSI, into contact with the measuring pads or plugs. When using the EB inspection apparatus or the probe inspection apparatus, an operator of the inspection apparatus performs manual operation to check the contact positions of the probes, while viewing an image such as an image of wiring through an optical microscope or a scanning electron microscope (hereinafter simply referred to as a “SEM”).
Recently, a circuit pattern formed on a semiconductor device such as the LSI has become more complicated, higher performance has led to higher operating frequencies, and the range of use environments has become wider. Hence, measures have had to be taken to cope with heat. Against this background, the design and development of the semiconductor device require a procedure that involves heating an LSI specimen, bringing the probe into direct contact with an object to be tested, and analyzing the electrical characteristics at a heating temperature. For example, Japanese Patent Application Laid-Open Publication No. 2000-258491 discloses a method in which, while the specimen is heated in a vacuum by a heating-cooling mechanism, the probe is moved by a probe driving mechanism to thereby measure the electrical characteristics of the specimen. Japanese Patent Application Laid-Open Publication No. Hei 6-74880 discloses that a specimen is integrally constituted with a heater and an insulation sheet interposed between the specimen and the heater. Thus, adiabatic efficiency and electrical insulation properties are improved, while temperature control is facilitated. There is a disclosure indicating that the insulation sheet having a thickness of 100 μm or more produces leak electric currents on the order of a several tens of picoamperes (pA) from the heater. Japanese Patent Application Laid-Open Publication No. 2004-227842 discloses that both the specimen and the probe are heated to substantially the same temperature.
It is essential that failure analysis be done with high sensitivity on a cell-by-cell basis, since the recent circuit pattern formed on the semiconductor device such as the LSI has become finer and more complicated. The method disclosed in Japanese Patent Application Laid-Open Publication No. 2000-258491 has difficulty in measuring the electrical characteristics with high accuracy on the order of a picoampere (pA) or lower. Specifically, in this method, since the specimen is merely placed directly in the heating-cooling mechanism such as the heater, the leak electric current arising from the heater makes the measurement difficult. When this method is followed to bring the probe into contact with a minute region on the specimen on the order of a several tens of nanometers (nm) to be observed by the SEM or the like, a drift can possibly occur due to temperature variations or temperature differentials resulting from heating. This drift causes the problem of offsetting the contact position, or causes damage to a probe point, thus making it impossible to accurately measure desired electrical characteristics. In addition, when the LSI or the like to be tested—as being in direct contact with the probe—is driven by a high clock, a great deal of heat can possibly be produced by the device. This temperature differential often leads to a drift of a several hundreds of nanometers (nm), which makes the probe point damaged. The method disclosed in Japanese Patent Application Laid-Open Publication No. Hei 6-74880 has to fabricate a heater unit integrally formed with each specimen, because the specimen, the heater and the insulation sheet are integrally formed with one another. For the recent finer semiconductor circuit pattern, acceptable leak electric current for high-sensitivity measurement is of the order of a picoampere (pA) or lower. It may be possible that the thickness of the insulation sheet is increased to suppress the leak electric current, but this configuration leads to deterioration in thermal efficiency, and leads to further difficulty in the temperature control. Thus, it is impossible to measure the electrical characteristics with high sensitivity. The method disclosed in Japanese Patent Application Laid-Open Publication No. 2004-227842 cannot measure the electrical characteristics with high accuracy if the heater is used for a variable temperature mechanism, because the probe is not provided with electrical insulation for a member for measuring the electrical characteristics.
An object of the present invention is to provide an inspection apparatus, such as a probe inspection apparatus, designed to measure electrical characteristics with high sensitivity by bringing a probe into direct contact with an LSI or the like. The inspection apparatus suppresses leak electric current from a heater to a specimen or the probe, when the specimen and the probe are heated by the heater. Thus, the inspection apparatus according to the present invention enables measuring highly sensitive electrical characteristics. Another object of the present invention is to provide the inspection apparatus which enables achieving measurement with good operability and high reliability without damage to the probe, even at the occurrence of a change in the position of the specimen due to heat.
According to the present invention, a specimen is heated by transferring heat—generated by a heater provided for a specimen stage—through a grounded metallic shield, which coats the heater as electrically insulated, and through an insulation member such as an insulation sheet disposed on a side of the metallic shield facing the mounted specimen. Moreover, a probe is heated by transferring heat—generated by a heater—through a grounded metallic shield, which coats the heater as electrically insulated, and through an insulation member such as an insulation sheet disposed on a side of the metallic shield facing the probe.
Moreover, expansion of a specimen having a fine circuit wiring pattern caused by self-heating of the specimen is detected by monitoring the height of the specimen. If a change in the height of the specimen caused by the self-heating is detected, control is performed so that the probe is withdrawn. In this way, damage to the probe is prevented.
The present invention can suppress the leak electric current from the heater to the specimen, and thus perform an inspection with high sensitivity, when the specimen is heated to measure electrical characteristics of the specimen relative to a temperature thereof.
Embodiments of the present invention will be described below with reference to the drawings. A SEM type inspection apparatus using an electron beam is herein given as an example of an inspection apparatus.
