Scatterometry multi-structure shape definition with multi-periodicity

Abstract

A modeling approach is disclosed which addresses samples with different regions where the structures exhibit different periodicities. In this approach, a first partial model is generated which defines the shape, material properties and periodicity of the first region. In addition, a second partial model is generated defining the shape, material properties and periodicity of the second region. These two partial models are then merged into a combined model. When optimizing the combined model, the shape and material properties of the first and second models are independently adjusted. The optical responses of the model with differing shapes and material properties are-calculated and compared to a physical sample. This process is iteratively carried out to derive a final combined model that corresponds to a physical sample.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram of an inspection system useable with the subject invention.

FIG. 2 is a schematic representation of a complex structure with two regions having different periodicity.

FIG. 3 is a representation of the lower portion of multilayer structure of FIG. 2 having a first periodicity.

FIG. 4 is a representation of the upper portion of multilayer structure of FIG. 2 having a second periodicity, different from the first periodicity.

FIG. 5 is a representation of a combined structure which is multi-periodic.

Claims

1. A method of modeling multilayer structural features formed on a semiconductor wafer, said features including a first region having a first periodicity and a second region having a second periodicity, said method comprising the steps of: generating a first model defining the shape, material properties and periodicity of the first region;generating a second model defining the shape, material properties and periodicity of the second region;combining the first and second models into a combined model;independently adjusting the shape and material properties of the first and second models and calculating sets of optical responses of the combined model to derive a final combined model that corresponds to a physical sample; andstoring parameters associated with the combined model for subsequent evaluation of physical samples.

2. A method of evaluating a semiconductor wafer having multilayer structural features formed thereon, said features including a first region having a first periodicity and a second region having a second periodicity, said method comprising the steps of: illuminating the wafer with a probe beam of radiation;collecting the radiation reflected from the wafer;measuring the reflected light and generating optical signals in response thereto;comparing the output signals to a set of theoretical signals generated based on a combined model of the structure, wherein the combined model is a combination of first and second models, the first model defining the shape, material properties and periodicity of the first region and the second model defining the shape, material properties and periodicity of the second region; andstoring the result.

3. A method as recited in claim 2, wherein during the comparison step, the shape and material properties of the first and second models are independently adjusted to modify the generated theoretical signals in order to better match the measured optical signals.

4. A method of modeling multilayer structural features formed on a semiconductor wafer, said features including a first region having a first periodicity and a second region having a second periodicity, said method comprising the steps of: generating a first model defining the shape, material properties and periodicity of the first region with the profile of the shape being defined by first control points;generating a second model defining the shape, material properties and periodicity of the second region, with the profile of the shape being defined by second control points;combining the first and second models into a combined model;independently adjusting the shape and material properties of the first and second models and wherein the adjustment of a control point in either model is propagated to any repeating structure in the model and calculating sets of optical responses of the combined model to derive a final combined model that corresponds to a physical sample; andstoring parameters associated with the combined model for subsequent evaluation of physical samples.

5. A method as recited in claim 4, wherein combined model having control points is rendered in a display and the shape of model is adjusted by moving the control points in the display.

6. A method of modeling multilayer structural features formed on a semiconductor wafer, said features including a first region having a first periodicity and a second region having a second periodicity, said method comprising the steps of: generating a first model defining the shape, material properties and periodicity of the first region;generating a second model defining the shape, material properties and periodicity of the second region;combining the first and second models into a combined model;calculating a plurality of sets of optical responses of the combined model corresponding to different parameter sets;creating a table which matches the sets of the optical response to the associated parameter sets; andstoring the table for comparison to optical results obtained from measuring wafers.