This application is a continuation of prior U.S. application Ser. No. 07/609,681, filed Nov. 6, 1990, abandoned.
Number | Name | Date | Kind |
---|---|---|---|
4288829 | Tango | Sep 1981 | |
4510678 | Eggers | Apr 1985 |
Number | Date | Country |
---|---|---|
56-70656 | Jun 1981 | JPX |
60-74658 | Apr 1985 | JPX |
60-101952 | Jun 1985 | JPX |
60-176251 | Sep 1985 | JPX |
60-254654 | Dec 1985 | JPX |
61-239656 | Oct 1986 | JPX |
62-193265 | Aug 1987 | JPX |
63-224339 | Sep 1988 | JPX |
Entry |
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Bartush et al, "Double dielectric process for multilevel metal", IBM TDB, vol. 22, No. 4, Sep. 79, pp. 1442-1445. |
"The Influence of Stress on Aluminum Conductor Life", by T. Turner et al, The Proceedings of the IEEE International Reliability Physics Symposium, 1985, pp. 142-147. |
"Line Width Dependence of Stresses in Aluminum Interconnect", by R. Jones, The Proceedings of IEEE International Reliability Physics Symposium, 1987, pp. 9-14. |
Number | Date | Country | |
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Parent | 609681 | Nov 1990 |