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5005102 | Larson | Apr 1991 | |
5046043 | Miller et al. | Sep 1991 | |
5081559 | Fazan et al. | Jan 1992 | |
5187638 | Sandhu et al. | Feb 1993 | |
5335138 | Sandhu et al. | Aug 1994 |
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2-83978 | Mar 1990 | JPX |
3-256358 | Nov 1991 | JPX |
Entry |
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Etched Shape Control of Single Crystalline Silicon in Reactive Ion Etching Containing Chlorine, Masaaki Sato et al. 1985 Dry Process Symposium, pp. 102-107. |
"A Stacked Capacitor with (Ba.sub.x Sr.sub.1-x)TiO.sup.3 For 256M DRAM", Kuniaki Koyama et al., 1991 IEEE, pp. 32.1.1-32.1.4. |