Patent Application
20140293711
1. Field of the Invention
One embodiment of the invention disclosed in this specification relates to a semiconductor device, a method for driving a semiconductor device, or a method for manufacturing a semiconductor device.
2. Description of the Related Art
Semiconductor elements in signal processing circuits such as central processing units (CPUs) have been downsized to increase operation speed and integration degree, and now transistors with a channel length of approximately 30 nm are manufactured. On the other hand, downsizing semiconductor elements leads to an increase in power consumption (leakage power) due to leakage current of transistors in CPUs. Specifically, most of the power consumption of conventional CPUs has been power consumed at the time of arithmetic operations (operating power), while leakage power accounts for at least 10% of the power consumption of CPUs in recent years.
The number of CPU cores in existing processors is significantly increased to improve computational performance and efficiency. However, when leakage power is increased as above in multi-core systems and many-core systems, power is consumed also in an unused CPU core; thus, it is difficult to construct a system with high power efficiency. In order to reduce power consumed in an unused CPU core, there has been suggested a method of stopping the supply of power with the use of a state retention register (i.e., power gating or normally-off computing). Specifically, a technique combined with a nonvolatile state retention register attracts attention (Non-Patent Document 1).
In a normally-off computer, the supply of power is stopped at short intervals, so that a memory element used for a state retention register needs to operate at high speed. For example, flash memory, which is nonvolatile memory, does not fill the need for high-speed performance, and its write cycles are inadequate for use as a state retention register.
In view of the above, there has been suggested a memory device in which a nonvolatile memory element that can operate at higher speed and has a larger number of write cycles than flash memory is provided in addition to a volatile memory element (Patent Document 1).
Patent Document 1 discloses an electronic circuit that includes a volatile data retention circuit using an inverter and a ferroelectric capacitor and can hold data by storing the data in the ferroelectric capacitor even when the supply of power is stopped.
In a normally-off computer, a short period of stopping the supply of power for power gating is likely to increase power consumption of a CPU when a break even time (BET) is long. Note that BET is a period of stopping the supply of power to equalize overhead power including power consumed by data saving and restoration and power that can be cut by stopping the supply of power. Thus, in order to further reduce power consumption more aggressively than ever before, it is important to further reduce power consumed by data saving and restoration. Note that overhead power is power involved in processing that is needed indirectly or additionally to perform any other processing.
Further, in the normally-off computer, if overhead time including time required for data saving and restoration in power gating is not short, it is difficult to stop the supply of power in a period during which the CPU does not operate. As the overhead time is shorter and the BET is shorter, the supply of power can be stopped even for a shorter time during which the CPU does not operate, so that power gating with fine time granularity is achieved. Note that overhead time is the time it takes to implement processing that is needed indirectly or additionally to perform any other processing.
In view of the foregoing technical background, an object of one embodiment of the present invention is to provide a semiconductor device capable of reducing overhead power. Another object of one embodiment of the present invention is to provide a semiconductor device capable of reducing overhead time. Another object of one embodiment of the present invention is to provide a device achieving lower power consumption by using one of the semiconductor devices.
In order to achieve at least one of the above objects, one embodiment of the present invention employs any of the following structures. Specifically, a semiconductor device of one embodiment of the present invention includes a first circuit, a second circuit, a third circuit, and a fourth circuit. The first circuit has a function of retaining data in a first period during which a power supply voltage is supplied. The second circuit has functions of saving the data retained in the first circuit in the first period and retaining the data saved from the first circuit in a second period during which supply of the power supply voltage is stopped. The third circuit has functions of saving the data retained in the second circuit in the second period and retaining the data saved from the second circuit in a third period during which supply of the power supply voltage is stopped. The second circuit is capable of being written with the data for a shorter time than the third circuit. The third circuit is capable of retaining the data for a longer time than the second circuit. The fourth circuit has a function of reading the data retained in the second circuit or the third circuit in a fourth period during which the power supply voltage is supplied.
A semiconductor device of another embodiment of the present invention includes a first circuit, a second circuit, a third circuit, and a fourth circuit. The first circuit has a function of retaining data in a first period during which a power supply voltage is supplied. The second circuit has functions of saving the data retained in the first circuit in the first period and retaining the data saved from the first circuit in a second period during which supply of the power supply voltage is stopped. The third circuit has functions of saving the data retained in the second circuit in the second period and retaining the data saved from the second circuit in a third period during which supply of the power supply voltage is stopped. The second circuit is capable of being written with the data for a shorter time than the third circuit. The third circuit is capable of retaining the data for a longer time than the second circuit. When a period during which supply of the power supply voltage is stopped is shorter than the second period, the data is restored from the second circuit to the first circuit through the fourth circuit in a fourth period during which the power supply voltage is supplied. When the period during which supply of the power supply voltage is stopped is longer than the second period, the data is restored from the third circuit to the first circuit through the fourth circuit in the fourth period.
In the semiconductor device of one embodiment of the present invention, the second circuit includes a first transistor containing crystalline silicon for a channel formation region, and a first capacitor charged and discharged through the first transistor in accordance with the data. The third circuit includes a second transistor containing an oxide semiconductor for a channel formation region, and a second capacitor charged and discharged through the second transistor in accordance with charge held in the first capacitor.
Note that the terms “source” and “drain” of a transistor interchange with each other depending on the polarity of the transistor or levels of potentials applied to the electrodes. In general, in an n-channel transistor, an electrode to which a lower potential is applied is called a source, and an electrode to which a higher potential is applied is called a drain. In a p-channel transistor, an electrode to which a lower potential is applied is called a drain, and an electrode to which a higher potential is applied is called a source. In this specification, although connection relation of the transistor is sometimes described assuming that the source and the drain are fixed for convenience, actually, the names of the source and the drain interchange with each other depending on the relation of the potentials. Accordingly, in this specification, a source and a drain are not particularly specified and are sometimes referred to as a first electrode (or a first terminal) and a second electrode (or a second terminal). For example, when the first electrode is a source, the second electrode refers to a drain, whereas when the first electrode is a drain, the second electrode refers to a source.
Note that the expression “A and B are connected” in this specification includes the case where A and B are electrically connected (i.e., A and B are connected through another element or another circuit) and the case where A and B are directly connected (i.e., A and B are connected without another element or another circuit placed therebetween). In addition, the state of being “electrically connected” can be regarded as a state where current, voltage, or potential can be supplied or transmitted, and therefore also includes a state of indirect connection through a circuit element such as a wiring, a resistor, a diode, or a transistor in which current, voltage, or potential can be supplied or transmitted.
Terms such as first, second, third, to N-th (N is a natural number) used in this specification are used only for preventing confusion between components, and thus do not limit numbers. For example, a first transistor in this specification can alternatively be referred to as a second transistor, a third transistor, or the like as long as it is not confused with another component.
According to one embodiment of the present invention, it is possible to provide a semiconductor device capable of reducing overhead power, a semiconductor device capable of reducing overhead time, or a device achieving lower power consumption by using one of the semiconductor devices.
In the accompanying drawings,
Embodiments of the present invention will be described in detail with reference to the accompanying drawings. Note that the present invention is not limited to the description below, and it is easily understood by those skilled in the art that modes and details can be modified in various ways without departing from the spirit and scope of the present invention. Therefore, the present invention should not be construed as being limited to the description of the embodiments. Note that in the embodiments of the present invention to be described below, the same reference numerals are used to denote the same components in different drawings.
