Number | Date | Country | Kind |
---|---|---|---|
10-370113 | Dec 1998 | JP |
Number | Name | Date | Kind |
---|---|---|---|
5652162 | Liao | Jul 1997 | A |
6027983 | Hashimoto et al. | Feb 2000 | A |
6037217 | Linliu | Mar 2000 | A |
6096595 | Huang | Aug 2000 | A |
6121086 | Kuroda et al. | Sep 2000 | A |
6130461 | Oowaki et al. | Oct 2000 | A |
6333223 | Moriwaki et al. | Dec 2001 | B1 |
20020004270 | Moriwaki et al. | Jan 2002 | A1 |
Number | Date | Country |
---|---|---|
03-046267 | Feb 1991 | JP |
04-162771 | Jun 1992 | JP |
08-107154 | Apr 1996 | JP |
09-148449 | Jun 1997 | JP |
09-232443 | Sep 1997 | JP |
09-293862 | Nov 1997 | JP |
10-189966 | Jul 1998 | JP |
11-074368 | Mar 1999 | JP |
11-126829 | May 1999 | JP |
Entry |
---|
A. Chatterjee, et al., “CMOS Metal Replacement Gate Transistors Using Tantalum Pentoxide Gate Insulator”, p. 777, 1998. |
Atsushi Yamaguchi et al., “High Performance Metal Gate MOSFETs Fabricated by CMP for 0.1um Regime” p. 785, 1998. |