The stage 5 includes: a small stage 37 having triaxial (xyz) travel directions, on which the specimen 2 is mounted; and a large stage 36 having biaxial (XY) travel directions, on which the small stage 37 is mounted. (See
The specimen chamber 7 is provided at its top with a Z-sensor 9 of laser focus type, which is disposed to measure focal points (or heights) of the electro-optic system 4 and the specimen 2. The specimen chamber 7 is provided with a field-through 34 so that a signal and power for controlling operation of the probe stage 6 from the controller 16 or a power supply unit 13 are externally fed, and so that a signal and power for controlling operation of the small stage 37 are externally fed. The specimen chamber 7 is connected to a turbo-molecular pump (TMP) 11 and a dry pump (DP) 12 linked to the turbo-molecular pump 11, and the specimen chamber 7 is evacuated in response to a signal from the controller 16 by a utility of the display device 14. The housing of the specimen chamber 7 is supported on a frame 35 having an anti-vibration function, shown by the chain double-dashed lines in
The inspection apparatus 1 includes the display device 14 having the image display unit 15 and the controller 16. In the inspection apparatus 1, operation information is converted into a control signal by the controller 16 to act as probe and stage operation signals, thereby controlling the probe stage 6 and the stage 5.
For example when a polyimide sheet having a film thickness of 25 μm is used as the insulation sheet, the metallic shield having a thickness of 2.5 mm is used for the heaters 23 and 28 having an amount of heat of 45 W. A probe unit head 25 and the bottom of the specimen holder 20 each include a temperature sensor 32, and its temperature information is transmitted from each of the temperature sensors 32 through the field-through 34 to the controller 16. The temperature information is used to perform heater control of a heating unit power supply. The controller 16 controls the heaters 23 and 28 so that the temperature of the specimen 2 is the same as that of the probe 3, using the temperature information from the temperature sensor 32 provided for the specimen holder 20 as well as the temperature information from the temperature sensor 32 provided for the probe unit head 25.
An electric signal from the probe 3 is fed to an electrical characteristic evaluation unit 10 such as a semiconductor parameter analyzer through the field-through 34. The signal from the probe 3 is analyzed by the electrical characteristic evaluation unit 10, while the electrical characteristic evaluation unit 10 or the image display unit 15 produces displays to express analytical results numerically in graphical or tabular form. It is required that independent electrical insulation properties of the probes 3 of the probe units 33 and electrical insulation properties of the specimen 2, that is, the specimen holder 20, be floating, in order that the inspection apparatus 1 measures electrical characteristics of the specimen 2 with high sensitivity.
According to the present invention, for example, the specimen heating unit 8 has a construction as shown in
In the embodiment, for example, when a polyimide sheet having a film thickness of 25 μm and an area of 20×20 mm is used as the insulation sheet 21, the metallic shield 22 having a thickness of 2.5 mm is used for the heater 23 having an amount of heat of 45 W, resulting in successfully reducing the leak electric current to the order of 100 femtoamperes (fA). The same goes for the probe heating unit 30.
As mentioned above, the use of the specimen heating unit 8 and the probe heating unit 30 having the constructions according to the present invention makes it possible to measure highly sensitive electrical characteristics without the leak electric current to the specimen 2 and the probe 3, on the occasion of heating the specimen 2 by the heater 23.
In
The embodiment makes it possible to track a change in temperature in units of 1 kHz (or 0.001 second). As mentioned above, the probe withdrawing mechanism is provided to automatically correct and cancel the drift in the specimen 2 caused by a sharp change in temperature. This enables highly reliable measurement without damage to the probe 3 and thus enables an improvement in operability of the inspection apparatus. Moreover, it goes without saying that a preset temperature to which the specimen 2 is heated is also automatically corrected by the controller 16, if there is a change in the temperature of the specimen 2 caused by self-heating.
Description will now be given with regard to calculation of the correction value at step S14. In this embodiment, two methods are used in order to adapt to the rise in the temperature of the specimen 2. The reason for using these methods is that the probe stage 6 is not adaptable to a significant change in temperature because the probe stage 6 has a short stroke of about 5 μm, although the probe stage 6 is capable of rapid withdrawal. On the other hand, the specimen stage makes slower response than the probe stage 6, although the specimen stage has a stroke of the order of millimeters (mm). Specifically, the probe stage 6 is moved and withdrawn if the amount of change in the height of the specimen 2 is 0.1 μm or more per 1 kHz (or 0.001 second). The specimen stage is moved and withdrawn if the amount of change in the height of the specimen 2 is 1 μm or more per 1 Hz (or per second). A sampling interval (or calculation interval) between logical calculations is 1 kHz. The correction value is logically calculated in accordance with the pattern of the rise in the temperature of the specimen 2.
In this embodiment, data is acquired and monitored at intervals of 0.001 second. If the amount of change in the height of the specimen 2 is 0.1 μm or more in the period of 0.001 second, the probe stage 6 is withdrawn in accordance with the amount of change in the height. If the rate of change in the height is 1 μm or more per second, the specimen stage is withdrawn in accordance with the amount of change in the height.
As a result, as shown in
Number | Date | Country | Kind |
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2006-343877 | Dec 2006 | JP | national |