An object of one embodiment of the present invention is not limited to those described above, and an object derived from the contents of the embodiments described below can be an object of one embodiment of the present invention. In one embodiment of the present invention, at least one object needs to be achieved.
In one embodiment of the present invention, an object other than the above objects, effect, and a novel feature will be apparent from the description of the specification and the drawings.
The embodiments described below can be implemented by being combined with any of the other embodiments described in this specification unless otherwise mentioned.
As a power supply voltage, a potential difference between a potential V1 and a potential V2 is supplied to the semiconductor device 10. One of the potential V1 and the potential V2 is high, and the other is low. The following shows an example of the structure of a semiconductor device in one embodiment of the present invention when the potential V1 is low and the potential V2 is high.
The first memory circuit 11 has a function of retaining data when a signal D including the data is input in a period during which the power supply voltage is supplied to the semiconductor device 10. The first memory circuit 11 outputs a signal Q including the retained data in the period during which the power supply voltage is supplied to the semiconductor device 10. On the other hand, the first memory circuit 11 cannot retain data in a period during which the power supply voltage is not supplied to the semiconductor device 10. That is, the first memory circuit 11 can be called a volatile memory circuit.
The second memory circuit 12 has a function of reading the data retained in the first memory circuit 11 to save the data in the period during which the power supply voltage is supplied to the semiconductor device 10. Specifically, the second memory circuit 12 includes at least a capacitor and a transistor for controlling supply, retention, or release of charge in the capacitor. Charge is supplied to the capacitor through the transistor in the on state in accordance with a potential corresponding to the data held in the first memory circuit 11, whereby the data retained in the first memory circuit 11 is saved in the second memory circuit 12.
Further, the second memory circuit 12 has a function of retaining the saved data in the period during which the power supply voltage is not supplied to the semiconductor device 10. Specifically, the transistor included in the second memory circuit 12 is turned off and the charge in the capacitor is kept, whereby the saved data is retained.
Here, a period during which data is retained in the second memory circuit 12 while the power supply voltage is not supplied to the semiconductor device 10 is determined mainly by the off-state current of the transistor and the capacitance of the capacitor in the second memory circuit 12. Turning off the transistor in the second memory circuit 12 enables data retention in a period determined by off-state current of the transistor and capacitance of the capacitor even while the power supply voltage is not supplied to the semiconductor device 10.
Note that unless otherwise specified, in this specification, off-state current of an n-channel transistor is current that flows between a source and a drain when the potential of the drain is higher than that of the source or a gate while the potential of the gate is 0 V or lower with the potential of the source used as a reference. Alternatively, in this specification, off-state current of a p-channel transistor is current that flows between a source and a drain when the potential of the drain is lower than that of the source or a gate while the potential of the gate is 0 V or higher with the potential of the source used as a reference.
The third memory circuit 13 has a function of reading the data retained in the second memory circuit 12 to save the data in the period during which the power supply voltage is not supplied to the semiconductor device 10. Specifically, the third memory circuit 13 includes at least a capacitor and a transistor for controlling supply, retention, or release of charge in the capacitor. The capacitor is charged or discharged through the transistor in accordance with a potential corresponding to the data retained in the second memory circuit 12, whereby the data retained in the second memory circuit 12 is saved in the third memory circuit 13.
Here, in one embodiment of the present invention, the data read time of the second memory circuit 12 is preferably shorter than that of the third memory circuit 13. As a specific example for achieving this, when both the second memory circuit 12 and the third memory circuit 13 include a transistor, the field-effect mobility of the transistor in the second memory circuit 12 is higher than that of the transistor in the third memory circuit 13. Specifically, the transistor in the second memory circuit 12 can be a transistor including crystalline silicon (preferably polycrystalline silicon, more preferably single crystal silicon) in a channel formation region, whereas the transistor in the third memory circuit 13 can be a transistor including an oxide semiconductor (preferably oxide containing In, Ga, and Zn) in a channel formation region.
As another specific example for making the data read time of the second memory circuit 12 shorter than that of the third memory circuit 13, when both the second memory circuit 12 and the third memory circuit 13 include a capacitor, it is possible to employ a structure in which the capacitance of the capacitor in the second memory circuit 12 is smaller than that of the capacitor in the third memory circuit 13.
By employing these structures, the second memory circuit 12 can read data held in the first memory circuit 11 at high speed in the period during which the power supply voltage is supplied to the semiconductor device 10; thus, overhead power can be easily reduced.
Although the use of the transistor including crystalline silicon in a channel formation region for the second memory circuit 12 contributes to high-speed reading of data retained in the first memory circuit 11, the off-state current of such a transistor is relatively high. Thus, if data stored in the first memory circuit 11 is saved only by the second memory circuit 12, the data cannot be retained for a long time; thus, the retention time of the second memory circuit 12 is a limiting factor even when the quiescent time of a semiconductor device including the semiconductor device 10 is long. Consequently, a period during which the supply of the power supply voltage to the first memory circuit 11 is stopped cannot be made longer.
In view of the above, the semiconductor device 10 of one embodiment of the present invention includes the third memory circuit 13 in addition to the second memory circuit 12. It is preferable that the third memory circuit 13 can retain data for a longer time than the second memory circuit 12. As a specific example for achieving this, when both the second memory circuit 12 and the third memory circuit 13 include a transistor, the off-state current of the transistor in the second memory circuit 12 is sufficiently lower than that of the transistor in the third memory circuit 13. Specifically, the transistor in the second memory circuit 12 can be a transistor including crystalline silicon in a channel formation region, whereas the transistor in the third memory circuit 13 can be a transistor including an oxide semiconductor (preferably oxide containing In, Ga, and Zn) in a channel formation region.
A transistor in which a channel formation region is formed in a film of a semiconductor having a wider bandgap and lower intrinsic carrier density than silicon has extremely low off-state current and thus is preferably used in the third memory circuit 13. Such a semiconductor can be, for example, an oxide semiconductor whose bandgap is two or more times that of silicon. The off-state current of a transistor containing such an oxide semiconductor can be much lower than that of a transistor including crystalline silicon in a channel formation region. Thus, the use of a transistor including an oxide semiconductor in a channel formation region in the third memory circuit 13 can prevent leakage of charge held in the capacitor of the third memory circuit 13. In the period during which the power supply voltage is not supplied to the semiconductor device 10, the third memory circuit 13 can retain the saved data for a longer time than the second memory circuit 12.
The capacitance of the capacitor included in the third memory circuit 13 is preferably larger than that of the capacitor included in the second memory circuit 12, in which case the third memory circuit 13 can retain the saved data for a longer time than the second memory circuit 12 in the period during which the power supply voltage is not supplied to the semiconductor device 10.
The read circuit 14 has a function of reading data stored in the second memory circuit 12 or the third memory circuit 13, in the period during which the power supply voltage is supplied to the semiconductor device 10.
As described above, in the semiconductor device of one embodiment of the present invention, the second memory circuit 12 to which data needs to be saved from the first memory circuit 11 within a period during which the power supply voltage is supplied to the semiconductor device 10 employs a structure capable of reading data at high speed. In addition, the third memory circuit 13 that can save data from the second memory circuit 12 in a period during which the supply of the power supply voltage is stopped (a period during which the power supply voltage is not supplied) has a function of retaining data for a long time to be prepared for long-term data retention. Such a structure makes it possible to minimize the time for saving data in a period during which the power supply voltage is supplied to the semiconductor device 10. Moreover, when long-term data retention is necessary, data can be saved while (instead of before) the supply of the power supply voltage is stopped. Thus, overhead power can be minimized while long-term data retention is performed. Further, a device using the semiconductor device of one embodiment of the present invention can implement power gating with fine time granularity, so that power consumption can be effectively reduced.
