Claims
- 1. A scanning type exposure apparatus for exposing a pattern region on a mask to a substrate by scanning said mask and said substrate with respect to a plurality of projection optical systems in a predetermined direction with a speed ratio in accordance with a magnification of said projection optical system, comprising:a plurality of illumination optical systems for illuminating respective areas of said pattern region on said mask with respective light fluxes; said plurality of projection optical systems being arranged so as to correspond to said respective illumination optical systems, said projection optical systems projecting respective images of said areas illuminated by said respective illumination optical system onto respective projection areas on said substrate; a magnification changing device for detecting a change of shape of said substrate and changing a magnification of at lest one of said projection optical systems in accordance with the change of shape of said substrate; and an imaging position changing device for changing the position of an image projected via said at least one projection optical system in accordance with said change in magnification.
- 2. A scanning type exposure apparatus according to claim 1, further comprising a control device for changing, in accordance with, among said change of shape, a change in a direction perpendicular to said predetermined direction, the magnification of said at least one projection optical system, and the position of said image projected via said at least one projection optical system in said perpendicular direction, and changing the position of said image of said at least one projection optical system in said scanning direction in accordance with, among said change of shape, a change in said scanning direction.
- 3. A scanning type exposure apparatus according to claim 1, further comprising a speed ratio changing means device for changing said speed ratio in accordance with the change of shape of said substrate.
- 4. A scanning type exposure apparatus according to claim 1, wherein said plurality of projection optical systems are arranged such that adjacent projection optical systems in a direction perpendicular to said predetermined direction are displaced from each other in said predetermined direction to form a plurality of rows in said perpendicular direction.
- 5. A scanning type exposure apparatus according to claim 1, wherein said imaging position changing device comprises a plurality of plane parallel glasses with the same thickness disposed in respective optical axes of said projection optical systems and said plane parallel glasses are displaced at respectively different angles with respect to said respective optical axes in accordance with the change of shape of said substrate.
- 6. A scanning type exposure apparatus according to claim 1, wherein said imaging position changing device comprises a plurality of plane parallel glasses with different thicknesses disposed in respective optical axes of said projection optical systems and said plane parallel glasses are displaced at the same angle with respect to said respective optical axes in accordance with the change of shape of said substrate.
- 7. A scanning type exposure apparatus according to claim 1, wherein said substrate has a plurality of alignment marks arranged in the vicinity of said projection areas along said predetermined direction, said apparatus further comprising a mark detecting device disposed with a predetermined positional relationship with respect to said projection optical systems in a position capable of detecting at least a portion of said alignment marks so as to detect said alignment marks while said mask and said substrate are moved; and a positioning device for correcting the position of said mask or said substrate with respect to said projection optical systems in accordance with the detection result of said mark detecting device.
- 8. A scanning type exposure apparatus according to claim 7, wherein the change of shape of said substrate is obtained in accordance with positions of said alignment marks detected by said mark detecting device.
- 9. A scanning type exposure apparatus according to claim 1, wherein said projection optical systems are a magnification-erection type.
- 10. A scanning type exposure apparatus according to claim 1, further comprising a holding member for holding said mask and said photosensitive substrate together.
- 11. A method of exposing a pattern image of a mask to a substrate via a plurality of projection optical systems, comprising the steps of:detecting a change of shape of said substrate; changing a magnification of at least one of said projection optical systems in accordance with the change of shape of said substrate; and changing the position of an image projected via said at least one projection optical system in accordance with the change of magnification of said at least one projection optical system.
- 12. A method according to claim 11, further comprising the steps of changing, in accordance with, among said change of shape, a change in a direction perpendicular to said predetermined direction, the magnification of said at least one projection optical system, and the position of said image projected via said at least one projection optical system in said perpendicular direction; and changing the position of said image projected via said at least one projection optical system in said predetermined direction in accordance with, among said change of shape, a change in said predetermined direction.
- 13. A method according to claim 11, further comprising the step of changing said speed ratio in accordance with the change of shape of said substrate.
