NSF Award
9801040
Active Impulse Systems, Inc. will develop two next-generation metrology tools that monitor semiconductor manufacturing processing tools in situ. These in situ monitors are based upon an Impulse Stimulated Thermal Scattering technique developed in the MIT Department of Chemistry and Electronic Packaging under NSF support. These monitors will allow in situ characterization of metal film thickness, and the concentration, depth and energy of ions implanted in semiconductor materials. Active Impulse Systems will work with SEMs, as well as SEMATECH and I300I in the development of these tools, which are expected to result in a more efficient semiconductor manufacturing capability.