In this embodiment, an example of a specific structure of the semiconductor device 10 of
The transistor 212 has a function of charging and discharging the capacitor 219 in accordance with data retained in the first memory circuit 11. The transistor 212 is preferably capable of charging and discharging the capacitor 219 at high speed in accordance with data retained in the first memory circuit 11. Specifically, the transistor 212 preferably contains crystalline silicon (preferably polycrystalline silicon, more preferably single crystal silicon) in a channel formation region.
The on/off state of the transistor 213 is determined in accordance with the charge held in the capacitor 219. The transistor 215 has a function of charging and discharging the capacitor 220 in accordance with the potential of a wiring 244 when the transistor 213 is on. It is preferable that the off-state current of the transistor 215 be extremely low. Specifically, the transistor 215 preferably contains an oxide semiconductor (preferably oxide containing In, Ga, and Zn) in a channel formation region.
Specific connection relations between the elements are as follows. One of a source and a drain of the transistor 212 is connected to the first memory circuit 11. The other of the source and the drain of the transistor 212 is connected to one electrode of the capacitor 219, a gate of the transistor 213, and a gate of the transistor 218. The other electrode of the capacitor 219 is connected to a wiring 242. One of a source and a drain of the transistor 213 is connected to the wiring 244. The other of the source and the drain of the transistor 213 is connected to one of a source and a drain of the transistor 215. The other of the source and the drain of the transistor 215 is connected to one electrode of the capacitor 220 and a gate of the transistor 210. The other electrode of the capacitor 220 is connected to a wiring 243. One of a source and a drain of the transistor 210 is connected to a wiring 241. The other of the source and the drain of the transistor 210 is connected to one of a source and a drain of the transistor 218. The other of the source and the drain of the transistor 218 is connected to one of a source and a drain of the transistor 209. The other of the source and the drain of the transistor 209 is connected to one of a source and a drain of the transistor 217 and the first memory circuit 11. The other of the source and the drain of the transistor 217 is connected to a wiring 240. Although a gate of the transistor 209 is connected to a gate of the transistor 217 in
Note that
In this embodiment, an example of a more specific structure of the semiconductor device 10 described in Embodiment 1 or 2 will be described with reference to
The semiconductor device 10 includes the first memory circuit 11, the second memory circuit 12, the third memory circuit 13, and the read circuit 14. The first memory circuit 11 has a function of storing data in a period during which a potential difference between the low-level potential V1 and the high-level potential V2 is supplied as the power supply voltage.
The first memory circuit 11 includes a transmission gate 203, a transmission gate 204, an inverter 205, an inverter 206, an inverter 207, and a NAND gate 208. Note that the first memory circuit 11 may also include another circuit element such as a diode, a resistor, or an inductor as needed.
The operating frequency (corresponding to the inverse of data delay time) of the first memory circuit 11 depends on the electrical characteristics of elements included in the transmission gates 203 and 204, the inverters 205 to 207, and the NAND gate 208. Thus, in order to operate the first memory circuit 11 at high frequency in a normal operation period (i.e., a period during which power gating is not performed), transistors including crystalline silicon (preferably polycrystalline silicon, more preferably single crystal silicon) in a channel formation region are preferably used as the elements included in the transmission gates 203 and 204, the inverters 205 to 207, and the NAND gate 208. In other words, it is preferable that a transistor including amorphous silicon or an oxide semiconductor in a channel formation region be not used as any of the elements included in the transmission gates 203 and 204, the inverters 205 to 207, and the NAND gate 208. In this case, the semiconductor device 10 can operate at a frequency equivalent to (e.g., 0.5 to 1.0 times) the operating frequency of a semiconductor device that does not include the second memory circuit 12 or the third memory circuit 13 and is composed only of the first memory circuits 11.
The transmission gate 203 determines whether to output a signal in accordance with a signal CLK. Specifically, the transmission gate 203 has a function of supplying a signal D including data to an input terminal of the inverter 205 when the signal CLK is low. Further, the transmission gate 203 has high impedance and stops the supply of the signal D to the input terminal of the inverter 205 when the signal CLK is high.
The inverter 205 determines whether to output a signal in accordance with a signal RE. Specifically, the inverter 205 has a function of inverting the polarity of a potential of a signal supplied to the input terminal and supplying the signal to an input terminal of the transmission gate 204 and an input terminal of the inverter 206 when the signal RE is high. Moreover, the inverter 205 has high impedance and stops the supply of the signal to the input terminal of the transmission gate 204 and the input terminal of the inverter 206 when the signal RE is low.
The inverter 206 determines whether to output a signal in accordance with the signal CLK. Specifically, the inverter 206 has a function of inverting the polarity of a potential of a signal supplied to its input terminal and supplying the signal to the input terminal of the inverter 205 when the signal CLK is high. Moreover, the inverter 206 has high impedance and stops the supply of the signal to the input terminal of the inverter 205 when the signal CLK is low.
The transmission gate 204 determines whether to output a signal in accordance with the signal CLK. Specifically, the transmission gate 204 has a function of supplying a signal supplied to its input terminal to an input terminal of the inverter 207 when the signal CLK is high. Furthermore, the transmission gate 204 has high impedance and stops the supply of the signal to the input terminal of the inverter 207 when the signal CLK is low.
The inverter 207 has a function of supplying the signal Q to a first input terminal of the NAND gate 208. The signal Q is obtained by inverting the polarity of the potential supplied to the input terminal of the inverter 207.
The NAND gate 208 is a two-input NAND gate and determines whether to output a signal in accordance with the signal CLK. A second input terminal of the NAND gate 208 is supplied with the signal RE. Specifically, the NAND gate 208 has a function of supplying a signal to the input terminal of the inverter 207 in accordance with signals input to first and second input terminals when the signal CLK is low. In addition, the NAND gate 208 has high impedance and stops the output of a signal regardless of the signals input to the first and second input terminals when the signal CLK is high.
The second memory circuit 12 includes the n-channel transistor 212 and the capacitor 219. The third memory circuit 13 includes n-channel transistors 213, 214, and 215 and the capacitor 220. The read circuit 14 includes n-channel transistors 209, 210, and 211 and p-channel transistors 216, 217, and 218. Note that the second memory circuit 12, the third memory circuit 13, and the read circuit 14 may also include another circuit element such as a diode, a resistor, or an inductor as needed. In order for the read circuit 14 to read data at high speed, the n-channel transistors 209 to 211 and the p-channel transistors 216 to 218 preferably contain crystalline silicon (preferably polycrystalline silicon, more preferably single crystal silicon) in a channel formation region.
The transistors 216, 217, 209, 218, 210, and 211 are connected in series in this order between the wiring 240 supplied with the potential V2 and the wiring 241 supplied with the potential V1. Specifically, one of a source and a drain of the transistor 216 is connected to the wiring 240, and the other of the source and the drain of the transistor 216 is connected to one of a source and a drain of the transistor 217. The other of the source and the drain of the transistor 217 is connected to one of a source and a drain of the transistor 209. The other of the source and the drain of the transistor 209 is connected to one of a source and a drain of the transistor 218. The other of the source and the drain of the transistor 218 is connected to one of a source and a drain of the transistor 210. The other of the source and the drain of the transistor 210 is connected to one of a source and a drain of the transistor 211. The other of the source and the drain of the transistor 211 is connected to the wiring 241.