- 14. A scanning type exposure apparatus comprising:a plurality of projection optical systems for respectively projecting a pattern image of a mask onto a substrate; a moving device for moving said mask and said substrate relative to said projection optical systems, while holding said mask and said substrate together; and an adjusting device for detecting a change of shape of said substrate, and for adjusting at least one imaging characteristic of said projection optical systems.
- 15. An exposure apparatus for exposing a pattern of a mask onto a substrate, comprising:an image transfer system that projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other; an imaging characteristic adjusting mechanism disposed in a space between the mask and the substrate, to adjust imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate; and an exposure system that exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.
- 16. The exposure apparatus according to claim 15, wherein the imaging characteristic adjusting mechanism includes an optical member.
- 17. The exposure apparatus according to claim 15, wherein the exposure apparatus includes a plurality of projection optical systems.
- 18. The exposure apparatus according to claim 17, wherein the exposure apparatus includes five of the projection optical systems.
- 19. The exposure apparatus according to claim 15, wherein a magnification of the portion of the image transfer system that projects the pattern onto the substrate is substantially equal to one.
- 20. The exposure apparatus according to claim 15, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a trapezoidal shape.
- 21. The exposure apparatus according to claim 15, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a polygonal shape.
- 22. The exposure apparatus according to claim 15, wherein the imaging characteristic adjusting mechanism includes a light transmissive optical member.
- 23. The exposure apparatus according to claim 15, wherein the imaging characteristic adjusting mechanism adjusts a magnification of the portion of the image transfer system that projects the pattern onto the substrate.
- 24. The exposure apparatus according to claim 15, wherein the imaging characteristic adjusting mechanism adjusts a size of the pattern formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 25. The exposure apparatus according to claim 15, wherein the imaging characteristic adjusting mechanism adjusts a location where the pattern is formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 26. A scanning exposure apparatus comprising:an image transfer system that projects a pattern on a mask onto a substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate; and an imaging characteristic adjusting mechanism that adjusts imaging characteristics of a portion of the image transfer system that projects the pattern of the mask onto the substrate, the imaging characteristic adjusting mechanism disposed in a space that includes the substrate and the portion of the image transfer system that projects the pattern onto the substrate; the image transfer system performing a transfer of the pattern on the mask onto the substrate by overlapping transfer of the pattern onto the substrate.
- 27. The scanning exposure apparatus according to claim 26, wherein the imaging characteristic adjusting mechanism includes an optical member.
- 28. The scanning exposure apparatus according to claim 26, wherein the image transfer system includes a plurality of projection optical systems.
- 29. The scanning exposure apparatus according to claim 28, wherein the image transfer system includes five of the projection optical systems.
- 30. The scanning exposure apparatus according to claim 26, wherein a magnification of the portion of the image transfer system that projects the pattern onto the substrate is substantially equal to one.
- 31. The scanning exposure apparatus according to claim 26, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a trapezoidal shape.
- 32. The scanning exposure apparatus according to claim 26, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a polygonal shape.
- 33. The scanning exposure apparatus according to claim 26, wherein the imaging characteristic adjusting mechanism includes a light transmissive optical member.
- 34. The scanning exposure apparatus according to claim 26, wherein the imaging characteristic adjusting mechanism adjusts a magnification of the portion of the image transfer system that projects the pattern onto the substrate.
- 35. The scanning exposure apparatus according to claim 26, wherein the imaging characteristic adjusting mechanism adjusts a size of the pattern formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 36. The scanning exposure apparatus according to claim 26, wherein the imaging characteristic adjusting mechanism adjusts a location where the pattern is formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 37. A method of performing exposure with an exposure apparatus, comprising the steps of:utilizing an image transfer system to project an image of a pattern on a mask onto a substrate to form the pattern onto the substrate while moving the mask and the substrate synchronously such that portions of the pattern overlap each other on the substrate; and adjusting at least one imaging characteristic of a portion of the image transfer system located between the mask and the substrate, the adjusting being accomplished by using an imaging characteristic adjusting mechanism disposed in a space between the substrate and the portion of the image transfer system that projects the pattern onto the substrate.
- 38. The method according to claim 37, wherein the imaging characteristic adjusting mechanism includes an optical member.
