Claims
- 1. A functionalized material comprising:a a substrate, and b. a single self-assembled monolayer prepared on said substrate in a supercritical fluid, said monolayer comprising; i. a plurality of assembly molecules, each assembly molecule having ii. an assembly atom, each assembly atom having a plurality of bonding sites greater in number than if said monolayer had been deposited by solution deposition.
- 2. The functionalized material as recited in claim 1, wherein said assembly atom is silicon having four bonding sites and said maximum portion is 40%.
- 3. The functionalized material as recited in claim 2, wherein said greater portion is greater than 55%.
- 4. The functionalized material as recited in claim 3, wherein said greater portion is greater than or equal to about 75%.
- 5. The functionalized material as recited in claim 1, wherein a surface density of said plurality of assembly molecules is greater than 5 assembly molecules per square nanometer.
- 6. The functionalized material as recited in claim 5, wherein said surface density is about 6.5 assembly molecules per square nanometer.
- 7. A functionalized material comprising:a. a substrate, and b. a single self-assembled monolayer prepared on said substrate in a supercritical fluid, said monolayer comprising; i. a plurality of assembly molecules in an amount greater than if said monolayer had been deposited by solution deposition, each of said assembly molecules having ii. an assembly atom, each assembly atom having a plurality of bonding sites.
- 8. The functionalized material as recited in claim 7, wherein said maximum surface density is less than or equal to 5 assembly molecules per square nanometer, and said greater density is greater than 5 assembly molecules per square nanometer.
- 9. The functionalized material as recited in claim 7, wherein said plurality of assembly molecules has a greater portion of fully bonded assembly atoms greater than a portion of fully bonded assembly atoms.
- 10. The functionalized material as recited in claim 9, wherein said greater portion of fully bonded silicon atoms is greater than 55%.
- 11. The functionalized material as recited in claim 10, wherein said greater portion of fully bonded silicon atoms is greater than or equal to about 75%.
- 12. The functionalized material as recited in claim 7, wherein said substrate is a mesoporous material.
CROSS REFERENCE TO RELATED INVENTION
This application is a Continuation-In-Part of application Ser. No. 09/272,762, filed Mar. 19, 1999, now abandoned.
Government Interests
This invention was made with Government support under Contract DE-AC0676RLO1830 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09/272762 |
Mar 1999 |
US |
Child |
09/528345 |
|
US |