A gate of the transistor 216 and a gate of the transistor 212 are supplied with the signal RE. A gate of the transistor 211 is supplied with a signal REb that is obtained by inverting the polarity of the potential of the signal RE. A gate of the transistor 217 and a gate of the transistor 209 are supplied with the signal CLK. A gate of the transistor 215 is supplied with a signal OS_G.
A gate of the transistor 218 is connected to one of the source and the drain of the transistor 212, the gate of the transistor 213, and one electrode of the capacitor 219. The other electrode of the capacitor 219 is connected to the wiring 242 supplied with the potential V1.
The gate of the transistor 210 is connected to one of the source and the drain of the transistor 215 and one electrode of the capacitor 220. The other electrode of the capacitor 220 is connected to the wiring 243 supplied with the potential V1.
Note that the wiring 240 and the wiring 244 may be connected to each other. In addition, the wiring 241, the wiring 242, and the wiring 243 may be connected to each other.
One of the source and the drain of the transistor 213 is connected to the wiring 244 supplied with the potential V2, one of a source and a drain of the transistor 214, and a gate of the transistor 214. The other of the source and the drain of the transistor 213 is connected to the other of the source and the drain of the transistor 215 and the other of the source and the drain of the transistor 214.
An output terminal of the inverter 205, the input terminal of the transmission gate 204, and the input terminal of the inverter 206 that are included in the first memory circuit 11 are connected to the other of the source and the drain of the transistor 217 and the one of the source and the drain of the transistor 209 that are included in the read circuit 14.
The output terminal of the transmission gate 204, the input terminal of the inverter 207, and an output terminal of the NAND 208 that are included in the first memory circuit 11 are connected to the other of the source and the drain of the transistor 212 included in the second memory circuit 12.
In one embodiment of the present invention, the use of a transistor with ultra-low off-state current as the transistor 215 leads to a reduction in the amount of charge leaking from the capacitor 220, thereby ensuring a long period during which data is retained in the third memory circuit 13. Specifically, the transistor 215 is preferably a transistor that contains an oxide semiconductor (preferably highly purified intrinsic or substantially highly purified intrinsic oxide semiconductor) for a channel formation region.
A transistor that contains an oxide semiconductor, which has a wider bandgap and lower intrinsic carrier density than silicon, in channel formation region has an off-state current much lower than that of a transistor that contains silicon in a channel formation region, and thus is suitable for the transistor 215. In particular, a highly purified oxide semiconductor (purified oxide semiconductor) obtained by reduction of impurities such as moisture or hydrogen which serve as electron donors (donors) and reduction of oxygen vacancies is an intrinsic (i-type) semiconductor or a substantially i-type semiconductor. For this reason, a transistor containing a highly purified intrinsic or substantially highly purified intrinsic oxide semiconductor for a channel formation region has ultra-low off-state current and high reliability. Specifically, the off-state current (standardized on the channel width) of such a transistor can be 100 zA/μm (z: SI prefix representing 10−21) or lower, preferably 100 yA/μm (y: SI prefix representing 10−24) or lower.
In this embodiment, an example of the operation of the semiconductor device 10 illustrating in
First, in a period T1 to a period T3, a potential difference between the potential V1 and the potential V2 is applied to the semiconductor device 10 as the power supply voltage. Thus, the potential V1 is applied to the wirings 241 to 243, and the potential V2 is applied to the wirings 240 and 244.
In the period T1, the signal RE is high, the signal OS_G is high, and the signal CLK oscillates between a high and a low state at predetermined intervals. Accordingly, the node (Node3) connected to the other of the source and the drain of the transistor 212 and one electrode of the capacitor 219 is supplied with a potential corresponding to data written into the first memory circuit 11. The node (Node2) connected to the other of the source and the drain of the transistor 215 and one electrode of the capacitor 220 is supplied with a high-level potential through the wiring 244. As above, one of the features of this embodiment is that the high-level potential is supplied to the node (Node2) and the capacitor 220 is charged in the period T1.
In the next period T2, the signal RE is kept high; however, the signal OS_G becomes low and the signal CLK becomes high. Thus, the transmission gate 203 has high impedance and the supply of the signal D to the semiconductor device 10 is stopped, so that data that is most recently written in the period T1 is retained in the first memory circuit 11. Accordingly, Node3 is supplied with a potential corresponding to the data stored in the first memory circuit 11. Turning off the transistor 215 allows the high-level potential to be held at Node2 by the capacitor 220.
In the next period T3, the signal RE goes from high to low. The signal OS_G remains low, and the signal CLK remains high. Thus, the transistor 212 is turned off, so that the potential supplied in the period T2 is maintained at Node3 in the period T3. The timing chart of
Through the above operations in the periods T2 and T3, data retained in the first memory circuit 11 can be saved in the second memory circuit 12.
In the next period T4, the supply of the power supply voltage to the semiconductor device 10 is stopped. Thus, the potential V1 is applied to the wirings 240 to 244. The signal RE and the signal OS_G are kept low. The signal CLK becomes low. Accordingly, in the period T4, the potential corresponding to the data is kept at Node3 as in the period T3. However, even if the high-level potential is kept at Node3 at the beginning of the period T4, the potential of Node3 is decreased a little in the period T4 over time because of leakage current. Moreover, the high-level potential is kept at Node2 because the transistor 215 with ultra-low off-state current remains off.
In the next period T5, a state in which the supply of the power supply voltage to the semiconductor device 10 is stopped is kept. The signal RE and the signal CLK are kept low. The signal OS_G becomes high. Thus, the transistor 215 is turned on in the period T5, so that the potential of Node2 is determined by the on/off state of the transistor 213. For example, when the low-level potential is kept at Node3, the transistor 213 is off; thus, the high-level potential is kept at Node2. On the other hand, when the high-level potential is kept at Node3, the transistor 213 is on. Here, the wirings 240 and 244 have the potential V1 because the supply of the power supply voltage to the semiconductor device 10 is stopped; thus, the low-level potential is supplied to Node2.
In the period T5, a potential corresponding to data saved from the first memory circuit 11 is kept at Node3. Accordingly, in the period T5, data saved from the first memory circuit 11 to the second memory circuit 12 in the period T2 can be saved in the third memory circuit 13.
In the next period T6, a state in which the supply of the power supply voltage to the semiconductor device 10 is stopped is kept. The signal OS_G becomes low and the transistor 215 is turned off, so that the potential of Node2 is maintained. In the period T6, the signal RE and the signal CLK are kept low. When the high-level potential is kept at Node3 in the period T5, the potential of Node3 is reduced to a low level depending on the length of the period T6. On the other hand, when the low-level potential is kept at Node3 in the period T5, Node3 maintains the low-level potential regardless of the length of the period T6.
Then, in periods T7 to T10, the supply of the power supply voltage is restarted. Thus, the potential V1 is applied to the wirings 241 to 243, and the potential V2 is applied to the wirings 240 and 244. In the period T7, the signal RE, the signal CLK, and the signal OS_G are kept low. Thus, the transistors 216 and 217 are on, so that the potential of the wiring 240 is supplied to Node1.