- 39. The method according to claim 37, wherein the image transfer system includes a plurality of projection optical systems, and the adjusting step is performed with respect to at least one of the plurality of projection optical systems.
- 40. The method according to claim 39, wherein there are five of the projection optical systems.
- 41. The method according to claim 37, wherein a magnification of the portion of the image transfer system that projects the pattern onto the substrate is substantially equal to one.
- 42. The method according to claim 37, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a trapezoidal shape.
- 43. The method according to claim 37, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a polygonal shape.
- 44. The method according to claim 37, wherein the imaging characteristic adjusting mechanism includes a light transmissive optical member.
- 45. The method according to claim 39, wherein the adjusting step adjusts a magnification of the portion of the image transfer system that projects the pattern onto the substrate.
- 46. The method according to claim 37, wherein the adjusting step adjusts a size of the pattern formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 47. The method according to claim 37, wherein the adjusting step adjusts a location where the pattern is formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 48. A substrate on which an image has been exposed utilizing the method of claim 37.
- 49. A method of performing exposure with a scanning exposure apparatus, comprising the steps of:utilizing an image transfer system to project an image of a pattern on a mask onto a substrate to form the pattern onto the substrate while moving the mask and the substrate synchronously; and adjusting at least one imaging characteristic of a portion of the image transfer system that projects the pattern onto the substrate, the adjusting being accomplished by using an imaging characteristic adjusting mechanism disposed in a space that includes the substrate and the portion of the image transfer system that projects the pattern onto the substrate; wherein the imaging transfer system transfers the pattern on the mask onto the substrate by overlapping transfer of the pattern onto the substrate.
- 50. The method according to claim 49, wherein the imaging characteristic adjusting mechanism includes an optical member.
- 51. The method according to claim 49, wherein the image transfer system includes a plurality of projection optical systems, the adjusting step being performed on at least one of the plurality of projection optical systems.
- 52. The method according to claim 51, wherein there are five of the projection optical systems.
- 53. The method according to claim 49, wherein a magnification of the portion of the image transfer system that projects the pattern onto the substrate is substantially equal to one.
- 54. The method according to claim 49, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a trapezoidal shape.
- 55. The method according to claim 49, wherein a projection area of the portion of the image transfer system that projects the pattern onto the substrate has a polygonal shape.
- 56. The method according to claim 49, wherein the imaging characteristic adjusting mechanism includes a light transmissive optical member.
- 57. The method according to claim 73, wherein the adjusting step adjusts a magnification of the portion of the image transfer system that projects the pattern onto the substrate.
- 58. The method according to claim 49, wherein the adjusting step adjusts a size of the pattern formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 59. The method according to claim 49, wherein the adjusting step adjusts a location where the pattern is formed on the substrate by the portion of the image transfer system that projects the pattern onto the substrate.
- 60. A substrate on which an image has been exposed utilizing the method of claim 49.
- 61. An exposure apparatus for exposing a pattern of a mask onto a substrate, comprising:image transferring means for transferring the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during projection of the pattern onto the substrate such that portions of the pattern overlap each other; imaging characteristic adjusting means disposed in a space between the mask and the substrate, to adjust imaging characteristics of a portion of the image transferring means that projects the pattern onto the substrate; and exposing means for exposing the pattern during the synchronous movement of the mask and the substrate by the image transferring means.
Priority Claims (2)
Number |
Date |
Country |
Kind |
5-282308 |
Nov 1993 |
JP |
|
6-232963 |
Sep 1994 |
JP |
|
Parent Case Info
This is a continuation of application Ser. No. 08/337,467, filed Nov. 8, 1994, now abandoned.
US Referenced Citations (20)
Foreign Referenced Citations (1)
Number |
Date |
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63-128713 |
Jun 1988 |
JP |
Divisions (1)
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Number |
Date |
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Parent |
08/689691 |
Aug 1996 |
US |
Child |
09/300376 |
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US |
Continuations (1)
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08/337467 |
Nov 1994 |
US |
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08/689691 |
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Reissues (1)
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08/689691 |
Aug 1996 |
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09/300376 |
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