In the period T8, the signal RE and the signal OS_G are kept low. The signal CLK becomes high. The potential of Node3 is low. Accordingly, the transistors 209, 218, and 211 are on and the transistor 217 is off in the period T8, so that the potential of Node1 is determined by the on/off state of the transistor 210. For example, the transistor 210 is off when the low-level potential is kept at Node2; thus, the high-level potential is kept at Node1. On the other hand, the transistor 210 is on when the high-level potential is kept at Node2; thus, the low-level potential is supplied to Node1 owing to the potential V1 of the wiring 241.
Node1 is connected to the output terminal of the inverter 205, the input terminal of the transmission gate 204, and the input terminal of the inverter 206 that are included in the first memory circuit 11. Thus, in the period T8, data saved from the second memory circuit 12 to the third memory circuit 13 in the period T5 can be read by the read circuit 14 and restored to the first memory circuit 11.
The timing chart of
Note that when the period T6 is short, it is possible that the potential of Node3 is not reduced to a low level in the period T8. In this case, since the transistor 218 is off, the high-level potential is kept at Node1 as in the case where the low-level potential is kept at Node2. Consequently, in any case, data saved from the second memory circuit 12 to the third memory circuit 13 in the period T5 can be restored to the first memory circuit 11.
In the period T9, the signal RE goes from low to high. The signal CLK remains high, and the signal OS_G remains low. Thus, in the period T9, the inverter 205 starts to supply signals to the input terminal of the transmission gate 204 and the input terminal of the inverter 206. The NAND gate 208 starts to supply a signal that is obtained by inverting the polarity of the potential supplied to the first input terminal, to the input terminal of the inverter 207. The transmission gate 204 supplies a signal to the input terminal of the inverter 207. Accordingly, in the period T9, the restored data is retained in the first memory circuit 11.
In the period T9, the transistor 212 is turned on, so that a potential corresponding to the data stored in the first memory circuit 11 is applied to Node3. The timing chart of
In the next period T10, as in the period T1, the signal RE is high, the signal OS_G is high, and the signal CLK oscillates between a high and a low state at predetermined intervals. Thus, as in the period T9, Node3 is supplied with the potential corresponding to the data written into the first memory circuit 11. Node2 is supplied with the high-level potential.
Note that in the semiconductor device 10 illustrated in
In addition, in the semiconductor device 10 shown in
In the semiconductor device 10 in
In the case where the switching of the transistor 212 is controlled with the signal RE, the number of signals necessary for controlling the operation of the semiconductor device 10 can be smaller than that in the case where the switching of the transistor 212 is controlled with a signal other than the signal RE.
In the read circuit 14 in the semiconductor device 10 shown in
On the other hand, in the case where the switching of the transistors 217 and 209 are controlled with the signal CLK, the number of signals necessary for controlling the operation of the semiconductor device 10 can be smaller than that in the case where the switching of the transistors 217 and 209 are controlled with a signal other than the signal CLK.
Employing the operation described in this embodiment enables a device including the semiconductor device 10 to reduce overhead power consumed by data saving and restoration.
In this embodiment, an example of the operation of the semiconductor device 10 illustrating in
In the operation example described in Embodiment 4, data stored in the third memory circuit 13 is used to restore data to the first memory circuit 11 regardless of the length of a period during which the power supply voltage is not supplied (also referred to as a period without power supply). On the other hand, in the operation example of this embodiment, in order to restore data to the first memory circuit 11, data stored in the third memory circuit 13 is used when the period without power supply is long, whereas data stored in the second memory circuit 12 is used when the period without power supply is short.
Here, a reference for determining whether the period without power supply is long or short can be set as appropriate. For example, whether the period without power supply is long or short can be set using any of the following references: the time it takes to save data from the second memory circuit 12 to the third memory circuit 13; predetermined counts of the clock signal (e.g., 10000, 100, 10, or 1 counts); and a maximum period during which the second memory circuit 12 can store data long enough to restore the original correct data from the second memory circuit 12 to the first memory circuit 11.
When the period without power supply is long, the operation described in Embodiment 4 is performed; therefore, the description is omitted here.
The operation example in which the period without power supply is short is described.
First, in a period T1 to a period T3, a potential difference between the potential V1 and the potential V2 is applied to the semiconductor device 10 as the power supply voltage. Thus, the potential V1 is applied to the wirings 241 to 243, and the potential V2 is applied to the wirings 240 and 244.
The period T1 corresponds to a normal operation period (i.e., a period during which power gating is not performed). In the period T1, the signal RE is high, the signal OS_G is high, and the signal CLK oscillates between a high and a low state at predetermined intervals. Accordingly, the node (Node3) connected to the other of the source and the drain of the transistor 212 and one electrode of the capacitor 219 is supplied with a potential corresponding to data written into the first memory circuit 11. The node (Node2) connected to the other of the source and the drain of the transistor 215 and one electrode of the capacitor 220 is supplied with a high-level potential through the wiring 244. As above, one of the features of this embodiment is that the high-level potential is supplied to the node (Node2) and the capacitor 220 is charged in the period T1.
In the next period T2, the signal RE is kept high; however, the signal OS_G becomes low and the signal CLK becomes high. Thus, the transmission gate 203 has high impedance and the supply of the signal D to the semiconductor device 10 is stopped, so that data that is most recently written in the period T1 is retained in the first memory circuit 11. Accordingly, Node3 is supplied with a potential corresponding to the data stored in the first memory circuit 11. The transistor 215 is turned off, whereby the high-level potential applied in the period T1 is held at Node2 by the capacitor 220.
In the next period T3, the signal RE goes from high to low. The signal OS_G remains low, and the signal CLK remains high. Thus, the transistor 212 is turned off, so that the potential supplied in the period T2 is maintained at Node3 in the period T3. The timing chart of
Through the above operations in the periods T2 and T3, data retained in the first memory circuit 11 can be saved in the second memory circuit 12.
In the next period T4, the supply of the power supply voltage to the semiconductor device 10 is stopped. The potential V1 is applied to the wirings 240 to 244. The signal RE and the signal OS_G are kept low. The signal CLK becomes low. Thus, in the period T4, the potential corresponding to the data is kept at Node3 as in the period T3. However, even if the high-level potential is kept at Node3 at the beginning of the period T3, the potential of Node3 is decreased a little in the period T4 over time because of leakage current of the transistor 212. Since the off-state current of the transistor 215 is extremely low, charge does not leak through the transistor 215 in the off state, so that the high-level potential kept at Node2 in the period T3 is maintained in the period T4.
Then, in a period T11, the signal RE and the signal CLK are kept low. The supply of the power supply voltage to the semiconductor device 10 is stopped for a predetermined period and then restarted. The signal OS_G becomes high and then goes to low. Accordingly, in the period T11, the transistors 216 and 217 are kept on after the supply of the power supply voltage is restarted; thus, the potential of the wiring 240 is supplied to Node1. Here, the wiring 240 is supplied with the potential V1, and then supplied with the potential V2 in response to restart of the supply of the power supply voltage. Thus, the potential of Node1 changes from low level (the potential V1) to high level (the potential V2) during the period T11. That is, the potential of Node1 is high at the end of the period T11.
Here, if the low-level potential is kept at Node3 in the period T11, the transistor 213 is off and the high-level potential kept at Node2 in the period T4 is maintained.
When the high-level potential is kept at Node3 in the period T11 as shown in
Note that the length of the period during which the signal OS_G is high in the period T11 of
Next, in the period T8, the power supply voltage keeps being supplied to the semiconductor device 10, and the signal RE and the signal OS_G are kept low. The signal CLK becomes high.
If the low-level potential is maintained at Node3 in the period T11, the transistor 218 is turned on in the period T8. The transistor 210 is on because the high-level potential is maintained at Node2. The transistor 211 is on because the signal REb is high. The transistor 209 is on and the transistor 217 is off because the signal CLK is high. Accordingly, Node1 is supplied with the potential of the wiring 241 (i.e., the low-level potential) through the transistors 209, 218, 210, and 211. Thus, in the period T8, data saved in the second memory circuit 12 in the periods T2 and T3 can be read by the read circuit 14 and restored to the first memory circuit 11.
When the high-level potential is kept at Node3 in the period T11 as shown in
When the high-level potential is kept at Node3 as described above, the potential of Node3 is decreased a little over time by the leakage current in a period during which the signal RE is low (i.e., in the periods T3, T4, T11, and T8). However, these periods are short enough to restore the original correct data from the second memory circuit 12 to the first memory circuit 11 and thus do not cause a problem with data restoration. In other words, if the period during which the signal RE is low is so long that a problem arises in data restoration (e.g., if the potential of Node3 goes form high to low during the period T6 as shown in
As described above, data can be read from the second memory circuit 12 and transmitted to the first memory circuit 11 (Node1) in the period T11 even when there is not enough time to save data stored in the second memory circuit 12 to the third memory circuit 13. Thus, overhead time as well as overhead power consumed by data saving and restoration can be reduced, whereby power gating with fine time granularity can be implemented.
Here, shorter overhead time achieved by the operation described in this embodiment will be described in detail.
In the operation example described in Embodiment 4 with reference to
On the other hand, in the operation example described in this embodiment with reference to
When the overhead time in the operation example of
From the reasons described above, to restore data to the first memory circuit 11, the semiconductor device 10 operates in the mode described in Embodiment 4 using
In the period T9, the signal RE goes from low to high. The signal CLK remains high, and the signal OS_G remains low. Thus, in the period T9, the inverter 205 starts to supply signals to the input terminal of the transmission gate 204 and the input terminal of the inverter 206. The NAND gate 208 starts to supply a signal that is obtained by inverting the polarity of the potential supplied to the first input terminal, to the input terminal of the inverter 207. The transmission gate 204 supplies a signal to the input terminal of the inverter 207. Accordingly, in the period T9, the restored data is retained in the first memory circuit 11.
In the period T9, the transistor 212 is turned on, so that a potential corresponding to the data stored in the first memory circuit 11 is applied to Node3. The timing chart of
The next period T10 corresponds to a normal operation period (a period during which power gating is not performed). In other words, as in the period T1, the signal RE is high, the signal OS_G is high, and the signal CLK oscillates between a high and a low state at predetermined intervals. Thus, as in the period T9, Node3 is supplied with the potential corresponding to the data written into the first memory circuit 11. Node2 is supplied with the high-level potential.
As has been described above, by performing the operation described in this embodiment, a semiconductor device including the semiconductor device 10 can reduce overhead time in addition to overhead power consumed by data saving and restoration. Consequently, power gating with fine time granularity can be implemented.
In this embodiment, examples of the structure of a semiconductor device will be described.
A semiconductor device illustrated in
In Embodiment 7, an example of the structure of a device including the semiconductor device in one embodiment of the present invention will be described with reference to
A semiconductor device 300 illustrated in
The control unit 307 has functions of decoding and executing instructions contained in a program such as inputted applications by controlling the overall operations of the PC 308, the pipeline registers 309 and 310, the ALU 311, the register file 312, the cache 304, the bus interface 305, the debug interface 306, and the power controller 302.
The ALU 311 has a function of performing a variety of arithmetic operations such as four arithmetic operations and logic operations.
The cache 304 has a function of temporarily storing frequently used data. The PC 308 is a register having a function of storing an address of an instruction to be executed next. Although not illustrated in
The pipeline register 309 has a function of temporarily storing instruction data.
The register file 312 includes a plurality of registers including a general purpose register and can save data that is read from the main memory of the control unit 307, data obtained as a result of arithmetic operations in the ALU 311, or the like.
The pipeline register 310 has a function of temporarily storing data used for arithmetic operations performed in the ALU 311, data obtained as a result of arithmetic operations in the ALU 311, or the like.
The bus interface 305 functions as a path for data between the semiconductor device 300 and devices outside the semiconductor device 300. The debug interface 306 functions as a path of a signal for inputting an instruction to control debugging to the semiconductor device 300. The bus interface 305 and the debug interface 306 are each provided with a register.
The power switch 303 has a function of controlling supply of the power supply voltage to circuits other than the power controller 302 in the semiconductor device 300. These circuits belong to several different power domains. The power switch 303 controls whether the power supply voltage is supplied to circuits in the same power domain. The power controller 302 has a function of controlling the operation of the power switch 303.
A description is made on an example of the power gating sequence in the semiconductor device 300 having the above configuration.
First, the CPU core 301 sets the timing for stopping the supply of the power supply voltage in a register of the power controller 302. Next, an instruction to start power gating is sent from the CPU core 301 to the power controller 302. Then, the registers and the cache 304 in the semiconductor device 300 start data saving. Subsequently, the power switch 303 stops the supply of the power supply voltage to the circuits other than the power controller 302 in the semiconductor device 300. Then, an interrupt signal is input to the power controller 302, thereby starting the supply of the power supply voltage to the circuits included in the semiconductor device 300. Note that a counter may be provided in the power controller 302 to be used to determine the timing of starting the supply of the power supply voltage regardless of input of an interrupt signal. Next, the registers and the cache 304 start data restoration. After that, execution of an instruction is resumed in the control unit 307.
In Embodiment 8, application examples of the semiconductor device in one embodiment of the present invention will be described.
In Embodiment 9, an example of structures of elements used in the semiconductor device of one embodiment of the present invention will be described with reference to
In the transistor 462, a channel formation region is provided in a single crystal silicon substrate 400 having n-type conductivity. Note that this is merely an example, and crystalline silicon such as polycrystalline silicon can be used for the transistor 462. Moreover, a single crystal silicon substrate having p-type conductivity can be used instead of the single crystal silicon substrate having n-type conductivity.
The transistor 462 is electrically isolated from other transistors by an element isolation insulating film 401. The transistor 462 includes impurity regions 402 and 403 that are formed in the single crystal silicon substrate 400 and function as a source region and a drain region, a gate electrode 404, and a gate insulating film 405 provided between the single crystal silicon substrate 400 and the gate electrode 404. The gate electrode 404 includes a region that overlaps a channel formation region formed between the impurity regions 402 and 403 with the gate insulating film 405 placed between the gate electrode 404 and the channel formation region.
An insulating film 409 is provided over the transistor 462. Openings are formed in the insulating film 409. A wiring 410 connected to the impurity region 402, a wiring 411 connected to the impurity region 403, and a wiring 412 electrically connected to the gate electrode 404 are formed in the openings.
The wiring 410 is electrically connected to a wiring 415 provided over the insulating film 409. The wiring 411 is electrically connected to a wiring 416 provided over the insulating film 409. The wiring 412 is electrically connected to a wiring 417 provided over the insulating film 409. A wiring 418 is provided over the insulating film 409.
An insulating film 420 and an insulating film 440 are stacked in this order over the wirings 415 to 418. An opening is formed in the insulating films 420 and 440. A wiring 421 electrically connected to the wiring 418 is provided in the opening.
The transistor 460 and the capacitor 461 are provided over the insulating film 440.
The transistor 460 includes an oxide semiconductor film 430, conductive films 432 and 433 that are positioned over the oxide semiconductor film 430 and function as a source electrode and a drain electrode, a gate insulating film 431 over the oxide semiconductor film 430 and the conductive films 432 and 433, and a gate electrode 434 that is positioned over the gate insulating film 431 and includes a region overlapping the oxide semiconductor film 430 between the conductive films 432 and 433. The conductive film 433 is electrically connected to the wiring 421.
A conductive film 435 is provided over the conductive film 433 with the gate insulating film 431 placed therebetween. A portion where the conductive film 435 overlaps the conductive film 433 with the gate insulating film 431 placed therebetween functions as the capacitor 461.
An insulating film 441 and an insulating film 442 are stacked in this order over the transistor 460 and the capacitor 461. An opening is formed in the insulating films 441 and 442. A conductive film 443 in contact with the gate electrode 434 is provided in the opening.
Next, a preferred structural example of the transistor 460 will be described.
As described in the foregoing embodiments, the transistor 460 used in the third memory circuit 13 is preferably capable of long-term data retention. As one way of having such properties, the transistor 460 used in the third memory circuit 13 needs to have sufficiently low off-state current.
An oxide semiconductor film should be used for a channel formation region to obtain a transistor having sufficiently low off-state current. Specifically, a highly purified oxide semiconductor (purified OS) obtained by reduction of impurities such as moisture or hydrogen serving as electron donors (donors) and reduction of oxygen vacancies is preferably used for a channel formation region. The purified oxide semiconductor is an i-type (intrinsic) semiconductor or a substantially i-type semiconductor. For this reason, a transistor having a channel formation region in a purified intrinsic or substantially purified intrinsic oxide semiconductor film has ultra-low off-state current and high reliability.
For example, in some cases, hydrogen in an oxide semiconductor film forms impurity states, whereby carrier density is increased. For this reason, a purified intrinsic or substantially purified intrinsic oxide semiconductor film preferably has a region with a hydrogen concentration of 5×1021 atoms/cm3 or less (preferably 5×102° atoms/cm3 or less, more preferably 5×1019 atoms/cm3 or less, still more preferably 5×1018 atoms/cm3 or less). The hydrogen concentration is measured by secondary ion mass spectrometry (SIMS). Further, in some cases, nitrogen in an oxide semiconductor film forms impurity levels, which increase carrier density. For this reason, a purified intrinsic or substantially purified intrinsic oxide semiconductor film preferably has a region with a nitrogen concentration of less than 5×1019 atoms/cm3 (preferably 5×1018 atoms/cm3 or less, more preferably 1×1018 atoms/cm3 or less, still more preferably 5×1017 atoms/cm3 or less), which is obtained by SIMS.
Various experiments can prove low off-state current of a transistor including a channel formation region in a purified intrinsic or substantially purified intrinsic oxide semiconductor film. For example, the off-state current of even an element having a channel width of 1×106 μm (=1 m) and a channel length of 10 μm can be lower than or equal to the measurement limit of a semiconductor parameter analyzer, that is, lower than or equal to 1×10−13 A at a voltage between the source and drain electrodes (drain voltage) of 1 V to 10 V. In this case, it can be seen that off-state current standardized on the channel width of the transistor is lower than or equal to 100 zA/μm. In addition, the off-state current is measured using a circuit in which a capacitor and a transistor are connected to each other and charge flowing into or from the capacitor is controlled by the transistor. In the measurement, a purified intrinsic or substantially purified intrinsic oxide semiconductor film is used for a channel formation region of the transistor, and the off-state current of the transistor is measured from a change in the amount of charge of the capacitor per unit time. As a result, it is found that when the voltage between the source and drain electrodes of the transistor is 3 V, a lower off-state current of several tens of yoctoamperes per micrometer (yA/μm), i.e., an off-state current of less than 100 yA/μm is obtained. As above, the off-state current of the transistor in which a purified intrinsic or substantially purified intrinsic oxide semiconductor film is used for a channel formation region is much lower than that of a transistor including crystalline silicon.
Note that an oxide semiconductor preferably contains at least indium (In) and/or zinc (Zn). In addition to indium (In) and/or zinc (Zn), the oxide semiconductor preferably contains gallium (Ga) as a stabilizer that reduces variations in electrical characteristics among transistors using the oxide semiconductor for a channel formation region. The oxide semiconductor may also contain tin (Sn), hafnium (Hf), aluminum (Al), or zirconium (Zr).
An In—Ga—Zn-based oxide and an In—Sn—Zn-based oxide among oxide semiconductors have the following advantages over silicon carbide, gallium nitride, and gallium oxide: transistors with excellent electrical characteristics can be formed by sputtering or a wet process and thus can be mass-produced easily. Moreover, unlike silicon carbide, gallium nitride, or gallium oxide, the In—Ga—Zn-based oxide allows a transistor with favorable electrical characteristics to be formed over a glass substrate and allows the use of a larger substrate.
The In—Ga—Zn-based oxide has sufficiently high resistance when no electric field is applied thereto, so that off-state current can be sufficiently reduced and mobility can be increased.
In this specification, an In—Ga—Zn-based oxide means an oxide containing In, Ga, and Zn, and there is no limitation on the ratio of In, Ga, and Zn. Further, the In—Ga—Zn-based oxide may contain a metal element other than In, Ga, and Zn. Interpretation of such notation in this specification applies to other elements.
For example, as an In—Ga—Zn-based oxide, an oxide with an atomic ratio of In:Ga:Zn=1:1:1 (=1/3:1/3:1/3) or 2:2:1 (=2/5:2/5:1/5) or an oxide with an approximate composition of the above oxide can be used. As an In—Sn—Zn-based oxide, an oxide with an atomic ratio of In:Sn:Zn=1:1:1 (=1/3:1/3:1/3), 2:1:3 (=1/3:1/6:1/2), or 2:1:5 (=1/4:1/8:5/8) or an oxide with an approximate composition of the above oxide may be used.
Although whether an oxide semiconductor film has crystallinity is not particularly limited, the oxide semiconductor film may include non-single crystals, for example. Specific examples of non-single crystals are a c-axis aligned crystal (CAAC), a polycrystal, a microcrystal, and an amorphous part. Among these, the oxide semiconductor film preferably includes a CAAC. In this specification, an oxide semiconductor including a CAAC is called a c-axis aligned crystalline oxide semiconductor (CAAC-OS).
In an image obtained with a transmission electron microscope (TEM), for example, crystal parts can be found in the CAAC-OS in some cases. In most cases, in an image obtained with a TEM, crystal parts in the CAAC-OS each fit inside a cube whose one side is less than 100 nm, for example. In an image obtained with a TEM, a boundary between the crystal parts in the CAAC-OS or a grain boundary in the CAAC-OS is not clearly observed in some cases. Since a clear grain boundary does not exist in the CAAC-OS, for example, segregation of an impurity, high density of defect states, and a reduction in electron mobility is unlikely to occur.
For example, the CAAC-OS sometimes includes a plurality of crystal parts in which c-axes are aligned in a direction parallel to a normal vector of a surface where the CAAC-OS is formed or a normal vector of a surface of the CAAC-OS. When the CAAC-OS is analyzed by an out-of-plane method with an X-ray diffraction (XRD) apparatus, a peak appears at 2 θ of around 31° in some cases. In a crystal of InGaZnO4, the peak at 2 θ of around 31° indicates a (009) crystal plane orientation. Further, in the CAAC-OS, a peak appears at 2 θ of around 36° in some cases. In a crystal of ZnGa2O4, the peak at 2 θ of around 36° indicates a (222) crystal plane orientation. In the CAAC-OS, it is preferable that the peak appear at 2 θ of around 31° and do not appear at 2θ of around 36°.
In the CAAC-OS, for example, among crystal parts, the directions of the a-axis and b-axis of one crystal part are sometimes different from those of another crystal part. For instance, when the CAAC-OS including a crystal of InGaZnO4 is analyzed with an X-ray diffractometer by an in-plane method in which an X-ray enters a sample in a direction perpendicular to the c-axis, a peak appears at 2 θ of around 56° in some cases. The peak at 2 θ of around 56° is derived from the (110) plane of the InGaZnO4 crystal. Here, when analysis (q) scan) is performed with 2θ fixed at around 56° and with a sample rotated using a normal vector of a surface of the sample as an axis (q) axis), a peak is not clearly observed in a sample of the CAAC-OS although six peaks having symmetry appear in a sample of a single crystal oxide semiconductor, in which the directions of the a-axis and b-axis of one crystal part are the same as those of another crystal part.
As described above, in a macroscopic view of the CAAC-OS, the c-axes are aligned and the a-axes and/or b-axes are not aligned in some cases, for example.
In each of the crystal parts included in the CAAC-OS, for example, the c-axis is aligned in a direction parallel to a normal vector of a surface where the CAAC-OS is formed or a normal vector of a surface of the CAAC-OS, triangular or hexagonal atomic arrangement that is seen from the direction perpendicular to the a-b plane is formed, and metal atoms are arranged in a layered manner or metal atoms and oxygen atoms are arranged in a layered manner when seen from the direction perpendicular to the c-axis. Note that among crystal parts, the directions of the a-axis and b-axis of one crystal part may be different from those of another crystal part. In this specification, the term “perpendicular” includes a range from 80° to 100°, preferably from 85° to 95°. In addition, the term “parallel” includes a range from −10° to 10°, preferably from −5° to 5°.
Since the c-axes of the crystal parts included in the CAAC-OS are aligned in the direction parallel to a normal vector of a surface where the CAAC-OS is formed or a normal vector of a surface of the CAAC-OS, the directions of the c-axes may be different from each other depending on the shape of the CAAC-OS film (the cross section of the surface where the CAAC-OS is formed or the cross section of the surface of the CAAC-OS). The film deposition is accompanied with the formation of the crystal parts or followed by the formation of the crystal parts through crystallization treatment such as heat treatment. Hence, the c-axes of the crystal parts are aligned in the direction parallel to a normal vector of the surface where the CAAC-OS is formed or a normal vector of the surface of the CAAC-OS.
The CAAC-OS can be obtained by reduction in the impurity concentration, for example. Here, the impurity means an element other than the main components of the oxide semiconductor, such as hydrogen, carbon, silicon, or a transition metal element. In particular, the bond strength of an element such as silicon with oxygen is higher than that of a metal element included in the oxide semiconductor; therefore, when the element abstracts oxygen in the oxide semiconductor, the atomic arrangement in the oxide semiconductor is disordered and the crystallinity of the oxide semiconductor is lowered in some cases. In addition, a heavy metal such as iron or nickel, argon, carbon dioxide, or the like has a large atomic radius (or molecular radius) and thus disorders the atomic arrangement in the oxide semiconductor, whereby the crystallinity of the oxide semiconductor is lowered in some cases. Hence, the CAAC-OS is an oxide semiconductor with a low impurity concentration. Note that the impurity included in the oxide semiconductor might serve as a carrier generation source.
In the CAAC-OS, distribution of crystal parts is not necessarily uniform. For example, in the formation process of the CAAC-OS, when crystal growth occurs from a surface side of the oxide semiconductor film, the proportion of crystal parts in the vicinity of the surface of the oxide semiconductor film is sometimes higher than that in the vicinity of the surface where the oxide semiconductor film is formed. Further, when an impurity is mixed into the CAAC-OS, the crystallinity of a crystal part in a region into which the impurity is mixed is lowered in some cases.
Further, the CAAC-OS can be formed by reduction in the density of defect states, for example. In an oxide semiconductor, for example, oxygen vacancies form defect states. The oxygen vacancies might serve as trap states or serve as carrier generation sources when hydrogen is trapped therein. In order to form the CAAC-OS, it is important to prevent oxygen vacancies from being generated in the oxide semiconductor, for example. Thus, the CAAC-OS is an oxide semiconductor with a low density of defect states. In other words, the CAAC-OS is an oxide semiconductor having few oxygen vacancies.
The state in which the impurity concentration is low and the density of defect states is low (the number of oxygen vacancies is small) is referred to as a “highly purified intrinsic” or “substantially highly purified intrinsic” state. A highly purified intrinsic or substantially highly purified intrinsic oxide semiconductor has few carrier generation sources, and thus has a low carrier density in some cases. Consequently, in some cases, a transistor including the oxide semiconductor in a channel formation region is less likely to have negative threshold voltage (to have normally-on characteristics). A highly purified intrinsic or substantially highly purified intrinsic oxide semiconductor has a low density of defect states and accordingly has a low density of trap states in some cases. Thus, the transistor including the oxide semiconductor in the channel formation region has a small variation in electrical characteristics and high reliability in some cases. A charge trapped by a trap state in an oxide semiconductor takes a long time to be released and may behave like a fixed charge. For this reason, a transistor that includes an oxide semiconductor with a high density of trap states in a channel formation region may have unstable electrical characteristics.
With the use of the highly purified intrinsic or substantially highly purified intrinsic CAAC-OS in a transistor, variation in the electrical characteristics of the transistor due to irradiation with visible light or ultraviolet light is small.
The CAAC-OS can be formed by sputtering using a DC power source, for example.
Table 1 shows comparison of the specifications between a memory circuit using a transistor including a film of a CAAC-OS containing an In—Ga—Zn-based oxide (hereinafter also referred to as CAAC-IGZO) and memory circuits using magnetoresistive random access memory (MRAM), resistive random access memory (ReRAM), and ferroelectric random access memory (FeRAM).
As described in the foregoing embodiments, the third memory circuit 13 can employ a structure capable of retaining data for a longer time than the second memory circuit 12. In view of this, an element included in the third memory circuit 13 can be MRAM, ReRAM, or FeRAM instead of the transistor using a CAAC-IGZO film. Note that as shown in Table 1, the memory circuit using a transistor including CAAC-IGZO for a channel formation region requires lower power for data writing than the other memory circuits. For example, a current necessary for data writing into MRAM is said to be 50 μA to 500 μA. On the other hand, when the transistor containing CAAC-IGZO for a channel formation region is used in the semiconductor device 10 having the structure in
This application is based on Japanese Patent Application serial no. 2013-064503 filed with Japan Patent Office on Mar. 26, 2013, the entire contents of which are hereby incorporated by reference.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2013-064503 | Mar 2013 | JP | national |
